• 한국전산유체공학회:학술대회논문집
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• 한국전산유체공학회 2008년도 학술대회
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• pp.340-346
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• 2008

A level-set method is developed for computation of drop motions in various engineering applications. Compared with the volume-of-fluid method based on a non-smooth volume-fraction function, the LS method can calculate an interface curvature more accurately by using a smooth distance function. Also, it is straightforward to implement for two-phase flows in complex geometries unlike the VOF method requiring much more complicated geometric calculations. The LS method is applied to simulation of inkjet process, thin film pattering and droplet collisions.

• 한국전산유체공학회:학술대회논문집
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• 한국전산유체공학회 2008년 추계학술대회논문집
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• pp.340-346
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• 2008

A level-set method is developed for computation of drop motions in various engineering applications. Compared with the volume-of-fluid method based on a non-smooth volume-fraction function, the LS method can calculate an interface curvature more accurately by using a smooth distance function. Also, it is straightforward to implement for two-phase flows in complex geometries unlike the VOF method requiring much more complicated geometric calculations. The LS method is applied to simulation of inkjet process, thin film pattering and droplet collisions.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권1호
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• pp.926-929
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• 2007

A significant progress has been made in the characterization of zinc oxide (ZnO) semiconductor as a new semiconductor layer instead of amorphous Si semiconductor used in thin film transistor due to its high electron mobility at low deposition temperature which is quite suitable for flexible display and OLED devices. The wet pattering of ZnO is another important issue with regard to mass production of ZnO thin film transistor device. However, the wet behavior of ZnO thin film in aqueous wet etching solutions conventionally used un TFT industry has not been reported yet, in this work, wet corrosion behavior of RF magnetron sputtered ZnO thin film in various wet solutions such as phosphoric and nitric acid solutions was studied using by electrochemical analysis. The effects of deposition parameters such as RF power and oxygen partial pressure on corrosion rate are also examined.

• 한국레이저가공학회지
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• 제12권4호
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• pp.1-5
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• 2009

Conventional patterning based on wet-process for multi-layered film is a relatively complex and costly process though it is a necessary step for fabrication of TFT-LCD module. Recently, a direct pattering by laser has been studied because it is low cost and simple process compared to the wet process. In this work, the selective removal process of multi-layered film (polyimide/indium tin oxide/glass) is studied by modeling the thermal and mechanical behavior for multi-layered structure. Especially, the effects of thickness of polyimide layer are examined.

• 한국레이저가공학회지
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• 제13권1호
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• pp.11-15
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• 2010

Indium tin oxide (ITO) provides high electrical conductivity and transparency in the visible and near IR (infrared) wavelengths. Thus, it is widely used as a transparent electrode for the fabrication of liquid crystal displays (LCDs) and organic light emitting diode displays (OLRDs), photovoltaic devices, and other optical applications. Lasers have been used for removing coating on polymer substrate for flexible display and electronic industry. In selective removal of ITO layer, laser wavelength, pulse energy, scan speed, and the repetition rate of pulses determine conditions, which are efficient for removal of ITO coating without affecting properties of the polymer substrate. ITO coating removal with a laser is more environmentally friendly than other conventional etching methods. In this paper, pattering of ITO film from polymer substrates is described. The Yb:KGW femtosecond laser processing system with a pulse duration of 250fs, a wavelength of 1030nm and a repetition rate of 100kHz was used for removing ITO coating in air. We can remove the ITO coating using a scanner system with various pulse energies and scan speeds. We observed that the amount of debris is minimal through an optical and a confocal microscope, and femtosecond laser pulses with 1030nm wavelength are effective to remove ITO coating without the polymer substrate ablation.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
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• pp.1154-1157
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• 2006

Organic thin-film transistors (OTFTs) based on a semiconducting polymer have been fabricated using an organic patterning methodology. Laser assisted lift-off (LALO) technique, ablating selectively the hydrophobic layer by an excimer laser, was used for producing a semiconducting polymer channel in the OTFT with high resolution. The selective wettability of a semiconducting polymer, poly (9-9-dioctylfluorene-co-bithiophene) (F8T2), dissolved in a polar solvent was found to define precisely the pattering resolution of the active channel. It is demonstrated that in the F8T2 TFTs fabricated using the LALO technique and is applicable for the larger area display.

• 한국입자에어로졸학회지
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• 제13권3호
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• pp.111-118
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• 2017

전기수력학 (Electrohydrodynamic, EHD) 프린팅 기술은 전기장을 이용하여 일반 프린팅 기술보다 더 작은 크기의 액적을 분사하고 패터닝할 수 있는 장점을 갖고 있다. EHD 프린팅은 일반적으로 인쇄 노즐이나 기판을 X-Y 방향으로 움직여 패턴을 제작하는 방식으로 사용되어 왔으나 본 연구에서는 다중전극 어레이 (Multielectrode array, MEA)를 이용하여 원하는 기판위에 2차원의 패터닝이 가능함을 연구하였다. 특히, 약물전달장치 등의 바이오메디칼 디바이스로의 응용이 가능한 생분해성 고분자와 염료를 혼합한 잉크의 EHD 프린팅을 시도하였으며 노즐이나 기판의 움직임 없이 안정적으로 분사할 수 있는 2차원 범위에 대한 연구를 통해 최소 약 $6{\mu}m$ 크기를 갖는 패턴을 노즐 위치로부터 수평방향으로 약 1 mm 범위까지 안정적 패터닝이 가능함을 확인하였다. 또한, MEA 전극 간의 거리에 의한 패턴 조밀도의 한계를 극복하기 위해 MEA와 인쇄가 이루어지는 기판과의 상대적 이동을 통해 더 조밀한 패터닝이 가능함을 보여주었다.