• Title/Summary/Keyword: Substrate range

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Effects of Substrate Temperature on the Microstructure and Photoluminescence Properties of ZnO Thin Films by Atomic Layer Deposition (ZnO 성장을 위한 Atomic Layer Deposition법에서 공정온도가 박막의 구조적 및 광학적 특성에 미치는 영향)

  • Lim, Jong-Min;Lee, Chong-Mu
    • Korean Journal of Materials Research
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    • v.15 no.11
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    • pp.741-744
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    • 2005
  • Atomic layer deposition (ALD) is a very promising deposition technique for ZnO thin films. However, there have been very few reports on ZnO grown by ALD. Effects of substrate temperature in both ALD and post annealing on the microstructure and PL properties of ZnO thin films were investigated using X-ray diffraction, photoluminescence, and scanning electron microscopy. The temperature window of ALD is found to be between $130-180^{\circ}C$. The growth rate of ZnO thin film increases as the substrate temperature increases in the temperature range except the temperature window. The crystal quality depends most strongly on the substrate temperature among all the growth parameters of ALD. The crystallinity of the film is improved by increasing the growth thine per ALD cycle or doing post-annealing treatment. The grain size of the film tends to increase and the grain shape tends to change from a worm-like longish shape to a round one as the annealing temperature increases from $600^{\circ}C\;to\;1,000^{\circ}C$.

Influence of Substrate Temperature of SCT Thin Film by RF Sputtering Method (RF 스퍼터링법에 의한 SCT 박막의 기판온도 영향)

  • Oh, Y.C.;Kim, J.S.;Cho, C.N.;Shin, C.G.;Song, M.J.;So, B.M.;Choi, W.S.;Kim, C.H.;Lee, J.U.
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.07b
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    • pp.718-721
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    • 2004
  • The $(Sr_{0.9}Ca_{0.1})TiO_3$(SCT) thin films are deposited on Pt-coated electrode$(Pt/TiN/SiO_2/Si)$ using RF sputtering method at various substrate temperature. The optimum conditions of RF power and $Ar/O_2$ ratio were 140[W] and 80/20, respectively. Deposition rate of SCT thin films was about $18.75[{\AA}/min]$. The crystallinity of SCT thin films were increased with increase of substrate temperature in the temperature range of $100\sim500[^{\circ}C]$. The dielectric constant of SCT thin films were increased with the increase of substrate temperature, and changed almost linearly in temperature ranges of $-80\sim+190[^{\circ}C]$. The current-voltage characteristics of SCT thin films showed the increasing leakage current as the substrate temperature increases.

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Deposition of Ferroelectric PB(Zr0.52Ti0.48)O3 Films on Platinized Silicon Using Nd:YAG Laser

  • Im, Hoong-Sun;Kim, Sang-Hyeob;Choi, Young-Ku;Lee, Kee-Hag;Jung, Kwang-Woo
    • Bulletin of the Korean Chemical Society
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    • v.18 no.1
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    • pp.56-61
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    • 1997
  • Lead zirconate titanate (PZT) thin fills were deposited onto the Pt/Ti/SiO2/Si substrate by the pulsed laser deposition with the second harmonic wavelength (532 nm) of Nd:YAG laser. In order to determine the optimum conditions for the film deposition, the phase of the films were investigated as functions of ambient oxygen pressure, substrate temperature, and laser fluence. Also the chemical composition analysis was conducted for the PZT films deposited under various ambient oxygen pressure. When the distance between substrate and bulk PZT target is set to 20 mm, the optimum conditions have been determined to be 3 torr of oxygen pressure, 1.5 J/cm2 of laser fluence, and 823-848(±10) K range of substrate temperature. At these conditions, perovskite phase PZT films were obtained on platinized silicon. The chemical composition of the films is very similar to that of PZT bulk target. The physical structure of the deposited films analyzed by scanning electron microscopy shows a columnar morphology perpendicular to the substrate surface. Capacitance-Voltage hysteresis loop measurements show also a typical characteristics of ferroelectric thin film. The dielectric constant is found to be 528 for the 0.48 μm thickness of PZT thin film.

