• Transactions of the Korean Society of Mechanical Engineers A
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• v.21 no.10
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• pp.1674-1682
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• 1997

Fatigue tests were performed to investigate the effect of ceramic coatings as in TiN and TiCN on fatigue crack growth properties of ceramic coated 1Cr-1Mo-0.25V steel with different coating thickness in laboratory air conditions. The experimental results are described with respect to a Paris equation, da/dN=C(.DELTA.K)$^{m}$ , where the crack growth rate of coated specimens provided as similar growth rate as that of the uncoated specimen regardless of coating thickness. Furthermore, it was observed that the type of coating layer had virtually no effect on crack growth rate in the full region of stress intensity factor range. And it was also appeared that the final crack length of TiCN coated specimens was short compared to that of TiN coated, and the substrate specimens, in which it was inferred due to lowering the toughness of coated material from high hardness of TiCN coating layer itself.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.445.1-445.1
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• 2014

Dye-sensitized solar cells (DSSCs) have been widely investigated as a next-generation solar cell because of their simple structure and low manufacturing cost. The $TiO_2$ film with thickness of $8{\sim}10{\mu}m$, which consists of nanoparticles, acts as both a scaffold with a high surface-to-volume ratio for the dye loading and a pathway to remove the electrons. However, charge carriers have to move across many particle boundaries by a hopping mechanism. So, one dimensional nanostructures such as nanotubes, nanorods and nanowires should improve charge carrier transportation by providing a facile direct electron pathway and lowering the diffusion resistance. However, the efficiencies of DSSCs using one dimensional nanostructures are less than the $TiO_2$ nanoparticle-based DSSCs. In this work, the patterned $TiO_2$ film with thickness of $3{\mu}m$ was deposited using photolithography process to decrease of electron pathway and increase of surface area and transmittance of $TiO_2$ films. Properties of the patterned $TiO_2$ films were investigated by various analysis method such as X-ray diffraction, field emission scanning electron microscopy (FESEM) and UV-visible spectrophotometer.

• Journal of the Korean Institute of Telematics and Electronics D
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• v.36D no.5
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• pp.69-79
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• 1999

In this paper, we proposed a diffuion model of Ti diffused lithium niobate optical waveguide for fabricating waveguides with high refractive index and compared with conventional one. The achivement of low optical insertion loss between waveguide interface and single mode fibers was discussed as a function of Ti thickness for $\lambda$=1.55$\mu\textrm{m}$ The proposed diffusion method exhibited higher refractive index waveguide than conventional one for $\lambda$=0.6328$\mu\textrm{m}$ We have achieved the total fiber-waveguide-fiber insertion loss as low as 0.5dB/cm in z-cut and 1$\pm$0.5dB/cm in x-cut for both TM and TE mode of Mach-Zehnder interferometric waveguide in the range of Ti thickness 1000-1400$\AA$ for $\lambda$=1.55$\mu\textrm{m}$ From these results, this diffusion model for making a low loss waveguide can be used for low-power-modulators and switches.

• Journal of Sensor Science and Technology
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• v.18 no.2
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• pp.110-115
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• 2009

Polystyrene (PS) microspheres were used to good advantage as a template material to prepare macroporous $TiO_2$ thin films. This is enabled to run the thermal decomposition of the PS without the collapsing of the 3-D macroporous framework during the calcination step. $TiO_2$ thin films were deposited onto the colloidal templated substrates at room temperature by RF sputtering, and then samples were thermally treated at $450^{\circ}C$ for 40.min in air to remove the organic colloidal template and induce crystallization of the $TiO_2$ film. The macroporous $TiO_2$ thin film exhibited a quasi-ordered partially hexagonal close-packed structure. Burst holes, estimated to be formed during PS thermal decomposition, are seen as the hemisphere walls. the inner as well as the outer surfaces of the hollow hemispheres formed by the method of thermal decomposition can be easily accessed by the diffusing gas species. As a consequence, the active surface area interacting with the gas species is expected to be enlarged about by a factor of fourth as large as compared to that of a planar films. Also the thickness at neighboring hemisphere could be controlled a few nm thickness. If the acceptor density becomes as large that depletion width reaches those thickness, the device is in the pinch off-situation and a strong resistance change should be observed.

• Proceedings of the Korean Society of Tribologists and Lubrication Engineers Conference
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• 2001.11a
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• pp.109-116
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• 2001

In this study, the effects of oxide layer formed on the contact parts of TiN coated ball and steel disk in sliding are investigated. Also wear mechanism to form the oxide layer and the characteristics of the oxide layer formation are investigated. AIS152100 steel ball is used for the substrate of coated ball specimens. Two types of coated ball specimens were prepared by depositing TiN coating with 1 and 4um in coating thickness. AISI1045 steel is used for the disk type counter-body. To investigate the effect of oxide layer on the contact parts of the two materials, the tests were performed both in ambient for forming oxide layer on the contact parts and in nitride environment to avoid oxidation. And to study the effects of surface roughness of counter-body, TiN coating thickness and contact load of sliding test on the characteristics of oxide layer formation on counter-body, various tests were carried out. From the results, the friction characteristics between the two materials was predominated by iron oxide layer that formed on wear track on counter-body and this layer caused the high friction. And the formation rate of the oxide layer on wear track increased as the real contact area between the two materials increased as the contact load increased, the TiN coating thickness decreased and the surface of counter-body smoothened.

