• Title/Summary/Keyword: Thin Film, Sensor

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Analysis of the Failure Position in the Unimorph Cantilever for Energy Harvesting (에너지 하베스팅용 압전 캔틸레버의 위치에 따른 파단점 분석)

  • Kim, Hyung-Chan;Jeong, Dae-Yong;Yoon, Seok-Jin;Kim, Hyun-Jai
    • Korean Journal of Materials Research
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    • v.17 no.2
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    • pp.121-123
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    • 2007
  • Energy harvesting from the vibration through the piezoelectric effect has been studied for powering the wireless sensor node. As piezoelectric unimorph cantilever structure can transfer low vibration to large displacement, this structure was commonly deployed to harvest electric energy from vibrations. Piezoelectric unimorph structure was composed of small stiff piezoelectric ceramic on the large flexible substrate. As there is the large Young's modulus difference between the flexible substrate and stiff piezoelectric ceramic, flexible substrate could not homogeneously transfer the vibration to stiff piezoelectric ceramic. As a result, most piezoelectric ceramics had been broken at the certain point. We measured and analyzed the stress distribution on the piezoelectric ceramic on the cantilever.

Properties of Magneto-resistance by annealing using by co-sputtering method (co-sputtering법으로 제조한 Insb박막의 후열처리기술에 의한 자기저항 특성)

  • Kim, Tae-Hyong;So, Byung-Moon;Song, Min-Jong;Park, Choon-Bae
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.08a
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    • pp.128-132
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    • 2002
  • Many compound semiconductors which have high carrier mobility and small band gap have attentive in application of various practical a field. Especially, InSb served for Hall device and magnetic resistor such as magnetic sensor because InSb thin film has high mobility. Many studies on InSb thin film deposistion because In and Sb has been very different feature of vapor pressure($10^{-4}$ times) When In and. Sb deposited. In this paper studied it In and Sb deposited simultaneously using by method of co-sputtering deposotion. This process, get to effects of manufacture process simplification. After that this paper observed micro structure and electronic behavior of InSb thin film using by co-sputtering and we study properties of magneto-resistance by annealing

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Catalytic combustion type hydrogen micro gas sensor using thin film heater and nano crystalline SnO2 (나노 결정 SnO2와 백금 박막히터를 이용한 접촉연소식 마이크로 가스센서의 감응특성 연구)

  • Han, Sang-Do;Hong, Dae-Ung;Han, Chi-Hwan;Chun, Il-Soo
    • Journal of Sensor Science and Technology
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    • v.17 no.3
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    • pp.178-182
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    • 2008
  • Planar type micro catalytic combustible gas sensor was developed by using nano crystalline $SnO_2$ Pt thin film as micro heater was deposited by thermal evaporation method on the alumina substrate. The thickness of the Pt heater was around 160 nm. The sensor showed high reliability with prominent selectivity against various gases(Co, $C_3H_8,\;CH_4$) at low operating temperature($156^{\circ}C$). The sensor with nano crystalline $SnO_2$ showed higher sensitivity than that without nano crystalline $SnO_2$. This can be explained by more active adsorption and oxidation of hydrogen by nano crystalline $SnO_2$ particles. The present planar-type catalytic combustible hydrogen sensor with nano crystalline $SnO_2$ is a good candidate for detection of hydrogen leaks.

Integrated IR Photo Sensor for Display Application (디스플레이 패널에 집적이 가능한 적외선 포토센서)

  • Jeon, Ho-Sik;Heo, Yang-Wook;Lee, Jae-Pyo;Han, Sang-Youn;Bae, Byung-Seong
    • Journal of the Korean Society for Precision Engineering
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    • v.29 no.11
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    • pp.1164-1169
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    • 2012
  • This paper presents a study of an integrated infrared (IR) photo sensor for display application. We fabricated hydrogenated amorphous silicon thin film transistor (a-Si:H TFT) and hydrogenated amorphous silicon germanium thin film transistor (a-SiGe:H TFT) which were bottom gate structure. We investigated the dependence of a-SiGe:H TFT characteristics on incident wavelengths. We proposed photo sensor which responded to wavelengths of IR region. Proposed pixel circuit of photo sensor was consists of switch TFT and photo TFT, and one capacitor. We developed integrated photo sensor circuit and investigated the performance of the proposed sensor circuit according to the input wavelengths. The developed photo sensor circuit with a-SiGe:H TFT was suitable for IR.

