• 제목/요약/키워드: Transistor detector

검색결과 46건 처리시간 0.032초

디지털 방사선영상에서 고스팅 아티팩트 (Ghosting Artifacts in Digital Radiography)

  • 정원희;천권수
    • 한국방사선학회논문지
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    • 제8권7호
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    • pp.377-382
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    • 2014
  • 방사선 임상 관련 분야에서 컴퓨터의 사용으로 인해 카세트 사용에서는 볼 수 없는 아티팩트가 만들어지고 있다. 고스팅 아티팩트는 평판형 박막 트랜지스터(Flat Panel Thin-Film Transistor) 배열 검출기를 사용할 때 발생될 수 있다. 특히 고선량의 방사선을 고대조도의 물질에 노출시킨 영상을 획득한 후, 바로 저선량의 조사가 이루어진 영상이 획득될 때 고스팅 아티팩트가 발생할 수 있다. 본 실험에서 고스팅 아티팩트가 육안 관찰시 3분에서 사라지는 것을 확인할 수 있었으며 정량적 분석으로는 대략 6분에서 없어지는 것을 확인할 수 있었다. 또한 이 아티팩트는 관전류보다는 관전압의 영향을 더 받는다는 사실과 노출에 의한 포획전하의 방출이 아닌 시간에 의해 포획전하가 소멸된다는 사실을 실험을 통해 검증할 수 있었다.

Label-free Femtomolar Detection of Cancer Biomarker by Reduced Graphene Oxide Field-effect Transistor

  • Kim, Duck-Jin;Sohn, Il-Yung;Jung, Jin-Heak;Yoon, Ok-Ja;Lee, N.E.;Park, Joon-Shik
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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    • pp.549-549
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    • 2012
  • Early detection of cancer biomarkers in the blood is of vital importance for reducing the mortality and morbidity in a number of cancers. From this point of view, immunosensors based on nanowire (NW) and carbon nanotube (CNT) field-effect transistors (FETs) that allow the ultra-sensitive, highly specific, and label-free electrical detection of biomarkers received much attention. Nevertheless 1D nano-FET biosensors showed high performance, several challenges remain to be resolved for the uncomplicated, reproducible, low-cost and high-throughput nanofabrication. Recently, two-dimensional (2D) graphene and reduced GO (RGO) nanosheets or films find widespread applications such as clean energy storage and conversion devices, optical detector, field-effect transistors, electromechanical resonators, and chemical & biological sensors. In particular, the graphene- and RGO-FETs devices are very promising for sensing applications because of advantages including large detection area, low noise level in solution, ease of fabrication, and the high sensitivity to ions and biomolecules comparable to 1D nano-FETs. Even though a limited number of biosensor applications including chemical vapor deposition (CVD) grown graphene film for DNA detection, single-layer graphene for protein detection and single-layer graphene or solution-processed RGO film for cell monitoring have been reported, development of facile fabrication methods and full understanding of sensing mechanism are still lacking. Furthermore, there have been no reports on demonstration of ultrasensitive electrical detection of a cancer biomarker using the graphene- or RGO-FET. Here we describe scalable and facile fabrication of reduced graphene oxide FET (RGO-FET) with the capability of label-free, ultrasensitive electrical detection of a cancer biomarker, prostate specific antigen/${\alpha}$ 1-antichymotrypsin (PSA-ACT) complex, in which the ultrathin RGO channel was formed by a uniform self-assembly of two-dimensional RGO nanosheets, and also we will discuss about the immunosensing mechanism.

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Wireless Communication at 310 GHz using GaAs High-Electron-Mobility Transistors for Detection

