• Title/Summary/Keyword: Thickness Uniformity

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Electrical Characterization of Ultrathin $SiO_2$ Films Grown by Thermal Oxidation in $N_2O$ Ambient ($N_2O$ 분위기에서 열산화법으로 성장시킨 $SiO_2$초박막의 전기적 특성)

  • Gang, Seok-Bong;Kim, Seon-U;Byeon, Jeong-Su;Kim, Hyeong-Jun
    • Korean Journal of Materials Research
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    • v.4 no.1
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    • pp.63-74
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    • 1994
  • The ultrathin oxide films less than 100$\AA$ were grown by thermal oxidation in $N_2O$ ambient to improve the controllability of thickness, thickness uniformity, process reproducibility and their electrical properties. Oxidation rate was reduced significantly at very thin region due to the formation of oxynitride layer in $N_2O$ ambient and moreover nitridation of the oxide layer was simultaneously accompanied during growth. The nitrogen incorporation in the grown oxide layer was characterized with the wet chemical etch-rate and ESCA analysis of the grown oxide layer. All the oxides thin films grown in $N_2O$, pure and dilute $O_2$ ambients show Fowler-Nordheim electrical conduction. The electrical characteristics of thin oxide films grown in $N_2O$ such as leakage current, electrical breakdown, interface trap density generation due to the injected electron and reliability were better than those in pure or dilute ambient. These improved properties can be explained by the fact that the weak Si-0 bond is reduced by stress relaxation during oxidation and replacement by strong Si-N bond, and thus the trap sites are reduced.

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The development of ultra high-speed metal film deposition system and process technology for a heat sink in digital devices (디지털 소자용 방열판 제작을 위한 초고속 금속필름 증착장치 및 공정기술 개발)

  • Yoon, Hyo Eun;Ahn, Seong Joon;Han, Dong Hwan;Ahn, Seungjoon
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.18 no.7
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    • pp.17-25
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    • 2017
  • To resolve the problem of the temperature rise in LED or OLED lighting, until now a thick metal film has been used as a heat-sink. Conventionally, this thick metal film is made by the electroplating method and used as the heat-dissipating plate of the electronic devices. However, nowadays there is increasing need for a Cu metal film with a thickness of several hundred micrometers that can be formed by the dry deposition method. In this work, we designed and fabricated a Cu film deposition system where the heating element is separated from the ceramic crucible, which makes ultra-rapid deposition possible by preventing heat loss. In addition, the resulting induction heating also contributes to the high deposition rate. By tuning the various parameters, we obtained a $100-{\mu}m$ thick Cu film whose heat conductivity is high and whose thickness uniformity is better than 2%, while the deposition rate is as high as $1000{\AA}/s$.

Robust Design for Showerhead Thermal Deformation

  • Gong, Dae-Wi;Kim, Ho-Jun;Lee, Seung-Mu;Won, Je-Hyeong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.150.1-150.1
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    • 2014
  • Showerhead is used as a main part in the semiconductor equipment. The face plate flatness should remain constant and the cleaning performance must be gained to keep the uniformity level of etching or deposition in chemical vapor deposition process. High operating temperature or long period of thermal loading could lead the showerhead to be deformed thermally. In some case, the thermal deformation appears very sensitive to showerhead performance. This paper describes the methods for robust design using computational fluid dynamics. To reveal the influence of the post distribution on flow pattern in the showerhead cavity, numerical simulation was performed for several post distributions. The flow structure appears similar to an impinging flow near a centered baffle in showerhead cavity. We took the structure as an index to estimate diffusion path. A robust design to reduce the thermal deformation of showerhead can be achieved using post number increase without ill effect on flow. To prevent the showerhead deformation by heat loading, its face plate thickness was determined additionally using numerical simulation. The face plate has thousands of impinging holes. The design key is to keep pressure drop distribution on the showerhead face plate with the holes. This study reads the methodology to apply to a showerhead hole design. A Hagen-Poiseuille equation gives the pressure drop in a fluid flowing through such hole. The assumptions of the equation are the fluid is viscous-incompressible and the flow is laminar fully developed in a through hole. An equation can be expressed with radius R and length L related to the volume flow rate Q from the Hagen-Poiseuille equation, $Q={\pi}R4{\Delta}p/8{\mu}L$, where ${\mu}$ is the viscosity and ${\Delta}p$ is the pressure drop. In present case, each hole has steps at both the inlet and the outlet, and the fluid appears compressible. So we simplify the equation as $Q=C(R,L){\Delta}p$. A series of performance curves for a through hole with geometric parameters were obtained using two-dimensional numerical simulation. We obtained a relation between the hole diameter and hole length from the test cases to determine hole diameter at fixed hole length. A numerical simulation has been performed as a tool for enhancing showerhead robust design from flow structure. Geometric parameters for the design were post distribution and face plate thickness. The reinforced showerhead has been installed and its effective deposition profile is being shown in factory.

