• Title/Summary/Keyword: Thin film type

Search Result 1,286, Processing Time 0.029 seconds

Structural and Optical Properties of CuInS2 Thin Films Fabricated by Electron-beam Evaporation

  • Jeong, Woon-Jo;Park, Gye-Choon;Chung, Hae-Duck
    • Transactions on Electrical and Electronic Materials
    • /
    • v.4 no.1
    • /
    • pp.7-10
    • /
    • 2003
  • Single phase CuInS$_2$ thin film with the strongest diffraction peak (112) at diffraction angle (2$\theta$) of 27.7$^{\circ}$ and the second strongest diffraction peak (220) at diffraction angle (2$\theta$) of 46.25$^{\circ}$was well made with chalcopyrite structure at substrate temperature of 70$^{\circ}C$. annealing temperature of 250$^{\circ}C$, annealing time of 60 min. The CuInS$_2$ thin film had the greatest grain size of 1.2 Um when the Cu/In composition ratio of 1.03, where the lattice constant of a and c were 5.60${\AA}$ and 11.12${\AA}$, respectively. The Cu/In stoichiometry of the single-phase CuInS$_2$thin films was from 0.84 to 1.3. The film was p-type when tile Cu/In ratio was above 0.99 and was n-type when the Cu/In was below 0.95. The fundamental absorption wavelength, absorption coefficient and optical band gap of p-type CuInS$_2$ thin film with Cu/In=1.3 were 837nm, 3.OH 104 cm-1 and 1.48 eV, respectively. The fundamental absorption wavelength absorption coefficient and optical energy band gap of n-type CuInS$_2$ thin film with Cu/In=0.84 were 821 nm, 6.0${\times}$10$^4$cm$\^$-1/ and 1.51 eV, respectively.

Hysteresis Characteristics in Low Temperature Poly-Si Thin Film Transistors

  • Chung, Hoon-Ju;Kim, Dae-Hwan;Kim, Byeong-Koo
    • Journal of Information Display
    • /
    • v.6 no.4
    • /
    • pp.6-10
    • /
    • 2005
  • The dependence of hysteresis characteristics in low temperature poly-Si (LTPS) thin film transistors (TFTs) on the gate-source voltage (Vgs) or the drain-source voltage (Vds) bias is investigated and discussed. The hysteresis levels in both p-type and n-type LTPS TFTs are independent of Vds bias but increase as the sweep range of Vgs increases. It has been found that the hysteresis in both p-type and n-type LTPS TFTs originated from charge trapping and de-trapping in the channel region rather than at the source/drain edges.

Realization and Analysis of p-Type ZnO:Al Thin Film by RF Magnetron Sputtering

  • Jin, Hu-Jie;Jeong, Yun-Hwan;Park, Choon-Bae
    • Transactions on Electrical and Electronic Materials
    • /
    • v.9 no.2
    • /
    • pp.67-72
    • /
    • 2008
  • Al-doped p-type ZnO thin films were fabricated by RF magnetron sputtering on n-Si (100) and homo-buffer layers in pure oxygen ambient. ZnO ceramic mixed with 2 wt% $Al_2O_3$ was selected as a sputtering target. XRD spectra show that the Al-doped ZnO thin films have ZnO crystal structure. Hall Effect experiments with Van der Pauw configuration show that p-type carrier concentrations are arranged from $1.66{\times}10^{16}$ to $4.04{\times}10^{18}\;cm^{-2}$, mobilities from 0.194 to $198\;cm^2V{-1}s^{-1}$ and resistivities from 0.0963 to $18.4\;{\Omega}cm$. FESEM cross section images of different parts of a p-type ZnO:Al thin film annealed at $800^{\circ}C$ show a compact structure. Measurement for same sample shows that density is $5.40\;cm^{-3}$ which is smaller than theoretically calculated value of $5.67\;cm^{-3}$. Photoluminescence (PL) spectra at 10 K show a shoulder peak of p-type ZnO film at about 3.117 eV which is ascribed to electron transition from donor level to acceptor level (DAP).

