• Title/Summary/Keyword: Substrate cells temperature

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Studies on the ${\beta}-Galactosidase$ Activity of Whole Cell Aspergillus Phoenicis (Aspergillus Phoenicis Whole Cell의 ${\beta}-Galactosidase$ 활성(活性)에 관한 연구(硏究))

  • Kim, Mal-Nam
    • The Korean Journal of Mycology
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    • v.11 no.3
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    • pp.109-114
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    • 1983
  • ${\beta}-Galactosidase$ activity of Aspergillus phoenicis was studied using ONPG and lactose as substrate. It increased monotonically during the exponential growth phase and dropped rapidly at the beginning of the stationary one. It exhibited high tolerable temperature and acidic optimal pH which provides certain advantages from the industrial view point. Enzyme of ${\beta}-galactosidase$ had more subsrate affinity for ONPG than for lactose and its apparent maximum activity was also higher with the former as substrate. Activity of this enzyme depended upon the conditions of immobilization. Optimum crosslinking reaction was occurred at pH 7.2 and 0. 35 vol. % of glutaraldehyde concentration.

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Electrical and Optical properties of TiO2-doped ZnO Films prepared on PEN by RF-magnetron Sputtering Method (고주파 마그네트론 스퍼터링에 의해 성막된 TiO2가 도핑된 ZnO 박막의 전기적 및 광학적 특성)

  • Kim, Hwa-Min;Sohn, Sun-Young
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.22 no.10
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    • pp.837-843
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    • 2009
  • $TiO_2$(2 wt.%)-doped ZnO(TZO) films with thickness from 100 nm to 500 nm were prepared on polyethylene naphthalate(PEN) substrate under various rf-power range from 40 W to 80 W. Their electrical and optical properties were investigated as a function of rf-power. We think that these properties were closely related with the crystallization and the film density of TZO films. It was also presumed that the vaporization of the water vapor and other adsorbed particles such as an organic solvents can affect the electrical properties of the conventional transparent conductive oxide(TCO) films. On the other hand, since the TZO film deposited on glass substrate at room temperature with rf-power of 80 W shows a very low resistivity of $7.5\times10^{-4}\;\Omega{\cdot}cm$ and a very excellent transmittance over an average 85% in the visible range, that is comparable to that of ITO films. Therefore, we expect that the TZO films can be used as transparent electrode for optoelectronic devices such as touch-panels, flat-panel displays, and thin-film solar cells.

Production of L-sorbose from the resting cells of Acetobacter suboxydans (Acetobacter suboxydans의 휴지 균체에 의한 L-sorbose의 생산)

  • Cho, Won-Dai;Ma, Sang-Jo
    • Applied Biological Chemistry
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    • v.36 no.6
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    • pp.481-487
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    • 1993
  • The production of sorbose from sorbitol in resting cell system of Acetobacter suboxydans was studied. The conversion of sorbose from sorbitol was markedly influenced by several factors such as the substrate concentration, reaction time, temperature, pH, metal ions, growth factors and aeration in the resting cells. Sorbose production rapidly increased in the range of 6 mg/ml cells with the concentration of 5% sorbitol. For production of sorbose from sorbitol, optimal temperature and pH were $30^{\circ}C$ and 6.0. The production of sorbose from sorbitol was activated by 1 mM of $Al^{+3}$ while inhibited by $Ni^{+2}$. The conversion of sorbitol to sorbose was stimulated by the adding of 1 mM p-aminobenzoic acid and nicotinic acid, respectively. During incubation of 1.5 ml of reaction mixture in 50 ml of Erlenmeyer flask, 5% sorbitol was completly converted to sorbose after 20 hours.

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Low Temperature Deposition of Microcrystalline Silicon Thin Films for Solar Cells (태양전지용 미세결정 실리콘 박막의 저온 증착)

  • Lee, J.C.;Yoo, J.S.;Kang, K.H.;Kim, S.K.;Yoon, K.H.;Song, J.;Park, I.J.
    • Proceedings of the KIEE Conference
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    • 2002.07c
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    • pp.1555-1558
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    • 2002
  • This paper presents deposition and characterizations of microcrystalline silicon(${\mu}c$-Si:H) films prepared by hot wire chemical vapor deposition at substrate temperature below $300^{\circ}C$. The $SiH_4$ Concentration$[F(SiH_4)/F(SiH_4)+F(H_2)]$ is critical parameter for the formation of Si films with microcrystalline phase. At 6% of silane concentration, deposited intrinsic ${\mu}c$-Si:H films shows sufficiently low dark conductivity and high photo sensitivity for solar cell applications. P-type ${\mu}c$-S:H films deposited by Hot-Wire CVD also shows good electrical properties by varying the rate of $B_2H_6$ to $SiH_4$ gas. The solar cells with structure of Al/nip ${\mu}c$-Si:H/TCO/glass was fabricated with sing1e chamber Hot-Wire CVD. About 3% solar efficiency was obtained and applicability of HWCVD for thin film solar cells was proven in this research.

