• 제목/요약/키워드: Thin-film manufacturing process

검색결과 171건 처리시간 0.027초

Study on Optical Characteristics of Nano Hollow Silica with TiO2 Shell Formation

  • Roh, Gi-Yeon;Sung, Hyeong-Seok;Lee, Yeong-Cheol;Lee, Seong-Eui
    • 한국세라믹학회지
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    • 제56권1호
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    • pp.98-103
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    • 2019
  • Optical filters to control light wavelength of displays or cameras are fabricated by multi-layer stacking process of low and high index thin films. The process of multi-layer stacking of thin films has received much attention as an optimal process for effective manufacturing in the optical filter industry. However, multi-layer processing has disadvantages of complicated thin film process, and difficulty of precise control of film morphology and material selection, all of which are critical for transmittance and coloring effect on filters. In this study, the composite $TiO_2$, which can be used to control of UV absorption, coated on nano hollow silica sol, was synthesized as a coating material for optical filters. Furthermore, systematic analysis of the process parameters during the chemical reaction, and of the structural properties of the coating solutions was performed using SEM, TEM, XRD and photo spectrometry. From the structural analysis, we found that the 85 nm nano hollow silica with 2.5 nm $TiO_2$ shell formation was successfully synthesized at proper pH control and titanium butoxide content. Photo luminescence characteristics, excited by UV irradiation, show that stable absorption of 350 nm-light, correlated with a 3.54 eV band gap, existed for the $TiO_2$ shell-nano hollow silica reacted with 8.8 mole titanium butoxide solution. Transmittance observed on substrate of the $TiO_2$ shell-nano hollow silica showed effective absorption of 200-300 nm UV light without deterioration of visible light transparency.

Micro-scale Thermal Sensor Manufacturing and Verification for Measurement of Temperature on Wafer Surface

  • Kim, JunYoung;Jang, KyungMin;Joo, KangWo;Kim, KwangSun
    • 반도체디스플레이기술학회지
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    • 제12권4호
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    • pp.39-44
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    • 2013
  • In the semiconductor heat-treatment process, the temperature uniformity determines the film quality of a wafer. This film quality effects on the overall yield rate. The heat transfer of the wafer surface in the heat-treatment process equipment is occurred by convection and radiation complexly. Because of this, there is the nonlinearity between the wafer temperature and reactor. Therefore, the accurate prediction of temperature on the wafer surface is difficult without the direct measurement. The thermal camera and the T/C wafer are general ways to confirm the temperature uniformity on the heat-treatment process. As above ways have limit to measure the temperature in the precise domain under the micro-scale. In this study, we developed the thin film type temperature sensor using the MEMS technology to establish the system which can measure the temperature under the micro-scale. We combined the experiment and numerical analysis to verify and calibrate the system. Finally, we measured the temperature on the wafer surface on the semiconductor process using the developed system, and confirmed the temperature variation by comparison with the commercial T/C wafer.

플라즈마 코팅재료의 파괴인성과 마모 거동 (Characterization of Fracture Toughness and Wear Behavior for Plasma Ceramic Coated Materials)

  • 하선호;이동우;아따 울 레만;압둘 와지;송정일
    • 한국기계가공학회지
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    • 제12권4호
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    • pp.123-130
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    • 2013
  • Zirconia is well known in industrial applications for its mechanical characteristics. DLC (diamond-like carbon) have high elastic modulus, high electric resistivity, high dielectric constant, high wear resistance, low friction coefficient, bio compatibility, chemically inert and thermally stable. Because of all these physical and chemical properties these types of coatings have become key procedure for thin coating. Friction coefficient of DLC films is already evaluated and the current work is a further advancement by calculating the fracture toughness and wear resistance of these coatings. In the present study DLC thin film coatings are developed on $ZrO_2$ alloy surface using Plasma Enhanced Chemical Vapor Deposition (PECVD) method. Vicker hardness test is employed and it was concluded that, DLC coatings increase the Vickers hardness of ceramics.

