• Title/Summary/Keyword: Ti3SiC2

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Structural and Dielectric Properties of $PbTiO_3$ Ferroelectric Thin Film Prepared by Sol-Gel Processing (Sol-Gel법으로 제조된 $PbTiO_3$ 강유전 박막의 구조적, 유전적 특성)

  • 김준한;백동수;박창엽
    • Journal of the Korean Ceramic Society
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    • v.30 no.9
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    • pp.695-700
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    • 1993
  • In this study, we prepared Pb-Ti stock solution by sol-gel processing and deposited PbTiO3 thin film on a Pt coated SiO2/Si wafer by spin coating using the stock solution. We used lead acetate trihydrate and titanium isopropoxide. The stock solution was partially hydrolized and finally a 0.25M coating solution was prepared. We achieved spin coating at 4000rpm for 30 seconds and heated the thin film at 375$^{\circ}C$ for 5 minutes and at $600^{\circ}C$ for 5 minutes successively, first and second heating state. And the thin film was finally sintered at 90$0^{\circ}C$ for 1 hour in the air. The upper electrode of the thin film was made by gold sputtering and was cricle shape with radius 0.4mm. Measured dielectric constant, dissipation factor and phase transition temperature(Cuire Temp.) were about 275, 0.02 and 521$^{\circ}C$ respectively. To observe ferroelectric characteristics we calculated Pr(remnant polarization) and Ec(coercive field) byhysteresis curve. Ec was 72kV/cm and Pr was 11.46$\mu$C/$\textrm{cm}^2$.

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Ferroelectric properties of $Pb[(Zr,Sn)Ti]NbO_3$ Thin Films by Annealing (열처리에 따른 $Pb[(Zr,Sn)Ti]NbO_3$ 박막의 강유전 특성)

  • 최우창;최혁환;이명교;권태하
    • Proceedings of the IEEK Conference
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    • 2000.06b
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    • pp.24-27
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    • 2000
  • Ferroelectric P $b_{0.99}$〔(Z $r_{0.6}$S $n_{0.4}$)$_{0.9}$ $Ti_{0.1}$$_{0.98}$N $b_{0.02}$ $O_3$(PNZST) thin films were deposited by a RF magnetron sputtering on (L $a_{0.5}$S $r_{0.5}$)Co $O_3$(LSCO)/Pt/Ti/ $SiO_2$/Si substrate using a PNZST target with excess PbO of 10 mole%. The thin films deposited at the substrate temperature of 500 $^{\circ}C$ were crystallized to a perovskite phase after rapid thermal annealing(RTA) The thin films annealed at 650 $^{\circ}C$ for 10 seconds in air exhibited the good crystal structures and ferroelectric properties. The remanent polarization and coercive field of the PNZST capacitor were about 20 $\mu$C/$\textrm{cm}^2$ and 50 kV/cm, respectively. The reduction of the polarization after 2.2$\times$10$^{9}$ switching cycles was less than 10 %.0 %.%.0 %.0 %.

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Effects of PZT-Electrode Interface Layers on Capacitor Properties (PZT 박막 캐퍼시터의 특성에 기여하는 PZT-전극계면층의 영향)

  • Kim, Tae-Ho;Gu, Jun-Mo;Min, Hyeong-Seop;Lee, In-Seop;Lee, In-Seop
    • Korean Journal of Materials Research
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    • v.10 no.10
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    • pp.684-690
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    • 2000
  • In order to study effects of interfacial layers between $Pb(Zr,Til)Q_3(PZT)$ films and electrodes for Metal-Ferroelectric-MetaI(MFM) structure capacitors, we have fabricated the capacitors with the Pt/PZT/interfacial-layer/Pt/$TiO_2/SiO_2$/Si structure. $PbTiO_3(PT)$ interfacial layers were formed by sol-gel deposition and PbO, ZrO, and $TiO_2$ thin layers were deposited by reactive sputtering. $TiO_2$ interface layers result in the finest grains of PZT(crystalline Temp. $600^{\circ}C$) films compare to $PbO_2\;and\;ZrO_2$ layers. However, as the thickness of $TiO_2$ layer increases. PZT thin films become rough and electrical characteristics were deteriorated due to remained anatase phase. On the other hand. PT interface layers result in improved morphology of PZT films and do not significantly change ferroelectric properties. It is a also observed that seed layers at the middle and top of PZT films do not give significant effects on grain size but the PT seed layer at the interface between the bottom electrode and the PZT films results in the small grain size.

