• Korean Journal of Materials Research
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• v.9 no.4
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• pp.414-418
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• 1999

Typical metal oxide thin films having optical and electrical properties are widely used as inorganic functional materials. Liquid phase deposition(LPD) method, a new low temperature process, has been developed for the several advantages of no vacuum system, low cost, high throughput, and low processing temperature(<$50^{\circ}C$). Silica powder was added to 40wt% hydrofluoro-silicic acid($H_2$SiF\ulcorner) to obtain an immersing solution of silica-saturated hydrofluorosilicic acid solution. Boric acid solution was continuously added in the range from 0 to 0.05M to prepare supersaturated hydrofluorosilicic acid solution. LPD $SiL_2$film was formed with the variation of added amount of $H_2$O. The SiO$_2$thin film could be prepared from hydrofluorosilicic acid by LPD method. The thickness of LPD $_SiO2$film was influenced by the boric acid concentration and added amount of $H_2$O. Silicon in thin film existed as SiF\ulcorner by Raman spectrum.

• Proceedings of the SAREK Conference
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• 2006.06a
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• pp.150-155
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• 2006

Falling liquid plays a role in a wide variety of naturally occurring phenomena as well as in the operation of industrial process equipment where heat and mass transfer take place. In such cases, it is required that the falling film should spread widely on the surface forming thin liquid film to enlarge contact surface. An addition of surface active agent to a falling liquid film affects the flow characteristics of the falling film. In this study the heat transfer characteristics for a falling liquid film has been investigated by an addition of the surface active agents. The falling liquid film was formed on a vertical flat plate. As the mass flow rate of liquid falling film is increased, the wetted area is a little increased while the heat transfer rate as well as heat transfer coefficient is significantly increased. It is also found that both wetted area and heat transfer rate is substantially increased while heat transfer coefficient is a little increased with an increase in the surfactant concentration at a given mass flow rate.

• Proceedings of the KSME Conference
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• 2008.11a
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• pp.1842-1846
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• 2008

This work reports development of novel liquid-level sensors based on the $3{\omega}$ method. The sensors determine the liquid level by measuring the thermal response as in the conventional hot-wire technique. However the sensors employ an AC heating method to enhance the sensitivity, noise resistance and time response. Also, the microfabricated thin-film structure of the sensor provides mass-producibility as well as improved sensor performance owing to the increase in the surface-volume ratio of the sensor. Two different types of the sensor are developed: one for point detection of the fluid phase and the other for monitoring continuous variation of liquid level. Notable is that the performance of the sensor is not considerably affected by the liquid flow.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2007.11a
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• pp.371-371
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• 2007

In this study, liquid crystal (LC) aligning capabilities for vertical alignment on the $CeO_x$ thin film by thermal evaporation method were investigated. Also, the control of pretilt angles and thermal stabilities of the NLC treated on $CeO_x$ thin film were investgated. The uniform LC alignment on the $CeO_x$ thin film surfaces and good thermal stabilities with thermal evaporation can be achieved. It is considerated that the LC alignment on the $CeO_x$ thin film by thermal evaporation is attributed to elastic interaction between LC molecules and micro-grooves at the $CeO_x$ thin film surface created by evaporation. In addition, it can be achieved the good electro-optical (EO) properties of the VA-LCD on $CeO_x$ thin film layer with oblique thermal evaporation.

• Journal of the Korean Vacuum Society
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• v.9 no.1
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• pp.42-47
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• 2000

The amorphous vanadium oxide thin films for thin-film rechargeable lithium batteries were fabricated by r.f. reactive sputtering at room temperature. As the experimental parameter, oxygen partial pressure was varied during sputtering. At high oxygen partial pressures(>30%), the as-deposited films, constant current charge/discharge characteristics were carried out in 1M $LiPF_6$, EC:DMC+1:1 liquid electrolyte using lithium metal as anode. The specific capacity of amorphous $V_2O_5$ after 200cycles of operation at room temperature was higher compared to crystalline $V_2O_5$. The amorphous vanadium oxide thin film and crystalline film showed about 60$\mu$Ah/$\textrm{cm}^2\mu\textrm{m}$ and about 38$\mu$Ah/$\textrm{cm}^2\mu\textrm{m}$, respectively. These results suggest that the battery capacity of the thin film vanadium oxide cathode strongly depends on the crystallinity.

