• The Korean Journal of Ceramics
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• 제5권4호
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• pp.324-330
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• 1999

$Si_3N_4$-$TiB_2$ with 2 wt% $Al_2O_3$ and 4 wt% $Y_2O_3$ additives was hot pressed in a flowing $N_2$ environment with varying $TiB_2$ content from 10 to 50 vol%. Variations of mechanical (hardness, fracture toughness, and flexual strength), and tribological properties as a function of $TiB_2$ content were investigated. As the content of $TiB_2$ increased, relative density decreased due to the chemical reaction of $TiB_2$in $N_2$ environment. The reduction of density causes mechanical properties to be degraded with an increase of $TiB_2$ in $Si_3N_4$. Tribological properties were dependent of microstructure as well as mechanical properties, however, they were degraded strongly by the chemical reaction of $Si_3N_4$-$TiB_2$ during hot pressing in $N_2$ environment. SEM and TEM observations, and X-ray diffraction analysis that the chemical reaction products at the interface are TiCN, Si, and $SiO_2$. Also, the comparison of XRD patterns of the $Si_3N_4$-40 vol% $TiB_2$ composites hot pressed at $1,750^{\circ}C$ for 1 hour between in $N_2$ and in Ar gas was made. The XRD peaks of Si and $SiO_2$ were not found in Ar, but still a weak peak of TiCN was presented.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2003년도 하계학술대회 논문집 Vol.4 No.1
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• pp.88-91
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• 2003

Tungsten is widely used as a plug for the multi-level interconnection structures. However, due to the poor adhesive properties of tungsten (W) on $SiO_2$ layer, the Ti/TiN barrier layer is usually deposited onto $SiO_2$ for increasing adhesion ability with W film. Generally, for the W-CMP (chemical mechanical polishing) process, the passivation layer on the tungsten surface during CMP plays an important role. In this paper, the effect of oxidants controlling the polishing selectivity of W/Ti/TiN layer were investigated. The alumina ($Al_2O_3$) abrasive containing slurry with $H_2O_2$ as the oxidizer, was studied. As our preliminary experimental results, very low removal rates were observed for the case of no-oxidant slurry. This low removal rate is only due to the mechanical abrasive force. However, for Ti and TiN with $H_2O_2$ oxidizer, different removal rate was observed. The removal mechanism of Ti during CMP is mainly due to mechanical abrasive, whereas for TiN, it is due to the formation of metastable soluble peroxide complex.

• 방사성폐기물학회지
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• 제13권3호
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• pp.229-233
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• 2015

파이로프로세싱 전해환원 공정에서 현재 사용 중인 Pt 양극을 대체하기 위한 소재 개발은 매우 중요하다. 이 연구에서는 전기화학 반응시 산소를 발생시키는 전도성 세라믹 양극으로서 TiN의 전기화학적 거동을 알아보았다. UO₂의 전해환원이 일어나는 동안 TiN 양극의 적합성과 안정성에 대한 평가를 진행하였다. LiCl-Li₂O 용융염에서 TiN 양극을 이용하여 UO₂를 전기화학적으로 금속 U로 변환시킬 수 있었다. 반응 도중 TiN의 산화 반응은 관찰되지 않았다. 하지만 TiN 내부에서 공공이 생기는 것을 확인하였으며, 이에 따라 소재 수명에 제한이 있을 것으로 판단된다.

