• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
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• pp.533-536
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• 2006

VIATRON TECHNOLOGIES has developed Field-Enhanced Rapid Thermal Processor (FERTP) system that enables LTPS LCD and AMOLED manufacturers to produce poly-Si films at low cost, high throughput, and high yield. The FE-RTP allows the diverse process options including crystallization, thermal oxidation of gate oxides and fast pre-compactions. The process and equipment compatibility with a-Si TFT lines is able to provide a viable solution to produce poly-Si TFTs using a-Si TFT lines.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
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• pp.540-543
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• 2006

LTPS TFT backplanes for AM OLED displays have advantages in regard to reliability and performance compared to TFT backplanes based on amorphous silicon. However, the requirements for homogeneous laser crystallization during LTPS process are much higher than for LCD backplanes. Most important is the energy stability of the laser source. In this paper we describe a new excimer laser which meets the requirements of LTPS manufacturing process with high homogeneity.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
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• pp.218-221
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• 2006

In this paper, a high-voltage generator with several mA draw output currents using LTPS-TFT technology is proposed. The new generator can be efficiently boosted about +18V output voltages with 5mA draw output currents and power efficiency ${\eta}$ is around 84% under the conditions of +5V power-supply voltage and 250kHz frequency.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
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• pp.505-508
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• 2006

Self-heating induced device degradation and its width/length (W/L) dimension dependence were studied in p-type polycrystalline silicon (poly-Si) thin film transistors (TFTs). Negative channel conductance was observed under high power region of output curve, which was mainly caused by hole trapping into gate oxide and also by trap state generation by self-heating effect. Self-heating effect became aggravated as W/L ratio was increased, which was understood by the differences in heat dissipation capability. By reducing applied power density normalized to TFT area, self-heating induced degradation could be reduced.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2002년도 International Meeting on Information Display
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• pp.552-555
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• 2002

In order to achieve higher performance and low cost a-Si TFT-LCD panel, new material architecture and its process integration for a-Si TFT array manufacturing method were developed. Material combination of low resistant dry-etchable metal and new pixel electrode under currently adopted 4 mask process made it possible to get more-simplified manufacturing method and better device performance for the a-Si TFT-LCD application. Proposed 4 mask process architecture with optimized wet etchants and dry etching process was applicable to various devices such as notebook, monitor and TV.

• Journal of Information Display
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• 제12권3호
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• pp.121-124
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• 2011

The mechanism for lattice-shaped mura defects was proposed by characterizing the electro-optic properties of liquid crystal (LC), which showed different transmission properties between the normal and mura defect areas. An increase in the mura defect rate was observed when the dotted LC in the one drop filling (ODF) was exposed for a longer time. The dotted LC droplet at the edge evaporated more rapidly than that in the center. This resulted in a higher concentration of polar singles at the edge of the dotted LC droplet, leading to a higher ${\Delta}n$ value and higher transmittance. This implies that the reductio of the exposure time of the dotted LC to air plays a critical role in decreasing the occurrence of lattice-shaped mura defects in ODF.

• Journal of Information Display
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• 제1권1호
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• pp.52-58
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• 2000

We observed that static electricity has an influence on the etching unformity of dry etching process. When the static electricity was applied from-200[V]to-1000[V] on glass substrates, the etching rate uniformity was changed to 1.5%-15%. In this experiment, the soft X-ray to neutralize static electricity was adopted as ore of neutralization methods. As an experimental result, soft X-ray irradiation improved neutralization capability on the surface of LCD glass substrate within the short time, about 15-30sec. The difference of etching rate uniformity was below 0.5%.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2003년도 International Meeting on Information Display
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• pp.288-291
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• 2003

The technology and performance of the world-largest 54-inch LCD TV using PVA mode have been introduced from two points of view: one is to manufacture large-size panels, the other is to improve electro-optical performance required for multimedia applications. Current ongoing research activities that have been explored include new stitching design, one drop filling with column spacer, response time less than one frame rate, color performance and light efficiency enhancement.

• Transactions on Electrical and Electronic Materials
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• 제8권5호
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• pp.215-217
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• 2007

Recently, color reproduction properties have attracted lots of attention with mass production of LCD especially corresponding to TV application and achievement of color reproduction properties such as CRT have been considered one of technical goals for high quality display. However, revision of the color reproduction properties only with CF(color filter) have fundamental limitations and resultant decrease in the transmittance of panel causes demand on high brightness of BL(Back Light). In this paper, we present such a method in which by optimization of original light spectrum from the BL source will improves the color reproduction properties corresponding to them of the CRT. When the intensity of RED and Green-Blue from ramp is revised densely, the characteristics different from CCFL(Cold Cathode Fluorescent Lamp) used before become added so that about 11 % of the color reproduction properties is improved compare to the existing LCD panel.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2008년도 International Meeting on Information Display
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• pp.553-556
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• 2008

We hereby report novel driving scheme to eliminate effect of "residual" image sticking (RRI) problem which arises due to hysteresis problem in Thin Film Transistor (TFT) in AMOLED Displays. The driving scheme applies "black" voltage after every data voltage period in order to drive AMOLED in uni-direction. The system can be easily implemented with 120 Hz driving scheme which is well matured in AMLCD industries. Our analyses show systematic evaluation of the problem and thereby solving it by simple methods which will be significantly effective of driving OLED towards mass manufacturing stage.