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Effect of Electropolishing on Surface Quality of Stamped Leadframe (Stamped Leadframe의 표면 품질에 미치는 전해연마 효과)

  • 남형곤;박진구
    • Journal of the Microelectronics and Packaging Society
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    • v.7 no.3
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    • pp.45-54
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    • 2000
  • The effect of electropolishing far stamped leadframe on the removal of the edge burr and residual stress relief was examined. The present study showed that the electropolishing could be used for enhanced surface quality of stamped leadframes. The electropolishing was performed at the condition of 60% phosphoric acid electrolyte, 5 ampere of current and 3 cm electrode gap at $70^{\circ}C$ for 2 minutes for Alloy42 type leadframe, and $50^{\circ}C$ for 1.5 minutes for C-194 type leadframe. The FWHM values from X-ray diffraction showed that residual stress of electropolished leadframe recovered to the level of as-received raw materials and surface roughness measured by using AFM tuned out to be improved by 0.079 $\mu\textrm{m}$ and 0.014 $\mu\textrm{m}$ ($R_{rms}$) far alloy 42 and C-194 type leadframes, respectively. The plated thickness using XRF showed the improved uniformity in thickness variation by 0.4~0.5 $\mu\textrm{m}$ and grain growth, which is favorable for interface adhesion, was also observed from the bake test samples. We could certify dimensional stability of leadframe with inspection by means of 3D-topography and hardness measurements.

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Formation of Size-controllable Ag Nanoparticles on Si Substrate by Annealing (크기 조절이 가능한 은 나노입자 형성을 위한 박막의 열처리 효과)

  • Lee, Sang Hoon;Lee, Tae Il;Moon, Kyeong-Ju;Myoung, Jae Min
    • Korean Journal of Materials Research
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    • v.23 no.7
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    • pp.379-384
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    • 2013
  • In order to produce size-controllable Ag nanoparticles and a nanomesh-patterned Si substrate, we introduce a rapid thermal annealing(RTA) method and a metal assisted chemical etching(MCE) process. Ag nanoparticles were self-organized from a thin Ag film on a Si substrate through the RTA process. The mean diameter of the nanoparticles was modulated by changing the thickness of the Ag film. Furthermore, we controlled the surface energy of the Si substrate by changing the Ar or $H_2$ ambient gas during the RTA process, and the modified surface energy was evaluated through water contact angle test. A smaller mean diameter of Ag nanoparticles was obtained under $H_2$ gas at RTA, compared to that under Ar, from the same thickness of Ag thin film. This result was observed by SEM and summarized by statistical analysis. The mechanism of this result was determined by the surface energy change caused by the chemical reaction between the Si substrate and $H_2$. The change of the surface energy affected on uniformity in the MCE process using Ag nanoparticles as catalyst. The nanoparticles formed under ambient Ar, having high surface energy, randomly moved in the lateral direction on the substrate even though the etching solution consisting of 10 % HF and 0.12 % $H_2O_2$ was cooled down to $-20^{\circ}C$ to minimize thermal energy, which could act as the driving force of movement. On the other hand, the nanoparticles thermally treated under ambient $H_2$ had low surface energy as the surface of the Si substrate reacted with $H_2$. That's why the Ag nanoparticles could keep their pattern and vertically etch the Si substrate during MCE.

Electron emission stability from CNTs with various densities (탄소나노튜브 밀도의 변화에 따른 전자방출 안정성 연구)

  • Lim Sung Hoon;Yun Hyun Sik;Ryu Je Hwang;Moon Jong Hyun;Park Kyu Chang;Jang Jin;Moon Byeong Yeon
    • Journal of the Korean Vacuum Society
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    • v.14 no.4
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    • pp.258-262
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    • 2005
  • We report on the field emission properties from vertically aligned carbon nanotubes (CNTs) produced by a triode PECVD with a SiNx capping layer on metal catalyst. It is found that the CNTs density can be controlled by the capping layer thickness and decreases with increasing SiNx thickness. The CNT density of $\~$ 104/$cm^{2}$ exhibited highest electron emission characteristics, the threshold field of 1.2 V/$\mu$m and the current density of 0.17 mA/$cm^{2}$ at 3.6 V/$\mu$m. We have carried out investigation of electron emission stability under ambient gas of N2. The electron emission stability was improved with decreasing CNT density. Under $1\times$$10^{-5}$ Torr ambient pressure, the CNTs in 5 $\mu$m hole show electron emission current higher than $1\times$$10^{-4}$ A/cm2 and it's electron emission uniformity has $2\%$.

