• 제목/요약/키워드: Surface protective layer

검색결과 199건 처리시간 0.025초

AC-PDP에서 지속방전으로 재형성 된 MgO 나노 입자의 음극선 분광 분석

  • 이경애;최준호;김용희;손창길;최은하
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2010년도 제39회 하계학술대회 초록집
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    • pp.109-109
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    • 2010
  • 최근 AC-PDP에서 MgO Protective Layer 위에 별도의 기능막(Functional Layer)을 사용하고 있는데, 이 기능막인 MgO 나노 입자는 장시간 구동시 AC_PDP panel내에서 plasma 방전에 의하여 MgO Protective Layer와 기능막이 방전 공간에 형성 된 이온에 의해 Sputtering 또는 재 증착 될 수 있다. 본 실험에서는 조성이 다른 기능막이 적용된 AC-PDP Test panel을 제작하여 장시간 구동 후 기능막인 두 가지 다른 MgO 나노 입자의 재형성된 형태를 주사 전자 현미경(Scanning Electron Microscope)을 통해 Surface Profile 및 구조의 변화를 분석하고, 또한 음극선 분광 분석(Cathodoluminascence)을 통하여 방전 영역과 비방전 영역의 delay time, 방전전압 및 효율 등의 전기 광학적 특성과의 관계를 분석하고자 한다.

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금속표면에 비정질의 피복 (Dip Coating of Amorphous Materials on Metal Surface)

  • 박병옥;윤병하
    • 한국표면공학회지
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    • 제20권2호
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    • pp.49-59
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    • 1987
  • The properties of $Cr_2O_3-Al_2O_3-SiO_2$ composite oxide coatings on steel surface were investigated. The results obtained were as follows: The microhardness of oxide coating layer increased with increasing heat-treatment temperature and $Cr_2O_3$ content in coating layer. The hardness showed the highest value (850Hv) treated at 700$^{\circ}C$ for $SiO_2:Al_2O_3:Cr_2O_3$=1:1:4. Increasing heat-treatment temperature, corrosion current density became lower and coating layer became denser. The corrosion current density showed the lowest value $(6.5{\times}10^{-5}\;Acm^2)$ treated at 750$^{\circ}C\;for\;SiO_2:Al_2O_3:Cr_2O_3$=1:1:3. These results were explained by protective layer which was formed during heat-treatment. The bonding between matrix and coating layer is expected to be made mechanically and chemically by the inter diffusion of Ni and Fe. The composite oxide coating was formed by softening of the binder with increasing heat-treatment temperature. The strengthening of coating layer is to be resulted from the dispersion of major oxide particles.

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계면활성제 기반 산화그래핀층이 도입된 전기변색 poly (3-hexyl thiophene) 박막의 장기 수명 특성 (Long term life-time of electrochromic poly (3-hexyl thiophene) films modified by surfactant-assisted graphene oxide layers.)

  • 김태호;최기인;김혜리;오성현;구자승;나윤채
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2016년도 추계학술대회 논문집
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    • pp.147-147
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    • 2016
  • In general, organic electrochromic (EC) materials have been known to be electrochemically unstable during the ionic exchange process. One effective method to realize stable EC materials is incorporating graphene derivatives in the polymer matrix, by using the strong interaction between graphene derivatives and polymer. However, previous studies are limited graphene derivatives. In this study, we developed a polymer-graphene derivative complex with the chemical assistance of a surfactant (octadecylamine, ODA). Surfactant-assisted graphene oxide (GO-ODA) was introduced as a protective layer on the electrochromic poly (3-hexyl thiophene) (P3HT) films by the Langmuir-Schaefer method. The deposition of GO-ODA protective layer with high coverage was confirmed by atomic force microscopy. The strong interactions between GO-ODA and P3HT were examined with UV-Vis spectrophotometry and X-ray photoelectron spectroscopy. Electrochemical and electrochromic investigations revealed that the GO-ODA layer greatly improved the long-term cyclability of the P3HT film. These findings imply that the GO-ODA complex has a significant role in creating stable EC cycling, due to its strong interaction with the P3HT film.

