• Title/Summary/Keyword: Substrate power

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Variation of optical characteristics with the thickness of bulk GaN grown by HVPE (HVPE로 성장시킨 bulk GaN의 두께에 따른 광학적 특성 변화)

  • Lee, Hee Ae;Park, Jae Hwa;Lee, Jung Hun;Lee, Joo Hyung;Park, Cheol Woo;Kang, Hyo Sang;Kang, Suk Hyun;In, Jun Hyeong;Shim, Kwang Bo
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.28 no.1
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    • pp.9-13
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    • 2018
  • In this work, we investigated the variation of optical characteristics with the thickness of bulk GaN grown by hydride vapor phase epitaxy(HVPE) to evaluate applicability as GaN substrates in fabrication of high-brightness optical devices and high-power devices. We fabricated 2-inch GaN substrates by using HVPE method of various thickness (0.4, 0.9, 1.5 mm) and characterized the optical property with the variation of defect density and the residual stress using chemical wet etching, Raman spectroscopy and photoluminescence. As a result, we confirmed the correlation of optical properties with GaN crystal thickness and applicability of high performance optical devices via fabrication of homoepitaxial substrate.

Temperature Analysis for the Point-Cell Source in the Vapor Deposition Process

  • Park, Jong-Wook;Kim, Sung-Cho;Hun Jung
    • Journal of Mechanical Science and Technology
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    • v.18 no.9
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    • pp.1680-1688
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    • 2004
  • The information indicating device plays an important part in the information times. Recently, the classical CRT (Cathod Ray Tube) display is getting transferred to the LCD (Liquid Crystal Display) one which is a kind of the FPDs (Flat Panel Displays). The OLED (Organic Light Emitting Diodes) display of the FPDs has many advantages for the low power consumption, the luminescence in itself, the light weight, the thin thickness, the wide view angle, the fast response and so on as compared with the LCD one. The OLED has lately attracted considerable attention as the next generation device for the information indicators. And also it has already been applied for the outside panel of a mobile phone, and its demand will be gradually increased in the various fields. It is manufactured by the vapor deposition method in the vacuum state, and the uniformity of thin film on the substrate depends on the temperature distribution in the point-cell source. This paper describes the basic concepts that are obtained to design the point-cell source using the computational temperature analysis. The grids are generated using the module of AUTOHEXA in the ICEM CFD program and the temperature distributions are numerically obtained using the STAR-CD program. The temperature profiles are calculated for four cases, i.e., the charge rate for the source in the crucible, the ratio of diameter to height of the crucible, the ratio of interval to height of the heating bands, and the geometry modification for the basic crucible. As a result, the blowout phenomenon can be shown when the charge rate for the source increases. The temperature variation in the radial direction is decreased as the ratio of diameter to height is decreased and it is suggested that the thin film thickness can be uniformed. In case of using one heating band, the blowout can be shown as the higher temperature distribution in the center part of the source, and the clogging can appear in the top end of the crucible in the lower temperature. The phenomena of both the blowout and the clogging in the modified crucible with the nozzle-diffuser can be prevented because the temperature in the upper part of the crucible is higher than that of other parts and the temperature variation in the radial direction becomes small.

Growth and Chrarcterization of $SiO_x$ by Pulsed ECR Plasma (Pulsed ECR PECVD를 이용한 $SiO_x$ 박막의 성장 및 특성분석)

  • Lee, Ju-Hyeon;Jeong, Il-Chae;Chae, Sang-Hun;Seo, Yeong-Jun;Lee, Yeong-Baek
    • Korean Journal of Materials Research
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    • v.10 no.3
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    • pp.212-217
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    • 2000
  • Dielectric thin films for TFT(thin film transistor)s, such as silicon nitride$(Si_3N_4)$ and silicon oxide$(SiO_2)$, are usually deposited at $200~300^{\circ}C$. In this study, authors have tried to form dielectric films not by deposition but by oxidation with ECR(Electron Cyclotron Resonance) oxygen plasma, to improve the interface properties was not intensionally heated during oxidation. THe oxidation was performed consecutively without breaking vacuum after the deposition of a-Si: H films on the substrate to prevent the introduction of impurities. In this study, especially pulse mode of microwave power has been firstly tried during FCR oxygen plasma formation. Compared with the case of the continuous wave mode, the oxidation with the pulsed ECR results in higher quality silicon oxide$SiO_X$ films in terms of stoichiometry of bonding, dielectric constants and surface roughness. Especially the surface roughness of the pulsed ECR oxide films dramatically decreased to one-third of that of the continuous wave mode cases.