• 한국환경과학회지
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• 제17권11호
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• pp.1195-1201
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• 2008

Enhancing with non-metallic elemental nitrogen(N) is one of several methods that have been proposed to modify the electronic properties of bulk titanium dioxide($TiO_2$), in order to make $TiO_2$ effective under visible-light irradiation. Accordingly, current study evaluated the feasibility of applying visible-light-induced $TiO_2$ enhanced with N element to cleanse aromatic compounds, focusing on xylene isomers at indoor air quality(IAQ) levels. The N-enhanced $TiO_2$ was prepared by applying two popular processes, and they were coated by applying two well-known methods. For three o-, m-, and p-xylene, the two coating methods exhibited different photocatalytic oxidation(PCO) efficiencies. Similarly, the two N-doping processes showed different PCO efficiencies. For all three stream flow rates(SFRs), the degradation efficiencies were similar between o-xylene and m,p-xylene. The degradation efficiencies of all target compounds increased as the SFR decreased. The degradation efficiencies determined via a PCO system with N-enhanced visible-light induced $TiO_2$ was somewhat lower than that with ultraviolet(UV)-light induced unmodified $TiO_2$, which was reported by previous studies. Nevertheless, it is noteworthy that PCO efficiencies increased up to 94% for o-xylene and 97% for the m,p-xylene under lower SFR(0.5 L $min^{-1}$). Consequently, it is suggested that with appropriate SFR conditions, the visible-light-assisted photocatalytic systems could also become important tools for improving IAQ.

• 한국재료학회:학술대회논문집
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• 한국재료학회 2003년도 추계학술발표강연 및 논문개요집
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• pp.163-163
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• 2003

TiN barrier막 위에 metal organic chemical deposition(MOCVD)법으로 RuO$_2$ 를 증착시 TiN막 표면을 세정처리하지 않을 경우 RuO$_2$의 핵생성이 어렵고, 그로 인해 RuO$_2$ 연속막이 형성되기 힘들다. 그러므로 RuO$_2$의 핵생성을 향상시키기 위해 TiN막에 대한 전처리 세정이 필수적이다. TiN막의 전처리 세정방법으로 ECR plasma 세정법을 사용하였으며, $O_2$ plasma와 H$_2$ plasma 그리고 Ai plasma를 이용해 각각의 exposure time을 변화시키며 전처리 세정을 실시하였다. H$_2$ plasma와Ar plasma의 exposure time이 증가됨에 따라 RuO$_2$의 핵생성이 향상되었다. 본 연구에서는 scanning electron microscopy(SEM), Auger electron emission spectrometry(AES), Atomic Force Microscope(AFM), X-ray diffraction (XRD) 등의 분석을 통해 TiN막 표면에 대한 ECR plasma 전처리 세정 이 RuO$_2$의 핵생성과 연속막 성장에 미치는 효과에 대해 조사하였다.

• 한국재료학회지
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• 제22권8호
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• pp.439-444
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• 2012

To compare the photocatalytic performances of titania for purification of waste water according to applied voltages and doping, $TiO_2$ films were prepared in a 1.0 M $H_2SO_4$ solution containing $NH_4F$ at different anodic voltages. Chemical bonding states of F-N-codoped $TiO_2$ were analyzed using surface X-ray photoelectron spectroscopy (XPS). The photocatalytic activity of the co-doped $TiO_2$ films was analyzed by the degradation of aniline blue solution. Nanotubes were formed with thicknesses of 200-300 nm for the films anodized at 30 V, but porous morphology was generated with pores of 1-2 ${\mu}m$ for the $TiO_2$ anodized at 180 V. The phenomenon of spark discharge was initiated at about 98 V due to the breakdown of the oxide films in both solutions. XPS analysis revealed the spectra of F1s at 684.3 eV and N1s at 399.8 eV for the $TiO_2$ anodized in the $H_2SO_4-NH_4F$ solution at 180 V, suggesting the incorporation of F and N species during anodization. Dye removal rates for the pure $TiO_2$ anodized at 30 V and 180 V were found to be 14.0% and 38.9%, respectively, in the photocatalytic degradation test of the aniline blue solution for 200 min irradiation; the rates for the F-N-codoped $TiO_2$ anodized at 30 V and 180 V were found to be 21.2% and 65.6%, respectively. From the results of diffuse reflectance absorption spectroscopy (DRS), it was found that the absorption edge of the F-N-codoped $TiO_2$ films shifted toward the visible light region up to 412 nm, indicating that the photocatalytic activity of $TiO_2$ is improved by appropriate doping of F and N by the addition of $NH_4F$.

