• 대한전기학회:학술대회논문집
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• 대한전기학회 1996년도 하계학술대회 논문집 C
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• pp.1547-1549
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• 1996

The electrical and optical switching characteristics of gold-doped silicon p-i-n diodes have been investigated. The device shows a dark switching voltage of about 500 V. The switching voltage decreases rapidly when the illumination level is increased. The differential sensitivity of optical gating over linear region is $d(V_{Th}/V_{Tho})/dP_{Ph}$=0.25/uW. The turn-on delay time and the turn-on rise time decrease with increasing optical pulse power. The turn-off delay and the fall time are negligible.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2007년도 추계학술대회 논문집
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• pp.484-485
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• 2007

This paper describes the series-gap characteristics of transmission line arrester with switching and lightning impulse flashover test. The transmission line arrester exhibited external gap because it is must not flashover with switching impulse on the other hand it is must flashover with lightning impulse. In accordance, minimum and maximum length of series-gap was determinated with these tests. As gap length is increased flashover voltage was increased in the range of 315.4 kV~496.3 kV and negative polarity exhibited a high voltage. As a result, It was thought tat the series-gap length of transmission line arrester exhibited in the range of 580 mm~1100 mm.

• 전자공학회논문지D
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• 제36D권11호
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• pp.63-70
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• 1999

PLT(10) 박막을 $Pt/TiO_2/SiO_2/Si$ 기판 위에 sol-gel법으로 제작하여, 상부전극의 면적과 외부인가 펄스전압 및 부하저항을 변화시켜 가며 비휘발성 메모리 소자에 응용하기 위해 필수적인 switching 특성을 조사하였다. 외부인가 펄스전압이 2V에서 5V 까지 증가함에 따라, switching time은 $0.49{\mu}s$에서 $0.12{\mu}s$로 감소하였으며, 인가된 펄스전압에 대한 switching time의 관계로부터 구한 활성화 에너지 ($E_a$)는 209 kV/cm이었다. 상부전극 면적이 $3.14{\times}10^{-4}cm^2$인 박막에서 이력곡선과 polarization switching 실험으로부터 구한 switched charge density는 5V에서 각각 $11.69{\mu}C/cm^2$과 $13.02{\mu}C/cm^2$으로 양쪽 값 사이의 오차는 약 10%로 비교적 잘 일치하는 경향을 나타내었다. 상부전극의 면적이 $3.14{\times}10^{-4}cm^2$에서 $5.03{\times}10^{-3}cm^2$으로 증가함에 따라, switching time이 $0.12{\mu}s$에서 $1.88{\mu}s$로 증가하였으며, 부하저항을 50${\Omega}$에서 3.3$k{\Omega}$으로 증가시킴에 따라 switching time은 $0.12{\mu}s$에서 $9.7{\mu}s$로 증가로 증가하였다. 이와 같은 switching 특성에 관한 연구를 통해 PLT(10) 박막이 비휘발성 메모리 소자에 응용될 수 있는 매우 유망한 재료임을 알 수 있다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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• pp.174-174
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• 2014

Memristor devices are one of the most promising candidate approaches to next-generation memory technologies. Memristive switching phenomena usually rely on repeated electrical resistive switching between non-volatile resistance states in an active material under the application of an electrical stimulus, such as a voltage or current. Recent reports have explored the use of variety of external operating parameters, such as the modulation of an applied magnetic field, temperature, or illumination conditions to activate changes in the memristive switching behaviors. Among these possible choices of signal controlling factors of memristor, photon is particularly attractive because photonic signals are not only easier to reach directly over long distances than electrical signal, but they also efficiently manage the interactions between logic devices without any signal interference. Furthermore, due to the inherent wave characteristics of photons, the facile manipulation of the light ray enables incident light angle controlled memristive switching. So that, in the tautological sense, device orienting position with regard to a photon source determines the occurrence of memristive switching as well. To demonstrate this position controlled memory device functionality, we have fabricated a metal-semiconductor-metal memristive switching nanodevice using ZnO nanorods. Superhydrophobicity employed in this memristor gives rise to illumination direction selectivity as an extra controlling parameter which is important feature in emerging. When light irradiates from a point source in water to the surface treated device, refraction of light ray takes place at the water/air interface because of the optical density differences in two media (water/air). When incident light travels through a higher refractive index medium (water; n=1.33) to lower one (air; n=1), a total reflection occurs for incidence angles over the critical value. Thus, when we watch the submerged NW arrays at the view angles over the critical angle, a mirror-like surface is observed due to the presence of air pocket layer. From this processes, the reversible switching characteristics were verified by modulating the light incident angle between the resistor and memristor.

• 한국재료학회지
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• 제20권5호
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• pp.257-261
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• 2010

A non-volatile resistive random access memory (RRAM) device with a Cr-doped $SrZrO_3/SrRuO_3$ bottom electrode heterostructure was fabricated on $SrTiO_3$ substrates using pulsed laser deposition. During the deposition process, the substrate temperature was $650^{\circ}C$ and the variable ambient oxygen pressure had a range of 50-250 mTorr. The sensitive dependences of the film structure on the processing oxygen pressure are important in controlling the bistable resistive switching of the Cr-doped $SrZrO_3$ film. Therefore, oxygen pressure plays a crucial role in determining electrical properties and film growth characteristics such as various microstructural defects and crystallization. Inside, the microstructure and crystallinity of the Cr-doped $SrZrO_3$ film by oxygen pressure were strong effects on the set, reset switching voltage of the Cr-doped $SrZrO_3$. The bistable switching is related to the defects and controls their number and structure. Therefore, the relation of defects generated and resistive switching behavior by oxygen pressure change will be discussed. We found that deposition conditions and ambient oxygen pressure highly affect the switching behavior. It is suggested that the interface between the top electrode and Cr-doped $SrZrO_3$ perovskite plays an important role in the resistive switching behavior. From I-V characteristics, a typical ON state resistance of $100-200\;{\Omega}$ and a typical OFF state resistance of $1-2\;k{\Omega}$, were observed. These transition metal-doped perovskite thin films can be used for memory device applications due to their high ON/OFF ratio, simple device structure, and non-volatility.

