• Bulletin of the Korean Chemical Society
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• v.31 no.2
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• pp.335-338
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• 2010

In this study, the atmospheric plasma treatment with $He/O_2$ was conducted to modify the surface chemistry of carbon fibers. The effects of plasma treatment parameters on the surface energetics of carbon fibers were experimentally investigated with respect to gas flow ratio, power intensity, and treatment time. Surface characteristics of the carbon fibers were determined by X-ray photoelectron spectroscopy (XPS), scanning electron microscope (SEM), Fourier transform infrared (FT-IR), Zeta-potential, and contact angle measurements. The results indicated that oxygen plasma treatment led to a large amount of reactive functional groups onto the fiber surface, and these groups can form together as physical intermolecular bonding to improve the surface wettability with a hydrophilic polymer matrix.

• Bulletin of the Korean Chemical Society
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• v.28 no.3
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• pp.413-416
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• 2007

The adsorption and surface reactions of NO on a VO/V(110) surface have been investigated using X-ray photoelectron spectroscopy (XPS), near-edge X-ray absorption fine structure, and temperature programmed desorption (TPD) technique. NO is molecularly adsorbed on VO/V(110) at 80 K. As the surface coverage of NO increases, the NO dimer is formed on the surface at 80 K. Both NO and (NO)2 are adsorbed on the surface with the N-O bond perpendicular to the surface. (NO)2 decomposes at ~100 K and the reaction product is desorbed as N2O. Decomposition of NO takes place when the surface temperature is higher than 273 K.

• Proceedings of the Korean Vacuum Society Conference
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• 2004.08a
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• pp.226-226
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• 2004

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.28 no.2
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• pp.104-108
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• 2015

Al thin films were deposited on TiN/Si(100) via metal-organic chemical vapor deposition using N-methylpyrrolidine alane as a precursor. Characterization of the deposited films were investigated with SEM, XRD, ${\alpha}$-step, AFM, 4-point probe. The early stage of Al thin film deposition was analyzed by in-situ surface reflectance measurement with laser and photometer apparatus. The surface reflectance were changed greatly during the initial 30~40 seconds. There were two increases and two decreases in the surface reflectance, thus the sequence of Al films were deposited at 8 significant points of the surface reflectance change. Surface topograph and cross-sectional view of each film were analyzed with SEM. Al films were grown in the complex mechanism of Volmer-Weber and Stranski-Krastanov process.

• Bulletin of the Korean Space Science Society
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• 2008.04a
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• pp.17.2-17.2
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• 2008

• Proceedings of the Korean Vacuum Society Conference
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• 1997.07a
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• pp.130-131
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• 1997

• Bulletin of the Korean Chemical Society
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• v.15 no.5
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• pp.339-340
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• 1994

• Proceedings of the Korean Vacuum Society Conference
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• 2011.02a
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• pp.425-425
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• 2011

The photocatalytic decomposition of toluene gas was investigated with $TiO_2$ on nano-diamond powder (NDP) under UV irradiation. Atomic layer deposition (ALD) was used for the growth of $TiO_2$ on the NDP. The structure and surface properties of catalysts were characterized by X-ray Diffraction (XRD), X-ray Photoelectron Spectroscopy (XPS) and Transmission Electron Microscopy (TEM). The photocatalytic activity for the toluene decomposition was evaluated by measuring the concentration change of toluene and $CO_2$ gas with gas chromatography (GC)-flame ionization detector (FID) system. The photocatalytic activities of $TiO_2$/NDP catalysts were compared with that of P-25. The rate of initial photocatalytic decomposition of toluene for the $TiO_2$/NDP catalysts was relatively lower when compared to P-25. The photocatalytic activity of P-25 was rapidly decreased with time, whereas, the deactivation of $TiO_2$/NDP catalysts was less pronounced. Therefore, as the reaction time increased, the photocatalytic activity of $TiO_2$/NDP catalysts became higher than that of P-25. The intermediates such as benzaldehyde or benzoic acid, etc were more easily adhered to the active site on the P-25 surface during reaction, resulting in easier deactivation of P-25. These results could be confirmed using FT-IR spectroscopy. We suggest that the NDP used as substrate can reduce the deactivation of $TiO_2$ on the surface.

• Korean Journal of Materials Research
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• v.34 no.2
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• pp.85-94
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• 2024

The optimization of deacetylation process parameters for producing chitosan from isolated chitin shrimp shell waste was investigated using response surface methodology with central composite design (RSM-CCD). Three independent variables viz, NaOH concentration (X₁), radiation power (X₂), and reaction time (X₃) were examined to determine their respective effects on the degree of deacetylation (DD). The DD of chitosan was also calculated using the baseline approach of the Fourier Transform Infrared (FTIR) spectra of the yields. RSM-CCD analysis showed that the optimal chitosan DD value of 96.45 % was obtained at an optimized condition of 63.41 % (w/v) NaOH concentration, 227.28 W radiation power, and 3.34 min deacetylation reaction. The DD was strongly controlled by NaOH concentration, irradiation power, and reaction duration. The coefficients of correlation were 0.257, 0.680, and 0.390, respectively. Because the procedure used microwave radiation absorption, radiation power had a substantial correlation of 0.600~0.800 compared to the two low variables, which were 0.200~0.400. This independently predicted robust quadratic model interaction has been validated for predicting the DD of chitin.

• Proceedings of the Korean Vacuum Society Conference
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• 2002.02a
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• pp.80-80
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• 2002