• Title/Summary/Keyword: Ta-Ti

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Study on the Relationship Between Microstructure and Creep-Rupture Behavior of GTD 111 (Ni기 초내열합금 GTD 111의 크리프 파단에 미치는 미세조직의 영향)

  • Sin, Hyeon-Jong;Kim, In-Su;Lee, Jae-Hyeon;Heo, Seong-Gang;Jo, Chang-Yong
    • Korean Journal of Materials Research
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    • v.11 no.1
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    • pp.8-14
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    • 2001
  • Microstructural evolution and creep failure behavior of GTD 111 have been studied. Solidification and precipitation behaviors of the alloy during casting have been analyzed by microstructural observations. It has been found that MC carbides solidify just before the $\gamma$/$\gamma$' eutectic solidification. The ηphase was found to be formed by transformation of Ti-rich $\gamma$'phase. PFZ has formed in the vicinity of the transformed $\eta$ phase. A few MC particles, which have been identified as TaC, precipitated within the PFZ. Creep failure along grainboundary was dominant at and above $871^{\circ}C$. Creep failure above$ 871^{\circ}C$ was caused by the propagation of surface cracks and internal cracks. Creep crack has initiated at the microporosities embedded on the grainboundary. The $\eta$phase and PFZ have been found to be little or no effect on creep crack initiation.

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Elevation of Properties of Al-Nb-Ar alloys Fabricated by Mechanical Alloying Metho (기계적합금화법을 이용한 고온 고강도 Al-Nb-Zr 합금 제조 및 특성 평가)

  • Kwon, Dae-Hwan;Ahn, In-Shup;Kim, Sang-Shik;Lee, Kwang-Min;Park, Min-Woo
    • Korean Journal of Materials Research
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    • v.10 no.7
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    • pp.499-504
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    • 2000
  • Recently there have been many investigations on the synthesis and properties of transition metal trialuminides based on Ti, Zr, V, Nb and Ta for use aircraft structure materials in an elevated environment. The effect of Zr additions on the formation behaviour of Al-Nb alloy was investigated. Al-1.3at.%(Nb+Zr) alloys with different Nb to Zr atomic 1:3, 1:1 and 3:1 were prepared by mechanical alloying(MA). The morphological changes and microstructural evolution of Al-Nb-Zr powders during MA were investigated by SEM, XRD and TEM. The intermetallic compound phase of $Nb_2Al\; and\; Al_3Zr_4$ was identified by X-ray diffraction. The intemetallic compound of $Al_3Zr,\; Al_3Nb$ and $Al_3Zr_4$ were formed by heat treatment for 1 hour at $500^{\circ}C$. The size of intermetallic compounds observed by TEM were approximately below 100nm, when they were heat treated after mechanically alloying for 30 hours.

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High temperature oxidation behavior and surface modification of Ni-based superalloys (니켈기 초합금의 고온산화거동과 표면개질에 관한 연구)

  • Seol, Gyeong-Won
    • Korean Journal of Materials Research
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    • v.4 no.2
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    • pp.166-176
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    • 1994
  • Ni base superalloys are composed of solid sohltion hardening elements(Co, Cr. Mo. W and so on) and $\gamma '$ precipitation hardening elements(A1, Ti, Nb, Ta and so on). To Improve the mechanical properties and oxidation resistanre of superalloys, rare earth elements(%r, Hf, Y and so on) are added to the inner substrate, or are used as coating materials. Their pffects on the growth rate and adhes~on of oxide are changed according to the kinds of oxides such as $AI_2O_3$ and $Cr_2O_3$. The effect of yttrium on the oxidation rate, grain size of oxide, internal structure, and crack resistance was investigated for two kinds of Ni-base superalloys. One in AF'115 superalloy containing Hf and the other is MA6000 superalloy containing $Y_2O_3$. They werr owid~zed at high temperature after yttrium surface modification using ion coater. Yttrium coating on the AF115 and MA6000 superalloys results in a marked change in the growth of the inner oxide. For AF115 superalloy, the degree of gram boundary segregation of $Cr_2O_3$, and prefer en^ tial oxidation of Hf are decreased, and the shape of inner oxidation layer was changed from triangle to plate type. For MA6000 superalloy, $Cr_2O_3$ oxide scale was transformed as outer oxidation layer of CrZOI and inner oxidation layer of $Cr_2O_3$.

