Characteristics of Contact resistivity on RTP annealing temperature and time after Plasma ion implant (플라즈마 이온주입 후 RTP 열처리 온도와 시간에 따른 접촉저항 특성)
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- Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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- 2009.06a
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- pp.5-6
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- 2009