• Title/Summary/Keyword: Strong field tunneling

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Theoretical Study of the Strong Field Emission of Electrons inside a Nanogap Due to an Enhanced Terahertz Field

  • Choi, Soo Bong;Byeon, Clare Chisu;Park, Doo Jae
    • Current Optics and Photonics
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    • v.2 no.6
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    • pp.508-513
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    • 2018
  • We report the development of a theoretical model describing the strong field tunneling of electrons in an extremely small nanogap (having a width of a few nanometers) that is driven by terahertz-pulse irradiation, by modifying a conventional semiclassical model that is widely applied for near-infrared wavelengths. We demonstrate the effects of carrier-envelope phase difference and strength of the incident THz field on the tunneling current across the nanogap. Additionally, we show that the dc bias also contributes to the generation of tunneling current, but the nature of the contribution is completely different for different carrier-envelope phases.

Thermally Assisted Carrier Transfer and Field-induced Tunneling in a Mg-doped GaN Thin Film (Mg가 첨가된 GaN 박막에서 캐리어 전이의 열적도움과 전계유도된 터러링 현상)

  • Chung, Sang-Geun;Kim, Yoon-Kyeom;Shin, Hyun-Gil
    • Korean Journal of Materials Research
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    • v.12 no.6
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    • pp.431-435
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    • 2002
  • The dark current and photocurrent(PC) spectrum of Mg-doped GaN thin film were investigated with various bias voltages and temperatures. At high temperature and small bias, the dark current is dominated by holes thermally activated from an acceptor level Al located at about 0.16 eV above the valence band maximum $(E_v)$, The PC peak originates from the electron transition from deep level A2 located at about 0.34 eV above the $E_v$ to the conduction band minimum $(E_ C)$. However, at a large bias voltage, holes thermally activated from A2 to Al experience the field-in-duces tunneling to form one-dimensional defect band at Al, which determines the dark current. The PC peak associated with the transition from Al to $E_ C$ is also observed at large bias voltages owing to the extended recombination lifetime of holes by the tunneling. In the near infrared region, a strong PC peak at 1.20 eV appears due to the hole transition from deep donor/acceptor level to the valence band.

Properties and Applications of Magnetic Tunnel Junctions

  • Reiss, G.;Bruckl, H.;Thomas, A.;Justus, M.;Meyners, D.;Koop, H.
    • Journal of Magnetics
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    • v.8 no.1
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    • pp.24-31
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    • 2003
  • The discoveries of antiferromagnetic coupling in Fe/Cr multilayers by Grunberg, the Giant Magneto Resistance by Fert and Grunberg and a large tunneling magnetoresistance at room temperature by Moodera have triggered enormous research on magnetic thin films and magnetoelectronic devices. Large opportunities are especially opened by the spin dependent tunneling resistance, where a strong dependence of the tunneling current on an external magnetic field can be found. We will briefly address important basic properties of these junctions like thermal, magnetic and dielectric stability and discuss scaling issues down to junction sizes below 0.01 $\mu\textrm{m}$$^2$with respect to single domain behavior, switching properties and edge coupling effects. The second part will give an overview on applications beyond the use of the tunneling elements as storage cells in MRAMs. This concerns mainly field programmable logic circuits, where we demonstrate the clocked operation of a programmed AND gate. The second 'unconventional' feature is the use as sensing elements in DNA or protein biochips, where molecules marked magnetically with commercial beads can be detected via the dipole stray field in a highly sensitive and relatively simple way.