• 한국세라믹학회지
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• 제38권6호
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• pp.587-592
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• 2001

난소결성의 TiN에 방전 플라즈마 소결법을 적용하여 고밀도 TiN 소결체를 제조하였다. 제조된 TiN 시편의 소결특성 및 입성장 정도를 평가하였으며, 전자현미경을 이용하여 미세구조를 분석하였다. Milling 과정동안 잠입된 $Al_2$O$_3$는 1$700^{\circ}C$ 이상의 소결온도에서 TiN 분말과 반응하여 부분적으로 액상을 형성하여 물질이동을 가속화함으로써 치밀화가 저온에서 시작하도록 함으로써 궁극적으로 결정립성장 제어에 기여하는 것으로 확인되었다. 이러한 현상은 굽어진 TiN 결정입계와 결정입계 삼중점에 존재하는 $Al_2$O$_3$를 포함하는 2차 결정상 cluster의 존재로 설명되어진다.

• Bulletin of the Korean Chemical Society
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• 제29권1호
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• pp.159-164
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• 2008

Two kinds of CNT/TiO2 composite photocatalysts were synthesized with multi-walled carbon nanotubes (MWCNTs) and titanium(IV) n-butoxide (TNB) by a MCPBA oxidation method. Since MWCNTs had charge transfer and semiconducting, the CNT/TiO2 composite shows a good photo-degradation activity. The XRD patterns reveal that only anatase phase can be identified for MCT composite, but the HMCT composite synthesized with HCl treatment was observed the mixed phase of anatase and rutile. The EDX spectra were shown the presence as major elements of Ti with strong peaks. From the SEM results, the sample MCT and HMCT synthesized by the thermal decomposition with TNB show a homogenous sample with only individual MWCNTs covered with TiO2 without any jam-like aggregates between CNTs and TiO2. From the photocatalytic results, we could be suggested that the excellent activity of the CNT/TiO2 composites for organic dye and UV irradiation time could be attributed to combination effects between TiO2 and MWCNTs with plausible photodegradation mechanism.

• 한국전기전자재료학회논문지
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• 제28권1호
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• pp.7-11
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• 2015

In this study, $Si_3N_4$/SnZnO/AZO/Ag/Ti/ITO multi-layer film were prepared on glass substrate by DC/RF magnetron sputtering method. To prevent interfacial reaction between Ag and ITO layer, Ti buffer layer was inserted. Optical properties and sheet resistance were studied depending on laminating times of each multi-layered film especially in visible ray. The simulation program, EMP (essential macleod program), was adopted and compared with experimental data to expect the experimental result. It was found out that the transmittance of the first stacked $Si_3N_4$/SnZnO/AZO/Ag/Ti/ITO multi-layer film was more than 90%. However, with increasing stacking times, the optical properties of $Si_3N_4$/SnZnO/AZO/Ag/Ti/ITO multi-layer film get worse. Consequently, Ti layer is good for oxidation barrier, but too many uses of this layer may have an adverse effect to optical properties of TCO film.

• 한국분말재료학회지
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• 제15권1호
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• pp.13-17
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• 2008

Visible-light responsive $TiO_2$:Zr, N powders were prepared by polymer complex solution method and the particle properties were characterized by using transmission electron microscope, BET method, X-ray diffractometer and UV-Vis spectrophotometer. The photocatalytic reactivity of the catalysts was also estimated by analyzing NO degradation. Polyhedral $TiO_2$ powder having about 20 um in the average particle diameter was successfully prepared, The XRD analysis revealed that the as-prepared powder consisted of anatase and rutile phases. The light absorption of the as-prepared $TiO_2$:Zr, N powder was shifted to the visible light. In addition, the as-prepared $TiO_2$:Zr, N nanoparticles showed the higher photocatalytic activity than the commercial $TiO_2$ under both UV and visible lights.