• Journal of the Korean Vacuum Society
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• v.17 no.6
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• pp.560-565
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• 2008

$(Pb_{0.98}La_{0.08})(Zr_{0.65}Ti_{0.35})O_3$ (PLZT) thin films with $TiO_2$ buffer layers were deposited on Pt/Ti/$SiO_2$/Si substrates by an R.F. magnetron sputtering method in order to improve the ferroelectric characteristics of the films. And the ferroelectric properties and crystallinities of the PLZT thin films were investigated in terms of the effects of the post annealing temperatures of $TiO_2$ buffer layers between a platinum bottom electrode and PLZT thin film. The ferroelectric properties of the PLZT thin films improved as increasing of the post annealing temperatures of $TiO_2$ layers, thereby reaching their maximum at $600^{\circ}C$.

• Korean Journal of Optics and Photonics
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• v.4 no.2
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• pp.162-167
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• 1993

The reflectance and transmittance of dielectric films at nonzero angle of incidence show strong polarization effects, and for many applications these effects are not desirable. In this work, some design methods are introduced, and we designed the nonpolarizing beam splitter using the outest equivalent quarter-wave layers. During this, the reflectances are varied under the constant optical thickness.

• Journal of the Korean Ceramic Society
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• v.27 no.1
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• pp.35-42
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• 1990

In the present investigation, ceramic PZT and Polymer were prepared. The former is Pb[(Sn1/2Sb1/2)0.1 Ti0.27Zr0.63]O3 including Pb(Sn1/2Sb1/2)O3 with good pyroelectric effect, and the latter PVA(Poly Vinyl Alcohol) with good plasticity. Then, they were fabricated to be flat by using 0-3 connectivity which is rather easily fabricated and capable of making thin film, extending surface area among the connectivities. Such were applied to the sample as variation of intensity of poling field, poling temperature, volume fraction between ceramic and polymer. Then dielectric constant, pyroelectric current, pyroelectric coefficient and the figure of merit were measured. And then their effects on pyroelectric characteristics were observed.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2001.07a
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• pp.33-36
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• 2001

Chemical mechanical polishing(CMP) process has been widely used to planarize dielectric layers, which can be applied to the integrated circuits for deep sub-micron technology. The rise throughput and the stability in the device fabrication can be obtained by applying of CMP process to STI structure in 0.18$\mu\textrm{m}$ m semiconductor device. The reverse moat process has been added to employ in of each thin films in STI-CMP was not equal, hence the devices must to be effected, that is, the damage was occurred in the device area for the case of excessive CMP process and the nitride film was remained on the device area for the case of insufficient CMP process, and than, these defects affect the device characteristics. Also, we studied the High Selectivity Slurry(HSS) to perform global planarization without reverse moat step.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2002.07b
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• pp.849-852
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• 2002

Recently, amorphous selenium is used as x-ray conversion material for flat-panel x-ray detector. In this paper, we investigated the effect of breakdown under high voltage and leakage current in PN-type multi-layer structure based on p-type a-Se and n-type conductive thin film. Experimental results show that the multi-layer based detector reduced leakage current because n-type CeO2 conductive layer prevent from hole injection into a-Se layer from collection electrode, Also, the breakdown voltage was improved by dielectric layer between a-Se and top electrode.

• Journal of the Institute of Electronics Engineers of Korea SD
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• v.38 no.3
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• pp.75-75
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• 2001

Si₃N₄/SiO₂/Si₃N₄ 멤브레인에 의해 실리콘 기판으로부터 열차단된 비냉각 초전형 박막 (Ba,Sr)TiO₃ 적외선 검지기를 제작하고, 적외선 검지기의 특성을 논의하였다. 25℃의 공기중에서 쵸핑주파수가 1 ㎐일 때 적외선 검지기는 약 168.8 V/W의 비교적 높은 전압 감응도를 나타내었으나, 매우 작은 신호대잡음비 때문에 약 2.6×10⁴㎝·㎐/sup 1/2//W의 낮은 비검지도를 나타내었다. 또한 출력파형의 쵸핑주파수 및 온도 의존성에 대한 정성적인 해석으로부터 적외선 검지기의 열잡음전압 및 열시정수가 모두 상당히 크다는 것을 알 수 있었다.

• 한국정보디스플레이학회:학술대회논문집
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• 2008.10a
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• pp.86-88
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• 2008

Organosiloxane based spin on planarizing dielectrics (PTS-E and PTS-R) were developed for application in flat panel displays as a replacement to conformal chemical vapor deposited SiNx. Here we demonstrate the successful use of siloxane-based material as a passivation layer for active matrix $\alpha$-Si thin film transistors (TFT) on both rigid and flexible substrates.

• 한국정보디스플레이학회:학술대회논문집
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• 2008.10a
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• pp.1631-1633
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• 2008

We demonstrate 4-in QVGA active-matrix electrophoretic display based on ink-jet printed organic transistors on glass substrates. Our TFT array had a bottom-gate, bottom-contact device architecture. The organic semiconductor and gate dielectric were solution processed. The field-effect mobility of the printed devices, calculated in the saturation region, was $0.1{\sim}0.3cm^2/Vs$ at Vg=-20 V.

• 한국정보디스플레이학회:학술대회논문집
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• 2006.08a
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• pp.190-193
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• 2006

we implemented pentacene TFTs able to operate at low voltage less than 2V by using ultrathin Al2O3 layer as a gate insulator. The OTFTs exhibited a mobility of $0.27{\pm}0.05\;cm^2/Vs$, an outstanding subthreshold slope of $0.109{\pm}0.027$, and an on/off current ratio of $2.87{\pm}1.07{\times}10^4$. OTFT operated at low voltage, producing 3.5uA at $V_GS$= 2V and $V_DS$= 1.5V.

• 한국정보디스플레이학회:학술대회논문집
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• 2003.07a
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• pp.359-361
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• 2003

Nano-porous alumina was investigated as a protecting layer in an AC Plasma Display Panel. A 2 ${\mu}m$ thick nano-porous $Al_2O_3$ layer inserted with MgO was formed on the dielectric layer instead of the conventional 500 nm-thick MgO thin film. Both nano-porous $Al_2O_3$layer and inserted MgO were prepared by wet process. The luminance and luminous efficiency of 3-inch test panel adopting nano-porous $Al_2O_3$ was higher than that of the conventional PDP.