• 한국정보통신학회논문지
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• 제15권9호
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• pp.1965-1970
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• 2011

본 논문에서는 그래프에 기초하여 유한체상의 스위칭함수를 도출하는 알고리즘과 이를 바탕으로 스위칭함수를 회로로 구현하는 방법을 제안하였다. 방향성그래프의 경로 수로부터 행렬방정식을 유도한 후에 이에 따른 스위칭 함수회로설계 알고리즘을 제안하였으며, 설계된 회로와 함께 방향성 그래프의 특성을 만족할 수 있게 노드들에 대한 코드를 할당하는 알고리즘을 제안하였다. 본 논문에서 제안한 알고리즘을 통해 설계한 스위칭함수회로는 기존의 방법에 비해 좀 더 최적화된 스위칭함수회로를 구현할 수 있었으며, 제안한 스위칭함수회로설계 알고리즘을 통해 임의의 자연수의 경로 수를 갖는 방향성 그래프에 대한 설계가 가능하였다. 또한, 입출력단자 수의 감소, 회로구성의 간략화, 연산속도의 향상과 비용감소 등의 이점이 있었다.

• 전력전자학회:학술대회논문집
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• 전력전자학회 1999년도 전력전자학술대회 논문집
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• pp.443-447
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• 1999

The AC drive systems of a voltage source inverter and an induction motor. The inverter non linearity caused by the turn on/off time dependency of the current level in the switching IGBT is described in the first part of this paper. To improve the low-speed drive characteristics, accurate applied voltage calculation is proposed under considerations of the compensations for the quantization error in the digital controller, the forward voltage drop of switching drives and the dead time of the inverter. The experimental studies show the improved drive characteristics.

• 대한전기학회논문지
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• 제40권7호
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• pp.664-669
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• 1991

In order to improve the reliability and the stability of static power conversion system, further to optimize the operational characteristics of the system, it is very important to investigate the effects (output and switching component characteristics) of each parameters in the system. Therefore this paper particualrly deals with the characteristics of a novel ZVS multi-resonant conversion system to duty cycle, resonant capacitance, resonant inductance, and output capacitance. The results show that resonant inductance and output capacitance are dominat factors in the system.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2009년도 하계학술대회 논문집
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• pp.131-131
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• 2009

Silicon Carbide (SiC) is a material with a wide bandgap (3.26eV), a high critical electric field (~2.3MV/cm), a and a high bulk electron mobility ($\sim900cm^2/Vs$). These electronic properties allow high breakdown voltage, high-speed switching capability, and high temperature operation compared to Si devices. Although various SiC DMOSFET structures have been reported so far for optimizing performances, the effect of channel dimension on the switching performance of SiC DMOSFETs has not been extensively examined. This paper studies different channel dimensons ($L_{CH}$ : $0.5{\mu}m$, $1\;{\mu}m$, $1.5\;{\mu}m$) and their effect on the the device transient characteristics. The key design parameters for SiC DMOSFETs have been optimized and a physics-based two-dimensional (2-D) mixed device and circuit simulator by Silvaco Inc. has been used to understand the relationship. with the switching characteristics. To investigate transient characteristic of the device, mixed-mode simulation has been performed, where the solution of the basic transport equations for the 2-D device structures is directly embedded into the solution procedure for the circuit equations. We observe an increase in the turn-on and turn-off time with increasing the channel length. The switching time in 4H-SiC DMOSFETs have been found to be seriously affected by the various intrinsic parasitic components, such as gate-source capacitance and channel resistance. The intrinsic parasitic components relate to the delay time required for the carrier transit from source to drain. Therefore, improvement of switching speed in 4H-SiC DMOSFETs is essential to reduce the gate-source capacitance and channel resistance.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2013년도 제45회 하계 정기학술대회 초록집
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• pp.237.2-237.2
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• 2013

ReRAM cell, also known as conductive bridging RAM (CBRAM), is a resistive switching memory based on non-volatile formation and dissolution of conductive filament in a solid electrolyte [1,2]. Especially, Chalcogenide-based ReRAM have become a promising candidate due to the simple structure, high density and low power operation than other types of ReRAM but the uniformity of switching parameter is undesirable. It is because diffusion of ions from anode to cathode in solid electrolyte layer is random [3]. That is to say, the formation of conductive filament is not go through the same paths in each switching cycle which is one of the major obstacles for performance improvement of ReRAM devices. Therefore, to control of nonuniform conductive filament formation is a key point to achieve a high performance ReRAM. In this paper, we demonstrated the enhanced repeatable bipolar resistive switching memory characteristics by spreading the Ag nanocrystals (Ag NCs) on amorphous GeSe layer compared to the conventional Ag/GeSe/Pt structure without Ag NCs. The Ag NCs and Ag top electrode act as a metal supply source of our devices. Excellent resistive switching memory characteristics were obtained and improvement of voltage distribution was achieved from the Al/Ag NCs/GeSe/Pt structure. At the same time, a stable DC endurance (>100 cycles) and an excellent data retention (>104 sec) properties was found from the Al/Ag NCs/GeSe/ Pt structured ReRAMs.