• Restorative Dentistry and Endodontics
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• v.29 no.3
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• pp.273-280
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• 2004

The purpose of this study was to evaluate the etching effects and bond strength of total etching and self-etching adhesive system on unground enamel using scanning electron microscopy and microtensile bond strength test. The buccal coronal unground enamel from human extracted molars were prepared using low-speed diamond saw. Scotchbond Multi-Purpose (group SM). Clearfil SE Bond (group SE), or Adper Prompt L-Pop (group LP) were applied to the prepared teeth. and the blocks of resin composite (Filtek Z250) were built up incrementally. Resin tag formation was evaluated by scanning electron microscopy. after removal of enamel surface by acid dissolution and dehydration. For microtensile bond strength test. resin-bonded teeth were sectioned to give a bonded surface area of $1\textrm{mm}^2$. Microtensile bond strength test was perfomed. The results of this study were as follows. 1. A definite etching pattern was observed in Scotchbond Multi-Purpose group. 2. Self-etching groups were characterized as shallow and irregular etching patterns. 3. The results (mean) of microtensile bond strength were SM: 26.55 MPa, SE: 18.15 MPa, LP: 15.57 MPa. SM had significantly higher microtensile bond strength than 8E and PL (p < 0.05). but there was no significant differance between SE and PL.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.592-592
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• 2012

태양전지에서 고효율 달성을 위해 태양광을 더 많이 활용하기 위해서는 태양전지 표면에서의 광 반사를 줄여야 하는데 가장 효과적인 방법은 실리콘 기판의 wet etching 공정을 통한 텍스쳐링이다. 태양전지에서 가장 많이 사용되는 파장대역은 가시광선 영역인데 555 nm 파장에서 실리콘 표면의 total reflectance는 30.1%로 매우 높고 diffuse reflectance는 0.1%로서 무시할만큼 적다. 하지만 wet etching을 한 후 total reflectance는 18%까지 감소하였고, diffuse reflectance는 16%까지 증가하였다. 결정면에 따른 식각선택성을 이용하는 이방성 etching으로 V groove 모양의 표면형상을 얻을 수 있었고, 후속 등방성 etching을 하여 U groove 표면형상을 얻을 수 있었다. 또한 wet etching의 문제점중의 하나는 반응중에 생성되는 수소기체가 실리콘 표면에 부착되어 etching이 불균일하게 진행되는 것인데 초음파를 사용하여 이 문제를 해결하였다. 그리고 Etchant의 성분용액중 하나인 IPA의 농도조절을 통해 표면에 형성되는 피라미드의 크기를 조절할 수 있었다. 본 연구에서는 실리콘 표면형상의 각각 서로 다른 크기와 모양에 따라 태양전지를 만들었을 때 빛의 활용 측면에서 어떤 변화가 있고 얼마만큼의 효율변화가 있는지에 대해서도 알아보았다.

• Proceedings of the KACD Conference
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• 2003.11a
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• pp.618-618
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• 2003

The purpose of this study was to evaluate the etching effects and bond strength of total etching and self-etching adhesive system on unground enamel using scanning electron microscopy and microtensile bond strength test. The buccal coronal unground enamel from human extracted molars were prepared using low-speed deamond saw. Scotchbond Multi-Purpose(group CM), Clearfil SE Bond(group SE), or Adper Prompt L-pop(group LP) were applied to the prepared teeth, and resin compasite(Z-250) was built up incrementally. Resin tag formation were evaluated by scanning electron microscopy, after removal of enamel surface by acid dissolution and dehydration.(중략)

• Restorative Dentistry and Endodontics
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• v.32 no.4
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• pp.365-376
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• 2007

The purpose of this study was to evaluate the effect of different etching times on microtensile bond strength (${\mu}TBS$) to dentin both initial and after thermocycling with 3 different types of total-etching adhesives. Fifty four teeth were divided into 18 groups by etching times (5, 15, 25 sec), adhesives types (Scotchbond Multipurpose (SM), Single Bond (SB), One-Step (OS)) and number of thermocycling (0, 2,000 cycles). Flat dentin surfaces were prepared on mid-coronal dentin of extracted third molars. After exposed fresh dentin surfaces were polished with 600-grit SiC papers, each specimen was acid-etched with 35% phosphoric acid (5, 15, 25 sec) and bonded with 3 different types of total etching adhesives respectively. Then, hybrid composite Z-250 was built up. Half of them were not thermocycled (control group) and the ethers were subjected to 2,000 thermocycle (experimental group). They were sectioned occluso-gingivally into $1.0\;{\times}\;1.0\;mm^2$ composite-dentin beams and tested with universal testing machine at a crosshead speed of 1.0 mm/min. Within limited data of this study, the results were as follows 1. There was no statistically significant difference in ${\mu}TBS$ between the thermocycled and non-thermocycled groups, except for both SM and SB etched for 25 sec. 2. In thermocycled SM and SB groups, bond strength decreased by extended etching time. In total etching systems, adhesive durability for dentin could be affected by type of solvents in adhesive and etching time. Especially, extended etching time may cause deteriorate effects on bond strength when ethanol-based adhesive was used.

• Corrosion Science and Technology
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• v.2 no.5
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• pp.238-242
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• 2003

The characteristics of Ru etching using $O_2/Cl_2$ plasmas were investigated by employing inductively coupled plasma (ICP) etcher. The changes of Ru etch rate, Ru to $SiO_2$ etch selectivity and Ru electrode etching slope with the gas flow ratio, bias power, total gas flow rate, and source power were scrutinized. A high etching slope (${\sim}86^{\circ}$) and a smooth surface after etching was attained using $O_2/Cl_2$ inductively coupled plasma.