Influence of Electron Beam Irradiation on the Structural, Optical, and Electrical Properties of ZTO/Ag/ZTO Trilayer Films

  • Eom, Tae-Young;Song, Young-Hwan;Gong, Tae-Kyung;Kim, Daeil;Cheon, Joo-Yong;Cha, Byung-Chul
    • Transactions on Electrical and Electronic Materials
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    • 제18권4호
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    • pp.217-220
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    • 2017
  • We deposited transparent conductive ZTO/Ag/ZTO trilayer thin films on glass substrates through magnetron sputtering, and then conducted intense electron beam irradiation on their surfaces to investigate the effects of electron irradiation on the structural, optical, and electrical properties of these films. After deposition, we electron irradiated the ZTO/Ag/ZTO films for 10 min at electron energies of 300, 500, and 700 eV. The films that were electron irradiated at 700 eV showed a higher optical transmittance (84.2%) in the visible wavelength region and a lower resistivity ($7.2{\times}10^{-5}{\Omega}cm$) compared with the other films. The figure of merit revealed that the ZTO/Ag/ZTO films that were electron irradiated at 700 eV had a higher optical and electrical performance than the other films prepared in this study.

고분자압출필름의 연신에 관한 연구 (A Study on the Elongation of Polymer Extrusion Film)

  • 최만성
    • 한국산학기술학회논문지
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    • 제15권2호
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    • pp.660-665
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    • 2014
  • 다량의 무기물이 첨가된 고분자제품을 초박막의 두께로 고속생산 할 경우 가장 중요한 요소는 적절한 원재료의 선정도 중요하지만 대개의 경우 한정된 범위의 수지를 사용할 수밖에 없기 때문에, 가장 중요한 요소는 압출기내에서 흘러나온 용융수지의 흐름을 균일하게 유지할 수 있도록 고분자의 용융 유동에 적합한 최적의 다이스 설계와 압출기의 공정 파라미터의 제어를 통해 균일한 두께 유지와 연신이 필요하다. 이와 관련하여 고분자 압출필름의 적절한 연신을 위하여 압출조건이 연신에 미치는 영향에 대한 연구가 필요하지만 관련된 연구는 아직 충분히 이루어지지 않고 있다. 따라서 본 연구는 통기성 필름의 압출필름에 주로 사용되는 LLDPE(Linear Low Density Polyethylene)에 대하여 압출기의 실린더 온도, 압출속도, 압출기의 다이스온도, 냉각롤의 온도, 연신비, 그리고 연신롤 온도 등의 압출 조건의 변화가 압출필름의 연신에 미치는 영향에 대하여 압출실험을 통하여 연구하였다. 연구결과에서 연신비가 2.0:1일 때 고분자압출필름의 연신에 가장 큰 영향을 미침을 알 수 있었다.

Ir-RE 코팅 대비 자장여과필터방식을 이용한 비구면 유리 렌즈용 초경합금(WC)표면의 ta-C 박막 코팅 성능 개선 연구 (A Study on the Performance Improvement of ta-C Thin Films Coating on Tungsten Carbide(WC) Surface for Aspherical Glass Lens by FCVA Method Compared with Ir-Re coating)

  • 정경서;김승희
    • 한국산학기술학회논문지
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    • 제20권12호
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    • pp.27-36
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    • 2019
  • 작은 굴절률 및 높은 굴절률을 갖는 저 분산 렌즈에 대한 요구가 증가함에 따라, 높은 내열성 및 내마모성을 갖는 이형성 보호 필름에 대한 필요성이 증가하고 있다. 그러나 광학 산업은 비구면 유리 렌즈 성형에 사용되는 이형보호 필름의 제조 공정 및 품질 표준에 대한 명확한 표준을 아직 확립하지 못했다. 이 기술은 광학 렌즈를 제조하는 각 회사의 노하우로 취급된다. 본 연구에서는 FCVA (Filtered Cathode Vacuum Arc) 기반 ta-C 박막 코팅의 이온에칭, 각 소스 및 필터부의 마그네트론 및 아크 전류, 바이어스 전압의 최적화에 관한 실험을 수행하였다. 그 결과, 코팅성능 측면에서, 이리듐- 레늄 합금 박막 스퍼터링 제품 대비 필름 두께가 약 50% 얇고, 경도는 약 20%, 박막의 접착강도는 약 40 % 개선된 것으로 측정되었다. 본 연구의 박막 코팅 공정 결과는 금형 이형 박막층의 최소 기계적 특성 및 품질 확립을 위한 유리 렌즈의 개발 및 활용에 크게 기여할 것으로 사료된다.