Properties of Inclined Silicon Carbide Thin Films Deposited by Vacuum Thermal Evaporation

  • Hamadi Oday A.;Yahia Khaled Z.;Jassim Oday N.S.
    • JSTS:Journal of Semiconductor Technology and Science
    • /
    • v.5 no.3
    • /
    • pp.182-186
    • /
    • 2005
  • In this work, thermal evaporation system was employed to deposit thin films of SiC on glass substrates in order to determine the parameters of them. Measurements included transmission, absorption, Seebak effect, resistivity and conductivity, absorption coefficient, type of energy band-gap, extinction coefficient as functions of photon energy and the effect of increasing film thickness on transmittance. Results explained that SiC thin film is an n-type semiconductor of indirect energy band-gap of ${\sim}3eV$, cut-off wavelength of 448nm, absorption coefficient of $3.4395{\times}10^{4}cm^{-1}$ and extinction coefficient of 0.154. The experimental measured values are in good agreement with the typical values of SiC thin films prepared by other advanced deposition techniques.

A Study on the Measurement of Oil-Film Pressure in Engine Connecting Rod Bearing and Piston Pin-Boss by Thin-Film Sensor

  • Mihara, Yuji;Someya, Tsuneo
    • Proceedings of the Korean Society of Tribologists and Lubrication Engineers Conference
    • /
    • 2002.10b
    • /
    • pp.409-410
    • /
    • 2002
  • In order to measure the oil-film pressure in sliding surface of machinery, we have developed a piezo-resistive type thin-film pressure sensor. To reduce the measurement error due to temperature and strain, the constituent of the pressure sensitive alloy was optimized and a new sensor shape was devised. In this study, we present the measurement results of the oil-film pressure distribution in engine connecting rod big-end bearing and piston pin- bosses with 3 different pin-boss shapes using the newly developed thin-film pressure sensor.

  • PDF

일사량에 따른 태양광 발전출력 분석

  • Jeong, Jong-Uk;Kim, Seon-Gu
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 2009.11a
    • /
    • pp.210-210
    • /
    • 2009
  • This paper describes the analysis results of an generated power with a inclined solar radiation. 2 different types of modules were employed to study the effect of the a inclined solar radiation on the generated power amount. As a result, it was confirmed that the generated power increased with the solar radiation and the mono crystal type cells generated higher power than the thin film type cells.

  • PDF

Preparation of Electrolyte Thin Film for Anode Support Type Solid Oxide Fuel Cells by Electrophoretic Deposition and Dip-Coating (전착법과 담금법에 의한 음극지지형 SOFC 지르코니아 전해질막 제조)

  • 김상우;이병호;손용배;송휴섭
    • Journal of the Korean Ceramic Society
    • /
    • v.36 no.8
    • /
    • pp.791-798
    • /
    • 1999
  • The preparation method of yttria-stabilized zirconia(YSZ) thin film for an anode support type solid oxide fuel cell(SOFC) by electrophoretic deposition(EPD) and dip-coating was studied. And the difference in both preparation method was investigated through basic understanding of processing parameters which may significantly affect weight microstruxcture and defect of film. In dip-coating the thickness of film increased with time until 30 s and then the weight of film decreased with time due to particle falling off from the coagulated film. In EPD although the weight of film increased with time and applied constant-current sagging of the film was observed when the applied current was less that 0.035 mA/$cm^2$ and more than 120 s. Since YSZ thin film by EPD on porous substrate was dense smooth and homogeneous it was expected to be suitable for the electrolyte of an anode support type SOFC.

