• 대한전자공학회:학술대회논문집
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• 대한전자공학회 2008년도 하계종합학술대회
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• pp.383-384
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• 2008

In this paper, we extract interface trap density with treatment of gate dielectric of OTFT's. Interface trap densities in this paper were extracted from transfer curves. We obtained interface trap densities in pentacene / PVP interface Non-treated device has $1.4{\times}10^{12}cm^{-2}eV^{-1}$ Dit and treated device has $1.1{\times}10^{12}cm^{-2}eV^{-1}$ Dit.

• 전자공학회논문지A
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• 제29A권8호
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• pp.56-62
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• 1992

This paper is analyzed the charge trapping and electrical properties of 0(Oxide), NO(Nitrided oxide) and ONO(Reoxidized nitrided oxide) as dielectric films in MIS structures. We have processed bottom oxide and top oxide by the thermal method, and nitride(Si$_{3}N_{4}$) by the LPCVD(Low Pressure Chemical Vapor Deposition) method on P-type(100) Silicon wafer. We have studied the charge trapping properties of the dielectrics by using a computer controlled DLTS system. All of the dielectric films are shown peak nearly at 300K. Those are bulk traps. Many trap densities which is detected in NO films, but traps. Many trap densities which is detected in NO films. Varing the nitride thickness, the trap densities of thinner nitride is decreased than the thicker nitride. Finally we have found that trap densities of ONO films is affected by nitride thickness.

• 전자공학회논문지A
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• 제29A권8호
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• pp.71-77
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• 1992

According to increasing the doping concentration in p-n junction, a tunneling current through trap as well as SRH(Shockley-Read-Hall) generation-recombination current in depletion region occurs. It is the tunneling current that is a dominant current at the forward bias. In this paper, the new tunneling-recombination equation is derived. The thermal generation-recombination current and tunneling current though trap can be easily calculated at the same time because this equation has the same form as the SRH generation-recombination equation. For the validity of this equation, 2 kind of samples are simulated. The one is $n^{+}$-p junction device fabricated with MCT(Mercury Cadmium Telluride, mole fraction=0.29), the other Si n$^{+}-p^{+}$ junction. From the results for MCT $n^{+}$-p junction device and comparing the simulated and expermental I-V characteristics for Si n$^{+}-p^{+}$ junction, it is shown that this equation is a good description for tunneling through trap and thermal generation-recombination current calculation.

• Molecular & Cellular Toxicology
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• 제3권1호
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• pp.19-22
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• 2007

Optic tweezer is powerful tool to investigate biologic cells. Of eukaryotic cells, it was poorly documented regarding to optic trapping to manipulate yeasts. In preliminary experiment to explore yeast biology, interferometric optical tweezers was exploited to trap and manipulate budding yeasts. Successfully, several budding yeasts are trapped simultaneously. We found that the budding direction of the daughter cell was almost outward and the daughter cell surrounded by other yeasts grows slowly or fail to grow. Thus it was assumed that neighboring cells around budding yeast may be critical in budding and the growth of daughter cells. This is first report pertaining to the pattern of yeast budding under the optical trap when multiple yeasts were trapped.

• 한국자동차공학회논문집
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• 제4권3호
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• pp.50-60
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• 1996

We designed and developed the burner which would be adapted on the burner type diesel particulate trap system. The burner type particulate trap system consists of burner system to regenerate to ceramic filter, ceramic filter canister, system controller and etc. Many design factors which affect the performance of the burner system were discussed. We also investigated burner characteristics according to the operating parameters. Burned gas temperature could be controlled better by the 2nd air flow rate than the 1st one. As the space velocity increases, the axial and radial temperature gradients in the filter decreases.

• 한국자동차공학회논문집
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• 제3권6호
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• pp.41-54
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• 1995

A mathematical model for wall-flow monolith ceramic diesel particulate filter was developed in order to describe the processes which take place in the filter during regeneration. The major output of the model comprises ceramic wall temperature and regeneration time(soot reduction). Various numerical tests were performed to demonstrate how the gas oxygen concentration, flow rate and the initial particulate trap loading affect the regeneration time and peak trap temperature. The model is shown to b in reasonable agreement with the published experimental results. This model can be applied to predict the thermal shock failure due to high temperature during combustion regeneration process.

