• Proceedings of the Korean Ceranic Society Conference
• /
• 2000.10a
• /
• pp.172.1-172
• /
• 2000

• Journal of the Korean institute of surface engineering
• /
• v.24 no.4
• /
• pp.196-205
• /
• 1991

Multi-level thin films are very important in ULSI applications because of their high electromigration resistance. This study presents the effects of titanium, titanium nitride and titanium tungsten underlayers of the stability of multi-aluminum thin films during isothermal annealing. High purity Al(99.999%) films have been electron-beam evaporated on Ti, TiN, TiW films formed on SiO2/Si (P-type(100))-wafer substrates by RF-sputtering in Ar gas ambient. The hillock growth was increased with annealing temperatures. Growth of hillocks was observed during isothermal annealing of the thin films by scanning electron microscopy. The hillock growth was believed to appear due to the recrystallization process driven by stress relaxation during isothermal annealing. Thermomigration damage was also presented in thin films by grain boundary grooving processes. It is shown that underlayers of Al/TiN/SiO2, Al/TiW/SiO2 thin films are preferrable to Al/SiO2 thin film metallization.

• Journal of the Semiconductor & Display Technology
• /
• v.16 no.2
• /
• pp.55-60
• /
• 2017

The supercritical $CO_2$ (sc-$CO_2$) mixture and the sc-$CO_2$-based Photoresist(PR) stripping(SCPS) process were applied to the removal of the post etch/ash PR residue on aluminum patterned wafers and the results were observed by scanning of electron microscope(SEM). In the case of MDII wafers, the carbonized PR was able to be effectively removed without pre-stripping by oxygen plasma ashing by using sc-$CO_2$ mixture containing the optimum formulated additives at the proper pressure and temperature, and the same result was also able to be obtained in the case of HDII wafer. It was found that the efficiency of SCPS of ion implanted wafer improved as the temperature of SCPS was high, so a very large amount of MEA in the sc-$CO_2$ mixture could be reduced if the temperature could be increased at condition that a process permits, and the ion implanted photoresist(IIP) on the wafer was able to be removed completely without pre-treatment of plasma ashing by using the only 1 step SCPS process. By using SCPS process, PR polymers formed on sidewalls of metal conductive layers such as aluminum films, titanium and titanium nitride films by dry etching and ashing processes were removed effectively with the minimization of the corrosion of the metal conductive layers.

• Corrosion Science and Technology
• /
• v.22 no.4
• /
• pp.232-241
• /
• 2023

The mechanical properties of the hydrogen valve responsible for supplying and blocking hydrogen gas in a hydrogen fuel cell electric vehicle (FCEV) were researched. Mechanical properties by hydrogen embrittlement were investigated by coating chromium nitride (CrN) and titanium nitride (TiN) on aluminum alloy by arc ion plating method. The coating layer was deposited to a thickness of about 2 ㎛, and a slow strain rate test (SSRT) was conducted after hydrogen embrittlement to determine the hydrogen embrittlement resistance of the CrN and TiN coating layers. The CrN-coated specimen presented little decrease in mechanical properties until 12 hours of hydrogen charging due to its excellent resistance to hydrogen permeation. However, both the CrN and TiN-coated specimens exhibited deterioration in mechanical properties due to the peeling of the coating layer after 24 hours of hydrogen charging. The specimens coated at 350 ℃ presented a significant decrease in ultimate tensile strength due to abnormal grain growth.

• Proceedings of the Korean Institute of Surface Engineering Conference
• /
• 2012.05a
• /
• pp.159-159
• /
• 2012

티타늄-알루미늄(Titanium-Aluminum) 질화물(Nitride)은 고경도 난삭재의 고능률 절삭 분야에 사용되는 공구의 수명 향상을 위한 표면처리 소재로 각광을 받고 있다. 본 연구에서는 아크 소스로 TiAl 타겟을 사용 하였으며, $N_2$ 유량을 변화시키며 코팅을 실시하였다. 그 결과 경도 883~2510 Hv로 나타나는 것을 확인하였다.

