• 제목/요약/키워드: Transparent Conductive Electrode

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반응성 DC sputtering으로 제작한 Sno$_2$:Sb 박막의 전기적.광학적 특성 (Electrical and Optical proper ties of Sno$_2$:sb thin Films Using Reactive DC Suttering)

  • 정해원;이천;신재혁;송국현;신성호;박정일;박광자
    • 한국표면공학회지
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    • 제30권6호
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    • pp.406-411
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    • 1997
  • Transparent conductive thin films have found many applications in active and passive electronic and opto-electronic devices such as flat panel display electrode, solar cell electrode and window heat mirror, etc. Low resistivity and high transmittance of these films can beotained by controlling deposition parameters which are oxygen partial pressure, substrate temperature and dopant concentration. In this study, non-stoichiometric and Sb-doped thin electrical properties of undoped films have been degraded with increase of substrate temperature and optical properties have been improved in Sb-doped films. The resistivity of $2.5\times10^{-3}\Omega\textrm{cm}$,/TEX>, average transmittance of 80% and sheet resistance of 130$\Omega$/$\square$ at thickess of 2000 $\AA$ could be obrained at optmal condimal conditions which were at $400^{\circ}C$ of substrate temperature, 58% of oxygen partial pressure and 5% of Sb doping concentration.

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Improvement on the Stability of Amorphous Indium Gallium Zinc Oxide Thin Film Transistors Using Amorphous Oxide Multilayer Source/Drain Electrodes

  • Lee, Sang Yeol
    • Transactions on Electrical and Electronic Materials
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    • 제17권3호
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    • pp.143-145
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    • 2016
  • In order to find suitable source and drain (S/D) electrodes for amorphous InGaZnO thin film transistors (a-IGZO TFTs), the specific contact resistance of interface between the channel layers and various S/D electrodes, such as Ti/Au, a-IZO and multilayer of a-IGZO/Ag/a-IGZO, was investigated using the transmission line model. The a-IGZO TFTs with a-IGZO/Ag/a-IGZO of S/D electrodes had good performance and low contact resistance due to the homo-junction with channel layer. The stability was measured with different electrodes by a positive bias stress test. The result shows the a-IGZO TFTs with a-IGZO/Ag/a-IGZO electrodes were more stable than other devices.

저가의 Ti 박막이 증착된 유리 기판을 사용한 TCO-less 염료감응형 태양전지의 응용 (Fabrication of TCO-less Dye-sensitized Solar Cells by Using Low Cost Ti Layer Deposited Glass Substrate)

  • 정행윤;기현철;구할본
    • 한국전기전자재료학회논문지
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    • 제27권11호
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    • pp.725-729
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    • 2014
  • In this study, a transparent conductive oxide (TCO)-less dye-sensitized solar cells (DSSCs) was fabricated by using titanium (Ti) electrode to replace the Fluorine-doped tin oxide (FTO) for the reduction of manufacturing cost. Ti film was formed by electron beam evaporation method and the results showed the sheet resistance of Ti electrodes with a thikness of 500 nm similar to FTO. In case of power conversion efficiency (PCE), a DSSC with Ti electrodes showed a lower value than that with FTO by 0.38%. For the investigation of the difference, the DSSCs were measured and analyzed by using electrochemical impedance analyzer (EIS).

저저항 투명전극/광추출층 집적기판과 이의 OLED 소자 응용 기술 개발 (Developtment of Integrated Substrate with Highly Conductive Transparent Electrode and Light Extraction Layer and Its Applications for OLED Lighting)