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Electrical Properties of (Bi,Y)4Ti3O12 Thin Films Grown by RF Sputtering Method

  • Nam, Sung-Pill;Lee, Sung-Gap;Bae, Seon-Gi;Lee, Young-Hie
    • Journal of Electrical Engineering and Technology
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    • v.2 no.1
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    • pp.98-101
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    • 2007
  • Yttrium(Y)-substituted bismuth titanate $(Bi_{4-x},Y_x)Ti_3O_{12}$ [x=0, 0.25, 0.5, 0.75, 1](BYT) thin films were deposited using an RF sputtering method on the $Pt/TiO_2/SiO_2/Si$ substrates. The structural properties and electrical properties of yttrium-substituted $(Bi_4-xYx)Ti_3O_{12}$ thin films were analyzed. The remanent polarization of $(Bi_4-xYx)Ti_3O_{12}$ films increased with increasing Y-content. The $(Bi_{3.25}Y_{0.75})Ti_3O_{12}$ films fabricated using a top Au electrode showed saturated polarization-electric field(P-E) switching curves with a remanent polarization(Pr) of $8{\mu}C/cm^2$ and coercive field (Ec) of 53 kV/cm at an applied voltage of 7 V. The $(Bi_{3.25}Y_{0.75})Ti_3O_{12}$ films exhibited fatigue-free behavior up to $4.5{\times}10^{11}$ read/write switching cycles at a frequency of 1MHz.

Preparation of A Bi$_4$Ti$_3$O$_{12}$ Thin Film and Its Electrical Properties (Bi$_4$Ti$_3$O$_{12}$ 박막의 제작과 그 특성에 관한 연구)

  • 김성진;정양희;윤영섭
    • Proceedings of the IEEK Conference
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    • 1999.11a
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    • pp.195-198
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    • 1999
  • A Bi$_4$Ti$_3$O$_{12}$ (BIT) thin film is prepared by sol-gel method using acetate precursors and evaluated whether it could be applied to NVFRAM. The drying and the annealing temperature are 40$0^{\circ}C$ and $650^{\circ}C$, respectively and they are determined from the DT-TG analysis. The BIT thin film deposited on Pt/Ta/SiO$_2$/Si substrate shows orthorhombic perovskite phase. The grain size and the surface roughness are about 100 nm and 70.2$\AA$, respectively. The dielectric constant and the loss tangent at 10 KHz are 176 and 0.038, respectively, and the leakage current density at 100㎸/cm is 4.71$mutextrm{A}$/$\textrm{cm}^2$. In the results of hysteresis loops measured at $\pm$250㎸/cm, the remanent polarization (Pr) and the coercive field (Ec) are 5.92$mutextrm{A}$/$\textrm{cm}^2$ and 86.3㎸/cm, respectively. After applying 10$^{9}$ square pulses of $\pm$5V, the remanent polarization of the BIT thin film decreases as much as about 33% from 5.92 $\mu$C/$\textrm{cm}^2$ of initial state to 3.95 $\mu$C/$\textrm{cm}^2$.

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Characteristic of ferroelectric properties of $(Bi,Ce)_4Ti_3O_{12}$ thin films deposited by pulsed laser deposition (Pulsed laser deposition 방법으로 증착된 $(Bi,Ce)_4Ti_3O_{12}$ 박막의 강유전 특성)

  • Oh, Young-Nam;Seong, Nak-Jin;Yoon, Soon-Gil;Jeon, Min-Gu;Woo, Seong-Ihl;Kim, Chang-Soo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2003.07a
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    • pp.168-171
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    • 2003
  • Bismuth layered structure, Cerium-substituted $Bi_4Ti_3O_{12}$ ($(Bi,Ce)_4Ti_3O_{12}$) thin films were prepared on the $Pt/TiO_2/SiO_2/Si$ substrates by the pulsed laser deposition method. We investigated the Ce-subsitituted effect on the grain orientation and ferroelectric properties. $Ce^{3+}$ ion substitution for $Bi^{3+}$ ion in perovskite layers of BTO decreased the deeree of c-axis orientation and increased the remanent polariation (2Pr). The structure and morphology of the films were characterized using X-ray diffraction and atomic force microscopy. The $(Bi,Ce)_4Ti_3O_{12}$ (BCT) thin films, which were annealed $700^{\circ}C\;and\;800^{\circ}C$ for 10min and 30min, showed a perovskite phase and dense microstructure. As the thickness of the BCT film was decresed that the ferroelectric properties of the BCT thin films were good.