Design of Ka-band Colpitts Oscillators with a Coplanar Waveguide Configuration (CPW 구조의 Ka-band Colpitts Oscillator 설계)

  • Ko, Jung-Min;Kim, Jun-Il;Jee, Yong
    • Proceedings of the IEEK Conference
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    • 2003.07b
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    • pp.1125-1128
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    • 2003
  • This paper presents the design method of a Colpitts type oscillator with coplanar waveguide(CPW) structures in the range of Ka-band frequency for transmitter and receiver modules. Series short stubs of CPW patterns provide inductances and capacitances in the range of Ka-band which can be expressed as a CLC-$\pi$ equivalent circuit. The experimentation has employed ro4003 substrates as a CPW substrate which has a dielectric constant of 3.38 and a signal and ground space of 100um. A method of momentum simulation for the CPW patterns has performed with an ADS software tool of Hewlett-Packard Corp. Inductance and capacitance circuits of a Colpitts oscillator was interconnected to a MESFET with CPW bend structures of including the input and output impedance matching circuits of the active transistor. Circuit parameters for impedance matching were determined through the network conversion to the equivalent length of CPW transmission lines by using T-network 1 $\pi$-network conversion circuit. A Colpitts oscillator was fabricated on the substrate of a area of 8.5mm x 17.4mm with a MESFET of Fujitsu FMM5704X and CPW series short stubs. The design suggested the possibility of realizing oscillators on a planar surface for the wireless system of tansmitter and receiver modules in the frequency range of 30GHz

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Ion-Induced Changes in a $Se_{75}Ge_{25}$ Inoaganic Resist for Focused Ion Beam Microlithgraphy (집속 이온빔 마이크로리소그라피를 위한 비정질 $Se_{75}Ge_{25}$ 무기질 레지스터의 이온 유기 변화)

  • 이현용;박태성;정홍배;강승언;김종빈
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1992.05a
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    • pp.30-33
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    • 1992
  • This thesis was investigated on ion-induced characteristics in a-$Se_{75}Ge_{25}$ positive and negative resists for focused-ion-beam microlithogaphy. The exposed a-$Se_{75}Ge_{25}$ inorganic thin film shows an increase in optical absorption after exposure to~$10_{16}$ dose of Ga+. The observed shift in the absorption edge toward longer wavelengths is consistent with that in films exposed to band-gap photons(~$10^{21}$photons/cm2). This result may be related with microstructural rearrangements with in the short range of SeGe network. Due to changes in the short range order, the chemical bonding may be affected, which results in increased chemical dissolution in ion-induced film. Also, this resist exhibits good thermal stability because of its high Tg(~$220^{\circ}C$). When focused ion beams are used for direct exposure of resist over a substrate, unwanted implantation of the substrate may be an issue. A possible way to avoid this is to match the thickness of the resist to the range of ions in the resist. Thin aspect is currently under investigation.

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Depositon of Transparent Conductive Films by a DC arc Plasmatron

  • Penkov, O.V.;Plaksin, V. Yu.;Joa, S.B.;Kim, J.H.;LEE, H.J.
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.480-480
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    • 2010
  • In the present work, we studied effect of the deposition parameters on the structure and properties of ZnO films deposited by DC arc plasmatron. The varied parameters were gas flow rates, precursor composition, substrate temperature and post-deposition annealing temperature. Vapor of Zinc acetylacetone was used as source materials, oxygen was used as working gas and argon was used as the cathode protective gas and a transport gas for the vapor. The plasmatron power was varied in the range of 700-1,500 watts. Flow rate of the gases and substrate temperature rate were varied in the wide range to optimize the properties of the deposited coatings. After deposition films were annealed in the hydrogen atmosphere in the wide range of temperatures. Structure of coatings was investigated using XRD and SEM. Chemical composition was analyzed using x-ray photo-electron spectroscopy. Sheet conductivity was measured by 4-point probe method. Optical properties of the transparent ZnO-based coatings were studied by the spectroscopy. It was shown that deposition by a DC Arc plasmatron can be used for low-cost production of zinc oxide films with good optical and electrical properties. Sheet resistance of 4 Ohms cm was achieved after the deposition and 30 min annealing in the hydrogen at $350^{\circ}C$. Elevation of the substrate temperature during the deposition process up to $350^{\circ}C$ leads to decreasing of the film's resistance due to rearrangement of the crystalline structure.

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A Comparative Study of Two Different SnO2:F-coated Glass Substrates for CdTe Solar Cells

  • Cha, Eun Seok;Ko, Young Min;Choi, Yong Woo;Park, Gyu Chan;Ahn, Byung Tae
    • Current Photovoltaic Research
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    • v.5 no.1
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    • pp.1-8
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    • 2017
  • Two different fluorine-doped tin oxide (FTO)-coated glass substrates were investigated to find better suitability for CdTe solar cells. Substrate A consisted of FTO (300 nm)/$SiO_2$ (24 nm)/intrinsic $SnO_2$ (30 nm)/borosilicate glass (2.2 mm), and substrate B consisted of FTO (700 nm)/intrinsic $SnO_2$ (30nm)/borosilicate glass (1.8 mm). The overall thickness of the FTO/glass substrates was about 2.5 mm. The total light transmittance of substrate B was much higher than that of substrate A throughout the whole spectral region, even though the thickness of the FTO in substrate B was twice larger than that of the FTO in the substrate A. The short-circuit current greatly increased in substrate B and the external quantum efficiency (EQE) increased over the whole wavelength range. This study shows that the diffuse optical transmittance played a key role in the large EQE value in the blue wavelength region, and the direct transmittance played a key role in the large EQE value in the red wavelength region. The higher transmittance is due to the rough surface generated by the thicker FTO on glass. The conversion efficiency of the CdTe solar cell increased from 12.4 to 15.1% in combination of rough FTO substrate and Cu solution back contact.

