• Title/Summary/Keyword: Ti-silicided Si FEA

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Fabrication of New Silicided Si Field Emitter Array with Long Term Stability (실리사이드를 이용한 새로운 고내구성 실리콘 전계방출소자의 제작)

  • Chang, Gee-Keun;Yoon, Jin-Mo;Jeong, Jin-Cheol;Kim, Min-Young
    • Korean Journal of Materials Research
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    • v.10 no.2
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    • pp.124-127
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    • 2000
  • A new triode type Ti-silicided Si FEA(field emitter array) was realized by Ti-silicidation of Ti coated Si FEA and its field emission properties were investigated. In the fabricated device, the field emission properties through the unit pixel with $200{\mu\textrm{m}}{\times}200{$\mu\textrm{m}}$ tip array in the area of $1000{\mu\textrm{m}}{\times}1000{$\mu\textrm{m}}$ were as follows : the turn-on voltage was about 70V under high vacuum condition of $10^8Torr$, and the field emission current and steady state current degradation were about 2nA/tip and 0.3%/min under the bias of $V_A=500V\;and\;V_G=150V$. The low turn-on voltage and the high current stability during long term operation of the Ti silicided Si FEA were due to the thermal and chemical stability and the low work function of silicide layer formed at the surface of Si tip.

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