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Characteristics of Low Dielectric Constant SiOF Thin Films with Post Plasma Treatment Time (플라즈마 후처리 시간에 따른 저유전율 SiOF 박막의 특성)

  • Lee, Seok Hyeong;Park, Jong Wan
    • Journal of the Korean Vacuum Society
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    • v.7 no.3
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    • pp.267-267
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    • 1998
  • The fluorine doped silicon oxide (SiOF) intermetal dielectric (IMD) films have been of interest due to their lower dielectric constant and compatibility with existing process tools. However instability issues related to bond and increasing dielectric constant to water absorption when the SiOF films was exposured to atmospheric ambient. Therefore, the purpose of this research is to study the effect of post oxygen plasma treatment on the resistance of moisture absorption and reliability of SiOF film. Improvement of moisture absorption resistance of SiOF film is due to the forming of thin SiO₂layer at the SiOF film surface. It is thought that the main effect of the improvement of moisture absorption resistance was densification of the top layer and reduction in the number of Si-F bonds that tend to associate with OH bonds. However, the dielectric constant was increased when plasma treatment time is above 5 min. In this study, therefore, it is thought that the proper plasma treatment time is 3 min when plasma treatment condition is 700 W of microwave power, 3 mTorr of process pressure and 300℃ of substrate temperature.

W 도핑된 ZnO 박막을 이용한 저항 변화 메모리 특성 연구

  • Park, So-Yeon;Song, Min-Yeong;Hong, Seok-Man;Kim, Hui-Dong;An, Ho-Myeong;Kim, Tae-Geun
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.410-410
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    • 2013
  • Next-generation nonvolatile memory (NVM) has attracted increasing attention about emerging NVMs such as ferroelectric random access memory, phase-change random access memory, magnetic random access memory and resistance random access memory (RRAM). Previous studies have demonstrated that RRAM is promising because of its excellent properties, including simple structure, high speed and high density integration. Many research groups have reported a lot of metal oxides as resistive materials like TiO2, NiO, SrTiO3 and ZnO [1]. Among them, the ZnO-based film is one of the most promising materials for RRAM because of its good switching characteristics, reliability and high transparency [2]. However, in many studies about ZnO-based RRAMs, there was a problem to get lower current level for reducing the operating power dissipation and improving the device reliability such an endurance and an retention time of memory devices. Thus in this paper, we investigated that highly reproducible bipolar resistive switching characteristics of W doped ZnO RRAM device and it showed low resistive switching current level and large ON/OFF ratio. This may be caused by the interdiffusion of the W atoms in the ZnO film, whch serves as dopants, and leakage current would rise resulting in the lowering of current level [3]. In this work, a ZnO film and W doped ZnO film were fabricated on a Si substrate using RF magnetron sputtering from ZnO and W targets at room temperature with Ar gas ambient, and compared their current levels. Compared with the conventional ZnO-based RRAM, the W doped ZnO ReRAM device shows the reduction of reset current from ~$10^{-6}$ A to ~$10^{-9}$ A and large ON/OFF ratio of ~$10^3$ along with self-rectifying characteristic as shown in Fig. 1. In addition, we observed good endurance of $10^3$ times and retention time of $10^4$ s in the W doped ZnO ReRAM device. With this advantageous characteristics, W doped ZnO thin film device is a promising candidates for CMOS compatible and high-density RRAM devices.