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The Effect of Pre-Treatment Methods for the Life Time of the Insoluble Electrodes (불용성 전극의 전처리 방법이 전극의 수명에 미치는 영향)

  • Park, Mi-Jung;Lee, Taek-Soon;Kang, Meea;Han, Chi-Bok
    • Journal of Korean Society of Environmental Engineers
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    • v.38 no.6
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    • pp.291-298
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    • 2016
  • Electrochemical water treatment process as a useful treatment method for the removal of non-degradable matter has been consistently studied for several decades. Key process of electrochemical water treatment are oxidation reaction from an anode and reduction from a cathode. In this study, the effect of pre-treatment methods in the insoluble electrode manufacturing process for the water treatment has been evaluated for the life time of electrode The results of this study showed that pre-treatment methods of a base metal such as surface roughness, clean method and interlayer formation influenced to life time of electrode when the same condition (catalyst electrode layer coating method and material system) was applied for pre-treatment methods. This study was conducted by using $IrO_2/Ti$ electrode In the test of sand-blasting process, an electrode manufactured by using sanding media of different sizes resulted in the most effective electrode life time when the size of alumina was used for $212{\sim}180{\mu}m$ praticle size (#80). The most effective method was considered using arc plasma in the additional roughness control and cleaning process, sputtering method to form Ta type interlayer formation process.

A Study on the Properties of Transition Metal Nitride Coating Materials for the Recovery of Tungsten and Rare Metals (텅스텐 및 희유금속 회수를 위한 초경합금 전이금속질화물 코팅소재 특성연구)

  • Kim, Jiwoo;Kim, Myungjae;Kim, Hyokyeong;Park, Sohyun;Seo, Minkyeong;Kim, Jiwoong
    • Resources Recycling
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    • v.31 no.1
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    • pp.46-55
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    • 2022
  • The recycling of coated cemented carbide scraps is becoming increasingly significant for the recovery of rare metals. However, coatings consisting of Group IV and V transition metal nitrides are one of the challenging factors in obtaining high-purity materials. We investigated the structural, elastic, and mechanical properties of Group IV and V transition-metal nitrides (TiN, VN, ZrN, NbN, HfN, and TaN) using first-principle calculations. Convergence tests were performed to obtain reliable calculated results. The equilibrium structures of the nitrides were in good agreement with those of a previous study, indicating the reliability of the data. Group IV transition metal nitrides show a higher covalent bonding nature. Thus, they exhibit a higher degree of brittleness than that of Group V transition metal nitrides. In contrast, Group V transition metal nitrides show weaker resistance to shear loading and more ductile behavior than Group IV transition metal nitrides because of the metallic bonds characterized by valence electron concentration. The results of the crystal orbital Hamilton population analysis showed good agreement with the shear resistance tendencies of all transition metal nitrides.

Occurrence and Chemical Composition of Ti-bearing Minerals from Samgwang Au-ag Deposit, Republic of Korea (삼광 금-은 광상에서 산출되는 함 티타늄 광물들의 산상 및 화학조성)