제조 공정을 달리한 LNO 전극에 코팅된 PZT 박막의 배향성 ((100) orientation of PZT thin films coated on the LNO electrode using a different manufacturing process)

  • 서병준;문병기;김강언;정수태
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2004년도 하계학술대회 논문집 Vol.5 No.2
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    • pp.916-919
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    • 2004
  • This paper studied about the (100) orientation of PZT thin films coated on the LNO electrode using a different thermal annealing. The thermal annealing method is divided into two things. The one is the method transferring heat to only the lower substrate and another is transferring heat to all directions. Orientation factor of PZT in the method of transferring heat to only the lower substrate was F=99% in the thermal annealing of the LNO. Orientation factor of PZT was F=67% in the method of transferring heat to all directions.

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Silicon 기반 IC 디바이스에서의 층간 절연막 특성 분석 연구 (Raman Spectroscopy Analysis of Inter Metallic Dielectric Characteristics in IC Device)

  • 권순형;표성규
    • 마이크로전자및패키징학회지
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    • 제23권4호
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    • pp.19-24
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    • 2016
  • Along the few nano sizing dimensions of integrated circuit (IC) devices, acceptable interlayer material for design is inevitable. The interlayer which include dielectric, interconnect, barrier etc. needs to achieve not only electrical properties, but also mechanical properties for endure post manufacture process and prolonging life time. For developing intermetallic dielectric (IMD) the mechanical issues with post manufacturing processes were need to be solved. For analyzing specific structural problem and material properties Raman spectroscopy was performed for various researches in Si semiconductor based materials. As improve of the laser and charge-coupled device (CCD) technology the total effectiveness and reliability was enhanced. For thin film as IMD developed material could be analyzed by Raman spectroscopy, and diverse researches of developing method to analyze thin layer were comprehended. Also In-situ analysis of Raman spectroscopy is introduced for material forming research.

Textured-AZO/AZO/Glass 투명전극을 갖는 염료감응 태양전지의 광전변환 특성 (Photoelectric Conversion Properties of Dye-sensitized Solar Cell in the Transparent Electrode of Textured-AZO/AZO/Glass)

  • 서빙;박춘배;황근창
    • 한국전기전자재료학회논문지
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    • 제25권1호
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    • pp.37-43
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    • 2012
  • We were studied that AZO conductive thin film can substitute for FTO electrode in dye sensitized solar cell. Three types of AZO films were deposited on soda-lime glass(AZO/glass, AZO/AZO/glass, textured AZO/AZO/glass) using RF magnetron sputtering process and investigated their properties of electrical, optical, and photoelectric conversion rate. The textured AZO/AZO/glass has the lowest resistivity of $3.079{\times}10^{-4}\;{\Omega}cm$ among other films. And the optical transmittance rate was better than both non textured AZO/AZO/glass and FTO/glass in the visible region. After manufacturing dye solar cells using the three types of AZO films, the textured AZO/AZO/glass showed the highest photoelectric conversion rate of 3.68% among AZO samples. But the transformation rate was slightly lower than FTO cells (4.52%). However, the conductive film of textured AZO/AZO/glass can be applicable to use an electrode in solar cells as cost-effective products.

스핀코터를 이용한 박막의 기계적 안정성 평가 (Mechanical Stability Evaluation of Thin Film with Spin-coater)

  • 김지은;김정환;홍성철;조한구;안진호
    • 반도체디스플레이기술학회지
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    • 제15권1호
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    • pp.6-11
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    • 2016
  • For high volume manufacturing using extreme ultraviolet (EUV) lithography, mask protection from contamination during lithography process must be solved, and EUV pellicle is the strongest solution. Based on the technical requirements of EUV pellicle, EUV pellicle should have large membrane area ($110{\times}140mm^2$) with film transmittance over 90% and mechanical stability. Even though pellicle that satisfies size standard with high transmittance has been reported, its mechanical stability has not been confirmed, nor is there a standard to evaluate the mechanical stability. In this study, we suggest a rather simple method evaluating mechanical stability of pellicle membrane using spin-coater which can emulate the linear accelerated motion. The test conditions were designed by simulating the acceleration distribution inside pellicle membrane through correlating the linear acceleration and centripetal acceleration, which occurs during linear movement and rotation movement, respectively. By these simulation results, we confirmed the possibility of using spin-coater to evaluate the mechanical stability of EUV pellicle.