• 제목/요약/키워드: Thick film process

검색결과 375건 처리시간 0.034초

Impedance Analysis of Resistance Anomaly of $BaTiO_3$ based PTC thermistor

  • Chun, Myoung-Pyo;Myoung, Seong-Jae;Nam, Joong-Hee;Cho, Jeong-Ho
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2009년도 하계학술대회 논문집
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    • pp.182-182
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    • 2009
  • The effect of Re-oxidation on the PTCR properties of Sm-doped barium titanate ceramics was investigated by means of impedance spectroscopy. Electrical properties such as resistance vs. temperature, I-V curve were measured and microstructure was observed with SEM photography. Sample was fabricated with thick film process such as tape casting of green sheet, screen printing of electrode pattern, stacking, firing in reduced atmosphere and re-oxidation, etc. As the temperature of re-oxidation increases, resistance jump as a function of temperature enhances but resistance at room temperature increases. These behavior of resistance as a function of temperature, dependent on the re-oxidation condition, is analyzed with Cole-Cole impedance plot and is shown to be related with the degree of oxidation of grain boundary regardless of grain core during re-oxidation process of sample.

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수평공진형 다결정실리콘 미소액추에이터의 설계, 제작 및 시험 (Design, Microfabricaiton and Testing of Laterally-Resonating Polysilicon Microactuators)

  • 조영호
    • 대한기계학회논문집A
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    • 제20권5호
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    • pp.1363-1371
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    • 1996
  • This paper presents the design, fabrication, and testing of polysilicon electrostatic microactuators that resonate in the direction parallel to the silicon susbstrates. A set of six different designs has been developed using a theoretical model and design formulae developed for the mocroactuators. Microactuator prototypes are fabricated from a 2.1 $\mu{m}$-thick LPCVD polysilicon film, using a 4-mask surface-micromachining process. The prototypes are tested under a d.c. bias voltage of 45V with an a.c. drive voltage amplitude of 20 v.Measured resorant frequencies are in the ranges of 40-60 kHz, showing a good agreement to their theoretical estimates within error bounds of .$\pm$.5%. Important issues inthe design and microfabrication of the microactuators are discussed, together with potential applicaitons of the key technology involved.

Facile Fabrication of Aligned Doubly Open-ended TiO2 Nanotubes, via a Novel Selective Etching Process, and Thier Application in Dye Sensitized Solar Cells

  • 최종민;박태호
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.483.2-483.2
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    • 2014
  • In this study, we describe a simple selective etching method that produces noncurling, freestanding, large-area, aligned $TiO_2$ nanotube (NT) with doubly ends opened. The novel selective etching process only removed the thin 2nd bottom layer from the physically and chemically stable thick amorphous 1st top layer under thermal treatment at $250^{\circ}C$, yielding ordered doubly open-ended NT (DNT) that could be easily transferred to an FTO substrate for the fabrication of front-illuminated dye sensitized solar cells (DSCs). The DNT-DSCs yielded a higher PCE (8.6%) than was observed from $TiO_2$ nanoparticle (TNP)-based DSCs (7.3%), for comparable film thicknesses of $16{\mu}m$, despite of 20% decreased amount of dye. Intensity-modulated photocurrent and photovoltage spectroscopy (IMPS and IMVS, respectively) revealed that the DNT-DSCs exhibited electron lifetimes that were 10 times longer than those of TNP-DSCs, which contributed to high device performances.

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SU-8 마스크를 이용한 유리의 입자분사 미세가공 정밀도 평가 (Precision assessment of micro abrasive jet machining result on glass by using thick SU-8 as a mask)

  • ;고태조;김희술;박영우;이인환
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2006년도 춘계학술대회 논문집
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    • pp.493-494
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    • 2006
  • SU-8 can be implemented as a mask for micro Abrasive Jet Machining (micro-AJM) process [1]. In this paper, we will evaluate the quality of micro grooving result on glass substrate by micro-AJM process which using SU-8 as a mask. It was evaluated on width and edge profile of the micro grooving. The result was having distortion compare with the master film used to pattern the SU-8 mask. The value of distortion with other properties which came along with it, such as depth and surface roughness, can be optimized in order to fabricate micro-channel for micro-fluidic application.

