• Journal of the Korean Magnetics Society
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• v.13 no.3
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• pp.103-108
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• 2003

A micromagnetic model and a Stoner-Wohlfarth model are used to analyze the effect of demagnetization field in patterned permalloy films. Permalloy films of 20 $\mu\textrm{m}$${\times}$(40 $\mu\textrm{m}$∼200 $\mu\textrm{m}$) are fabricated by DC magnetron sputtering and photo lithography. Measured magnetoresistance data of patterned permalloy films are compared with simulation results. The micromagnetic model gives a better agreement with the measured MR data than the Stoner-Wohlfarth model. Based on the simulation results, we propose a revised approximation formula for dernagnetization field in Stoner- Wohlfarth model for a few fm patterned magnetic films.