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Oxygen detection of sensor cells based on YSZ (Yttria-Stabilized Zirconia) thin films (YSZ(yttria-stabilized zirconia) 박막을 이용한 센서 셀의 산소 감응)

  • 박준용;배정운;황순원;김기동;조영아;전진석;최동수;염근영
    • Journal of the Korean Vacuum Society
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    • v.8 no.4B
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    • pp.507-513
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    • 1999
  • 8mol%-yttria-stabilized zirconia(YSZ) thin films as oxygen ion conductor were deposited by rf-magnetron sputtering, and the oxygen gas sensors with the structure of $SiO_2$ substrate/Ni-NiO mixed reference layer/Pt/YSZ/Pt were fabricated and their oxygen sensing properties were investigated. The steady-state electro-motive force (EMF) values were measured as a function of oxygen partial pressure ($PO_2;form 1.013\times10^3 \textrm{Pa \;to}\; 1.013\times10^5$Pa) and operating temperature ($300^{\circ}C$ to $700^{\circ}C$). The fabricated YSZ oxygen sensor showed the best oxygen sensing properties at 50$0^{\circ}C$. However, oxygen sensing properties were very low at the temperature lower than 30$0^{\circ}C$ due to the lack of oxygen ion mobility and at the temperature higher than $700^{\circ}C$ due 새 intermixing of materials between the layers. Especially, the YSZ sensor operating at $500^{\circ}C$ and oxygen partial pressure above $1.565\times10^4$Pa showed the oxygen sensing properties close to the values predicted by ideal Nernst equation.

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Fast and Low Temperature Deposition of Polycrystalline Silicon Films by Hot Wire CVD (Hot Wire CVD를 이용한 다결정 Si 박막의 고속 저온 증착)

  • Lee, Jeong-Chul;Kang, Ki-Whan;Kim, Seok-Ki;Yoon, Kyung-Hoon;Song, Jin-Soo;Park, I-Jun
    • Proceedings of the KIEE Conference
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    • 2001.07c
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    • pp.1427-1429
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    • 2001
  • Polycrystalline silicon(poly-Si) films are deposited on low temperature glass substrate by Hot-Wire CVD(HWCVD). The structural properties of the poly-Si films are strongly dependent on the wire temperature($T_w$). The films deposited at high $T_w$ of 2000$^{\circ}C$ have superior crystalline properties; average lateral grain sizes are larger than $1{\mu}m$ and there at·e no vertical grain boundaries. The surface of the high $T_w$ samples are naturally textured like pyramid shape. These large grain size and textured surface are believed to give high current density when applied to solar cells. However, the poly-si films are structurally porous and contains high defect density, by which high concentration of C and O resulted within the films by air-penetration after removed from chamber.

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Influence of RTA treatments on optical properties of ZnO nanorods synthesized by wet chemical method

  • Shan, Qi;Ko, Y.H.;Lee, H.K.;Yu, J.S.
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.190-190
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    • 2010
  • Zinc oxide is the most attractive material due to the large direct band gap (3.37 eV), excellent chemical and thermal stability, and large exciton binding energy (60 meV). Recently, ZnO nanorods were used as the high efficient antireflection coating layer of solar cells based on silicon (Si). In this reports, we studied the effects of rapid thermal annealing (RTA) treatment on optical properties of ZnO nanorods. For fabrication of ZnO nanorods, there are many methods such as hydrothermal method, sol-gel method, and metal organic chemical vapor deposition method. Among of them, we used the conventional wet chemical method which is simple and low temperature growth. In order to synthesize the ZnO nanorods, the ZnO films were deposited on Si substrate by RF magnetron sputtering at room temperature and the samples were dipped to aqua solution containing the zinc nitrate and hexamethylentetramines (HMT). The synthesis process was achieved in keeping with temperature of $90-95^{\circ}C$ and under constant stirring. The morphology of ZnO nanorods on glass and Si was characterized by scanning electron microscopy. For the analysis of antireflection performance, the reflectance and transmittance were measured by spectrophotometer. And for analyzing the effects of RTA treatment on ZnO nanorods, crystalline properties were investigated by X-ray diffraction measurements and optical properties was estimated by photoluminescence spectra.