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Electrical Properties of Sol-Gel Derived Ferroelectric Bi3.35Sm0.65Ti3O12 Thin Films

  • Kang, Dong-Kyun;Cho, Tae-Jin;Kim, Byong-Ho
    • Journal of the Korean Ceramic Society
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    • v.42 no.3 s.274
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    • pp.150-154
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    • 2005
  • Ferroelectric $Bi_{3.35}Sm_{0.65}Ti_{3}O_{12}(BSmT)$ thin films were synthesized by sol-gel process. In this experiments, $Bi(TMHD)_{3},\;Sm_{5}(O^{i}Pr)_{13},\;Ti(O^{i}Pr)_4$ were used as precursors, which were dissolved in 2-methoxyethanol. The BSmT thin films were deposited on the Pt/TiO/SiO/Si substrates by spin-coating. Thereafter, the thin films with the thickness of 240 nm were annealed from 600 to $720^{\circ}C$ in oxygen atmosphere for 1 h, and post-annealed in oxygen atmosphere for 1 h after deposition of Pt electrode to enhance the electrical properties. To investigate the effects of Sm-substitution in the BTO thin films, the BTO and BSmT thin films were prepared, respectively. The remanent polarization and coercive voltage of the BSmT thin films annealed at $720^{\circ}C$ were $19.48{\mu}C/cm^2$ and 3.40 V, respectively.

Fabrication and characteristics of porous ceramics from $ZrTiO_4$ based ceramic material (다공성 $ZrTiO_4$ 재료의 제조 및 특성)

  • Hur, Geun;Myoung, Seong-Jae;Lee, Yong-Hyun;Chun, Myoung-Pyo;Cho, Jeong-Ho;Kim, Byung-Ik;Shim, Kwang-Bo
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.18 no.1
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    • pp.5-9
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    • 2008
  • Cordierite has a very low thermal expansion coefficient, but has problem that it has a weak mechanical strength and is apt to be attacked by acid such as sulfur for using as a diesel particulate filter support. The physical properties of $ZrTiO_4$ modified with $SiO_2,\;Al_2O_3$, MoOx, $Cr_2O_3\;and\;Nb_2O_5$ were investigated with XRD, SEM, UTM and thermal expansion, etc. in this paper. $ZrTiO_4$ powder was synthesized as a monoclinic structure with processes that starting materials of $TiO_2\;and\;ZrO_2$ were mixed with ball mill and calcined above $1240^{\circ}C$ for 3 hr. Additive modified $ZrTiO_4$ specimens for flexural strength and thermal expansion measurement were obtained by mixing $ZrTiO_4$ powder with additives, pressing and firing at $1300^{\circ}C$ for 3 hr. The porosity of additive modified $ZrTiO_4$ decreased monotonically with increasing additive content by 5 wt% regardless of additive types and saturated for further increase of additive by 10wt. The flexural strength of $Al_2O_3$ (5, 10 wt%) modified $ZrTiO_4$ shows a large increase, but that of other additives modified $ZrTiO_4$ decreased. The thermal expansion coefficient of additive modified $ZrTiO_4$ except $Nb_2O_5$ decreased continuously with the content of additive. In particular, the lowest thermal expansion coefficient of $ZrTiO_4$ was obtained for the additive of $SiO_2$.

A Fabrication and ferroelectric properties of BLT Thin Films for FRAM (FRAM 응용을 위한 BLT 박막의 제작 및 특성)

  • Kim, Kyoung-Tae;Kwon, Ji-Woon;Shim, Il-Wun;Kim, Chang-Il
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.11b
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    • pp.565-568
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    • 2001
  • We have fabricated $Bi_{3.25}La_{0.75}Ti_{3}O_{12}(BLT)$ thin(200nm) films on the $Pt/Ti/SiO_{2}/Si$ substrates using a MOD(Metalorganic decomposition) method with annealing temperature from $550^{\circ}C$ to $750^{\circ}C$. The structural properties of the films examined by x-ray diffraction. The layered-perovskite phase obtained above $600^{\circ}C$. Scanning electron micrographs showed uniform surface composed of rodlike grains. The grain size increased with increasing annealing temperature. The BLT thin films showed little polarization fatigue test up to $3.5{\times}10^{9}$ bipolar cycling at a 5V and 100kHz.

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A Fabrication and ferroelectric properties of BLT Thin Films for FRAM (FRAM 응용을 위한 BLT박막의 제작 및 특성)

  • 김경태;권지운;심일운;김창일
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.11a
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    • pp.565-568
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    • 2001
  • We have fabricated $Bi_{3.25}$$La_{0.75}$ti$_3$O$_{12}$ (BLT) thin(200nm) films on the Pt/Ti/SiO$_2$/Si substrates using a MOD(Metalorganic decomposition) method with annealing temperature from 55$0^{\circ}C$ to 75$0^{\circ}C$. The structural properties of the films examined by x-ray diffraction. The layered-perovskite phase obtained above $600^{\circ}C$. Scanning electron micrographs showed uniform surface composed of rodlike grains. The grain size increased with increasing annealing temperature. The BLT thin films showed little polarization fatigue test up to 3.5x10$^{9}$ bipolar cycling at a 5V and 100kHz.kHz.

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