  • Yoo, Bong Chul
    • Korean Journal of Mineralogy and Petrology
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    • v.33 no.3
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    • pp.195-214
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    • 2020
  • The Samgwang Au-Ag deposit has been one of the largest deposits in Korea. The deposit consists of eight lens-shaped quartz veins which filled fractures along fault zones in Precambrian metasedimentary rock, which feature suggest that it is an orogenic-type deposit. The Ti-bearing minerals occur in wallrock (titanite, ilmenite and rutile) and laminated quartz vein (rutile). They occur minerals including biotite, muscovite, chlorite, white mica, monazite, zircon, apatite in wallrock and white mica, chlorite, arsenopyrite in laminated quartz vein. Chemical composition of titanite has maximum vaules of 3.94 wt.% (Al2O3), 0.49 wt.% (FeO), 0.52 wt.% (Nb2O5), 0.46 wt.% (Y2O3) and 0.43 wt.% (V2O5). Titanite with 0.06~0.14 (Fe/Al ratio) and 0.06~0.15 (XAl (=Al/Al+Fe3++Ti)) corresponds with metamorphic origin and low-Al variety. Chemical composition of ilmenite has maximum values of 0.07 wt.% (ZrO2), 0.12 wt.% (HfO2), 0.26 wt.% (Nb2O5), 0.04 wt.% (Sb2O5), 0.13 wt.% (Ta2O5), 2.62 wt.% (As2O5), 0.29 wt.% (V2O5), 0.12 wt.% (Al2O3) and 1.59 wt.% (ZnO). Chemical composition of rutile in wallrock and laminated quartz vein has maximum values of 0.35 wt.%, 0.65 wt.% (HfO2), 2.52 wt.%, 0.19 wt.% (WO3), 1.28 wt.%, 1.71 wt.% (Nb2O3), 0.03 wt.%, 0.07 wt.% (Sb2O3), 0.28 wt.%, 0.21 wt.% (As2O5), 0.68 wt.%, 0.70 wt.% (V2O3), 0.48 wt.%, 0.59 wt.% (Cr2O3), 0.70 wt.%, 1.90 wt.% (Al2O3) and 4.76 wt.%, 3.17 wt.% (FeO), respectively. Rutile in laminated quartz vein is higher contents (HfO2, Nb2O3, As2O5, Cr2O3, Al2O3 and FeO) and lower content (WO3) than rutile in wallrock. The substitutions of rutile in wallrock and laminated quatz vein are as followed : rutile in wallrock [(Fe3+, Al3+, Cr3+) + Hf4+ + (W5+, As5+, Nb5+) ⟵⟶ 2Ti4+ + V4+, 2Fe2+ + (Al3+, Cr3+) + Hf4+ + (W5+, As5+, Nb5+) ⟵⟶ 2Ti4+ + 2V4+], rutile in laminated quartz vein [(Fe3+, Al3+) + As5+ ⟵⟶ Ti4+ + V4+, (Fe3+, Al3+) + As5+ ⟵⟶ Ti4+ + Hf4+, 4(Fe3+, Al3+) ⟵⟶ Ti4+ + (W5+, Nb5+) + Cr3+], respectively. Based on these data, titanite, ilmenite and rutile in wallrock were formed by resolution and reconcentration of cations (W5+, Nb5+, As5+, Hf4+, V4+, Cr3+, Al3+, Fe3+, Fe2+) in minerals of wallrock during regional metamorphism. And then rutile in laminated quartz vein was formed by reconcentration of cations (Nb5+, As5+, Hf4+, Cr3+, Al3+, Fe3+, Fe2+) in alteration minerals (white mica, chlorite) and Ti-bearing minerals reaction between hydrothermal fluid originated during ductile shear and Ti-bearing minerals (titanite, ilmenite and rutile) in wallrock.

Effects of the Introduction of UV Irradiation and Rapid Thermal Annealing Process to Sol-Gel Method Derived Ferroelectric Sr0.9Bi2.1Ta1.8Nb0.2O9 Thin Films on Crystallization and Dielectric/Electrical Properties (UV 노광과 RTA 공정의 도입이 Sol-Gel 법으로 제조한 강유전성 Sr0.9Bi2.1Ta1.8Nb0.2O9 박막의 결정성 및 유전/전기적 특성에 미치는 영향)

  • 김영준;강동균;김병호
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.17 no.1
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    • pp.7-15
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    • 2004
  • The ferroelectric SBT thin films as a material of capacitors for non-volatile FRAMs have some problems that its remanent polarization value is relatively low and the crystallization temperature is quite high abovc 80$0^{\circ}C$. Therefore, in this paper, SBTN solution with S $r_{0.9}$B $i_{2.1}$T $a_{1.8}$N $b_{0.2}$$O_{9}$ composition was synthesized by sol-gel method. Sr(O $C_2$ $H_{5}$)$_2$, Bi(TMHD)$_3$, Ta(O $C_2$ $H_{5}$)$_{5}$and Nb(O $C_2$ $H_{5}$)$_{5}$ were used as precursors, which were dissolved in 2-methoxyethanol. SBTN thin films with 200 nm thickness were deposited on Pt/Ti $O_2$/ $SiO_2$/Si substrates by spin-coating. UV-irradiation in a power of 200 W for 10 min and rapid thermal annealing in a 5-Torr-oxygen ambient at 76$0^{\circ}C$ for 60 sec were used to promote crystallization. The films were well crystallized and fine-grained after annealing at $650^{\circ}C$ in oxygen ambient. The electrical characteristics of 2Pr=11.94 $\mu$C/$\textrm{cm}^2$, Ps+/Pr+=0.54 at the applied voltage of 5 V were obtained for a 200-nm-thick SBTN films. This results show that 2Pr values of the UV irradiated and rapid thermal annealed SBTN thin films at the applied voltage of 5 V were about 57% higher than those of no additional processed SBTN thin films. thin films.lms.s.s.