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인체전류를 기반으로 하는 감전의 위험성 평가방법 (A Method for Evaluating Electric Shock Hazards Based on Human Body Current)

  • 이복희;유양우;최종혁
    • 조명전기설비학회논문지
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    • 제25권6호
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    • pp.108-114
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    • 2011
  • In order to mitigate the possible hazards from electric shock due to the touch and step voltages, the high resistivity material such as gravel is often spread on the earth's surface in substations. When the grounding electrode is installed in two-layer soil structures, the surface layer soil resistivity is different with the resistivity of the soil contacted with the grounding electrodes. The design of large-sized grounding systems is fundamentally based on assuring safety from dangerous voltages within a grounding grid area. The performance of the grounding system is evaluated by tolerable touch and step voltages. Since the floor surface conditions near equipment to be grounded are changed after a grounding system has been constructed, it may be difficult to determine the tolerable touch and step voltage criteria. In this paper, to propose an accurate and convenient method for evaluating the protective performance of grounding systems, the propriety of the method for evaluating the current flowing through the human body around on a counterpoise buried in two-layer soils is presented. As a result, it is reasonable that the grounding system performance would be evaluated by measuring and analyzing the current flowing through the human body based on dangerous voltages such as the touch or step voltages and the contact resistance between the ground surface and feet.

Al-hot Dipping Followed by High-Temperature Corrosion of Carbon Steels in Air and Ar-0.2%SO2 Gas

  • Abro, Muhammad Ali;Jung, Seung Boo;Lee, Dong Bok
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2015년도 춘계학술대회 논문집
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    • pp.128-129
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    • 2015
  • Al-rich coatings were prepared on hot rolled low carbon steel by hot dipping method in molten Al-bath to investigate the corrosion resistance with the possible outcomes and defects of aluminized coatings in air and $Ar-0.2%SO_2$ mixed gases. Coating microstructure was composed of an inner Al-Fe intermetallic layer and outer Al-rich layer. Aluminum oxidized preferentially to the thin, outer, protective ${\alpha}-Al_2O_3$ layer, without forming the nonprotective iron/sulfur-oxide layer after heating at $800^{\circ}C$ for 20 h, in both the gases and provided the resistance against corrosion.

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Al-hot Dipping Followed by High-Temperature Corrosion of Carbon Steels in Air and Ar-0.2%SO2 Gas

  • 김민정;;박상환;지권용
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2015년도 춘계학술대회 논문집
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    • pp.122-122
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    • 2015
  • Al-rich coatings were prepared on hot rolled low carbon steel by hot dipping method in molten Al-bath to investigate the corrosion resistance with the possible outcomes and defects of aluminized coatings in air and $Ar-0.2%SO_2$ mixed gases. Coating microstructure was composed of an inner Al-Fe intermetallic layer and outer Al-rich layer. Aluminum oxidized preferentially to the thin, outer, protective ${\alpha}-Al_2O_3$ layer, without forming the nonprotective iron/sulfur-oxide layer after heating at $800^{\circ}C$ for 20h, in both the gases and provided the resistance against corrosion.

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국부적 양극산화 기술 동향 (Technological Trends in a local anodization)

  • 강광모;최수민;나윤채
    • 한국표면공학회지
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    • 제56권2호
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    • pp.115-124
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    • 2023
  • Anodization is an electrochemical process that electrochemically converts a metal surface into an oxide layer, resulting in enhanced corrosion resistance, wear resistance, and improved aesthetic appearance. Local anodization, also known as selective anodization, is a modified process that enables specific regions or patterns on the metal surface to undergo anodization instead of the entire surface. Several methods have been attempted to produce oxide layers via localized anodic oxidation, such as using a mask or pre-patterned substrate. However, these methods are often intricate, time-consuming, and costly. Conversely, the direct writing or patterning approach is a more straightforward and efficient way to fabricate the oxide layers. This review paper intends to enhance our comprehension of local anodization and its potential applications in various fields, including the development of nanotechnologies. The application of anodization is promising in surface engineering, where the anodic oxide layer serves as a protective coating for metals or modifies the surface properties of materials. Furthermore, anodic oxidation can create micro- and nano-scale patterns on metal surfaces. Overall, the development of efficient and cost-effective anodic oxidation methods is essential for the advancement of various industries and technologies.

