• Korean Journal of Materials Research
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• v.17 no.8
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• pp.447-451
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• 2007

We investigated the dependence of the various annealing conditions and thickness ($6\sim45nm$) of the Ti-doped $Al_2O_3$ coating on the electrochemical properties and the capacity fading of Ti-doped $Al_2O_3$ coated $LiCoO_2$ films. The Ti-doped-$Al_2O_3$-coating layer and the cathode films were deposited on $Al_2O_3$ plate substrates by RF-magnetron sputter. Microstructural and electrochemical properties of Ti-doped-$Al_2O_3$-coated $LiCoO_2$ films were investigated by transmission electron microscopy (TEM) and a dc four-point probe method, respectively. The cycling performance of Ti-doped $Al_2O_3$ coated $LiCoO_2$ film was improved at higher cut-off voltage. But it has different electrochemical properties with various annealing conditions. They were related on the microstructure, surface morphology and the interface condition. Suppression of Li-ion migration is dominant at the coating thickness >24.nm during charge/discharge processes. It is due to the electrochemically passive nature of the Ti-doped $Al_2O_3$ films. The sample be made up of Ti-doped $Al_2O_3$ coated on annealed $LiCoO_2$ film with additional annealing at $400^{\circ}C$ had good adhesion between coating layer and cathode films. This sample showed the best capacity retention of $\sim92%$ with a charge cut off of 4.5 V after 50 cycles. The Ti-doped $Al_2O_3$ film was an amorphous phase and it has a higher electrical conductivity than that of the $Al_2O_3$ film. Therefore, the Ti-doped $Al_2O_3$ coated improved the cycle performance and the capacity retention at high voltage (4.5 V) of $LiCoO_2$ films.

• Proceedings of the Korean Vacuum Society Conference
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• 1999.07a
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• pp.86-86
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• 1999

본 연구에서는 마이크로파 유전체 소자로서의 응용 및 절연 산화막으로의 응용을 위해 마이크로파 유전체 세라믹으로 사용되어 온 MgTiO3 물질을 펄스 레이저로 박막을 제조하였다. MgTiO3 는 주로 고주파에서 높은 유전율을 갖고 높은 품질계수 (22.000 at 5 GHz) 혹은 낮은 유전손실을 갖으며 유전특성의 온도 안정성이 우수하여 유전체 세라믹 재료로 응용된다. MgTiO3 박막의 성장은 KrF(파장:248nm) 엑시머 레이저를 이용했으며 공정조건으로 박막의 성장온도는 500-75$0^{\circ}C$, 산소 압력은 10-5-200mTorr, 성장 후 냉각시 산소분위기는 200Torr, 레이저 에너지 밀도는 1.5-5J/cm2 등의 조건으로 박막을 성장하였다. MgTiO3 박막을 여러 가지 기판, 즉 Al2O3(r-plane), Si, Pt 위에 성장시켰으며 기판에 따라 에픽텍셜 혹은 다결정 상태를 갖는 ilmenite 구조로 성장되었다. PLD(Pulsed laser deposition)법에 의해 형성된 MgTiO3 박막을 보면, 우선 Al2O3(r-plane) 기판위에 성장된 경우 $700^{\circ}C$에서 에픽텍셜하게 성장하였으며, Si 기판 위에 성장된 경우 $650^{\circ}C$에서부터 (003)면으로 우선 배향된 단일상의 ilmenite 구조가 형성된다. Ptdnl에 성장된 경우 $600^{\circ}C$에서부터 (003)면으로 우선배향성을 가지며 $650^{\circ}C$에서 결정의 안정화를 이루었으나, MgTiO3 박막은 전기적 특성으로 유전특성 및 유전분산 특성 등이 측정 분석되어 MgTiO3 박막의 고주파 유전체로의 응용에 관한 가능성을 토의하였다.

• Journal of the Korean Ceramic Society
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• v.22 no.6
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• pp.29-36
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• 1985

This study was carried out to research on the optimum condition of $MgAl_2O_4$ spinel synthesis and the chara-ceteristics of its sintered bodies. In this study the used materials-MgO $Al_2O_3$-were prepared from the extragrade chemicals $Mg(OH)_2 Al(OH)_3$ respectively. The tendency to spinel synthesis and sintering condition were discussed about additives of SEM and the characteristics of sintered bodies were measured by TMA etc, The results were as follows ; 1. The addion of $TiO_2$ promoted more effectively the sinterbility than that of $MnO_2$. 2. Residual $\alpha$-$Al_2O_3$ and MgO in theorectical composition samples were disappeared at 1$600^{\circ}C$ 3. When added MnO2 residual $\alpha$-$Al_2O_3$ and MgO were disappeared at 150$0^{\circ}C$ and 1$600^{\circ}C$ respectively. 4, . When added $TiO_2$ residual $\alpha$-$Al_2O_3$ and MgO were disappeared at 150$0^{\circ}C$ and 134$0^{\circ}C$ respectively.

• Journal of the Korean Ceramic Society
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• v.34 no.4
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• pp.368-372
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• 1997

The microwave dielectric properties of (1-x)La2/3TiO3-xLaAlO3 system in which LaAlO3 having $\varepsilon$r$\geq$90 and positive $\tau$f was investigated. The crystal system of (1-x)La2/3TiO3-xLaAlO3 was pseudo-cubic in the range of 0.1$\leq$x$\leq$0.07. Its lattice constant increased with increasing x in spite that the amount of LaAlO3 containing of smaller Al(0.57 $\AA$) ion than Ti(0.64 $\AA$) increased. As the amount of LaAlO3 increased from x=0.1 to 0.9, the relative dielectric constant ($\varepsilon$r) decreased from 50 to 23 and the temperature coefficient of resonant frequency($\tau$f) decreased from +84 to -50. On the other hand, the value of Q.f0 reached a maximum (148,000 at 7 GHz) at x=0.7, where a rapid increase in the peak intensity of XRD occured, and further increased after prolonged sintering. The microwave dielectric properties of $\varepsilon$r=37, Q.f0=47,000 (at 7 GHz), and $\tau$f=-2 ppm/$^{\circ}C$ were obtained near 0.6La2/3TiO3-0.4LaAlO3 (x=0.4) composition.

• Journal of the Korean Society for Heat Treatment
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• v.13 no.6
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• pp.398-404
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• 2000

The Ti-Al-V-N films have been deposited on various substrates by d.c and r.f reactive magnetron sputtering from a Ti-6Al-4V alloy target in mixed $Ar-N_2$ discharges. The films were investigated by means of XRD, AES, SEM/EDX, microhardness, TG and scratch test. The XRD and SEM results indicated that the films were of single B1 NaCl phase having dense columnar structure with the (111) preferred orientation. The composition of Ti-Al-V-N film was the Ti-7.1Al-4.3V-N(wt%) films. Adhesion and microhardness of Ti-Al-V-N films deposited by r.f magnetron sputtering method were better than those deposited by d.c magnetron sputtering method. The anti-oxidation properties of Ti-Al-V-N films were also superior to that of Ti-N film deposited by the same deposition conditions.

• Proceedings of the Materials Research Society of Korea Conference
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• 1998.05a
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• pp.108-108
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• 1998

• Proceedings of the Korean Powder Metallurgy Institute Conference
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• 2005.11a
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• pp.90-90
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• 2005

• Proceedings of the Korean Powder Metallurgy Institute Conference
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• 2005.04a
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• pp.61-61
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• 2005

• Proceedings of the Korean Ceranic Society Conference
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• 2003.10a
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• pp.60.1-60
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• 2003

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2006.10a
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• pp.80-80
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• 2006