Thermal Stability of $\textrm{Fe}_{80-x}\textrm{P}_{10}\textrm{C}_{6}\textrm{B}_{4}\textrm{M}_{x}$(M=Transition Metal) Amorphous Alloys ($\textrm{Fe}_{80-x}\textrm{P}_{10}\textrm{C}_{6}\textrm{B}_{4}\textrm{M}_{x}$(M=Transition Metal) 비정질합금의 열적안정성)

  • Guk, Jin-Seon;Jeon, U-Yong;Jin, Yeong-Cheol;Kim, Sang-Hyeop
    • Korean Journal of Materials Research
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    • v.7 no.3
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    • pp.218-223
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    • 1997
  • At the aim of finding a Fehased amorphous alloy with a wide supercooled liquid region (${\Delta}T_{x}=T_{x}-T_{g}$) before crystallization, the changes in glass transition temperatudfI$T_{g}$ and crystallization temperature ($T_{x}$) by the dissolution of additional M elements were examined for the $Fe_{80}P_{10}C_{6}B_{4}$(x~6at%. M= transition metals) amorphous alloys. The ${\Delta}T_{x}$ value is 27K for the Fe,,,P,,,C,,R, alloy and increases to 40K for the addition of M=4at%Hf, 4at%Ta or 4at%Mo. The increase in ${\Delta}T_{x}$ is due to the increase of $T_{x}$ exceeding the degree in the increase in $T_{g}$. The $T_{g}$ and $T_{x}$ increase with decreasing electron concentration (e/a) from about 7 38 to 7.05. The decrease of e/a also implies the increase in the attractive bonding state between the M elements and other constitutent elements. It is therefore said that $T_{g}$ and $T_{x}$ increase kith increasing attractive bonding force.

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Electrochemical treatment of wastewater using boron doped diamond electrode by metal inter layer

  • KIM, Seohan;YOU, Miyoung;SONG, Pungkeun
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.251-251
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    • 2016
  • For several decades, industrial processes consume a huge amount of raw water for various objects that consequently results in the generation of large amounts of wastewater. Wastewaters are consisting of complex mixture of different inorganic and organic compounds and some of them can be toxic, hazardous and hard to degrade. These effluents are mainly treated by conventional technologies such are aerobic and anaerobic treatment and chemical coagulation. But, these processes are not suitable for eliminating all hazardous chemical compounds form wastewater and generate a large amount of toxic sludge. Therefore, other processes have been studied and applied together with these techniques to enhance purification results. These include photocatalysis, absorption, advanced oxidation processes, and ozonation, but also have their own drawbacks. In recent years, electrochemical techniques have received attention as wastewater treatment process that could be show higher purification results. Among them, boron doped diamond (BDD) attract attention as electrochemical electrode due to good chemical and electrochemical stability, long lifetime and wide potential window that necessary properties for anode electrode. So, there are many researches about high quality BDD on Nb, Ta, W and Si substrates, but, their application in effluents treatment is not suitable due to high cost of metal and low conductivity of Si. To solve these problems, Ti has been candidate as substrate in consideration of cost and property. But there are adhesion issues that must be overcome to apply Ti as BDD substrate. Al, Cu, Ti and Nb thin films were deposited on Ti substrate to improve adhesion between substrate and BDD thin film. In this paper, BDD films were deposited by hot filament chemical vapor deposition (HF-CVD) method. Prior to deposition, cleaning processes were conducted in acetone, ethanol, and isopropyl alcohol (IPA) using sonification machine for 7 min, respectively. And metal layer with the thickness of 200 nm were deposited by DC magnetron sputtering (DCMS). To analyze microstructure X-ray diffraction (XRD, Bruker gads) and field emission scanning electron microscopy (FE-SEM, Hitachi) were used. It is confirmed that metal layer was effective to adhesion property and improved electrode property. Electrochemical measurements were carried out in a three electrode electrochemical cell containing a 0.5 % H2SO4 in deionized water. As a result, it is confirmed that metal inter layer heavily effect on BDD property by improving adhesion property due to suppressing formation of titanium carbide.