Limit-current type zirconia oxygen sensor with porous diffusion layer (다공성 확산층을 이용한 한계전류형 지르코니아 산소센서)

  • Oh, Young-Jei;Lee, Chil-Hyoung
    • Journal of Sensor Science and Technology
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    • v.17 no.5
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    • pp.329-337
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    • 2008
  • Simple, small and portable oxygen sensors were fabricated by tape casting technique. Yttria stabilized zirconia containing cordierite ceramics (YSZC) were used as a porous diffused layer of oxygen in pumping cell. Yttria stabilized zirconia (YSZ) solid electrolyte, YSZC porous diffusion layer and heater-patterned ceramic sheets were prepared by co- firing method. Limit current characteristics and the linear relationship of current to oxygen concentration were observed. Viscosity variation of the slurries both YSZ and YSZC showed a similar behavior, but micro pores in the fired sheet were increased with increasing of the cordierite amount. Molecular diffusion was dominated due to the formation of large pores in porous diffusion layer. The plateau range of limit current in porous-type oxygen sensor was narrow than the one of aperture-type oxygen sensor. However limit current curve was appeared in porous-type oxygen sensor even at the lower applied voltage. The plateau range of limit-current was widen as increasing the thickness of porous diffusion layer of the YSZ containing cordierite. Measuring temperature of $600{\sim}650^{\circ}C$ was recommended for limit-current oxygen sensor. Porous diffusion layer-type oxygen sensor showed faster response than the aperture-type one and was stable up to 30 days running without any crack at interface between the layers.

The Image Sensor Operating by Thin Film Transistor (박막트랜지스터에 의해 구동되는 이미지센서)

  • Hur Chang-wu
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.10 no.1
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    • pp.111-116
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    • 2006
  • In this paper, the image sensor using the a-Si:H TFT is proposed. The optimum amorphous silicon thin film is deposited using plasma enhanced chemical vapor deposition (PECVD). TFT and photodiode both with the thin film are fabricated and form image sensor. The photodiode shows that Idark is $10^{-12}A$, Iphoto is $10^{-9}A$ and Iphoto/Idark is $10^3$, respectively. In the case of a-Si:H TFT, it indicates that Ion/Ioff is $10^6$, the drain current is a few ${\mu}A$ and Vth is $2\~4$ volts. For the analysis on the fabricated image sensor, the reverse bias of -5 voltage in ITO of photodiode and $70{\mu}sec$ pulse in the gate of TFT are applied. The image sensor with good property was conformed through the measured photo/dark current.

Effect of Process Parameter on Piezoelectric Properties of PZT Thin films (PZT 박막의 압전특성에 미치는 공정변수의 효과)

  • 김동국;지정범
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.15 no.12
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    • pp.1060-1064
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    • 2002
  • We have studied the effect of crystallization temperature, composition and film thickness, which are the fundamental processing parameters of lead zirconate titanate(PZT) thin film fabrication, in the respect of the piezoelectric properties by our pneumatic loading method(PLM). A great deal of research has been done in the field of characterization for piezoelectric thin films after the first report on the measurement for the piezoelectric coefficient of thin films in 1990. Even though the piezoelectric properties of thin films are very critical factors in the micro-electro mechanical system(MEMS) and thin film sensor devices, a few reports for the piezoelectric characterization are provided for the last decade unlikely the bulk piezoelectric devices. We have found that the piezoelectric properties of thin films are improved as the increase of crystallization temperature up to 750$\^{C}$ and this behavior can be also explained by the analysis of dielectric polarization hysteresis loop, X-ray diffraction and scanning electron microscopy. The effect of Zr/Ti composition has been also studied. This gives us the fact that the maximum piezoelectricity is found near Morphotropic Phase Boundary(MPB) as bulk PZT system does.