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상용 LTCC 소재의 슬러리 제조 공정에서 분산성 평가 및 최적화 (Evaluation and Optimization of Dispersion in Slurry Preparation of Commercial LTCC Material)

  • 권혁중;신효순;여동훈;김종희;조용수
    • 한국전기전자재료학회논문지
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    • 제21권4호
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    • pp.341-347
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    • 2008
  • Laminated LTCC components of high integrity, fabricated by thick film process, are applied to industrial field of IT technology along with miniaturization trend of electronic devices. Dispersion states were examined by several evaluation methods with MLS-22, which is one of commercial LTCC powders, to achieve optimal dispersion as basis for stable LTCC fabrication process. Slurry viscosity, surface roughness of dip-coated slide glass, sedimentaion of slurry, and SEM observation of dried surface were utilized with respective amount change of various commercial dispersants. Among these commercial dispersants, optimal dispersion state was obtained with 0.4 wt% of BYK-111, from the results of various evaluation methods.

전기영동 초전도 선재의 크랙발생 억제 (Control of Cracking on Superconducting Wire by Electrophoresis)

  • 소대화;이영매;조용준;김태완;박정철;코로보바나탈리아
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2000년도 하계학술대회 논문집
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    • pp.270-273
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    • 2000
  • For the well-preparation of the superconducting wire by electrophoresis, the control of the cracking on the YBCO, BSCCO superconductor deposited on Ag wire in acetone and buthanol solution with PEG(poly-ethylenglycol) was investigated with XRD and SEM analysis. After deposition, drying and heat treatment process, the cracks on the deposited surface of YBCO and BSCCO samples was clearly removed and decreased, which was perpared in suspension with addition of PEG from 1 to 3ml. However, in the case of the addition rate of PEG in acetone suspension was exceeded in 3ml, BSCCO superconductor deposited on Ag wire was slightly melted at 90$0^{\circ}C$ which was the same heat treatment condition of other samples with different additin rate of PEG. In the process of electrophoretic deposition, drying and heat treatment, PEG added into the suspension solution as a binder was very useful to prepare the crack-free thick film-wire of YBCO and BSCCO.

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RF 마그네트론 스퍼터링법으로 제작된 ITO 박막의 공정압력 변화에 따른 특성 (Properties of ITO thin films deposited by RF magnetron sputtering with process pressure)

  • 정성진;김덕규;김홍배
    • 반도체디스플레이기술학회지
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    • 제9권4호
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    • pp.83-86
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    • 2010
  • The transparent electrode properties of ITO films deposited by RF magnetron sputtering with process pressure were investigated. The ITO thin films was deposited on a glass substrate using a target with 3in diameter sintered at a ratio of $In_2O_3$ : $SnO_2$ (9 : 1). 200-nm-thick ITO thin films were manufactured by various process pressures ($2.0{\times}10^{-2}$, $7.0{\times}10^{-3}$ and $2.0{\times}10^{-3}$ Torr). The optical transmittance and resistivity of the deposited ITO thin films showed a relatively satisfactory result under $10^{-2}$ Torr. For high process pressure, the optical transmittance was below 80%, while for low process pressure, the optical transmittance was above 85%. As a result of of mobility, resistivity and carrier concentration by Hall measurement, we obtained satisfactory properties to apply into a transparent conducting thin film.

상온 진공 분말 분사법에 의한 NiMn2O4계 NTC Thermistor 후막제작 및 특성평가 (Fabrication and Characterization of NiMn2O4 NTC Thermistor Thick Films by Aerosol Deposition)