• Journal of the Korean Vacuum Society
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• v.8 no.4A
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• pp.476-481
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• 1999

Characteristics of platinum dry etching were investigated in a cryogenic magnetized inductively coupled plasma (MICP). The problem with platinum etching is the redeposition of sputtered platinum on the sidewall. Because of the redeposits on the sidewall, the etching of patterned platinum structure produces feature sizes that exceed the original dimension of the PR size and the etch profile has needle-like shape [1]. The main object of this study was to investigate a new process technology for fence-free Pt etching As bias voltage increased, the height of fence was reduced. In cryogenic etching, the height of fence was reduced to 20% at-$190^{\circ}C$ compared with that of room temperature, however the etch profile was not still fence-free. In Ar/$SF_6$ Plasma, fence-free Pt etching was possible. As the ratio of $SF_6$ gas flow is more than 14% of total gas flow, the etch profile had no fence. Chemical reaction seemed to take place in the etch process.

• Journal of the Korean Society for Precision Engineering
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• v.30 no.6
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• pp.638-643
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• 2013

Laser beam machining (LBM) is fast, contactless and able to machine various materials. So it is used to cut metal, drill holes, weld or pattern the imprinted surface. However, after LBM, there still leave burrs and recast layers around the machined area. In order to remove these unwanted parts, LBM process often uses electrochemical etching (ECE). But, the total thickness of workpiece is reduced because the etching process removes not only burrs and recast layers, but also the entire surface. In this paper, surface coating was performed using enamel after LBM on metal. The recast layer can be selectively removed without decreasing total thickness. Comparing with LBM process only, the surface quality of enamel coating process was better than that. And edge shape was also maintained after ECE.

• Restorative Dentistry and Endodontics
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• v.10 no.1
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• pp.7-16
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• 1984

The purpose of this study was to investigate the pulpal responses to adhesive resins as phosphoric ester system: "Clearfil F II" (Composite filling material), "Panavia EX" (Composite cementing Material) and "Silar" (Microfilled Compsoite resin) comparing with Zinc-Oxide-Eugenol cement. Total 70 cavities of the permanent healthy teeth from 5 dogs were prepared and placed with experimental resins and Zinc-Oxide-Eugenol cement as control. The dogs were sarificed at 5 intervals of 3 days, one, two, four, six weeks. The specimens were routinely prepared and stained by Hematoxylin-Eosin. Followings were the results obtained through microscopic examination. 1. In cases of Clearfil F II and Panavia EX without etching and lining, pulp response in the early stage showed more severe vascular congestion and hemorrhage than that of Zinc-Oxide-Engenol cement. 2. The pulp response of totally etched cases was similar to that of unetched cases in the groups of Clearfil F II and Panavia EX. 3. The cases of Clearfil F II and Panavia EX with enamel etching showed no significant histologic change compared to that of total cavity etching. 4. The Silar case with total etching showed retarded tendency of histologic recovery compared to Clearfil F II and Panavia EX group. 5. Generally, pulp responses of experimental groups were not severe and the six week case showed the evidence of a histologic recovery.

• Proceedings of the Optical Society of Korea Conference
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• 2009.02a
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• pp.133-134
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• 2009

Cold temperature development (CTD) of electron beam (EB) patterned resists and subsequent dry etching were investigated for fabrication of nano-patterned Niobium (Nb). Bulky Nb fims on GaAs substrates were deposited with EB evaporation. Line patterns on Nb cathode were fabricated by EB patterning and reactive ion etching (RIE). Size deviations of nano-sized line patterns from CAD designed patterns are dependent on the EB total exposure, but it can be improved by CTD of EB-exposed resist. Line patterns of 10 to 300 nm widths of EB-exposed resist patterns were drawn under various exposure conditions of $0.2{\mu}s$/dot (total 240,000 dot) with a constant current (50 pA). Compared with room temperature development (RTD), the CTD improves pattern resolution due to the suppression of backscattering effect. RIE with $CF_4$ was performed for formation of several nano-sized line patterns on Nb. Each EB-resist patterned samples with RTDs and CTDs were etched with two different $CF_4$ gas pressures of 5 Pa. Nb etching rate increases while GaAs (or ZEP) etching rate decreases as the chamber pressure increases. This different dependent of the etching rate on the $CF_4$ pressure between Nb and GaAs (or ZEP) has a significant meaning because selective etching of nano-sized Nb line patterns is possible without etching of the underlying active layer.

• Journal of the korean academy of Pediatric Dentistry
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• v.36 no.4
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• pp.514-521
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• 2009

The aim of this study was to evaluate the bonding ability of two self etch systems to human primary and permanent enamel and the effect of additional acid etching time. Exfoliated, caries free human primary molar(n=65) and permanent molar extracted (n=65) were used. prepared enamel specimens were randomly divided into 2 test groups and a control group. The control group(n=10) were treated with 35% phosphoric acid gel and Scotchbond Multi-purpose adhesive. Experimental groups(self-etching systems) were subdivided into 6 groups(each n=10) according to additional etching time(0s, 5s, 10s, 15s, 20s, 30s). The result were as follows : 1) The shear bond strengths of the self-etching adhesives(Clearfil SE Bond, Adper Prompt L-pop) without additional etching were lower than control group(Scotch Bond Multipurpose). 2) Between the same self-etch adhesive groups, additional etched groups showed higher shear bond strength 3) There was no significant difference between primary and permanent enamel. In conclusion, bond strength of self-etch adhesives to enamel could be increased with additional etching.