Substrate Interactions in the Biodegradation of Volatile Organic Compounds by a Yeast Strain (Yeast에 의한 휘발성 유기화합물 분해에 있어서의 기질상호관계 해석)

  • Jang, Hyun Sup;Jeong, MI Young;Shin, Shoung Kyu;Song, Ji Hyeon;Hwang, Sun Jin
    • Journal of Korean Society of Water and Wastewater
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    • v.22 no.2
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    • pp.187-193
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    • 2008
  • Biological removal capacities for volatile organic compounds (VOCs) were determined using a yeast strain, Candida tropicalis. In this study, VOCs including toluene, benzene, p-xylene, and styrene as single substrates or mixtures were tested in the batch culture of the yeast strain. In addition, a kinetic model was applied to evaluate substrate interactions between the VOCs. The yeast strain was able to biodegrade each VOC effectively as a growth substrate, implying it could applied to wide range of VOCs. When the yeast strain was subjected to VOCs in mixtures, the biodegradation rate of one substrate were either increased (stimulated) or decreased (inhibited) by the presence of the others. Both benzene and toluene were inhibited by the other VOCs, and substrate interaction parameters estimated in the model indicated that styrene was the strongest inhibitor for the benzene and toluene biodegradation. Meanwhile, the biodegradation of p-xylene and styrene was stimulated by the presence of either benzene or toluene. The biodegradation rate of p-xylene was significantly increased especially by the presence of toluene, and the styrene biodegradation was enhanced greatly by the benzene addition. The results of the substrate interaction by the yeast strain suggest that the biodegradation rates for the VOCs in mixtures should be carefully evaluated. Furthermore, the competitive inhibition coefficient could be applied as a useful index to determine the substrate interaction

Heat Transfer between Substrate and Substrate-heater in Low Vacuum (저진공 내 시료가열판과 시료의 열전달)

  • Park, Hyon-Jae;Oh, Soo-Ghee;Shin, Yong-Hyeon;Chung, Kwang-Hwa
    • Journal of the Korean Vacuum Society
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    • v.17 no.4
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    • pp.302-310
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    • 2008
  • Heat transfer between substrate and substrate-heater in low vacuum was investigated. The convection related with gas flow and pressure, the heat conduction considering surface roughness and contact pressure, and the heat loss by radiation depending on the surface emissivity were considered. The coefficient of heat conduction $h_c$ in the Fourier's law were determined experimentally from the temperature difference between the substrate and the substrate-heater in the range of substrate-heater temperature $100\;-\;500^{\circ}C$, in the pressures of 300 mTorr - 1 Torr. The temperature difference was then calculated in the reverse way for the purpose of verification, using the heat flow and the experimentally determined coefficients. The verified temperature differences were thus obtained within 0.33 % error.

Nitrogen Monoxide Gas Sensing Characteristics of Transparent p-type Semiconductor CuAlO2 Thin Films (투명한 p형 반도체 CuAlO2 박막의 일산화질소 가스 감지 특성)

  • Park, Soo-Jeong;Kim, Hyojin;Kim, Dojin
    • Korean Journal of Materials Research
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    • v.23 no.9
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    • pp.477-482
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    • 2013
  • We investigated the detection properties of nitrogen monoxide (NO) gas using transparent p-type $CuAlO_2$ thin film gas sensors. The $CuAlO_2$ film was fabricated on an indium tin oxide (ITO)/glass substrate by pulsed laser deposition (PLD), and then the transparent p-type $CuAlO_2$ active layer was formed by annealing. Structural and optical characterizations revealed that the transparent p-type $CuAlO_2$ layer with a thickness of around 200 nm had a non-crystalline structure, showing a quite flat surface and a high transparency above 65 % in the range of visible light. From the NO gas sensing measurements, it was found that the transparent p-type $CuAlO_2$ thin film gas sensors exhibited the maximum sensitivity to NO gas in dry air at an operating temperature of $180^{\circ}C$. We also found that these $CuAlO_2$ thin film gas sensors showed reversible and reliable electrical resistance-response to NO gas in the operating temperature range. These results indicate that the transparent p-type semiconductor $CuAlO_2$ thin films are very promising for application as sensing materials for gas sensors, in particular, various types of transparent p-n junction gas sensors. Also, these transparent p-type semiconductor $CuAlO_2$ thin films could be combined with an n-type oxide semiconductor to fabricate p-n heterojunction oxide semiconductor gas sensors.