• Title/Summary/Keyword: Thin liquid film

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A Study on the Process Improvement in TFT LCD Cleaning (TFT LCD 세정 방법에 대한 프로세스 개선에 관한 연구)

  • 홍민성;김종민;강신재
    • Proceedings of the Korean Society of Machine Tool Engineers Conference
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    • 2004.04a
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    • pp.269-274
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    • 2004
  • As next generation display, TFT LCD gets into the spotlight, and the bigger glass size is required. Currently, its display size is 1500 mm by 1870 mm at the six generation comparing with 300mm by 400 mm at the first one and the size is increasing continuously, which cause the difficulties to apply the cleaning operation including the general brush cleaning. In this study, water-jet cleaning operation has been introduced, which spent the less water them other cleaning methods. Throughout the experiment, is has been found the possible damage of the declined cell and the variation of the tilt bias angle depending upon the increasing time. In addition, the simulation predicts the glass bending of the display.

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The Optimization of LCD Color Filter Coating Method

  • Cho, Moon-Chul;Bae, Dong-Ho
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2009.11a
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    • pp.177-177
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    • 2009
  • We examine the process to enhance the productivity of the thin-film transistor-addressed liquid-crystal display (TFT LCD) panels with the objective of optimizing the relation between the Type of color PR dispense nozzle and the amount of dispensing of color PR consumption, directly affecting a spectroscopic analysis. Most manufacturers of the panels have been utilizing a spin-type coater. We show that we successfully optimize the spectral values by controlling the color PR dispense type(Static dispense or Dynamic dispense) and the amount of color PR. From this study, we accomplished to decrease 43% in color PR consumption and to decrease 30% in color PR Stained, to decrease 30% rework rate.

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A Study of Master Production Scheduling Scheme in TFT-LCD Factory considering Line Balancing (TFT-LCD 공장의 라인 밸런싱을 고려한 MPS 수립에 관한 연구)

  • Won, Dae-Il;Baek, Jong-Kwan;Kim, Sung-Shick
    • IE interfaces
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    • v.16 no.4
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    • pp.463-472
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    • 2003
  • In this study we consider the problem of MPS(master production planning) of TFT-LCD(Thin Film Transistor - Liquid Crystal Display) production factory. Due to the complexities of the TFT-LCD production processes, it is difficult to build effective MPS. This study presents an algorithm having a concept of IDPQ(Ideal Daily Production Quantity) that considers line balancing of TFT-LCD production process. In general, the MPS building procedure does not consider line balancing in non-bottleneck processes. MPS without considering line balancing may make ineffective schedule. We present algorithms for building MPS considering factory capacity and line balancing according to the sales order.

Automatic TFT-LCD Mura Inspection Based on Studentized Residuals in Regression Analysis

  • Chuang, Yu-Chiang;Fan, Shu-Kai S.
    • Industrial Engineering and Management Systems
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    • v.8 no.3
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    • pp.148-154
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    • 2009
  • In recent days, large-sized flat-panel display (FPD) has been increasingly applied to computer monitors and TVs. Mura defects, appearing as low contrast or non-uniform brightness region, sometimes occur in manufacturing of the Thin-Film Transistor Liquid-Crystal Displays (TFT-LCD). Implementation of automatic Mura inspection methods is necessary for TFT-LCD production. Various existing Mura detection methods based on regression diagnostics, surface fitting and data transformation have been presented with good performance. This paper proposes an efficient Mura detection method that is based on a regression diagnostics using studentized residuals for automatic Mura inspection of FPD. The input image is estimated by a linear model and then the studentized residuals are calculated for filtering Mura regions. After image dilation, the proposed threshold is determined for detecting the non-uniform brightness region in TFT-LCD by means of monitoring the every pixel in the image. The experimental results obtained from several test images are used to illustrate the effectiveness and efficiency of the proposed method for Mura detection.

Technical Obstacles to Suftla Flexible Microelectronics

  • Miyasaka, Mitsutoshi
    • 한국정보디스플레이학회:학술대회논문집
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    • 2007.08b
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    • pp.1763-1766
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    • 2007
  • Three technical obstacles must be overcome to build a fruitful business in the nascent industry of flexible microelectronics: the self-heating effect of thin film transistors (TFTs), the thermal and mechanical durability of flexible devices, and the cost issue. The self-heating effect is controlled through TFT shape, TFT electrical performance, dimensional reduction and energy-efficient circuits. Plastic engineering is one of the keys to solving thermal and mechanical durability problems faced by flexible microelectronics devices. For the Suftla flexible microelectronics business to be viable, Suftla transfer yield must be sufficiently high to keep down device cost. Improving the transfer yield is not easy, but it is the same challenge already faced and cleared in the TFT liquid crystal display industry.

