• 제어로봇시스템학회:학술대회논문집
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• 2001.10a
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• pp.97.4-97
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• 2001

Recently, TFT LCD (thin film transistor liquid crystal display) manufacturing industry is more concerned with the ways of cleaning large TFT LCD´s with high pixed density than ever Ultrasonic cleaners with high frequencies like 1MHz (megasonic cleaners) are effective in removing very small particles without causing mechanical damage to the surface. In this study a megasonic cleaner for TFT LCD manufacturing process is developed and the performance is evaluated through experiments. The experimental results show that the developed magasonic cleaners is effective in removing very small particle from the LCD panel.

• Proceedings of the KSME Conference
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• 2008.11a
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• pp.26-29
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• 2008

In the fields of electronics and displays where inkjet printing has demonstrated its capability to fabricate colorant subpixels of thin film transistor liquid crystal(TFT LCD) color filters and organic light emitting diode (OLED) displays, conducting tracks and TFTs, the production of satellite droplets is one of primary things to eliminate because they generally deteriorate the pattern quality. To understand the production mechanism of satellite droplets in this paper, driving waveforms such as monopolar and bipolar were employed and the influence of the pulse duration time were investigated in both experimental and numerical aspects.

• Electrical & Electronic Materials
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• v.17 no.7
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• pp.21-29
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• 2004

절연성 기판 위에 단결정이 아닌 반도체 박막을 이용하여 만든 전계효과 (Field Effect FET) 소자로 일반적으로 정의되는 박막 트랜지스터 (Thin Film Transistor, TFT)는 1962 RCA lab.의 Weimer에 제안되어 지금까지 많은 발전을 거듭해 왔다. ［1］ TFT는 SRAM이나 ROM에도 응용되지만, 주된 사용 분야는 능동구동방식 평판 디스플레이(Active Matrix Flat Panel Display)의 화소 스위칭 소자이다. 액정 디스플레이(Liquid Crystal Display, LCD)나 유기 전계발광 디스플레이(Organic Electro-luminescence Display, OELD) 화소의 스위칭 소자로도 TFT가 널리 사용되고 있다. (중략)

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.5 no.1
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• pp.37-43
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• 1995

The proper choice of the solvent is a prerequisite for solution growth of silicon. In the present work, the temperature to dissolve at least 1 atomic% silicon was calculated in various molten solvents.

• Proceedings of the Korean Vacuum Society Conference
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• 2015.08a
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• pp.163-163
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• 2015

The effect of nematic liquid crystal(5CB-4-Cyano-4'-pentylbiphenyl) on the amorphous indium gallium zinc oxide thin film transistors(a-IGZO TFTs) was investigated. Through dropping the 5CB on the a-IGZO TFT's channel layer which is deposited by RF-magnetron sputtering, properties of a-IGZO TFTs was dramatically improved. When drain bias was induced, 5CB molecules were oriented by Freedericksz transition generating positive charges to one side of dipoles. From increment of the capacitance by orientation of liquid crystals, the drain current was increased, and we analyzed these phenomena mathematically by using MOSFET model. Transfer characteristic showed improvement such as decreasing of subthreshold slope(SS) value 0.4 to 0.2 and 0.45 to 0.25 at linear region and saturation region, respectively. Furthermore, in positive bias system(PBS), prevention effect for electron trapping by 5CB liquid crystal dipoles was observed, which showing decrease of threshold voltage shift [(${\delta}V$]_TH) when induced +20V for 1~1000sec at the gate electrode.