• Journal of the Korean Society for Heat Treatment
• /
• v.10 no.2
• /
• pp.138-149
• /
• 1997

TiN and AlN are ceramic materials with extensive applications due to its excellent mechanical and chemical properties at elevated temperature. The purpose of this research is to develop the method for the synthesis of ternary nitride powder, titanium-aluminum-nitrogen system, which have an excellent property of both TiN and AlN. The ternary nitride such as $Ti_3AlN$, $Ti_2AlN$ and $Ti_3Al_2N_2$ can be synthesized by the interdiffusion nitriding method in Ar gas, however, the ternary nitride coexist with TiN, AlN, $Ti_3Al$ and ${\alpha}$-Ti. The ternary nitride are stable below $1400^{\circ}C$, but these are gradually decomposed into TiN, $Ti_3Al$ and AlN above $1400^{\circ}C$. The thermal oxidation characteristics of the Ti-Al-N compound synthesized by the interdiffusion nitriding method is superior to that of the TiN+AlN mixed powder, and the oxidation for both materials show the differential behaviors.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2011.08a
• /
• pp.269-269
• /
• 2011

티타늄-알루미늄(Titanium-Aluminum) 질화물(Nitride)은 고경도 난삭재의 고능률 절삭 분야에 사용되는 공구의 수명 향상을 위한 표면처리 소재로 각광을 받고 있다. 건식고속가공을 효과적으로 수행하기 위해서는 코팅막 재료가 가공 중 발생하는 고온에서도 견디는 우수한 내산화성을 지니면서 내마모, 내충격 특성등의 기계적 성질이 우수한 코팅을 필요로 하며 이러한 분야에 TiAlN을 적용하기 위한 많은 연구가 진행되고 있다. 본 연구에서는 아크(Cathodic Arc) 코팅을 시스템을 이용하여 N2 유량변화에 따라 TiAlN 박막을 제조하고 그 특성을 평가하였다. 아크 소스에 장착된 타겟은 120 $mm{\Phi}$, Ti : Al=50 : 50 at% 의 TiAl 타겟을 사용 하였고, 시편과 타겟 간의 거리는 약 30 cm이며, 시편은 SUS를 사용하였다. 시편을 진공용기에 장착하고 ~10-6 Torr까지 진공배기를 실시하고, Ar 가스를 진공용기 내로 공급하여 ~10-4 Torr에서 시편에 bias (Pulse : 400V)를 인가한 후 아크를 발생시켜 약 5분간 청정을 실시하였다. 플라즈마 청정이 끝나면 시편에 인가된 bias를 차단하고 N2 유량을 변화시키며 코팅을 실시하였다. 질소 유량이 증가함에 따라 색상은 회색에서 어두운 보라색으로 변화하였고 SEM 사진을 통해 Micro paticle 이 감소하는 것을 확인 할 수 있었으며 이는 질소유량이 증가 할수록 표면조도 또한 감소하는 분석결과와도 일치하였다. XRD 분석을 통해 질소 유량이 160 sccm 이상에서 TiAlN이 합성되는 것을 볼 수 있었고 질소 유량이 240 sccm일 때 가장 높은 경도를 보였다. 따라서 본 연구에서 얻어진 결과를 바탕으로 더욱 다양한 조건에서 TiAlN 코팅에 응용한다면 다양한 색상 구현과 내마모성 등에서 많은 장점을 얻을 수 있을 것으로 예상된다.

• The korean journal of orthodontics
• /
• v.51 no.4
• /
• pp.270-281
• /
• 2021

Objective: The aim of this in vitro study was to evaluate the changes in friction between orthodontic brackets and archwires coated with aluminum oxide (Al₂O₃), titanium nitride (TiN), or chromium nitride (CrN). In addition, the resistance of the coatings to intraoral conditions was evaluated. Methods: Stainless steel canine brackets, 0.016-inch round nickel-titanium archwires, and 0.019 × 0.025-inch stainless steel archwires were coated with Al₂O₃, TiN, and CrN using radio frequency magnetron sputtering. The coated materials were examined using scanning electron microscopy, an X-ray diffractometer, atomic force microscopy, and surface profilometry. In addition, the samples were subjected to thermal cycling and in vitro brushing tests, and the effects of the simulated intraoral conditions on the coating structure were evaluated. Results: Coating of the metal bracket as well as nickel-titanium archwire with Al₂O₃ reduced the coefficients of friction (CoFs) for the bracket-archwire combination (p < 0.01). When the bracket and stainless steel archwire were coated with Al₂O₃ and TiN, the CoFs were significantly lower (0.207 and 0.372, respectively) than that recorded when this bracket-archwire combination was left uncoated (0.552; p < 0.01). The friction, thermal, and brushing tests did not deteriorate the overall quality of the Al₂O₃ coatings; however, some small areas of peeling were evident for the TiN coatings, whereas comparatively larger areas of peeling were observed for the CrN coatings. Conclusions: Our findings suggest that the CoFs for metal bracket-archwire combinations used in orthodontic treatment can be decreased by coating with Al₂O₃ and TiN thin films.