  • Blin, Stephane;Tohme, Lucie;Coquillat, Dominique;Horiguchi, Shogo;Minamikata, Yusuke;Hisatake, Shintaro;Nouvel, Philippe;Cohen, Thomas;Penarier, Annick;Cano, Fabrice;Varani, Luca;Knap, Wojciech;Nagatsuma, Tadao
    • Journal of Communications and Networks
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    • 제15권6호
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    • pp.559-568
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    • 2013
  • We report on the first error-free terahertz (THz) wireless communication at 0.310 THz for data rates up to 8.2 Gbps using a 18-GHz-bandwidth GaAs/AlGaAs field-effect transistor as a detector. This result demonstrates that low-cost commercially-available plasma-wave transistors whose cut-off frequency is far below THz frequencies can be employed in THz communication. Wireless communication over 50 cm is presented at 1.4 Gbps using a uni-travelling-carrier photodiode as a source. Transistor integration is detailed, as it is essential to avoid any deleterious signals that would prevent successful communication. We observed an improvement of the bit error rate with increasing input THz power, followed by a degradation at high input power. Such a degradation appears at lower powers if the photodiode bias is smaller. Higher-data-rate communication is demonstrated using a frequency-multiplied source thanks to higher output power. Bit-error-rate measurements at data rates up to 10 Gbps are performed for different input THz powers. As expected, bit error rates degrade as data rate increases. However, degraded communication is observed at some specific data rates. This effect is probably due to deleterious cavity effects and/or impedance mismatches. Using such a system, realtime uncompressed high-definition video signal is successfully and robustly transmitted.

Micromachined ZnO Piezoelectric Pressure Sensor and Pyroelectric Infrared Detector in GaAs

  • Park, Jun-Rim;Park, Pyung
    • Journal of Electrical Engineering and information Science
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    • 제3권2호
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    • pp.239-244
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    • 1998
  • Piezoelectric pressure sensors and pyroelectric infrared detectors based on ZnO thin film have been integrated with GaAs metal-semiconductor field effect transistor (MESFET) amplifiers. Surface micromachining techniques have been applied in a GaAs MESFET process to form both microsensors and electronic circuits. The on-chip integration of microsensors such as pressure sensors and infrared detectors with GaAs integrated circuits is attractive because of the higher operating temperature up to 200 oC for GaAs devices compared to 125 oC for silicon devices and radiation hardness for infrared imaging applications. The microsensors incorporate a 1${\mu}$m-thick sputtered ZnO capacitor supported by a 2${\mu}$m-thick aluminum membrane formed on a semi-insulating GaAs substrate. The piezoelectric pressure sensor of an area 80${\times}$80 ${\mu}$m2 designed for use as a miniature microphone exhibits 2.99${\mu}$V/${\mu}$ bar sensitivity at 400Hz. The voltage responsivity and the detectivity of a single infrared detector of an area 80${\times}$80 $\mu\textrm{m}$2 is 700 V/W and 6${\times}$108cm$.$ Hz/W at 10Hz respectively, and the time constant of the sensor with the amplifying circuit is 53 ms. Circuits using 4${\mu}$m-gate GaAs MESFETs are fabricated in planar, direct ion-implanted process. The measured transconductance of a 4${\mu}$m-gate GaAs MESFET is 25.6 mS/mm and 12.4 mS/mm at 27 oC and 200oC, respectively. A differential amplifier whose voltage gain in 33.7 dB using 4${\mu}$m gate GaAs MESFETs is fabricated for high selectivity to the physical variable being sensed.

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Development and Evaluation of a Thimble-Like Head Bolus Shield for Hemi-Body Electron Beam Irradiation Technique

  • Shin, Wook-Geun;Lee, Sung Young;Jin, Hyeongmin;Kim, Jeongho;Kang, Seonghee;Kim, Jung-in;Jung, Seongmoon
    • Journal of Radiation Protection and Research
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    • 제47권3호
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    • pp.152-157
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    • 2022
  • Background: The hemi-body electron beam irradiation (HBIe-) technique has been proposed for the treatment of mycosis fungoides. It spares healthy skin using an electron shield. However, shielding electrons is complicated owing to electron scattering effects. In this study, we developed a thimble-like head bolus shield that surrounds the patient's entire head to prevent irradiation of the head during HBIe-. Materials and Methods: The feasibility of a thimble-like head bolus shield was evaluated using a simplified Geant4 Monte Carlo (MC) simulation. Subsequently, the head bolus was manufactured using a three-dimensional (3D) printed mold and Ecoflex 00-30 silicone. The fabricated head bolus was experimentally validated by measuring the dose to the Rando phantom using a metal-oxide-semiconductor field-effect transistor (MOSFET) detector with clinical configuration of HBIe-. Results and Discussion: The thimble-like head bolus reduced the electron fluence by 2% compared with that without a shield in the MC simulations. In addition, an improvement in fluence degradation outside the head shield was observed. In the experimental validation using the inhouse-developed bolus shield, this head bolus reduced the electron dose to approximately 2.5% of the prescribed dose. Conclusion: A thimble-like head bolus shield for the HBIe- technique was developed and validated in this study. This bolus effectively spares healthy skin without underdosage in the region of the target skin in HBIe-.