• Transactions of the Korean Society of Mechanical Engineers B
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• v.27 no.4
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• pp.476-483
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• 2003

A mathematical model is presented to predict the two-phase flow and heat transfer phenomena of the evaporating extended meniscus region in a micro-channel. The pressure difference at the liquid-vapor interface can be obtained by the augmented Laplace-Young equation. The correlative equations for film thickness, pressure, and velocity in the meniscus region are derived by applying the mass, momentum, and energy equations into the control volume. The results show that increasing the heat flux and the liquid inlet velocity cause the length and liquid film thickness of the extended meniscus region to decrease. The variation, however, of the heat flux and liquid inlet velocity has no effect on the profile of film thickness. The majority of heat is transferred through the thin film region that is a very small region in the extended meniscus region. It is also found that the vapor velocity increases gradually in the meniscus region. However, it increases sharply at the junction of the meniscus and thin film regions.

• Transactions on Electrical and Electronic Materials
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• v.6 no.6
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• pp.272-275
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• 2005

We studied the control of pretilt angles for homeotropic aligned nematic liquid crystal (NLC) on SiOx thin film surface by $45^{\circ}$ evaporation method with electron beam system. The uniform vertical LC alignment on. the SiOx thin film surfaces with electron beam evaporation was achieved. It is considered that the LC alignment on SiOx thin film by $45^{\circ}$ electron beam evaporation is attributed to elastic interaction between LC molecules and micro-grooves at the SiOx thin film surface created by evaporation. The pretilt angles of about $3.5^{\circ}$ in aligned NLC on SiOx thin film surfaces by electron beam evaporation of $45^{\circ}$ were measured. Consequently, the high pretilt angles of the NLC on the SiOx thin film by $45^{\circ}$ oblique electron beam evaporation method can be achieved.

• Korean Journal of Air-Conditioning and Refrigeration Engineering
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• v.12 no.9
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• pp.835-842
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• 2000

Film boiling heat transfer of the subcooled turbulent liquid film flow on a horizontal plate was investigated by theoretical and experimental studies. In the theoretical analysis, by solving the integral energy and momentum equations analytically, some generalized expressions for Nusselt number was deduced. Next, by comparing the deduced equations with the experimental data on the turbulent film boiling heat transfer of the subcooled thin liquid film flow, the semi-empirical relation between the Nusselt number based on the modified heat transfer coefficient and the Reynolds number was obtained. The correlating equation was very similar to that of the turbulent heat transfer in a single phase flow, and it was found that the heat transfer was dissipated to increase the liquid temperature.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2008.11a
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• pp.301-301
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• 2008

Ion beam (IB)-induced alignment of inorganic materials has been investigated intensively as it provides controllability in a nonstop process for producing high-resolution displays[1][2]. LC orientation via ion-beam (IB) irradiation on the nitrogen doped diamond like carbon (NDLC) thin film deposited by physical deposition method-sputtering was embodied. The NDLC thin film that was deposited by sputter showed uniform LC alignment at the 1200eV of the ion beam intensity. The pretilt angle of LC on NDLC thin films was measured with various IB exposure time and angle. The maximum pretilt angle were showed with IB irradiation angle of $45^{\circ}$ and exposure time of 62.5 sec, respectively. To show NDLC thin film stability in high temperature, thermal stability test was proceeded. The uppermost of the thermal stability of NDLC thin film was $200^{\circ}C$. In this investigation, the electro-optical (EO) characteristics of LC on NDLC thin film were measured.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.15 no.8
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• pp.726-730
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• 2002

Electro-optical (EO) performances of the ion beam (IB) aligned twisted-nematic (TN)-liquid crystal display (LCD) with ion beam exposure on the new diamond-like carbon (DLC) thin film surface were investigated. A good voltage-transmittance (V-T) curve of the ion beam aligned TN-LCD with oblique ion beam exposure on the DLC thin film surface for 1 min was observed. Also, the fast response time of the ion beam aligned TN-LCD with oblique ion beam exposure on the DLC thin film surface for 1 min can be achieved. Finally, the residual DC voltage of the ion beam aligned TN-LCD on the DLC thin film surface is almost the same as that of the rubbing aligned TN-LCD on a polyimide (Pl) surface.