• Journal of Powder Materials
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• v.29 no.3
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• pp.207-212
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• 2022

Nanosized rutile titanium dioxide (TiO₂) is used in inorganic pigments and cosmetics because of its high whiteness and duality. The high quality of the white pigments depends on their surface coating technique via the solgel process. SiO₂ coatings are required to improve the dispersibility, UV-blocking, and whiteness of TiO₂. Tetraethyl orthosilicate (TEOS) is an important coating precursor owing to its ability to control various thicknesses and densities. In addition, we use Na₂SiO₃ (sodium silicate) as a precursor because of its low cost. Compared to TEOS, which controls the pH using a basic catalyst, Na₂SiO₃ controls the pH using an acid catalyst, giving a uniform coating. The coating thickness of TiO₂ is controlled using a surface modifier, cetrimonium bromide, which is used in various applications. The shape and thickness of the nanosized coating layer on TiO₂ are analyzed using transmission electron microscopy, and the SiO₂ nanoparticle behavior in terms of the before-and-after size distribution is measured using a particle size analyzer. The color measurements of the SiO₂ pigment are performed using UV-visible spectroscopy.

• Solar Energy
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• v.10 no.2
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• pp.69-76
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• 1990

Photoelectrochemical decomposition of water by the irradiation of light to the $TiO_2$ thin film soaked in water was observed. The $TiO_2$ thin film was coated on top of $SnO_2$ nesa glass by use of spray method and of dip-coating method. The spray technique of $SnO_2$ nesa film production and dip-coating technique of $TiO_2$ thin film preparation on top of the $SnO_2$ nesa film were discribed briefly. $TiO_2$ film appearance was observed by SEM and I-V characteristic curve were measured for the various thickness of $TiO_2$ film. The film Thickness $1.8{\mu}m$ showed the maximum photoelectric current. Xe-lamp was used as light source for the photoelectrochemical reaction of thin film $TiO_2$ in acidic water(pH=1)

• Korean Journal of Materials Research
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• v.18 no.10
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• pp.515-520
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• 2008

We fabricated 10 nm-$TiO_2$ thin films for DSSC (dye sensitized solar cell) electrode application using ALD (atomic layer deposition) method at the low temperatures of $150^{\circ}\;and\;250^{\circ}$. We characterized the crosssectional microstructure, phase, chemical binding energy, and absorption of the $TiO_2$ using TEM, HRXRD, XPS, and UV-VIS-NIR, respectively. TEM analysis showed a 10 nm-thick flat and uniform $TiO_2$ thin film regardless of the deposition temperatures. Through XPS analysis, it was found that the stoichiometric $TiO_2$ phase was formed and confirmed by measuring main characteristic peaks of Ti $2p^1$, Ti $2p^3$, and O 1s indicating the binding energy status. Through UV-VIS-NIR analysis, ALD-$TiO_2$ thin films were found to have a band gap of 3.4 eV resulting in the absorption edges at 360 nm, while the conventional $TiO_2$ films had a band gap of 3.0 eV (rutile)${\sim}$3.2 eV (anatase) with the absorption edges at 380 nm and 410 nm. Our results implied that the newly proposed nano-thick $TiO_2$ film using an ALD process at $150^{\circ}$ had almost the same properties as thsose of film at $250^{\circ}$. Therefore, we confirmed that the ALD-processed $TiO_2$ thin film with nano-thickness formed at low temperatures might be suitable for the electrode process of flexible devices.

• Korean Journal of Materials Research
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• v.29 no.4
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• pp.258-263
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• 2019

Since the directly bonded interface between TiAl alloy and SCM440 includes lots of cracks and generated intermetallic compounds(IMCs) such as TiC, FeTi, and $Fe_2Ti$, the interfacial strength can be significantly reduced. Therefore, in this study, Cu is selected as an insert metal to improve the lower tensile strength of the joint between TiAl alloy and SCM440 during friction welding. As a result, newly formed IMCs, such as $Cu_2TiAl$, CuTiAl, and $TiCu_2$, are found at the interface between TiAl alloy and Cu layer and the thickness of IMCs layers is found to vary with friction time. In addition, to determine the relationship between the thickness of the IMCs and the strength of the welded interfaces, a tensile test was performed using sub-size specimens obtained from the center to the peripheral region of the friction-welded interface. The results are discussed in terms of changes in the IMCs and the underlying deformation mechanism. Finally, it is found that the friction welding process needs to be idealized because IMCs generated between TiAl alloy and Cu act to not only increase the bonding strength but also form an easy path of fracture propagation.

• Korean Journal of Materials Research
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• v.17 no.9
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• pp.463-468
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• 2007

The interdiffusion characteristics of Cu-plug/Capping Layer/NiSi contacts were investigated. Capping layers were deposited on Ni/Si to form thermally-stable NiSi and then were utilized as diffusion barriers between Cu/NiSi contacts. Four different capping layers such as Ti, Ta, TiN, and TaN with varying thickness from 20 to 100 nm were employed. When Cu/NiSi contacts without barrier layers were furnace-annealed at $400^{\circ}C$ for 40 min., Cu diffused to the NiSi layer and formed $Cu_3Si$, and thus the NiSi layer was dissociated. But for Cu/Capping Layers/NiSi, the Cu diffusion was completely suppressed for all cases. But Ni was found to diffuse into the Cu layer to form the Cu-Ni(30at.%) solid solution, regardless of material and thickness of capping layers. The source of Ni was attributed to the unreacted Ni after the silicidation heat-treatment, and the excess Ni generated by the transformation of $Ni_2Si$ to NiSi during long furnace-annealing.