  • 정성훈;안원민;김도근
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2017년도 춘계학술대회 논문집
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    • pp.161.1-161.1
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    • 2017
  • 최근 OLED기술을 조명에 응용하고자 하는 연구가 급증되고 있다. 이는 유연하고, 대면적 확장이 가능하며, 다양한 형태 구현에 있어 장점이 존재하기에 차세대 감성조명으로써 주목을 받고 있다. 고효율의 OLED 조명을 위해서는 저저항/고유연의 투명전극 소재의 개발을 통해 전기적 손실을 최소화해야하고, 광추출층의 적용을 통해 내부에서 생성된 빛을 외부로 잘 방출시켜 광학적 손실을 최소화해야한다. 이를 위해 많은 다양한 투명전극에 대한 연구와 광추출을 위한 방법에 대한 연구가 진행이 되고 있고, 두 가지 효과를 한번에 얻을 수 있는 집적기판에 대한 수요가 높아지고 있다. 본 연구는 인쇄공정과 플라즈마 공정을 통해, 미세배선이 함몰된 집적 기판을 개발하여 저저항/고유연 투명전극을 구현하였고 기판상 나노구조체 형성을 통해 광추출 효율을 기존에 비해 20% 이상 향상시킬 수 있었다. 이러한 기판은 향후 대면적 OLED 조명에 응용이 가능할 것이라 전망한다.

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Methods to Improve Light Harvesting Efficiency in Dye-Sensitized Solar Cells

  • Park, Nam-Gyu
    • Journal of Electrochemical Science and Technology
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    • 제1권2호
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    • pp.69-74
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    • 2010
  • Methodologies to improve photovoltaic performance of dye-sensitized solar cell (DSSC) are reviewed. DSSC is usually composed of a dye-adsorbed $TiO_2$ photoanode, a tri-iodide/iodide redox electrolyte and a Pt counter electrode. Among the photovoltaic parameters of short-circuit photocurrent density, open-circuit voltage and fill factor, short-circuit photocurrent density is the collective measure of light harvesting, charge separation and charge collection efficiencies. Internal quantum efficiency is known to reach almost 100%, which indicates that charge separation occurs without loss by recombination. Thus, light harvesting efficiency plays an important role in improvement of photocurrent. In this paper, technologies to improve light harvesting efficiency, including surface area improvement by nano-dispersion, size-dependent light scattering efficiency, bi-functional nano material, panchromatic absorption by selective positioning of three different dyes and transparent conductive oxide (TCO)-less DSSC, are introduced.

NiO/AZO anode를 적용한 OLED의 정공주입 향상에 관한 연구 (A study on the enhancement of hole injection in OLED using NiO/AZO Anode)

  • 진은미;송민종;김진사;박춘배
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 하계학술대회 논문집 Vol.8
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    • pp.444-445
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    • 2007
  • Aluminum-doped zinc oxide (AZO) films are attractive materials as transparent conductive electrode because they are inexpensive, nontoxic and abundant element compared with indium tin oxide (ITO). AZO films have been deposited on glass (coming 1737) substrates by RF magnetron sputtering system. An ultrathin layer of nickel oxide (NiO) was deposited on the AZO anode to enhance the hole injections in organic light-emitting diodes (OLED). The current density-voltage and luminescence-voltage properties of devices were studied and compared with ITO device.

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XPS 분석에 의한 AZO 박막의 전기전도 메커니즘 해석 (Electric conduction mechanism Analysis of AW Thin Films using XPS Measurement)

  • 진은미;김경민;박춘배
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 하계학술대회 논문집 Vol.8
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    • pp.446-447
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    • 2007
  • Aluminisum-doped zinc oxide (AZO) films are attractive materials as transparent conductive electrode because they are inexpensive, nontoxic and abundant element compared with indium tin oxide (ITO). In our paper, AZO films have been deposited on glass (coming 1737) substrates by RF magnetron sputtering. The AZO film was post-annealed at $600^{\circ}C$, $800^{\circ}C$ for 2 hr with $N_2$ atmosphere, respectively. We investigated that the electric properties and qualitative analysis of AZO films, which measured using the methods of Hall effect, X-ray photoelectron spectroscopy (XPS).