  • 백창우;한귀팡;한병동;윤운하;최종진;박동수;류정호;정대용
    • 한국재료학회지
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    • 제21권5호
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    • pp.277-282
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    • 2011
  • Negative temperature coefficient (NTC) materials have been widely studied for industrial applications, such as sensors and temperature compensation devices. NTC thermistor thick films of $Ni_{1+x}Mn_{2-x}O_{4+{\delta}}$ (x = 0.05, 0, -0.05) were fabricated on a glass substrate using the aerosol deposition method at room temperature. Resistance verse temperature (R-T) characteristics of the as-deposited films showed that the B constant ranged from 3900 to 4200 K between $25^{\circ}C$ and $85^{\circ}C$ without heat treatment. When the film was annealed at $600^{\circ}C$ 1h, the resistivity of the film gradually decreased due to crystallization and grain growth. The resistivity and the activation energy of films annealed at $600^{\circ}C$ for 1 h were 5.203, 5.95, and 4.772 $K{\Omega}{\cdot}cm$ and 351, 326, and 299 meV for $Ni_{0.95}Mn_{2.05}O_{4+{\delta}}$, $NiMn_2O_4$, and $Ni_{1.05}Mn_{1.95}O_{4+{\delta}}$, respectively. The annealing process induced insulating $Mn_2O_3$ in the Ni deficient $Ni_{0.95}Mn_{2.05}O_{4+{\delta}}$ composition resulting in large resistivity and activation energy. Meanwhile, excess Ni in $Ni_{1.05}Mn_{1.95}O_{4+{\delta}}$ suppressed the abnormal grain growth and changed $Mn^{3+}$ to $Mn^{4+}$, giving lower resistivity and activation energy.

ICP-CVD 비정질 실리콘에 형성된 처리온도에 따른 저온 니켈실리사이드의 물성 변화 (Property of Nickel Silicides on ICP-CVD Amorphous Silicon with Silicidation Temperature)

  • 김종률;최용윤;박종성;송오성
    • 한국산학기술학회논문지
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    • 제9권2호
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    • pp.303-310
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    • 2008
  • ICP-CVD(inductively-coupled Plasma chemical vapor deposition)를 사용하여 $250^{\circ}C$기판온도에서 140 nm 두께의 수소화된 비정질 실리콘(${\alpha}$-Si:H)을 제조하였다. 그 위에 30 nm-Ni을 열증착기를 이용하여 성막하고, $200{\sim}500^{\circ}C$ 사이에서 $50^{\circ}C$간격으로 30분간 진공열처리하여 실리사이드화 처리하였다. 완성된 실리사이드의 처리온도에 따른 실리사이드의 면저항값 변화, 미세구조, 상 분석, 표면조도 변화를 각각 사점면저항측정기, HRXRD(high resolution X-ray diffraction), FE-SEM(field emission scanning electron microscope), TEM(transmission electron microscope), SPM(scanning probe microscope)을 활용하여 확인하였다. $300^{\circ}C$에는 고저항상인 $Ni_3Si$, $400^{\circ}C$에서는 중저항상인 $Ni_2Si$, $450^{\circ}C$이상에서 저저항의 나노급 두께의 균일한 NiSi를 확인되었다. SPM결과에서 저저항 상인 NiSi는 $450^{\circ}C$에서 RMS(root mean square) 표면조도 값도 12 nm이하로 전체 공정온도를 $450^{\circ}C$까지 낮추어 유리와 폴리머기판 등 저온기판에 대응하는 저온 니켈모노실리사이드 공정이 가능하였다.

초전형 적외선 센서용 P(VDF/TrFE) 막의 분극에 따른 유전특성의 변화 (Dielectric characteristics with poling of P(VDF/TrFE) films for pyroelectric infrared sensor)

  • 권성렬;김영우;배승춘;박성근;김기완
    • 센서학회지
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    • 제9권1호
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    • pp.9-14
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    • 2000
  • 스핀 코팅 방법으로 제조된 P(VDF/TrFE) 막의 유전적 특성을 조사하였다. 막의 결정성과 막질을 개선하기 위해 스핀 코팅 후에 3 단계에 걸친 열처리 공정을 하였다. 상부전극을 마스크로 사용하는 간단한 P(VDF/TrFE) 막의 식각공정과 조건을 확립하였다. 분극을 여러 단계에 걸쳐 하는 정확한 분극공정을 실현하였다. 스핀코팅으로 제조된 막의 두께는 용액농도 10 wt%, 스핀속도 3000 rpm, 스핀시간 30초에서 $1.87\;{\mu}m$였다. 제조된 P(VDF/TrFE) 막의 유전상수와 유전손실을 측정하였다. 1 kHz의 주파수에서 분극전 P(VDF/TrFE) 막의 유전상수는 13.5, 유전 손실은 0.042로 나타났으며 분극후 각각 11.5, 0.037로 나타났다.

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