• Proceedings of the KSME Conference
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• 2003.04a
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• pp.1491-1498
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• 2003

Droplet evaporation can be used to transfer large amounts of energy since heat is transferred across a thin liquid film. Spreading the drop over a larger area can enhance this heat transfer. One method of accomplishing this is to dissolve gas into the liquid. When the drop strikes the surface, a gas bubble nucleates and can grow and merge within the liquid, resulting in an increase in the droplet diameter. In this study, time and space resolved heat transfer characteristics for a single droplet striking a heated surface were experimentally investigated. The local wall heat flux and temperature measurements were provided by a novel experimental technique in which 96 individually controlled heaters were used to map the heat transfer coefficient contour on the surface. A high-speed digital video camera was used to simultaneously record images of the drop from below. The measurements to date indicate that significantly smaller droplet evaporation times can be achieved. The splat diameter was observed to increase with time just after the initial transient dies out due to the growth of the bubble, in contrast to a monotonically decreasing splat diameter for the case of no bubbles. Bursting of the bubble corresponded to a sudden decrease in droplet heat transfer.

• Transactions on Electrical and Electronic Materials
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• v.8 no.1
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• pp.46-50
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• 2007

We have studied the nematic liquid crystal (NLC) alignment effects on a nitrogen-doped diamond-like carbon (NDLC) thin film layer with ion beam irradiation. The pretilt angle for NLC on the NDLC surface with ion beam exposure was observed below 1 degree. Also, we had the good LC alignment characteristics on the NDLC thin films with ion beam exposure of 1800 eV. In thermal stability experiments, the alignment defect of the NLC on the NDLC surface with ion beam irradiation above annealing temperature of $250^{\circ}C$ can be observed. Therefore, the good thermal stability and LC alignment for NLC by ion beam aligned NDLC thin films can be achieved.

• Journal of Sensor Science and Technology
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• v.19 no.5
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• pp.398-402
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• 2010

The liquid phase epitaxy(LPE) method was widely used to growth of mercury cadmium telluride(MCT) thin films. However, this method lead to Hg-vacancies in MCT thin film, because Hg has high vapor pressure at this temperature range. This is a well known defect in HgCdTe grown by LPE method. In this study, we report the development of techniques for improving the crystalline quality and controlling the composite uniformity of HgCdTe thin films using high- pressure Hg-ambient annealing method. As a result, we achieved the improvement of the composite uniformity of HgCdTe thin films. It was observed by the high angle annular dark field scanning TEM(HAADF-STEM) analysis. Moreover, new HgTe phase and a shrinking of lattice fringe were observed.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.450-450
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• 2012

In recent days, advances in ZnO-based oxide semiconductor materials have accelerated the development of thin-film transistors (TFTs), which are the building blocks for active matrix flat-panel displays including liquid crystal displays (LCD) and organic light-emitting diodes (OLED). In particular, the development of high-mobility ZnO-based channel materials has been proven invaluable; thus, there have been many reports of high-performance TFTs with oxide semiconductor channels such as ZnO, InZnO (IZO), ZnSnO (ZTO), and InGaZnO (IGZO). The reliability of oxide TFTs can be improved by examining more stable oxide channel materials. In the present study, we investigated the effects of an ALD-deposited water vapor permeation barrier on the stability of ZnO and HfZnO (HZO) thin film transistors. The device without the water vapor barrier films showed a large turn-on voltage shift under negative bias temperature stress. On the other hand, the suitably protected device with the lowest water vapor transmission rate showed a dramatically improved device performance. As the value of the water vapor transmission rate of the barrier films was decreased, the turn-on voltage instability reduced. The results suggest that water vapor related traps are strongly related to the instability of ZnO and HfZnO TFTs and that a proper combination of water vapor permeation barriers plays an important role in suppressing the device instability.

• Proceedings of the KIEE Conference
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• 1996.07c
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• pp.1498-1501
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• 1996

To evaluate insulating properties of polyimide thin film on high temperature over $100\;^{\circ}C$, polyimide film were prepared by electrophoretic deposition onto metal surface from nonaqueous emulsion. The emulsion is made by adding a solution of the resin to a precipitant, which is an organic liquid compeltely miscible with the solvent of the organic resin solution, but which does not dissolve the resin. The polyimide film obtained by annealing shows good insulation properties of 5.8 MV/cm at elevated temperature and breakdown strength of the film reveals thickness dependence.