Mechanical behavior and microstructural characterization of different zirconia polycrystals in different thicknesses

  • Arcila, Laura Viviana Calvache;Ramos, Nathalia de Carvalho;Campos, Tiago Moreira Bastos;Dapieve, Kiara Serafini;Valandro, Luiz Felipe;de Melo, Renata Marques;Bottino, Marco Antonio
    • The Journal of Advanced Prosthodontics
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    • v.13 no.6
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    • pp.385-395
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    • 2021
  • PURPOSE. To characterize the microstructure of three yttria partially stabilized zirconia ceramics and to compare their hardness, indentation fracture resistance (IFR), biaxial flexural strength (BFS), and fatigue flexural strength. MATERIALS AND METHODS. Disc-shaped specimens were obtained from 3Y-TZP (Vita YZ HT), 4Y-PSZ (Vita YZ ST) and 5Y-PSZ (Vita YZ XT), following the ISO 6872/2015 guidelines for BFS testing (final dimensions of 12 mm in diameter, 0.7 and 1.2 ± 0.1 mm in thicknesses). Energy-dispersive X-ray spectroscopy (EDX), X-ray diffraction (XRD) and scanning electron microscopy (SEM) analyses were performed, and mechanical properties were assessed by Vickers hardness, IFR, quasi-static BFS and fatigue tests. RESULTS. All ceramics showed similar chemical compositions, but mainly differed in the amount of yttria, which was higher as the amount of cubic phase in the diffractogram (5Y-PSZ > 4Y-PSZ > 3Y-TZP). The 4Y- and 5Y-PSZ specimens showed surface defects under SEM, while 3Y-TZP exhibited greater grain uniformity on the surface. 5Y-PSZ and 3Y-TZP presented the highest hardness values, while 3Y-TZP was higher than 4Y- and 5Y-PSZ with regard to the IFR. The 5Y-PSZ specimen (0.7 and 1.2 mm) showed the worst mechanical performance (fatigue BFS and cycles until failure), while 3Y-TZP and 4Y-PSZ presented statistically similar values, higher than 5Y-PSZ for both thicknesses (0.7 and 1.2 mm). Moreover, 3Y-TZP showed the highest (1.2 mm group) and the lowest (0.7 mm group) degradation percentage, and 5Y-PSZ had higher strength degradation than 4Y-PSZ group. CONCLUSION. Despite the microstructural differences, 4Y-PSZ and 3Y-TZP had similar fatigue behavior regardless of thickness. 5Y-PSZ had the lowest mechanical performance.

The Dosimetric Data of 10 MV Linear Accelerator Photon Beam for Total Body Irradiation (전신 방사선조사를 위한 10MV 선형가속기의 선량측정)