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UHV Materials (초고진공계재료)

  • 박동수
    • Proceedings of the Korean Vacuum Society Conference
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    • 1998.02a
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    • pp.24-24
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    • 1998
  • 반도체장비를 포함하는 초고진공장비의 園훌化가 급속히 그리고 절실히 요구되고 있는 것이 현실정이다. 當面해서 실현할 국산진공장비의 대상은 廣範圍하다. 즉, 각종 진공 pump ( (rotary, dry, diffusion, cryo, ion, turbo melecular pump), 진공 chamber, 진공 line, gate valve 를 위 시 한 진공 V머ve, flange, gasket, fl않d야lU, mainpulater 퉁 진공 部品이 다. 진공계 의 핵심 은 適切하고 優良한 진공재료의 선태파 사용이다. 진공장비는 사용자가 원하는 진공도를 원하 는 시간 동안 륨空度를 유지해 주어야 한다. 진공재료 선태의 기준사항은:(1) 기체의 透過성 (2) 薰했훌 (3) 혔體放出특성 - -outgassing과 degassing- (4) 機械的 량훌度 (5) 온도 의존성 (6) 化學톡성 (7) 加I성 및 鎔接 성 (8) 課電특성 (9) 磁氣특성 (10) 高速함子 및 放射線 특성 (11) 經濟성 및 調達생 둥이 다. 우량한 초고진공계재료는 풍부하게 개발되어 왔고, 또 新材料들이 개발되고 있다. 여기에서는 주로 초고진공 내지는 극고진공계의 構造材料, 機能材料, 部品材料 일반파 몇가지 신재료의 특 성에 관해서 記述한다. M Mild SteeHSAE, 1112, 1010, 1020, 1022, etc)., S Stainless SteeHAlSI, 304, 304L, 310, 316, 321, 347): 구조재료, chamber, fl하1ges A Aluminum과 Alloys (1060, 1100, 2014, 4032, 6(뻐1): 구조재료, chamber, flanges, gaskets A AI, Al 떠loy는 SS에 代替하는 역 할올 시 작하고 있다. C Copper, Copper Alloys(C11$\alpha$)0, C26800, C61400, Cl7200): 내장인자, gasket, cryopanel, tubing T Titanium, Ziriconium, Haf띠um 및 Alloys: 특히 Ti은 10n pump 용 getter material 이 외 에 U UHV,XHV용 chamber계로서 관심올 끌고 있다. N Nickel, Nickel Alloys (200, 204, 211, monel, nichrome): 부식 방지 , 전자장치 , 자기 장치 귀 금속(Ag, Au, Pt, Pd, Rh, Ir, Os, Ru): 보조부품, gasket, filament, coating, thermocouple, 접 합부위 T TiC, SiC, zrC, HfC, TaC 둥의 탄화물과, BN, TiN, AlN 동의 질화물, 붕화물이 둥장하고 었 다. 유리: Soda Lime, Borosilicate, Potash Soda Lead: View Port, Chamber envelope C Ceramics: AlZ03, BeO, MgO, zrOz, SiOz, MgOzSiOz, 3Alz032SiOz, Z$textsc{k}$hSiOz S상N4: e electrical, thermal insulators, crucibles, boats, single crystals, sepctr려 windows 저자는 최근 저자들이 발견한 Zr-Ti-Cu-Ni-Be amorphous alloys coated cham뾰r가 radiation p proof로 이용될 수 있는 사실을 점검하고 었다 .. Z.Y. Hua 들은 Cs3Sb를 새로운 photocathode 재료로 보고하고 있다.

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