박막트랜지스터의 방사선 내구성 평가 (Radiation Resistance Evaluation of Thin Film Transistors)

  • 전승익;이봉구
    • 한국방사선학회논문지
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    • 제17권4호
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    • pp.625-631
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    • 2023
  • 24시간/7일 동안 높은 관전압 하에서 높은 프레임 속도로 검사 대상체의 불량을 검사하는 산업용 동영상 엑스레이 디텍터의 중요한 요구사양은 높은 방사선 내구성을 확보하는 것이다. 본 연구는 비정질 실리콘 (a-Si), 다결정 실리콘 (Poly-Si), In-Ga-Zn-O 산화물 (IGZO) 등의 반도체 층을 갖는 다양한 박막트랜지스터를 제작하여 각각의 방사선 내구성을 확인하였다. a-Si TFT 대비 수십 배 높은 전계효과 이동도로 고속 동영상 구현이 가능한 IGZO TFT의 경우, IGZO 반도체 층과 층간절연막 사이에 수소화 처리를 진행할 경우 산업용 요구사양인 10,000 Gy 누선선량까지 엑스레이 영상센서로 적용 가능한 수준 이상으로 전기적 특성의 변화가 없음을 확인하였다. 따라서 수소화한 IGZO TFT는 방사선 내구성을 확보함과 동시에 높은 전계효과 이동도로 동영상 디텍터의 영상센서에 적용 가능한 유일한 소자임을 확인하였다.

능동소자의 접합 커패시턴스를 이용한 VCO 설계에 관한 연구 (A Study on the Design of VCO Using Junction Capacitance of Active Element)

  • 강석엽;박욱기;고민호;박효달
    • 한국항행학회논문지
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    • 제8권1호
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    • pp.57-65
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    • 2004
  • 본 논문에서는 경량화, 소형화 가격절감에 맞추어 전압 제어 발진기의 공진기 부분에 바랙터 다이오드를 사용하지 않고, 발진부에 사용된 트랜지스터의 베이스 단에 제어 전압을 인가하여 TR 내부 커패시턴스를 변화시키므로 하여 X/Ku 대역 민수용 RD에 사용 가능한 전압 제어 발진기를 설계 및 제작하였다. 시뮬레이션을 수행 한 결과 설계한 전압 제어 발진기는 4.25 V에서 4.80 V까지의 제어 전압에 의하여 약 110 MHz의 주파수 동조 범위를 보였으며, 11.46 GHz 동작 주파수에서 9.63 dBm의 출력 및 1 MHz의 옵셋 주파수에서 -107.2 dBc의 위상잡음 특성을 나타내어 상용 목적에 적합한 성능을 내었다.

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PLL 고정시간의 저감대책 수립과 저 지터 구현을 위한 위상-주파수 감지기의 설계 (A Design of Phase-Frequency Detector for Low Jitter and Fast Locking Time of PLL)

  • 정석민;이종석;김종열;우영신;성만영
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1999년도 추계학술대회 논문집 학회본부 B
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    • pp.742-744
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    • 1999
  • In this paper, a new precharge type PFD for fast locking time of PLL is suggested. It is realized by inserting NMOS transistor and inverter into the precharge part of PFD for isolating the reset of the Up signal from the feedback signal. The new precharge type PFD generates the Up signal while the feedback signal is fixed at a high level. Therefore the new PFD output is increased than the conventional precharge type PFD output. As a result of the increased PFD output, fast locking of PLLs is achieved. Additionally, with control the falling time of the inverter, the dead-zone is reduced and the jitter characteristics are improved. The whole characteristics of PFD and PLL are simulated by using HSPICE. Simulation results show that the dead-zone is 20ps and the locking time of PLL using the new PFD is 38ns at the 350MHz frequency of referecne signal. This value is quite small compared with conventional PFD.