The Fabrication of Chromium Nitride Thin-Film Type Pressure Sensors for High Pressure Application and Its Characteristics (고압용 코롬질화박막형 압력센서의 제작과 그 특성)

  • 정귀상;최성규;서정환;류지구
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.14 no.6
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    • pp.470-474
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    • 2001
  • This paper describes the fabrication and characteristics of CrN thin-film type pressure sensors, in which the sensing elements were deposited on SuS. 630 diaphragm by DC reactive magnetron sputtering in an argon-nitride atmosphere(Ar-(10%)N$_2$). The optimized condition of CrN thin-film sensing elements was thickness range of 3500$\AA$ and annealing condition(300$\^{C}$, 3 hr) in Ar-10%N$_2$ deposition atmosphere. Under optimum conditions, the CrN thin-films for strain gauges is obtained a high resistivity, ρ=1147.65 $\mu$Ωcm, a low temperature coefficient of resistance, TCR=186ppm/$\^{C}$ and a high temporal stability with a good longitudinal, 11.17. The output sensitivity of fabricated CrN thin-film type pressure sensors is 2.36 mV/V, 4∼20nA and the maximum non-linearity is 0.4%FS and hysteresis is less than 0.2%FS.

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Characteristics of thin-film type pressure sensors for high pressure (고압용 박막형 압력센서의 특성)

  • 서정환;최성규;정찬익;류지구;남효덕;정귀상
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.07a
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    • pp.737-740
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    • 2001
  • This paper describes the fabrication and characteristics of CrN thin-film type pessure sensors, which the sensing elements were deposited on SUS. 630 diaphragm by DC reactive magnetron sputtering in an argon-nitride atmosphere(Ar-(10%)N$_2$). The optimized condition of CrN thin-film sensing elements was thickness range of 3500${\AA}$ and annealing condition(300$^{\circ}C$, 3 hr) in Ar-10 %N$_2$deposition atmosphere. Under optimum conditions, the CrN thin-films for strain gauges is obtained a high resistivity, $\rho$=1147.65 ${\mu}$$\Omega$cm, a low temperature coefficient of resistance, TCR=-186 ppm/$^{\circ}C$ and a high temporal stability with a good longitudinal, 11.17. The output sensitivity of fabricated CrN thin-film type pressure sensors is 2.36 mV/V, 4∼20 mA and the maximum non-linearity is 0.4 %FS and hysteresis is less than 0.2 %FS.

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Low Velocity Impact Monitoring for a Composite Sandwich Beam Using Piezo Thin Film Sensors (압전필름센서를 이용한 복합재 샌드위치 보의 저속충격 모니터링)

  • Park, Chan Ik;Lee, Gwan Ho;Kim, In Geol;Lee, Yeong Sin
    • Journal of the Korean Society for Aeronautical & Space Sciences
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    • v.31 no.2
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    • pp.51-56
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    • 2003
  • The piezoelectric thin film(PVDF: polyvinylidene fluoride) sensors having good dynamic sensing charachteristics can be used to monitor low vwlocit impact on composite structures. The impact response function for composite sandwich beam was derved. The impact tests at low energy without inducing damage were performed on the instrumented drop weight impact tester. The measured signals of PVDF sensors attached on the surface of the beam agreed well with the simulated signals. And the inverse technique was applied to reconstruct the impact forces from the PVDF sensor signals. Most of reconstructed impact forces showed good agreement with the measured forces. The comparison results showed that the piezoelectric thin film sensor can be used to monitor the low velocity impact on composite sandwich structures.