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A Study on $TiO_2$ Thin Film by PLD for Buffer Layer between Mesoproso $TiO_2$ and FTO of Dye-sensitized Solar Cell (염료 감응형 태양전지에서 Mesoproso $TiO_2$/FTO 사이에 완충층으로써의 PLD로 증착한 $TiO_2$ 박막에 관한 연구)

  • Song, Sang-Woo;Kim, Sung-Su;Roh, Ji-Hyoung;Lee, Kyung-Ju;Moon, Byung-Moo;Kim, Hyun-Ju
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.11a
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    • pp.424-424
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    • 2008
  • Dye-sensitized Solar Cell (DSC) is a new type of solar cell by using photocatalytic properties of $TiO_2$. The electric potential distribution in DSCs has played a major role in the operation of such cells. Models based on a built-in electric field which sets the upper limit for the open circuit voltage(Voc) and/or the possibility of a Schottky barrier at the interface between the mesoporous wide band gap semiconductor and the transparent conducting substrate have been presented. $TiO_2$ thin films were deposited on the FTO substrate by Nd:YAG Pulsed Laser Deposition(PLD) at room temperature and post-deposition annealing at $500^{\circ}C$ in flowing $O_2$ atmosphere for 1 hour. The structural properties of $TiO_2$ thin films have investigated by X-ray diffraction(XRD) and atomic force microscope(AFM). Thickness of $TiO_2$ thin films were controlled deference deposition time and measurement by scanning electron microscope(SEM). Then we manufactured a DSC unit cells and I-V and efficiency were tested using solar simulator.

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Molybdenum Oxides as Diffusion Barrier Layers against MoSe2 Formation in A Nonvacuum Process for CuInSe2 Solar Cells (비진공법 CuInSe2 태양전지에서 MoSe2의 생성을 억제하기 위한 산화 몰리브데늄 확산장벽 층)

  • Lee, Byung-Seok;Lee, Doh-Kwon
    • Current Photovoltaic Research
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    • v.3 no.3
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    • pp.85-90
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    • 2015
  • Two-step processes for preparing $Cu(In,Ga)Se_2$ absorber layers consist of precursor layer formation and subsequent annealing in a Se-containing atmosphere. Among the various deposition methods for precursor layer, the nonvacuum (wet) processes have been spotlighted as alternatives to vacuum-based methods due to their potential to realize low-cost, scalable PV devices. However, due to its porous nature, the precursor layer deposited on Mo substrate by nonvacuum methods often suffers from thick $MoSe_2$ formation during selenization under a high Se vapor pressure. On the contrary, selenization under a low Se pressure to avoid $MoSe_2$ formation typically leads to low crystal quality of absorber films. Although TiN has been reported as a diffusion barrier against Se, the additional sputtering to deposit TiN layer may induce the complexity of fabrication process and nullify the advantages of nonvacuum deposition of absorber film. In this work, Mo oxide layers via thermal oxidation of Mo substrate have been explored as an alternative diffusion barrier. The morphology and phase evolution was examined as a function of oxidation temperature. The resulting Mo/Mo oxides double layers were employed as a back contact electrode for $CuInSe_2$ solar cells and were found to effectively suppress the formation of $MoSe_2$ layer.

Effect of the Deposition Time onto Structural Properties of Cu2ZnSnS4 Thin Films Deposited by Pulsed Laser Deposition (펄스 레이저 증착법으로 제작한 Cu2ZnSnS4 박막의 구조 특성 변화에 대한 증착 시간 효과)

  • Byeon, Mirang;Bae, Jong-Seong;Hong, Tae-Eun;Jeong, Euh-Duck;Kim, Shinho;Kim, Yangdo
    • Korean Journal of Materials Research
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    • v.23 no.1
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    • pp.7-12
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    • 2013
  • The $Cu_2ZnSnS_4$ (CZTS) thin film solar cell is a candidate next generation thin film solar cell. For the application of an absorption layer in solar cells, CZTS thin films were deposited by pulsed laser deposition (PLD) at substrate temperature of $300^{\circ}C$ without post annealing process. Deposition time was carefully adjusted as the main experimental variable. Regardless of deposition time, single phase CZTS thin films are obtained with no existence of secondary phases. Irregularly-shaped grains are densely formed on the surface of CZTS thin films. With increasing deposition time, the grain size increases and the thickness of the CZTS thin films increases from 0.16 to $1{\mu}m$. The variation of the surface morphology and thickness of the CZTS thin films depends on the deposition time. The stoichiometry of all CZTS thin films shows a Cu-rich and S-poor state. Sn content gradually increases as deposition time increases. Secondary ion mass spectrometry was carried out to evaluate the elemental depth distribution in CZTS thin films. The optimal deposition time to grow CZTS thin films is 150 min. In this study, we show the effect of deposition time on the structural properties of CZTS thin film deposited on soda lime glass (SLG) substrate using PLD. We present a comprehensive evaluation of CZTS thin films.