  • Ahn Sung Ja;Kang Wee-Saing;Park Seung Jin;Nam Taek Keun;Chung Woong Ki;Nah Byung Sik
    • Radiation Oncology Journal
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    • v.12 no.2
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    • pp.225-232
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    • 1994
  • Purpose : This study was to obtain the basic dosimetric data using the 10 MV X-ray for the total body irradiation. Materials and Methods : A linear accelerator photon beam is planned to be used as a radiation source for total body irradiation (TBI) in Chonnam University Hospital. The planned distance from the target to the midplane of a patient is 360cm and the maximum geometric field size is 144cm x 144cm. Polystyrene phantom sized $30{\times}30{\times}30.2cm^3$ and consisted of several sheets with various thickness, and a parallel plate ionization chamber were used to measure surface dose and percent depth dose (PDD) at 345cm SSD, and dose profiles. To evaluate whether a beam modifier is necessary for TBI, dosimetry in build up region was made first with no modifier and next with an 1cm thick acryl plate 20cm far from the polystyrene phantom surface. For a fixed sourec-chamber distance, output factors were measured for various depth. Results : As any beam modifier was not on the way of radiation of 10MV X-ray, the $d_{max}$ and surface dose was 1.8cm and $61\%$, respectively, for 345cm SSD. When an 1cm thick acryl plate was put 20cm far from polystyrene phantom for the SSD, the $d_{max}$ and surface dose were 0.8cm and $94\%$, respectively. With acryl as a beam spoiler, the PDD at 10cm depth was $78.4\%$ and exit dose was a little higher than expected dose at interface of exit surface. For two-opposing fields for a 30cm phantom thick phantom, the surface dose and maximum dose relative to mid-depth dose in our experiments were $102.5\%$ and $106.3\%$, respectively. The off-axis distance of that point of $95\%$ of beam axis dose were 70cm on principal axis and 80cm on diagonal axis. Conclusion: 1. To increase surface dose for TBI by 10MV X-ray at 360cm SAD, 1cm thick acrylic spoiler was sufficient when distance from phantom surface to spoiler was 20cm. 2. At 345cm SSD, 10MV X-ray beam of full field produced a satisfiable dose uniformity for TBI within $7\%$ in the phantom of 30cm thickness by two-opposing irradiation technique. 3. The uniform dose distribution region was 67cm on principal axis of the beam and 80cm on diagonal axis from beam axis. 4. The output factors at mid-point of various thickness revealed linear relation with depth, and it could be applicable to practical TBI.

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The Crystallographic and Magnetic Properties of $Fe_{1-x}Co_x$System ($Fe_{1-x}Co_x$계의 결정구조와 자기적인 성질)

  • 김정기;한경훈;서정철
    • Journal of the Korean Magnetics Society
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    • v.9 no.4
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    • pp.190-195
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    • 1999
  • The crystallographic and magnetic properties of the system of $Fe_{1-x}Co_x$(x=0.2 and 0.4) prepared by microwave arc-melting with the maximum power of 3.5 kW and a iron-foil with thickness of 25 ${\mu}{\textrm}{m}$ have been studied by the methods of X-ray diffraction and the measurement of the magnetic hysteresis using the vibrating sample magnetometer at room temperature. The samples were prepared in three different ways: First, pellet form pressed under the pressure of 9,000 N/$\textrm{cm}^2$. Second, the sheet cold rolled. Third, thin sheet treated with the temperature of 90$0^{\circ}C$. The X-ray diffraction pattern of the sample prepared by the first method shows that the crystal structure of the sample is bcc as same as that of Fe with a good uniformity. The iron-foil has the coercivity of 43 Oe and the initial slope of magnetization of 0.328 emu/gOe. The coervicity and magnetization of the sample prepared by the second method increased as the Co content increased. But the initial slop of the magnetization decreased as the Co content increased. This means that the displacement of domain wall is suppressed by the increases of coercivity as the Co content increased. The saturation magnetization of the samples made by the third method increased. On the other hand, the coercivity of these samples decreased. The increase of saturation magnetization of the samples seems to be related to the changes in X-ray intensity after heat treatment. Also some magnetic parameters of the samples were calculated by using a simple model and compared with other values.

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Applications of Artificial Pollination, Spraying Gibberellin A4+7 Plus Benzyladenine for Production of Uniform Fruits in 'Fuji' Apples (인공수분(人工受粉) 및 Promalin 처리에 의한 사과 '후지' 품종(品種)의 과형(果形) 개선(改善))

  • Park, Jeong-Gwan;Hong, Jae-Seong;Choi, In-Myung;Kim, Jung-Bae;Kim, Seong-Ho;Park, Hee-Sung
    • Horticultural Science & Technology
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    • v.16 no.1
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    • pp.27-29
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    • 1998
  • Artificial pollination (AP) and gibberellin A4+7 plus benzyladenine (promalin) were applied alone and together. AP was applied at 10% flowering time with 'Senshu' pollen (Malus domestica cv. Senshu). 12mg/L promalin was applied at 0, 10 and 20 days after falling of central flowers, respectively. In promalin treatment with or without AP application methods, fruit length, weight and length/diameter (L/D) were higher than those of control and AP. However, in AP and AP+ promalin application, the number of seeds and seed weight were higher than those of control and promalin. In AP+ promalin treatment, 78.6% fruits showed their uniform fruit shape and so significantly enhanced fruit uniformity compared to other treatments. Also cortex and core thickness of fruits were greater at the apex than that of other treatment. Fruit with L/D ratio over 0.87 were highly produced by applications of AP+promalin and promalin than control and AP only. 'Fuji' apples in good shape can be produced by using of AP + promalin together.

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