• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2018년도 춘계학술대회 논문집
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• pp.71-71
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• 2018

현재 상용화된 Graphite 음극활물질의 경우 낮은 부피당, 무게당 용량을 가지며 이는 다양한 분야에 활용하는데 제약이 있다. $SiO_2$는 Si에 비해서는 낮은 용량이지만 metal oxide 계열 중 가장 높은 이론용량을 가지고 있으며, 리튬 이온과 반응 시 큰 부피팽창을 하며, 절연체로 전기전도도가 낮아 리튬이 차전지의 음극재로 상용화가 어려운 단점이 있다. 본 연구에서는 TEOS를 이용하여 탄소와 $SiO_2$를 동시에 $TiO_2$ microcone 구조에 코팅하여 3가지 물질의 복합체를 형성하여 용량을 증대시키고 구조적 안전성을 향상시키는 방법을 소개 한다. 음극재의 특성은 고분해능 주사전자현미경 (HR-SEM), 고분해능 엑스선 회절분석기 (XRD), 를 통해 조사하였으며, 순환전류법 (CV), 충 방전 싸이클 분석을 통해 리튬이차전지의 작동원리와 보다 향상된 성능을 규명하였다.

• Journal of Welding and Joining
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• 제14권6호
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• pp.93-100
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• 1996

Effect of a flux composition on weld metal toughness in submerged arc welding with 60kgf/$\textrm{mm}^2$ grade C-Mo type wires was investigated and interpreted in terms of weld metal microstructure and hardenability. Flux workability was also studied by characterizing a weld bead profile. Compared to other weld metals, .weld metal used alumina basic flux with nickel showed lowest oxygen content, highest hardenability and the most acicular ferrite. The highest impact toughness of that weld metal, however, was attributed to the tough matrix due to the nickel rather than to the larger amount of acicular ferrite. Manganese silicate flux had better workability than alumina basic flux, showing broader welding conditions resulting in a depth-to-width ratio of 0.5. The composition of oxides in the weld metal was dependent on the flux composition, showing MnO-SiO$_2$-TiO in manganese silicate flux and MnO-SiO$_2$-Al$_2$O$_3$-TiO in alumina basic flux. MnO-SiO$_2$composition in both oxides was similar to a tephroite.

• 한국자기학회지
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• 제11권3호
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• pp.129-133
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• 2001

본 연구에서는 TiO$_2$ 하지층이 첨가된 hexagonal barium-ferrite(BaM) 박막을 RF/DC magnetron sputtering system을 이용하여 상온에서 증착한 후, 여러 온도에서 열처리하여 결정화하였다. BaM박막에 TiO$_2$ 하지층을 첨가하여 열처리한 경우 Si와 BaM의 (006), (106), (114), (217), (2011) peak들이 사라지고 (008)의 intensity가 낮아졌으며 SiO$_2$와 (116), (302)의 peak들이 성장하였음을 XRD pattern을 통하여 알 수 있었다. BaM 박막의 자기적 특성을 VSM을 통하여 알아본 결과, 보자력, 잔류자화, 각형비 등의 자기적인 특성들은 수직에 비해 수평이 더 좋게 나타났는데, 이러한 결과로 박막면에 평행한 방향으로의 자화용이축이 존재하고 있다는 것을 알 수 있었다. SEM을 통하여 증착압력 및 열처리 시간에 따른 결정화 정도와 자기적 특성을 알아본 결과 5 mTor 보다 10 mTrr에서 더 좋게 나타났으며, 열처리를 시작한 뒤 10분 이내에 750 $^{\circ}C$ 이상에서 대부분의 특성변화가 일어났음을 알 수 있었다.

• 한국재료학회지
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• 제5권1호
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• pp.3-11
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• 1995

Titanium oxide$(TiO_{2})$ 박막을 금속 알콕사이드 물질인 $(Ti(OC_3H_7)_4$(titanium isopropoxide)를 이용하여 p-Si(100) 기판위에 상압 화학 기상 증착법으로 증착시켰다. $(TiO_{2})$ 박막의 증착기구는 단순경 계층 이론으로 잘 설명되었으며, 화학반응 지배 기구 영역에서 겉보기 활성화 에너지는 18.2kcal/mol이었다. 증착된 박막은 $250^{\circ}C$이상에서 anatase상의 결정질 박막이었으며, 고온에서 열처리를 했을 경우에 rutile상으로 전이하였다. 박막의 상전이에는 열처리 온도외에도 열처리 시간과 박막의 두께가 영향을 미쳤다. 정전용량-전압특성을 조사해 본 결과 전형적인 MOS 다이오드구조의 특성을 보였으며, 비유전율 상수는 약 80정도였다. 제조한 $(TiO_{2})$ 박막의 열처리 공정 후에는 정전용량이 감소하였으며, 첨가물을 사용한 박막은 열처리 전과 같았다. 이때 $V_{FB}$는 -0.5 ~ 1.5V였다. 전기전도 특성을 알아보기 위하여 전류-전압특성을 조사하였으며 증착된 박막의 전도기구는 hopping mechanism이었다. 전기적 특성을 개선하기 위해서 후열처리 방법과 박막 증착시 Nb, Sr을 첨가하였으며, 모두 누설전류의 감소와 정전파괴전압의 증가를 가져왔다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1997년도 춘계학술대회 논문집
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• pp.309-313
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• 1997

(Ba$_{x}$Sr$_{l-x}$)TiO$_3$(BST) thin fi1ms with various Ba/Sr ratios were deposited on Pt(80nm)/SiO$_2$(100nm)/Si by RF magnetron sputtering. BST thin films which have x=0.6, 0.5, 0.4 were studied dielectric properties with temperature variation. The frequency was used from 100Hz to 1MHz for measuring dielectric constant. The measurement conditions of dielectric constant with Temperature Variation were 1KHz and 2$0^{\circ}C$. As a result, the dielectric constant of BST thin film was about 425 and loss factor was 0.013. Also, with increasing Temperature, the dielectric constants of BST thin films were gradually decreased.sed.

