• Korean Journal of Materials Research
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• v.6 no.7
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• pp.742-751
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• 1996

Ti-48Al(at.%) specimens were coated with Al-21Ti-23Cr(at.%) film by RF magnetron sputtering. Ti-48Al specimen coated at 200, 0.8Pa and 573K showed the best oxidation resistance property in the isothermal oxidation test. Al-21Ti-23Cr film was amophous after depostion, but crystallized and fromed a protective ${Al}_{2}{O}_{3}$ layer on the surface during oxidation. Ti-48Al specimens coated at 573K have been sassessed by isothermal oxidation test for 100 hours at 1073K, 1173K and 1273K. The mass gain curves showed that parabolic stage continued at al tested temperature range in isothermal oxidation test, and the excellent oxidation resistance is attriutable to the formation of a protective ${Al}_{2}{O}_{3}$ layer on the surface of Al-21Ti-23Cr film. After oxidation test at 1273K, the matrix of Al-21Ti-23Cr film had transformed into TiAlCr phase due to the depletion of Al during oxidation and the diffusion of Ti from the substrate, and the extent of mass gain of the specimen increased compared with that of specimens tested at lower temperature.

• Journal of Sensor Science and Technology
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• v.4 no.1
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• pp.51-63
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• 1995

Polycrystalline $CdS_{1-x}Se_{x}$ thin films were grown on ceramic substrate using a chemical bath deposition method. They were annealed at various temperature and X-ray diffraction patterns were measured by X-ray diffractometer in order to study $CdS_{1-x}Se_{x}$ polycrystal structure using extrapolation method of X-ray diffraction patterns for the CdS, CdSe samples annealed in $N_{2}$ gas at $550^{\circ}C$ it was found hexagonal structure which had the lattice constant $a_{0}=4.1364{\AA}$, $c_{0}=6.7129{\AA}$ in CdS and $a_{0}=4.3021{\AA}$, $c_{0}=7.0142{\AA}$ in CdSe, respectively. Hall effect on these samples was measured by Van der Pauw method and then studied on carrier density and mobility depending on temperature. We measured also spectral response, sensitivity(${\gamma}$), maximum allowable power dissipation and response time on these samples.

• Journal of Sensor Science and Technology
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• v.8 no.2
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• pp.115-123
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• 1999

A micro-gas sensor with heater and sensing electrode on the same plane was fabricated on phosphosilicate glass(PSG, 800nm)/$Si_3N_4$ (150nm) dielectric membrane. PSG film was provided by atmospheric pressure chemical vapor deposition(APCVD), and $Si_3N_4$ film by low pressure chemical vapor deposition (LPCVD). Total area of the fabricated device was $3.78{\times}3.78mm^2$. The area of diaphragm was $1.5{\times}1.5mm^2$, and that of the sensing layer was $0.24{\times}0.24mm^2$. Finite-element simulation was employed to estimate temperature distribution for a square-shaped diaphragm. The power consumption of Pt heater was about 85mW at $350^{\circ}C$. Tin thin films were deposited on the silicon substrate by thermal evaporation at room temperature and $232^{\circ}C$, and tin oxide films($SnO_2$) were prepared by thermal oxidation of the metallic tin films at $650^{\circ}C$ for 3 hours in oxygen ambient. The film analyses were carried out by SEM and XRD techniques. Effects of humidity and ambient temperature on the resistance of the sensing layer were found to be negligible. The fabricated micro-gas sensor exhibited high sensitivity to butane gas.

• Journal of Sensor Science and Technology
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• v.4 no.3
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• pp.60-70
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• 1995

Polycrystalline $Cd_{1-x}Zn_{x}S$ thin film were grown on slide glass(corning-2948) substrate using a chemical bath deposition (C.B.D) method. They were annealed at various temperature and X -ray diffraction patterns were measured by X-ray diffractometor in order to study $Cd_{1-x}Zn_{x}S$ polycrystal structure using extrapolation method of X-ray diffraction patterns for the CdS, ZnS sample annealed in $N_{2}$ gas at $550^{\circ}C$. It was found hexagonal structure which had the lattice constant $a_{0}\;=\;4.1364{\AA}$, $c_{0}\;=\;6.7129{\AA}$ in CdS and $a_{0}\;=\;3.8062{\AA}$, $c_{0}\;=\;6.2681{\AA}$ in ZnS, respectively. Hall effect on these sample was measured by Van der Pauw method and then studied on carrier density and mobility depending on temperature. We measured also spectral response, sensitivity maximum allowable power dissipation and response time on these sample.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2009.05a
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• pp.3-3
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• 2009