• 전자공학회논문지D
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• 제34D권6호
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• pp.43-49
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• 1997

Tungsten poycide has studied gate oxide reliability and dielectric strength charactristics as the composition of gate electrode which applied submicron on CMOS and MOS device for optimizing gate electrode resistivity. The gate oxide reliability has been tested using the TDDB(time dependent dielectric breakdwon) and SCTDDB (stepped current TDDB) and corelation between polysilicon and WSi$_{2}$ layer. iN the case of high intrinsic reliability and good breakdown chracteristics on polysilicon, confirmed that tungsten polycide layer is a better reliabilify properities than polysilicon layer. Also, hole trap is detected on the polysilicon structure meanwhile electron trap is detected on polycide structure. In the case of electron trap, the WSi$_{2}$ layer is larger interface trap genration than polysilicon on large POCL$_{3}$ doping time and high POCL$_{3}$ doping temperature condition. WSi$_{2}$ layer's leakage current is less than 1 order and dielectric strength is a larger than 2MV/cm.

• 한국정보통신학회:학술대회논문집
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• 한국해양정보통신학회 2002년도 추계종합학술대회
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• pp.575-578
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• 2002

In this paper, we discuss carrier trapping model and trap characteristics of nitrided oxide thin film. Based on the experimental results, the carrier trapping model for system having multi-traps is proposed and is fitted with experimental data in order to determine trap parameter of nitride oxide and O2 annealed nitrided oxide. As a results of curve fitting, the heavy nitridation of oxide introduces three kinds of traps with capture cross section $\sigma$n1=1.48$\times$10$^{-17}$ $\textrm{cm}^2$, $\sigma$n2=1.51$\times$10$^{-19}$ $\textrm{cm}^2$, $\sigma$p=1.53$\times$10$^{-18}$ $\textrm{cm}^2$ and corresponding trap densities Nnl=2.66$\times$10$^{12}$ Cm$^{-2}$ , Nn2=1.32$\times$10$^{12}$ Cm$^{-2}$ , Np=8.35$\times$10$^{12}$ Cm$^{-2}$ .

• 한국전기전자재료학회논문지
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• 제17권6호
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• pp.668-672
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• 2004

Upon Debye's dielectric relaxation theory, we tried simple determination method of trap level in organic EL materials. From dielectric measurements in the 20 Hz - 1 MHz frequency range and in the 150 K - 320K temperature range, the depth of traps in Alq$_3$ filled with remaining electrons was determinated. Comparing to other determination techniques like TSL, or TL, the apparatus all we need is just simple LCR meter, thermometer and cooling method(liquid nitrogen). The mean activation energy is about 0.20 eV. It is in good agreement with previous determinations by other techniques like TSL. This results consolidate the validity of Burrow's transport mechanism model. Further intensified experiment with UV light on the dielectric absorption(Photodipolair effect) was nevertheless disturbed by the photoconductivity component.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2001년도 추계학술대회 논문집
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• pp.497-500
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• 2001

Due to their better photosensitivity in X-ray, the amorphous selenium based photoreceptor is widely used on the X-ray conversion materials. It was possible to control the charge carrier transport of amorphous selenium by suitably alloying a-Se with other elements(e,g. As, Cl). The charge transport properties of amorphous Selenium is decided on hole which is induced from metal to selenium in metal-selenium junction and which is transferred in a-Se bulk. This phenomenon is resulted of changing electric field owing to increasing of space charge by deep trap of a-Se bulk. In this paper, We dopped the chlorine to compensate deep hole trap and deposited blocking layer using dielectric material to prevent from increasing space charge for injection charge between metal electrode and a-Se layer. We compared space charge and the decreasing of trap density through measuring dark and photo current.