• 한국결정성장학회지
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• 제11권1호
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• pp.38-42
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• 2001

Electric and dielectric(Ba,Sr)$TiO_3$[BST] thin films for emtal-Insulator-Semiconductor(MIS) capacitors have been studied. BST thin films wre deposted on p-Si(100) substrates bythe RF magnetron sputtering with tempratue range of 500~$600^{\circ}C$. The dielectric properties of MIS capacitors consisting of Al/BST/$SiO_2$/Si sandwich structure were evaluated ot redcue the leakage current density. The charge state densities of the MIS capacitors were determined by high frequency (1 MHz) C-V measurement. In order to reduce the leakage current in MIS capacitor, high quality $SiO_2$ layer was deposited on bare p-Si substrate. Depending on the oxygen pressure and substrate temperature both positive and negative polarities of effective oxide charge in the MIS capacitors were evaluated. It is considered that the density of electronic states, generated at the BST/$SiO_2$/p-Si interface due to the asymmetric structure within BST/$SiO_2$/Si structure, and the oxygen vacancy content has influence on the behavior of oxide charge.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2003년도 춘계학술대회 논문집 기술교육전문연구회
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• pp.66-70
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• 2003

This dissertation is about the development of $BaTiO_{3}$-type PTC(Positive Temperature Coefficient) thermistor by composition method. PTC samples were fabricated after setting the experimental composition equation as $(Ba_{0.95-x}Sr_{0.05}Ca_x)TiO_3\;-\;0.01TiO_2\;-\;0.01SiO_2\;-\;aMnCO_3\;-\;0.2Nb_{2}O_{5}$ and their testing results were analyzed. a PTC thermistor, having the characteristics of relatively low resistance at room temperature and c and a good temperature coefficient, has been developed.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2001년도 하계학술대회 논문집
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• pp.263-266
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• 2001

In this paper, we investigated dielectric properies for BST thin films that was deposited on MgO/Si substrates using RF magnetron sputtering. In here, MgO film was used to perform that a diffusion b arrier between the BST film and Si substrate and a buffer layer to assist the BST film growth. A d eposition condition for MgO films was RF Power of 50W, substrate temperature of room temperature and the working gas ratio of Ar:O$_2$ were varied from 90:10 to 60:47. Finally we manufactured the cap acitor of Al/BST/MgO/Si/Al structure to know electrical properties of this capacitor through I-V, C-V measurement. In the results, C-V aha racteristic curves was shown a ferroelectric property so we measured P-E. A remanent poliazation and coerceive electric field was present 2$\mu$C/cm$^2$ and -27kV/cm respectively at Ar:O$_2$=90:10. And a va clue of dielectric constant was 86 at Ar:02=90:10.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2010년도 제39회 하계학술대회 초록집
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• pp.322-322
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• 2010

Recently, anti-reflective films (AR) are one of the most studied parts of a solar cell since these films improve the efficiency of photovoltaic devices. Also, anti-reflection films on the textured silicon solar cells reduce the amount of reflection of the incident light, which improves the device performance due to light trapping of incident light into the cell. Therefore, we preformed two step processes to get textured Si (100) substrate in this experiment. Pyramid size of textured silicon had approximately $2{\sim}9\;{\mu}m$. A well-textured silicon surface can lower the reflectance to 10%. For more reduced reflection, TiO2 anti-reflection films on the textured silicon were deposited at $600^{\circ}C$ using titanium tetra-isopropoxide (TTIP) as a precursor by metal-organic chemical vapor deposition (MOCVD), and the deposited TiO2 layers were then treated by annealing for 2 h in air at 600 and $1000^{\circ}C$, respectively. In this process, the treated samples by annealing showed anatase and rutile phases, respectively. The thickness of TiO2 films was about $75{\pm}5\;nm$. The reflectance at specific wavelength can be reduced to 3% in optimum layer.

• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제55권1호
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• pp.1-5
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• 2006

The effect of A/B moi ratios and sintering temperatures on dielectric properties and microstructure of $(Ba_{0.93}Ca_{0.07})_m(Ti_{0.82}Zr_{0.18})O_3$ ceramics were investigated. The dielectric constant decreased with increasing the A/B mol ratio. However, the dielectric loss is improved. As the dielectric properties of A/B mol ratio with m = 1.009 at sintered temperature $1260^{\circ}C$, we obtained dielectric constant 12,800, dielectric loss $3.5\%$ and Y5V temperature characteristics. Highly reliable Ni-MLCCs, 1.6mm$(length){\time}0.8mm(width){\time}0.8mm$(height) with capacitance of 1.23 ${\mu}F$ and 야ssipation loss of $5.2\%$ were obtained employing dielectric material composed of $(Ba_{0.93}Ca_{0.07})_{1.009}(Ti_{0.82}Zr_{0.18})O_3$ - $MnO_2\;0.2wt\%-Y_2O_3\;0.18wt\%,\;-\;SO_2\;0.15wt\%-(Ba_{0.4}Ca_{0.6})SiO_3\;1wt\%$.