  • PDF

Changes in Interface Properties of TCO/a-Si:H Layer by Zn Buffer Layer in Silicon Heterojunction Solar Cells (실리콘 이종접합 태양전지의 Zn 확산방지층에 의한 TCO/a-Si:H 층간의 계면특성 변화)

  • Tark, Sung-Ju;Son, Chang-Sik;Kim, Dong-Hwan
    • Korean Journal of Materials Research
    • /
    • v.21 no.6
    • /
    • pp.341-346
    • /
    • 2011
  • In this study, we inserted a Zn buffer layer into a AZO/p-type a-si:H layer interface in order to lower the contact resistance of the interface. For the Zn layer, the deposition was conducted at 5 nm, 7 nm and 10 nm using the rf-magnetron sputtering method. The results were compared to that of the AZO film to discuss the possibility of the Zn layer being used as a transparent conductive oxide thin film for application in the silicon heterojunction solar cell. We used the rf-magnetron sputtering method to fabricate Al 2 wt.% of Al-doped ZnO (AZO) film as a transparent conductive oxide (TCO). We analyzed the electro-optical properties of the ZnO as well as the interface properties of the AZO/p-type a-Si:H layer. After inserting a buffer layer into the AZO/p-type a-Si:H layers to enhance the interface properties, we measured the contact resistance of the layers using a CTLM (circular transmission line model) pattern, the depth profile of the layers using AES (auger electron spectroscopy), and the changes in the properties of the AZO thin film through heat treatment. We investigated the effects of the interface properties of the AZO/p-type a-Si:H layer on the characteristics of silicon heterojunction solar cells and the way to improve the interface properties. When depositing AZO thin film on a-Si layer, oxygen atoms are diffused from the AZO thin film towards the a-Si layer. Thus, the characteristics of the solar cells deteriorate due to the created oxide film. While a diffusion of Zn occurs toward the a-Si in the case of AZO used as TCO, the diffusion of In occurs toward a-Si in the case of ITO used as TCO.

NH3 Sensing Properties of SnO Thin Film Deposited by RF Magnetron Sputtering

  • Vu, Xuan Hien;Lee, Joon-Hyung;Kim, Jeong-Joo;Heo, Young-Woo
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 2014.02a
    • /
    • pp.272-272
    • /
    • 2014
  • SnO thin films, 100 nm in thickness, were deposited on glass substrates by RF magnetron sputtering. A stack structure of $SnO_2/SnO$, where few nanometers of $SnO_2$ were determined on the SnO thin film by X-ray photoelectron spectroscopy. In addition, XPS depth profile analysis of the pristine and heat treated thin films were introduced. The electrical behavior of the as-sputtered films during the annealing was recorded to investigate the working conditions for the SnO sensor. Subsequently, The NH3 sensing properties of the SnO sensor at operating temperature of $50-200^{\circ}C$ were examined, in which the p-type semiconducting sensing properties of the thin film were noted. The sensor shows good sensitivity and repeatability to $NH_3$ vapor. The sensor properties toward several gases like $H_2S$, $CH_4$ and $C_3H_8$ were also introduced. Finally, a sensing mechanism was proposed and discussed.

  • PDF

Preparation and Characterization of Blue Thin Film Phosphors by Pulsed Laser Deposition (PLD(Pulsed Laser Deposition)를 이용한 청색 박막 형광체의 제조 및 특성분석)

  • Cho, Sang-Ho;Jung, Yu-Sun;Kwak, Jung-Ho;Sohn, Kee-Sun
    • Journal of the Korean Ceramic Society
    • /
    • v.43 no.12 s.295
    • /
    • pp.852-858
    • /
    • 2006
  • It is well known that $BaMgAl_{10}O_{17}:Eu^{2+}$ (BAM) and $CaMgSi_2O_6:Eu^{2+}$ (CMS) are a highly efficient blue phosphor. However, these phosphors in the form of thin films have not yet been realized clue to technical difficulties. We prepared thin film type BAM and CMS phosphors on quartz glass substrate using a pulsed laser deposition technique. The luminescent and structural properties of thin film phosphors were monitored as a function of key processing parameters such as oxygen partial pressure inside the deposition chamber, deposition time, laser energy density and the type of post-deposition treatments used. Even though we could not obtain single homogenous phases, thin films with large homogenous areas and a high photoluminescence could be produced by optimizing these processing parameters.