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Effect of Major Factors on the Spray Characteristics of Ultrasonic Atomizing Nozzle (초음파 미립화 노즐의 분무 특성에 미치는 주요 인자의 영향)

  • Jeong, Seon Yong;Lee, Kye Bock
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.18 no.6
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    • pp.1-7
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    • 2017
  • The atomization of a liquid into multiple droplets has many important industrial applications, including the atomization of fuels in combustion processes and coating of surfaces and particles. Ultrasonic atomizing nozzle has a transducer that receives electrical input in the form of a high frequency signal from a power generator and converts that into mechanical energy at the same frequency. Liquid is atomized into a fine mist spray using high frequency sound vibrations. In coating applications, the unpressurized, low-velocity spray reduces the amount of overspray significantly because the droplets tend to settle on the substrate, rather than bouncing off it. The spray can be controlled and shaped precisely by entraining the slow-moving spray in an ancillary air stream using specialized types of spray-shaping equipment. The desired patterns of spray can be obtained using an air stream. To simulate the water mist behavior of an ultrasonic atomizing nozzle using an air stream, the Lagrangian dispersed phase model was employed using the commercial code FLUENT. The effects of the nozzle contraction shape, water droplet size and the pneumatic pressure drop on the spray characteristics were investigated to obtain the optimal condition for coating applications.

A Study on the Konjak Mannan-hydrolyzing Enzymes from Aspergillus awamori (Aspergillus awamori 가 생산하는 konjak mannan 분해효소에 관한 연구)

  • Chang, Kyung-Jung;Lee, Su-Rae
    • Applied Biological Chemistry
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    • v.15 no.3
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    • pp.199-206
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    • 1972
  • As a study on the konjak mannan-hydrolyzing enzymes from Aspergillus awamori, the culture conditions for enzyme formation, purification and properties of the enzymes and the effect of gamma-irradiation on the enzymatic hydrolysis were investigated. The results are summarized as follows: 1) A strain of A. awamori was selected as having the highest productivity of mannanase among 81 species of molds. 2) The optimum conditions for solid culture on wheat bran were 3 days of culture period, pH 4 of spraying water and 100% addition of tap water. 3) The optimum conditions for shaking culture were 6 days of culture period, addition of 0.1% xylose plus 0.5% konjak mannan and of 0.04% peptone. 4) Konjak mannan-hydrolyzing enzymes were separated into fraction I and fraction II by ammonium sulfate fractionation and DEAE-Sephadex column chromatography. 5) Fractions I and II showed pH optima of 4, pH stability of $3.5{\sim}5$ and $3{\sim}6$ and the extent of hydrolyzing konjak mannan 9% and 50%, respectively. 6) Hydrolysis of konjak mannan by a crude enzyme preparation was partially accerelated by gamma-irradiation of substrate above 0.5 Mrad and the effect was more remarkable by irradiating in wet state than in dry state. 7) Gamma-irradiation of konjak mannan brought about the increase in reducing power and decrease in viscosity and the effect was more remarkable in wet state than in dry state.

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A Review : On Exercise Performance Induction Gene Factors Change (운동이 유전자 조절물질에 미치는 영향에 관한 고찰)

  • Um, Ki-Mai;Yang, Yoon-Kwon;Kim, Tae-Woo
    • Journal of Korean Physical Therapy Science
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    • v.8 no.1
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    • pp.745-758
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    • 2001
  • The purpose of study to phenomenological examine and the mechanism regarding the gene(DNA, RNA, Protein) and sports to studied, analyzed. and evaluated. This review considers the evidence for genetic effects in several determinants of endurance performance and resistance performance, namely: body measurements and physique, body fat pulmonary functions, cardiac and circulatory functions, muscle characteristics. substrate utilization, maximal aerobic power and other. Moreover, the response to aerobic training of indicators aerobic work metabolism and endurance performance is reviewed, with emphasis on the specificity of the response and the individual differences observed in training ability. This study indicate that improvement of 'Enhancer Action' in RNA genes changed by exercise or sports. Moreover exercise was effect on Central Dogma with DNA makes RNA makes Protein. and think that occurred with exercise influence on skeletal muscle into cell have to Myosin Heavy Chain (MHC) changed was after exercise performance, which accompanied into skeletal muscle that were exercise-induces gene-modulation that is, take gene mutations. This study known that existed hormone(epinephrine)-immune system with interaction. Exercise were altered insulin binding and MAP Kinase signaling increased into immune cells. This review suggested that the high rate of glutamine utilization by cells of the immune system serves to maintain a high intra cellular concentration of the intermediates of biosynthetic pathways such that optimal rates of DNA, RNA and protein synthesis can be maintained. In the absence of glutamine, lymphocytes do not proliferate in vitro: proliferation increase greatly as the glutamine concentration increase. Glutamine is synthesized in skeletal muscle. Skeletal muscle and plasma glutamine levels are lowered by sepsis, injury, bums, surgery and endurance exercise and in the overtrained athlete. The study of result show that production of ET-1 is markedly increased tissue specifically in the heart by exercise without appreciable changes in endothelin-converting enzyme and endothelial receptor expressions, suggest that myocardial ET-1 may participate in modulation of cardiac function during exercise. Conclusionally, this study indicate that improvement of 'Enhancer Action' in RNA genes changed by exercise or sports. Moreover exercise was effect on Central Dogma with DNA makes RNA makes Protein. This study is expected to contribute the area of sports science, medicine, hereafter more effort is required to establish the relation between gene alters and exercise amount.