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CONDUCTIVE SnO$_2$ THIN FILM FABRICATION BY SOL-GEL METHOD

  • Lee, Seung-Chul;Lee, Jae-Ho;Kim, Young-Hwan
    • 한국표면공학회지
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    • 제32권3호
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    • pp.456-460
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    • 1999
  • Transparent conducting tin (IV) oxide thin films have been studies and developed for the electrode materials of solar cell substrate. Fabrication of tin oxide thin films by sol-gel method is process development of lower cost photovoltaic solar cell system. The research is focused on the establishment of process condition and development of precursor. The precursor solution was made of tin isopropoxide dissolved in isopropyl alcohol. The hydrolysis rate was controlled by addition of triethanolamine. Dip and spin coating technique were applied to coat tin oxide on borosilicate glass. The resistivity of the thin film was lower than 0.1Ω-cm and the transmittance is higher than 90% in a visible range.

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Preparation of Transparent conductive oxide cathode for Top-Emission Organic Light-Emitting Device by FTS system and RF system

  • Hong, Jeong-Soo;Park, Yong-Seo;Kim, Kyung-Hwan
    • 반도체디스플레이기술학회지
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    • 제9권3호
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    • pp.23-27
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    • 2010
  • We prepared Al doped ZnO thin film as a top electrode on a glass substrate with a deposited $Alq_3$ for the top emission organic Light emitting device (TEOLED) with facing target sputtering (FTS) method and radio-frequency (RF) sputtering method, respectively. Before the deposition of AZO thin film, we evaporated the $Alq_3$ on glass substrate by thermal evaporation. And we evaluated the damage of organic layer. As a result, PL intensity of $Alq_3$ on grown by FTS method showed higher than that of grown by RF sputtering method, so we found that the FTS showed the lower damage sputtering than RF sputtering. Therefore, we can expect the FTS method is promising the low-damage sputtering system that can be used as a direct sputtering on the organic layer.

RF 마그네트론 스퍼터링을 이용한 p 타입 투명전도 산화물 SrCu2O2 박막의 제조 (Fabrication of P-type Transparent Oxide Semiconductor SrCu2O2 Thin Films by RF Magnetron Sputtering)

  • 석혜원;김세기;이현석;임태영;황종희;최덕균
    • 한국재료학회지
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    • 제20권12호
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    • pp.676-680
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    • 2010
  • Most TCOs such as ITO, AZO(Al-doped ZnO), FTO(F-doped $SnO_2$) etc., which have been widely used in LCD, touch panel, solar cell, and organic LEDs etc. as transparent electrode material reveal n-type conductivity. But in order to realize transparent circuit, transparent p-n junction, and introduction of transparent p-type materials are prerequisite. Additional prerequisite condition is optical transparency in visible spectral region. Oxide based materials usually have a wide optical bandgap more than ~3.0 eV. In this study, single-phase transparent semiconductor of $SrCu_2O_2$, which shows p-type conductivity, have been synthesized by 2-step solid state reaction at $950^{\circ}C$ under $N_2$ atmosphere, and single-phase $SrCu_2O_2$ thin films of p-type TCOs have been deposited by RF magnetron sputtering on alkali-free glass substrate from single-phase target at $500^{\circ}C$, 1% $H_2$/(Ar + $H_2$) atmosphere. 3% $H_2$/(Ar + $H_2$) resulted in formation of second phases. Hall measurements confirmed the p-type nature of the fabricated $SrCu_2O_2$ thin films. The electrical conductivity, mobility of carrier and carrier density $5.27{\times}10^{-2}S/cm$, $2.2cm^2$/Vs, $1.53{\times}10^{17}/cm^3$ a room temperature, respectively. Transmittance and optical band-gap of the $SrCu_2O_2$ thin films revealed 62% at 550 nm and 3.28 eV. The electrical and optical properties of the obtained $SrCu_2O_2$ thin films deposited by RF magnetron sputtering were compared with those deposited by PLD and e-beam.