• 접착 및 계면
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• 제3권4호
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• pp.10-18
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• 2002

오늘날 플라스틱은 많은 분야에서 매우 중요한 역할을 하고 있으며, 플라스틱의 표면개질을 통해 경도, 마모, 내화학성과 같은 성질을 개선하여 성능을 향상시킬 수 있다. 본 연구의 목적은 polycarbonate, polymethylmethacrylate, acrylonitrilebutadienestyrene과 같은 플라스틱에 적용되는 기능성 하드코팅제를 개발하기 위한 것이다. 하드코팅제를 개발하기 위하여 먼저 실리콘아크릴레이트 올리고머(SAOE)를 합성하고, 이를 함유한 코팅필름을 PC 기재로 하였으며, 도막은 자외선경화에 의하였다. 실험의 결과에 의하면, SAOE를 함유하고 있는 도막의 물성이 SAOE를 함유하고 있지 않은 도막의 물성에 비해서 크게 향상되었다. 특히 코팅 조성물내에 1wt%의 SAOE가 함유되었을 때, 이로부터 얻어진 도막의 경도나 광택이 가장 우수함을 나타내었다.

• 한국고분자학회:학술대회논문집
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• 한국고분자학회 2006년도 IUPAC International Symposium on Advanced Polymers for Emerging Technologies
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• pp.354-354
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• 2006

Alginic acid-silica hydrogel films was prepared for testing as protective coating materials for PTFE OD membranes. Unprotected hydrophobic membranes are subject to wet-out when contacted by surface-active agents. Films were characterised using SEM, XRD, DSC, mechanical strength measurements, and water-swelling measurements. In OD trials using coated membranes, no wet-out occurred over the 15 h duration of three consecutive 5 h OD trials using orange oil-water mixtures. In the case of detergent solutions, the coating afforded protection to the membrane for 4-5 h. In a separate trial, no wet-out occurred when the coated side of the membrane was placed in contact with 1.2 wt % orange oil for 72 hours.

• 한국표면공학회지
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• 제37권4호
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• pp.208-214
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• 2004

The influence of the boron content on the various properties of Ni-B alloy films produced by electrodeposition was investigated. The considerable reduction in grain size was observed with increasing boron content. The internal stress was tensile and increased linearly with increasing boron content. Hardness increased up to $750H_{v}$ at 2 at% boron and then kept the value to 11 at% boron for as-plated Ni-B coatings. The hardness of Ni-B films increased up to $1,250H_{v}$ due to the intermetallic$ Ni_3$B precipitation by the heat treatment, and maximum hardness of each coating increases with boron content. Wear resistance decreased with increasing the boron content because of high friction coefficient and brittle fracture of film which has higher content of boron.

• 한국표면공학회지
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• 제36권1호
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• pp.22-26
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• 2003

This short communication reports on the experiment which demonstrates that superhard nanostructured films with hardness of about 40 GPa and greater can be composed not only of two or more nanocrystalline and/or amorphous phases of different materials, as it is in the case of nanocomposite coatings, but also that can be formed by a mixture of small (<10 nm) nanocrystalline grains of the same material with different crystallographic orientation and/or lattice structures. This finding opens new possibilities to develop advanced nanostructured materials with enhanced physical and functional properties.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2012년도 춘계학술발표회 논문집
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• pp.124-125
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• 2012

Korea institute of materials science (KIMS) use a linear deposition source called as a closed drift linear plasma source (CDLPS) as well as dual magnetron sputtering (DMS) to deposit SiOxCyHz films in $HMDSO/O_2$ plasma. The CDLPS generates linear plasma using closed drifting electrons and can reduce device degradations due to energetic ion bombardments on organic devices such as organic photovoltaic and organic light emission diode by controlling an ion energy. The deposited films are investigated by Fourier transform infrared (FT-IR) spectroscopy, X-ray photoelectron spectroscopy (XPS), and atomic force microscopy (AFM). Optical emission spectroscopy (OES) is used to measure relative radical populations of dissociation and recombination products such as H, CH, and CO in plasma. And SiOx film is applied to a barrier film on organic photovoltaic devices.

• 한국표면공학회지
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• 제43권6호
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• pp.266-271
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• 2010

Ternary Mo-Cu-N films were deposited on Si wafer substrates with various copper contents by magnetron sputtering method using Mo target and Cu target in $Ar/N_2$ gaseous atmosphere. As increasing $N_2$ pressure, the microstructure of Mo-N films changed from ${\gamma}-Mo_2N$ of (111) having face-centered-cubic (FCC) structure to $\delta$-MoN of (200) having hexagonal structure. Detailed the microstructures of the Mo-Cu-N coatings were studied by X-ray diffraction, scanning electron microscopy and field emission transmission electron microscope. The results indicated that the incorporation of copper into the growing Mo-N coating led to the $Mo_2N$ and MoN crystallites were more well-distributed and refined and the copper existed in grain boundary. Ternary Mo-Cu-N films had a composite microstructure of the nanosized crystal crystalline ${\gamma}-Mo_2N$ and $\delta$-MoN surrounded by amorphous $Cu_3N$ phase.