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고효율 X선 검출기 적용을 위한 PbO 필름 제작 및 특성 연구 (Fabrication and Characterization of Lead Oxide (PbO) Film for High Efficiency X-ray Detector)

  • 조성호;강상식;최치원;권철;남상희
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 하계학술대회 논문집 Vol.8
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    • pp.329-329
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    • 2007
  • Photoconductive poly crystalline lead oxide coated on amorphous thin film transistor (TFT) arrays is the best candidate for direct digital x-ray detector for medical imaging. Thicker films with lessening density often show lower x-ray induced charge generation and collection becomes less efficient. In this work, we present a new methodology used for the high density deposition of PbO. We investigate the structural properties of the films using X-ray diffraction and electron microscopy experiments. The film coatings of approximately $200\;{\mu}m$ thickness were deposited on $2"{\times}2"$ conductive-coated glass substrates for measurements of dark current and x-ray sensitivity. The lead oxide (PbO) films of $200\;{\mu}m$ thickness were deposited on glass substrates using a wet coating process in room temperature. The influence of post-deposition annealing on the characteristics of the lead oxide films was investigated in detail. X-ray diffraction and scanning electron microscopy, and atomic force microscopy have been employed to obtain information on the morphology and crystallization of the films. Also we measured dark current, x-ray sensitivity and linearity for investigation of the electrical characteristics of films. It was found that the annealing conditions strongly affect the electrical properties of the films. The x-ray induced output charges of films annealed in oxygen gas increases dramatically with increasing annealing temperatures up to $500^{\circ}C$ but then drops for higher temperature anneals. Consequently, the more we increase the annealing temperatures, the better density and film quality of the lead oxide. Analysis of this data suggests that incorporation and decomposition reactions of oxygen can be controlled to change the detection properties of the lead oxide film significantly. Post-deposition thermal annealing is also used for densely film. The PbO films that are grown by new methodology exhibit good morphology of high density structure and provide less than $10\;pA/mm^2$ dark currents as they show saturation in gain (at approximate fields of $4\;V/{\mu}m$). The ability to operate at low voltage gives adequate dark currents for most applications and allows voltage electronics designs.

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평판 디지털 X-ray 검출기의 개발과 성능 평가에 관한 연구 (Development of $14"{\times}8.5"$ active matrix flat-panel digital x-ray detector system and Imaging performance)

  • 박지군;최장용;강상식;이동길;석대우;남상희
    • 대한방사선기술학회지:방사선기술과학
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    • 제26권4호
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    • pp.39-46
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    • 2003
  • 의료영상 분야에서의 디지털화가 시도되면서부터 평판형 디지털 영상검출기가 일반촬영 및 투시영상을 비롯한 다양한 영상 획득 장치에의 적용을 위해 꾸준히 연구, 개발되어져 왔다. 본 연구는 비정질 셀레늄을 이용한 디지털 방사선 검출기를 통해 획득된 영상의 평가를 통해 순수 국내 기술로 개발중인 디지털 방사선 검출기의 임상 사용여부를 확인하고, 영상평가의 주요인자인 modulation transfer function (MTF), noise power spectrum (NPS), and detective quantum efficiency (DQE) 이용하여 정량적인 값을 도출함으로써 의료영상평가에 필요한 측정 방법 및 그 기초 자료의 제공을 그 목적으로 한다. 비정질 셀레늄을 이용한 디지털 방사선 검출기는 pixel pitch가 $139\;{\mu}m$이며, 전체 active area은 $14{\times}8.5\;inch^2$, 전체 pixel의 수는 3.9백만개이다. 디지털 X-선 검출기에서 광도전체로서 비정질 셀레늄은 TFT 평판 패널 위에 진공 증착된다. 비정질 셀레늄의 두께는 $500\;{\mu}m$이다. 디지털 방사선 검출기의 성능을 평가하기 위해 민감도, 선형성, MTF, NPS, 그리고 DQE가 측정되었다. 선형성 평가에서는 뛰어난 선형성[($r^2$)=0.9693]을 보였다. 측정된 민감도는 인가전압 $10\;V/{\mu}m$에서 $4.16{\times}10^6\;ehp/pixel{\cdot}mR$이며, MTF는 2.5\;lp/mm에서 52%이다. 그리고 DQE는 1.5\;lp/mm에서 75%이다. 본 연구를 통해 영상평가 측정 기술의 기본적 토대를 마련하고, 측정된 값은 국내 기술로 개발중인 비정질 셀레늄을 이용한 직접방식의 디지털 방사선 검출기의 임상적 사용가치가 충분함을 뒷받침할 수 있는 기초 자료로서 제공될 수 있을 것으로 판단된다.

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