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A Study on the Optimization of the SiNx:H Film for Crystalline Silicon Sloar Cells (결정질 실리콘 태양전지용 SiNx:H 박막 특성의 최적화 연구)

  • Lee, Kyung-Dong;Kim, Young-Do;Dahiwale, Shailendra S.;Boo, Hyun-Pil;Park, Sung-Eun;Tark, Sung-Ju;Kim, Dong-Hwan
    • Journal of the Korean Vacuum Society
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    • v.21 no.1
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    • pp.29-35
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    • 2012
  • The Hydrogenated silicon nitride (SiNx:H) using plasma enhanced chemical vapor deposition is widely used in photovoltaic industry as an antireflection coating and passivation layer. In the high temperature firing process, the $SiN_x:H$ film should not change the properties for its use as high quality surface layer in crystalline silicon solar cells. Initially PECVD-$SiN_x:H$ film trends were investigated by varying the deposition parameters (temperature, electrode gap, RF power, gas flow rate etc.) to optimize the process parameter conditions. Then by varying gas ratios ($NH_3/SiH_4$), the hydrogenated silicon nitride films were analyzed for its optical, electrical, chemical and surface passivation properties. The $SiN_x:H$ films of refractive indices 1.90~2.20 were obtained. The film deposited with the gas ratio of 3.6 (Refractive index=1.98) showed the best properties in after firing process condition. The single crystalline silicon solar cells fabricated according to optimized gas ratio (R=3.6) condition on large area substrate of size $156{\times}156mm$ (Pseudo square) was found to have the conversion efficiency as high as 17.2%. Optimized hydrogenated silicon nitride surface layer and high efficiency crystalline silicon solar cells fabrication sequence has also been explained in this study.

Optical and Electrical Characteristics of GaN-based Blue LEDs after Low-current Stress (GaN계 청색 발광 다이오드에서 저전류 스트레스 후의 광 및 전기적 특성 변화)

  • Kim, Seohee;Yun, Joosun;Shin, Dong-Soo;Shim, Jong-In
    • Korean Journal of Optics and Photonics
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    • v.23 no.2
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    • pp.64-70
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    • 2012
  • We analyzed the changes in electrical and optical characteristics of 1 $mm^2$ multiple-quantum-well (MQW) blue LEDs grown on a c-plane sapphire substrate after a stress test. Experiments were performed by injecting 50 mA current for 200 hours to TO-CAN packaged sample chips. We selected the value of injection current for stress through the junction-temperature measurement by using the forward-voltage characteristics of a diode to maintain a sufficiently low junction temperature during the test. The junction temperature at the selected injection current of 50 mA was 308 K. Experiments were performed under the assumption that the average junction temperature of 308 K did not affect the characteristics of the ohmic contact and the GaN-based materials. Before and after the stress test, we measured and analyzed current-voltage, light-current, light distribution on the LED surface, wavelength spectrum and relative external quantum efficiency (EQE). After the stress test, it was observed experimentally that the optical power and the relative EQE decreased. We theoretically investigated and experimentally proved that these phenomena are due to the increased nonradiative recombination rate caused by the increased defect density.