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Development of Large Sized AM-OLED

  • Lee, Baek-Woon;Kunjal, Parikh;HUh, Jong-Moo;Chu, Chang-Woong;Chung, Kyu-Ha
    • Proceedings of the Polymer Society of Korea Conference
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    • 2006.10a
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    • pp.17-18
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    • 2006
  • Flat Panel Displays (FPDs) have made a revolution in the display industry. TFT-LCD (Thin Film Transistor Liquid Crystal Display) has been the main player of FPD for last two decades. As the industry continuously develops the technology for better performance with lower cost is constantly demanded where several post LCD technologies are being developed. One of the prime candidates of post LCD technology is AMOLED (Active Matrix Organic Light Emitting Diode) that is considered to be an ideal FPD due to its extraordinary display performance and potentially low cost display structure. This technology has been accepted to small size display applications, such as cellular phone, PDA and PMP, etc. In this paper it is discussed that how this technology can be extended to large size display applications, such as TV. The technical issues and solutions of TFT backplane and color patterning of OLED materials are discussed and proposed

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New Azo Polymers and Their Applications to High Density Optical Memory Devices

  • Han, Yang-Kyoo;Lee, Min-Jeong
    • Proceedings of the Polymer Society of Korea Conference
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    • 2006.10a
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    • pp.169-169
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    • 2006
  • Novel liquid crystalline malonic ester monomers were synthesized from malonyl dichloride and mesogenic alcohols as a photoresponsive group. The monomers were polymerized with aliphatic or aromatic dibromides in the presence of sodium hydride to give 8 kinds of novel poly(malonic esters) with two symmetrical azobenzene groups. We found that the resulting polymer films could be used as rewritable optical data storage (or holographic image) media through a photoisomerization of azobenzene group by Ar laser irradiation. The sensitivity of data recording was dependent not only on the thickness of the polymeric thin film but also on the intensity of laser beam.

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Precise Edge Detection Method Using Sigmoid Function in Blurry and Noisy Image for TFT-LCD 2D Critical Dimension Measurement

  • Lee, Seung Woo;Lee, Sin Yong;Pahk, Heui Jae
    • Current Optics and Photonics
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    • v.2 no.1
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    • pp.69-78
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    • 2018
  • This paper presents a precise edge detection algorithm for the critical dimension (CD) measurement of a Thin-Film Transistor Liquid-Crystal Display (TFT-LCD) pattern. The sigmoid surface function is proposed to model the blurred step edge. This model can simultaneously find the position and geometry of the edge precisely. The nonlinear least squares fitting method (Levenberg-Marquardt method) is used to model the image intensity distribution into the proposed sigmoid blurred edge model. The suggested algorithm is verified by comparing the CD measurement repeatability from high-magnified blurry and noisy TFT-LCD images with those from the previous Laplacian of Gaussian (LoG) based sub-pixel edge detection algorithm and error function fitting method. The proposed fitting-based edge detection algorithm produces more precise results than the previous method. The suggested algorithm can be applied to in-line precision CD measurement for high-resolution display devices.

Development of IGZO TFTs and Their Applications to Next-Generation Flat-Panel Displays

  • Hsieh, Hsing-Hung;Lu, Hsiung-Hsing;Ting, Hung-Che;Chuang, Ching-Sang;Chen, Chia-Yu;Lin, Yusin
    • Journal of Information Display
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    • v.11 no.4
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    • pp.160-164
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    • 2010
  • Organic light-emitting devices (OLEDs) have shown superior characteristics and are expected to dominate the nextgeneration flat-panel displays. Active-matrix organic light-emitting diode (AMOLED) displays, however, have stringent demands on the performance of the backplane. In this paper, the development of thin-film transistors (TFTs) based on indium gallium zinc oxide (IGZO) on both Gen 1 and 6 glasses, and their decent characteristics, which meet the AMOLED requirements, are shown. Further, several display prototypes (e.g., 2.4" AMOLED, 2.4" transparent AMOLED, and 32" AMLCD) using IGZO TFTs are demonstrated to confirm that they can indeed be strong candidates for the next-generation TFT technology not only of AMOLED but also of AMLCD (active-matrix liquid crystal display).

Dry Etch Process Development for TFT-LCD Fabrication Using an Atmospheric Dielectric Barrier Discharge

  • Choi, Shin-Il;Kim, Sang-Gab;Choi, Seung-Ha;Kim, Shi-Yul;Kim, Sang-Soo;Lee, Seung-Hun;Kwon, Ho-Cheol;Kim, Gon-Ho
    • 한국정보디스플레이학회:학술대회논문집
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    • 2008.10a
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    • pp.1272-1275
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    • 2008
  • We present the development of dry etch process for the liquid crystal display (LCD) fabrication using a dielectric barrier discharge (DBD) system at atmospheric pressure. In this experimental work, the dry etch characteristics and the electrical properties of thin film transistor are evaluated by using the scanning electron microscopy and electric probe, and TFT-LCD panel ($300\;mm\;{\times}\;400\;mm$) is manufactured with the application of the amorphous silicon etch step in the 4 mask and 5 mask processes.

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