접착 필름과 평판 유리를 이용하여 봉지된 유기 발광 소자의 발광 특성 (Emission Characteristics of Encapsulated Organic Light Emitting Devices Using Attaching Film and Flat Glass)

  • 임수용;양재웅;주성후
    • 한국표면공학회지
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    • 제46권3호
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    • pp.111-115
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    • 2013
  • To study the encapsulation method for large-area organic light emitting devices (OLEDs), OLED of ITO / 2-TNATA / NPB / $Alq_3$:Rubrene / $Alq_3$ / LiF / Al structure was fabricated, which on $Alq_3$/LiF/Al as protective layer of OLED was deposited to protect the damage of OLED, and subsequently it was encapsulated using attaching film and flat glass. The current density and luminance of encapsulated OLED using attaching film and flat glass has similar characteristics compared with non-encapsulated OLED when thickness of Al as a protective layer was 1200 nm, otherwise power efficiency of encapsulated OLED was better than non-encapsulated OLED. Encapsulation process using attaching film and flat glass did not have any effects on the emission spectrum and the Commission International de L'Eclairage (CIE) coordinate. The lifetime of encapsulated OLED using attaching film and flat glass was 287 hours in 1200 nm Al thickness, which was increased according to thickness of Al protective layer, and was improved 54% compared with 186 hours in same Al thickness, lifetime of encapsulated OLED using epoxy and flat glass. As a result, it showed the improved efficiency and the long lifetime, because the encapsulation method using attaching film and flat glass could minimize the impact on OLED caused through UV hardening process in case of glass encapsulation using epoxy.

Cu 용 슬러리 환경에서의 보호성 코팅이 융착 CMP 패드 컨니셔너에 미치는 영향 (Effect on protective coating of vacuum brazed CMP pad conditioner using in Cu-slurry)

  • 송민석;지원호
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2005년도 춘계학술대회 논문집
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    • pp.434-437
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    • 2005
  • Chemical Mechanical Polishing (CMP) has become an essential step in the overall semiconductor wafer fabrication technology. In general, CMP is a surface planarization method in which a silicon wafer is rotated against a polishing pad in the presence of slurry under pressure. The polishing pad, generally a polyurethane-based material, consists of polymeric foam cell walls, which aid in removal of the reaction products at the wafer interface. It has been found that the material removal rate of any polishing pad decreases due to the so-called 'pad glazing' after several wafer lots have been processed. Therefore, the pad restoration and conditioning has become essential in CMP processes to keep the urethane polishing pad at the proper friction coefficient and to allow effective slurry transport to the wafer surface. Diamond pad conditioner employs a single layer of brazed bonded diamond crystals. Due to the corrosive nature of the polishing slurry required in low pH metal CMP such as copper, it is essential to minimize the possibility of chemical interaction between very low pH slurry (pH <2) and the bond alloy. In this paper, we report an exceptional protective coated conditioner for in-situ pad conditioning in low pH Cu CMP process. The protective Cr-coated conditioner has been tested in slurry with pH levels as low as 1.5 without bond degradation.

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Microstructural characterization of accident tolerant fuel cladding with Cr-Al alloy coating layer after oxidation at 1200 ℃ in a steam environment

  • Park, Dong Jun;Jung, Yang Il;Park, Jung Hwan;Lee, Young Ho;Choi, Byoung Kwon;Kim, Hyun Gil
    • Nuclear Engineering and Technology
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    • 제52권10호
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    • pp.2299-2305
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    • 2020
  • Zr alloy specimens were coated with Cr-Al alloy to enhance their resistance to oxidation. The coated samples were oxidized at 1200 ℃ in a steam environment for 300 s and showed extremely low oxidation when compared to uncoated Zr alloy specimens. The microstructure and elemental distribution of the oxides formed on the surface of Cr-Al alloys have been investigated by transmission electron microscopy (TEM) and X-ray photoelectron spectroscopy (XPS). A very thin protective layer of Cr2O3 formed on the outer surface of the Cr-Al alloy, and a thin Al2O3 layer was also observed in the Cr-Al alloy matrix, near the surface. Our results suggest that these two oxide layers near the surface confers excellent oxidation resistance to the Cr-Al alloy. Even after exposure to a high temperature of 1200 ℃, inter-diffusion between the Cr-Al alloy and the Zr alloy occurred in very few regions near the interface. Analysis of the inter-diffusion layer by high-resolution transmission electron microscopy (HRTEM) and energy dispersive X-ray spectroscopy (EDS) measurement confirmed its identity as Cr2Zr.