• International Journal of Ocean System Engineering
• /
• v.2 no.2
• /
• pp.106-115
• /
• 2012

In the present study, TiN and CrN films were coated by arc ion plating equipment onto aluminum alloy substrate, A2024. The film thickness was about 4.65 ${\mu}m$. TiN and CrN films were analyzed by X-ray diffraction and energy dispersive X-ray equipments. The Young's modulus and the micro-Vickers hardness of aluminum substrate were modified by the ceramic film coatings. The difference in Young's modulus between substrate and coating film would affect on the wear resistance. The critical load, Lc, was 75.8 N for TiN and 85.5 N for CrN. It indicated from the observation of optical micrographs for TiN and CrN films that lots of cracks widely propagated toward the both sides of scratch track in the early stage of MODE I. TiN film began to delaminate completely at MODE II stage. The substrate was finally glittered at MODE III stage. For CrN film, a few crack can be observed at MODE I stage. The delamination of film was not still occurred at MODE II and then was happened at MODE III. This agrees with critical load measurement which the adhesive strength was greater for CrN film than for TiN film. Consequently, it was difficult for CrN to delaminate because the adhesive strength was excellent against Al substrate. The wear process, which the film adheres and the ball transfers, could be enhanced because of the increase in loading. The wear weight of ball was less for CrN than for TiN. This means that the wear damage of ball was greater for TiN than for CrN film. It is also obvious that it was difficult to delaminate because the CrN coating film has high toughness. The coefficient of friction was less for CrN coating film than for TiN film.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2012.02a
• /
• pp.151-151
• /
• 2012

빗각 증착법(oblique angle deposition; OAD)을 이용하여 코팅된 알루미늄과 질화 티타늄 박막의 특성을 분석하였다. OAD는 기판과 증발원이 수평하게 위치하는 일반적인 코팅방법과 다르게 기판이 증발원과 수평하게 놓이지 않고 일정한 각으로 기울여 코팅하는 방법을 의미한다. 코팅 시 기판이 증발원과 수평하지 않으면 입사되는 증기가 일정한 각도를 유지하기 때문에 코팅되는 박막의 구조가 달라지고 이로 인해서 물리적 특성도 변하게 된다. 본 연구에서는 음극아크와 스퍼터링을 이용하여 각각 질화 티타늄과 알루미늄을 빗각으로 코팅하여 박막의 미세구조와 물성 변화를 관찰하였다. 스퍼터링을 이용하여 빗각 코팅된 알루미늄의 경우, 박막의 구조가 치밀해지고 표면 조도가 낮아지는 현상이 관찰되었다. 알루미늄 박막의 치밀도와 표면조도 향상은 가시광선 영역의 반사율을 높이는 효과가 있었다. 강판에 알루미늄을 코팅하여 염수분무를 실시한 결과, 치밀한 조직으로 인해서 내식성이 향상되는 결과를 보였다. 음극 아크를 이용하여 빗각 코팅된 질화 티타늄 박막에서 기판과 수직하지 않고 일정한 각도로 기울어진 주상 조직이 관찰되었다. 기판에 수직하게 성장된 질화 티타늄 박막과 비교하여 기울어진 주상 구조의 박막은 경도가 높아지는 특성 변화가 관찰되었다. 빗각 증착법을 이용하여 박막의 조직, 물성 등을 제어할 수 있었다. 박막에 다양한 기능을 부여하는 코팅방법으로 빗각 증착법이 활용될 수 있을 것으로 판단된다.