In order to investigate the possibility of using mixed rare earth $(Nd_{1/3}Eu_{1/3}Gd_{1/3})Ba_2Cu_3O_{7-x}$ (NEG123) as the superconducting layer of the HTS coated conductor, the NEG123 thin film was deposited epitaxialy on LAO(100) single crystal and IBAD_YSZ metal templates by pulsed laser deposition. Systematic studies were carried out to investigate the influences of deposition parameters of PLD on the micro structure, texture and superconducting properties of NEG-123 coated conductor. Deposition at oxygen partial pressure of 600 mTorr was needed to routinely obtain high quality NEG123 films with $J_c$'s (77K) over 2 MA/$cm^2$ and Tc's over 90K (${\Delta}T{\sim}2\;K$). We verified from magnetization study that the NEG123 has an improved in-field Jc as the field increases at temperatures between 10 K and 77 K compared with Gd123. The $J_c$ (77K, self field) and the value of onset $T_c$ of NEG123 thin film on LAO substrate was $4.0MA/cm^2$ and 92K, respectively. This is the first report, to the best of our knowledge, of coated conductors with NEG123 film as the superconducting layer which have Ic and Jc over 40 A/cm-width and 1.6 MA/$cm^2$ at 77K, self field. This study shows the possibility of using NEG123 film as the superconducting layer of the HTS coated conductor which can be used in high magnetic field power electric devices.

• Food Science and Preservation
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• v.24 no.2
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• pp.237-245
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• 2017

Lactic acid fermentation of Flammulina velutipes (FV) powder was optimized to produce higher content of ${\gamma}-aminobutyric$ acid (GABA). FV powder (10%) was fermented with 0.5% yeast extract, 1% glucose, 5% mono sodium-L-glutamate (MSG) by Lactobacillus plantarum EJ2014 for 5 days at $30^{\circ}C$. The pH decreased from 6.1 to 4.4 for first 2 days after then increased to 6.2 for following 5 days. While the acidity increased from 0.5% to 1.3% for 2 days, after then decreased to 0.4% for 5 days. Viable cell count showed higher value of $2.2{\times}10^9CFU/mL$ after fermentation for 5 days. In particular, 3.54% MSG as a substrate was completely utilized during lactic acid fermentation, indicating higher 2.31% GABA content. The fermented FV powder showed higher antioxidant properties than that of un-fermented FV power. $IC_{50}$ values of DPPH radical scavenging and ABTS radical scavenging activities were 1.11 mg/mL and 2.58 mg/mL, respectively. Conclusively, natural fermented seasoning from the lactic acid fermentation of 30g of FV powder and 1 g of roasted wheat bran could provide the functional ingredients with 17% GABA, probiotics and dietary fiber, which is used for health food and functional seasoning.

• Korean Journal of Materials Research
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• v.19 no.3
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• pp.132-136
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• 2009

This study investigates GaAs dry etching in capacitively coupled $BCl_3/N_2$ plasma at a low vacuum pressure (>100 mTorr). The applied etch process parameters were a RIE chuck power ranging from $100{\sim}200W$ on the electrodes and a $N_2$ composition ranging from $0{\sim}100%$ in $BCl_3/N_2$ plasma mixtures. After the etch process, the etch rates, RMS roughness and etch selectivity of the GaAs over a photoresist was investigated. Surface profilometry and field emission-scanning electron microscopy were used to analyze the etch characteristics of the GaAs substrate. It was found that the highest etch rate of GaAs was $0.4{\mu}m/min$ at a 20 % $N_2$ composition in $BCl_3/N_2$ (i.e., 16 sccm $BCl_3/4$ sccm $N_2$). It was also noted that the etch rate of GaAs was $0.22{\mu}m/min$ at 20 sccm $BCl_3$ (100 % $BCl_3$). Therefore, there was a clear catalytic effect of $N_2$ during the $BCl_3/N_2$ plasma etching process. The RMS roughness of GaAs after etching was very low (${\sim}3nm$) when the percentage of $N_2$ was 20 %. However, the surface roughness became rougher with higher percentages of $N_2$.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2001.06a
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• pp.8-8
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• 2001