Electrical Characteristics of Tunneling Field-effect Transistors using Vertical Tunneling Operation Based on AlGaSb/InGaAs

  • Kim, Bo Gyeong;Kwon, Ra Hee;Seo, Jae Hwa;Yoon, Young Jun;Jang, Young In;Cho, Min Su;Lee, Jung-Hee;Cho, Seongjae;Kang, In Man
    • Journal of Electrical Engineering and Technology
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    • v.12 no.6
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    • pp.2324-2332
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    • 2017
  • This paper presents the electrical performances of novel AlGaSb/InGaAs heterojunction-based vertical-tunneling field-effect transistor (VTFET). The device performance was investigated in views of the on-state current ($I_{on}$), drain-induced barrier thinning (DIBT), and subthreshold swing (SS) as the gate length ($L_G$) was scaled down. The proposed TFET with a $L_G$ of 5 nm operated with an $I_{on}$ of $1.3mA/{\mu}m$, a DIBT of 40 mV/V, and an SS of 23 mV/dec at a drain voltage ($V_{DS}$) of 0.23 V. The proposed TFET provided approximately 25 times lower DIBT and 12 times smaller SS compared with the conventional $L_G$ of 5 nm TFET. The AlGaSb/InGaAs VTFET showed extremely high scalability and strong immunity against short-channel effects.

$NiFe/Co/Al_2O_3/Co/IrMn$ 접합의 터널링 자기저항효과

  • 홍성민;이한춘;김택기
    • Journal of the Korean Magnetics Society
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    • v.9 no.6
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    • pp.291-295
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    • 1999
  • $NiFe/Co/Al_2O_3/Co/IrMn$ tunneling junctions were grown on (100)Si wafer and their spin-valve tunneling magnetoresistance (TMR) was studied. The tunneling junctions were grown by using a 5-gun RF/DC magnetron sputter. $Al_2O_3$ barrier layer was formed by exposing Al layer to oxygen atmosphere at 6$0^{\circ}C$ for 72 hours. Strong exchange coupling interaction is observed between the ferromagnetic Co and the antiferromagnetic IrMn of Co/IrMn bilayer when IrMn is 100$\AA$ thick. $NiFe(183\;{\AA})/Co(17\;{\AA})/Al_2O_3(16\;{\AA})/Co(100\;{\AA})/IrMn(100\;{\AA})$ tunneling junction shows best TMR ratio of about 10% in the applied magnetic field range of $\pm$20 Oe. The TMR ratio is improved about 23% and electrical resistance is decreased about 34% when annealed at 200 $^{\circ}C$ for 1 hour in magnetic field of 330 Oe, parallel to the bottom electrode. With increasing the active area of junction the TMR ratio increases while electrical resistance decreases.

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A Study of Rockbursts Within a Deep Mountain TBM Tunnel (산악 TBM 터널에서 발생한 암반파열 현상에 대한 연구)

  • Lee, Seong-Min;Park, Boo-Seong
    • Journal of the Korean Geotechnical Society
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    • v.19 no.6
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    • pp.39-47
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    • 2003
  • Rockbursts are mainly caused by a sudden release or the stored strain energy in the rock mass. They have been the major hazard in deep hard rock mines but rarely occur in tunnels. Due to the short history and limited information on rockbursts, the topic has rarely been studied in Korea. Some cases of rockbursts, however, have been reported during construction of a mountain tunnel for waterway. This study focuses on analyzing data on rockbursts obtained from a TBM (Tunnel Boring Machine) tunnel and suggests methods for a comprehensive understanding on rockbursts. From the analysis of the field data of rockbursts, it was found that most rockbursts mainly occurred at the section between the tunnel face and the TBM operating room, and the rock bursting phenomena lasted up to 20 days after excavation in certain areas. The data also show that the bursting spots are located all around the tunnel surface including the face, the wall, and the roof, The maximum size of bursting spots is usually less than 100cm. This study also suggests new scale systems of brittleness and uniaxial compressive strength to evaluate the possible tendency for a rockburst. These systems are scaled based on the scale system of strain energy density. In addition, with these scale systems, this research shows that there are potentially higher tendencies for rockbursts in this specific tunnel. Moreover this research suggests that properties of rock and rock mass, RMR (Rock Mass Rating) value, tunneling method, excavating speed, and depth of tunnel have a strong correlation with rockbursts.