• Journal of Electrochemical Science and Technology
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• 제12권2호
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• pp.188-203
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• 2021

The specific benefits of the modified films formed on preliminary anodized aluminum, including the versatility of their potential applications impose the need for evaluation of the exploitation reliability of these films. In this aspect, the durability of Cu and Ni modified anodized aluminum oxide (AAO) films on the low-doped AA1050 alloy was assessed through extended exposure to a 3.5% NaCl model corrosive medium. The electrochemical measurements by means of electrochemical impedance spectroscopy (EIS) and potentiodynamic scanning (PDS) after 24 and 720 hours of exposure have revealed that the obtained films do not change their obvious barrier properties. In addition, supplemental analyses of the coatings were performed, in order to elucidate the impact of the AC-deposition of Cu and Ni inside the pores. The scanning electron microscopy (SEM) images have shown that the surface topology is not affected and resembles the typical surface of an etched metal. The subsequent energy dispersive X-ray spectroscopy (EDX) tests have revealed a predominance of Cu in the combined AAO-Cu/Ni layers, whereas additional X-ray photoelectron (XPS) analyses showed that both metals form oxides with different oxidation states due to alterations in the deposition conditions, promoted by the application of AC-polarization of the samples.

• 한국세라믹학회지
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• 제50권6호
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• pp.390-395
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• 2013

Nanocrystalline CrN films were deposited on Si (100) substrates by means of asymmetric pulsed DC reactive magnetron sputtering. We investigated the growth behavior, corrosion resistance and mechanical properties of CrN films with a change in the duty cycle and pulse frequency. The grain size of the CrN films decreased from 25.4 nm to 11.2 nm upon a decrease in the duty cycle. The corrosion potentials for the CrN films by DC sputtering was approximately - 0.6 V, and it increased to - 0.3 V in the CrN films which underwent pulsed sputtering. The nanoindentation hardness of the CrN films also increased with a decrease in the duty cycle. This enhancement of the corrosion resistance and mechanical properties of pulsed sputtered CrN films could be attributed to the densification and surface smoothness of the microstructure of the films.

• 한국세라믹학회지
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• 제38권11호
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• pp.1067-1074
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• 2001

수팽윤성 점토로서 벤토나이트(BEN), 유기금속 비누계 건조제, 아크릴계 바인더 및 코팅첨가제들을 배합하여 서로 성분이 다른 자동산화 건조형 수성코팅제(WBC-1, WBC-2, WBC-3, WBC-4) 4종류를 제조하였다. 제조한 수성코팅제(WBC)의 용액점도, 고형분, 유동학적인 성질 및 자동산화 건조성을 조사하였다. 또한 주조된 WBC 필름의 열안정성, 투명성 및 내수성을 측정하였고, WBC 필름의 표면형상을 주사탐침현미경으로 조사하였다. BEN이 포함된 WBC-2, WBC-3 및 WBC-4는 전단력에 따라 요변성이 나타남으로서 WBC의 저장안정성이 우수하였다. 자동산화형 WBC의 건조성은 건조제가 Mn/Zn/Ba=1/2/3의 비로 혼합되었을 때, 6$0^{\circ}C$에서 5초로서 최대치를 나타내었다. 또한 BEN이 포함된 WBC 필름의 초기분해온도와 투명성은 시판 WBC(MC-21W)의 필름보다 32.2~54.7$^{\circ}C$와 5.1~8.6%의 범위로 증가하였고, WBC 필름의 내수성은 MC-21W

• 한국전기전자재료학회논문지
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• 제27권8호
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• pp.516-521
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• 2014

An excellent hydrophobic surface has a high contact angle over 147 degree and the contact angle hysteresis below $5^0$ was produced by using roughness combined with hydrophobic PTFE coatings, which were also confirmed to exhibit an extreme adhesion to glass substrate. To form the rough surface, the glass was etched by Ar-plasma. A very thin PTFE film was coated on the plasma etched glass surface. Roughness factors before or after PTFE coating on the plasma etched glass surface, based on Wensel's model were calculated, which agrees well with the dependence of the contact angle on the roughness factor is predicted by Wensel's model. The PTFE films deposited on glass by using a conventional rf-magnetron sputtering. The glass substrates were etched Ar-plasma prior to the deposition of PTFE. Their hydrophobicities are investigated for application as a anti-fouling coating layer on the screen of displays. It is found that the hydrophobicity of PTFE films mainly depends on the sputtering conditions, such as rf-power, Ar gas content introduced during deposition. These conditions are closely related to the deposition rate or thickness of PTFE film. Thus, it is also found that the deposition rate or the film thickness affects sensitively the geometrical morphology formed on surface of the rf-sputtered PTFE films. In particular, 1,950-nm-thick PTFE films deposited for 30 minute by rf-power 50 watt under Ar gas content of 20 sccm shows a very excellent optical transmittance and a good anti-fouling property and a good durability.