초고속 증착은 짧은 시간에 박막 형성을 가능하게 하므로 window glass 코팅등의 대면적 코팅에 있어서 비용을 절감 시키고, 대량생산을 가능하게 만들기 때문에 관심이 집중되고 있다. 고속증착 공정으로는 high current arc, laser arc, hollow cathode discharge ion plating 그리고 마그네트론 스퍼터링법 등이 있다. 특별히 마그네트론 스퍼터링법은 3m이상의 넓이에 코팅을 할때 두께가 매우 균일하며, 증착율은 evaporation 공정에 비해 경제적, 기능적인 면에서 효율적이다. 그리고 증착된 박막은 매우 조밀하고 좋은 밀착력을 갖고 있으며, 고융점 금속을 포함하여 금속 합금 및 혼합물의 비율을 조정 및 금속 산화물, 질화물, 탄화물 등과 같은 금속의 증착도 stoichiometry를 조정하여 박막을 합성 시키는데 있어서 효과적이다. 이러한 초고속 증착을 만들기 위한 마그네트론 스퍼터링법의 요건은 마그네트론 원이 높은 타켓 power density를 가져야 하며, 타켓에서 효율적으로 플라즈마를 구속하여 스퍼터 되는 이온의 양을 최대화 시킬 수 있어 한다. 따라서 본 실험에서는 초고속 증착을 위해서 직경 50mm 타켓의 UBM magnetron원을 설계 제작하였다. 고밀도의 플라즈마를 형성시키기 위해서, Poisson simulation c code를 이용하여 자기장의 방향, 세기 및 밀도를 측정 하였고, 자기장 측정기(Gauss meter)를 이용하여 실제 자장을 측정 비교 분석하였다. 상기의 data를 바탕으로 여러 형상의 마그네트론원을 설계, 제작하였고. 마그네트론 원의 특성 분석을 위해 I-V 방전 특성을 평가하였고 substrate ion current density와 박막의 증착율을 측정하였다.duty-on 시간의 증가에 따라 $Cr_2N$ 상의 형성이 점점 많아져 80% duty-on 시간 경우에는 거의 CrN과 $Cr_2N$ 상이 공존하는 것으로 나타났다. 또한 duty-on 시간이 증가할수록 회절피크의 세기가 증가하여 결정화가 더 많이 진행되어짐을 알 수 있었다. 마찬가지로 바이어스 펄스이 주파수에 다른 결정성의 변화도 펄스의 주파수가 증가할수록 박막이 결정성이 좋아지고 $Cr_2N$ 상이 쉽게 형성되었다. 증착 진공도에 따른 결정성은 상대적으로 질소의 농도가 높은 낮은 진공도에서는 CrN 상이 주로 형성되었으며, 반대로 높은 진공도에서는 $Cr_2N$ 상이 많이 만들어졌다. 즉 $1.3{\times}10^{-2}Torr$의 증착 진공도에서는 CrN 상만이 보이는 반면 $9.0{\tiems}1-^{-2}Torr$ 진공도에서부터 $Cr_2N$ 상이 형성되기 시작하여 $5.0{\tiems}10^{-2}Torr$ 진공도에서는 두개의 상이 혼재되어 있음을 알 수 있었다. 박막의 내마모성을 조사한 결과 CrN 박막의 마찰 계수는 초기에 급격하게 증가한 후 0.5에서 0.6 사이의 값으로 큰 변화를 보이지 않았으며, $Cr_2N$ 박막도 비슷한 거동을 보였다.차 이, 목적의 차이, 그리고 환경의 의미의 차이에 따라 경관의 미학적 평가가 달라진 것으로 나타났다.corner$적 의도에 의한 경관구성의 일면을 확인할수 있지만 엄밀히 생각하여 보면 이러한 예의 경우도 최락의 총체적인 외형은 마찬가지로 $\ulcorner$순응$\lrcorner$

• The Journal of the Korea institute of electronic communication sciences
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• v.12 no.6
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• pp.1019-1026
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• 2017

The structural properties of $HfO_2$ films could be improved by calibrating the working pressure owing to the enhanced quality of a thin film. We deposited $HfO_2$ films on glass substrates by radio frequency (RF) magnetron sputtering under a base vacuum pressure lower than $4.5{\times}10^{-6}Pa$, RF power of 100 W, substrate temperature of $300^{\circ}C$. The working pressures were varied from 1 mTorr to 15 mTorr. Subsequently, their structural and optical properties were investigated. In particular, the $HfO_2$ film deposited at 1 mTorr had superior properties than the others, with a crystallite size of 10.27 nm, surface roughness of 1.173 nm, refractive index of 2.0937 at 550 nm, and 84.85 % transmittance at 550 nm. These results indicate that the $HfO_2$ film deposited at 1 mTorr is suitable for application in transparent electric devices.

• Journal of the Korean Electrochemical Society
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• v.7 no.2
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• pp.94-99
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• 2004

Anode-supported flat tubular solid oxide fuel cell (SOFC) was investigated to increase the cell power density. The anode-supported flat tube was fabricated by extrusion process. The porosity and pore size of Ni/YSZ ($8mol\%$ yttria-stabilized zirconia) cermet anode were $50.6\%\;and\;0.23{\mu}m$, respectively. The Ni particles in the anode were distributed uniformly and connected well to each other particles in the cermet anode. YSZ electrolyte layer and multilayered cathode composed of $LSM(La_{0.85}Sr_{0.15})_{0.9}MnO_3)/YSZ$ composite, LSM, and $LSCF(La_{0.6}Sr_{0.4}Co_{0.2}Fe_{0.7}O_3)$ were coated onto the anode substrate by slurry dip coating, subsequently. The anode-supported flat tubular cell showed a performance of $300mW/cm^2 (0.6V,\; 500 mA/cm^2)\;at\;500^{\circ}C$. The electrochemical characteristics of the flat tubular cell were examined by ac impedance method and the humidified fuel enhanced the cell performance. Areal specific resistance of the LSM-coated SUS430 by slurry dipping process as metallic interconnect was $148m{\Omega}cm^2\;at\;750^{\circ}C$ and then decreased to $148m{\Omega}cm^2$ after 450hr. On the other hand, the LSM-coated Fecralloy by slurry dipping process showed a high area specific resistance.