• 소음진동
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• 제9권4호
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• pp.643-651
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• 1999

A brief description of the current technology (contact-start-stop) employed in most of today's hard disk drive is presented. The dynamics and head/disk interactions during a start/stop process are very complicated and no one has been able to accurately model the interactions. Thus, the head/disk interface that meets the start/stop durability and stiction requirements are always developed statistically. In arriving at a solution. many sets of statistical tests are run by varying several parameters. such as, the carbon overcoat thickness. lubricant thickness. disk surface roughness, etc. Consequently, the cost associated III developing an interface could be significant since the outcome is difficult to predict. An alternative method known as Load/Unload technology alters the problem set. such that. the start/stop performance can be designed in a predictable manner. Although this techno¬logy offers superior performance and significantly reduces statistical testing time, it also has some potential problems. However. contrary to the CSS technology. most of the problems can be solved by design and not by trial and error. One critical problem is that of head/disk contacts during the loading and unloading processes. These contact can cause disk and slider damage because the contacts are likely to occur at high disk speeds resulting in large friction forces. Use of glass substrate disks also may present problems if not managed correctly. Due to the low thermal conductivity of glass substrates. any head/disk contacts may result in erasure due to frictional heating of the head/disk interface. In spite of these and other potential problems. the advantage with L/UL system is that these events can be understood. analyzed. and solved in a deterministic manner.

• Tribology and Lubricants
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• 제19권4호
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• pp.230-236
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• 2003

In applications such as MEMS and NEMS devices, the adhesion force and contact load may be of the same order of magnitude and the static friction coefficient can be very large. Such large coefficient may result in unacceptable and possibly catastrophic adhesion, stiction, friction and wear. To obtain the static friction coefficient of contacting real surfaces without the assumption of an empirical coefficient value, numerical simulations of the contact load, tangential force, and adhesion force are preformed. The surfaces in dry contact are statistically modeled by a collection of spherical asperities with Gaussian height distribution. The asperity micro-contact model utilized in calculation (the ZMC model), considers the transition from elastic deformation to fully plastic flow of the contacting asperity. The force approach of the modified DMT model using the Lennard-Jones attractive potential is applied to characterize the intermolecular forces. The effect of the surface topography on the static friction coefficient is investigated for cases rough, intermediate, smooth, and very smooth, respectively. Results of the static friction coefficient versus the external force are presented for a wide range of plasticity index and surface energy, respectively. Compared with those obtained by the GW and CEB models, the ZMC model is more complete in calculating the static friction coefficient of rough surfaces.

• 대한기계학회:학술대회논문집
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• 대한기계학회 2003년도 춘계학술대회
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• pp.1073-1077
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• 2003

This study aims to investigate the fabrication process of nano silicon mold using electron beam lithography (EBL) to generate the nanometer level patterns by nano-imprinting technology. the nano-patterned mold including 100mm pattern size has been fabricated by EBL with different doses ranged from 22 to 38 ${\mu}C/cm^2$ on silicon using the conventional polymethylmetharcylate(PMMA) resist. The silicon mold is fabricated with various patterns such as circles, rectangles, crosses, oblique lines and mixed forms, The effect of dosage on pattern density in EBL is discussed based on SEM (Scannning Electron Microscopy) analysis of fabricated molds. The mold surface is modified by hydrophobic fluorocarbon (FC) thin films to avoid the stiction during nano-imprinting process.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 1996년도 춘계학술대회 논문집
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• pp.146-150
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• 1996

A thermal micro actualtor has been fabricated using surface micromachining techniques. It consists of doped ploysilicon as a moving part and TEOS(Tetra Ethyl Ortho Silicate) as a sacrificial layer. The polysilicon was annealed for the reduction of residual stress which is the main cause to its deformation such as bending and buckling. And the newly developed HF VPE(vapor phase etching)process was also used as an effective release method for the elimination of sacrificaial layer. With noliquid involved during any of the steps for relasing, unlike other reported relase techniques, the HF VPE pocess has produced polysilicon microstructures with virtually no process-induced stiction problem. The actuation is incured by the thermal expasion due to current flow in active polysilicon cantilever, which motion is amplified bylever mechanism. The thickness of pllysilicon is 2 .mu. m and the length of active and passive polysilicon cantilever are 500 .mu. m, respectively. The moving distance of polysilicon actuator was experimentally conformed as large as 21 .mu. m at the input voltage level of 10 V and 50Hz square wave. These micro actuator technology can be utilized for the fabrication of MEMS (microlectromechanical system) such as microrelay, which requires large displacement or contact force but relatively slow response.

• 한국소음진동공학회:학술대회논문집
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• 한국소음진동공학회 2003년도 춘계학술대회논문집
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• pp.1157-1164
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• 2003

Dynamic Load/unload (L/UL) mechanism is an alternative to the contact start stop (CSS) technology which eliminates stiction and wear failure modes associated with CSS. Other benefits of L/UL include increased areal density due to smooth disk surfaces, thinner overcoats, and lower head flying height Improved shock resistance due to elimination of head slap, and reduced power consumption. Inertia latch mechanism becomes important for mobile disk drives because of non operating shock performance. Various types of latch designs have been introduced in hard disk drives to limit a rotary actuator from sudden uncontrolled motion. In this paper, a single spring inertia latch is introduced for a small form optical disk drive, which uses a rotary actuator for moving an optical pick-up. A new small inertia latch with single spring is designed to ensure both feasible and small size. The shock performance of the new inertia latch is experimentally verified.

• 센서학회지
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• 제10권5호
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• pp.292-303
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• 2001

본 연구에서는 수평형 전계 방출 소자를 제작하고 그 특성을 측정하였다. 이를 진공자장 센서에 이용하기 위하여 Lorentz 원리를 응용하여 센서를 설계하고 제작하였다. $POCl_3(10^{20}cm^{-3})$ 도핑된 다결정 실리콘을 전계 방출 소자의 음극 및 양극 재료로 이용하였으며 그 두께는 각각 $2\;{\mu}m$였다. PSG(두께 $2\;{\mu}m$)를 희생층으로 사용하여 최종 단계에서 불산을 이용하여 제거하고 승화건조법을 이용하여 소자의 기판 점착 현상을 방지하였다. 제작된 소자를 유리기판 #1 위에 silver paste로 고정시키고 Cr 전극 패드와 와이어본딩 한 뒤 진공내에서 양극접합공정을 이용하여 소자를 $1.0{\times}10^{-6}\;Torr$에서 진공 실장하였다. 실장 후 게터를 활성화하여 내부진공도를 향상시켰다. 이렇게 패키징된 소자는 두달여 기간 동안 특별한 특성저하 없이 잘 동작되었으며 그 이상의 기간에 대해서는 확인하지 못하였다. 패키징된 자장 센서는 패키징하기 전 진공챔버 내에서 보인 특성치와 별다른 차이 없이 잘 동작되었으며 단지 약간의 전류 감소 현상만이 관찰되었다. 측정된 센서의 감도는 약 3%/T로서 작은 값이었으나 그 가능성을 확인할 수는 있었다.

• 청정기술
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• 제18권3호
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• pp.280-286
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• 2012

초임계 이산화탄소를 이용하여 희생 $SiO_2$층에 대한 건식 식각 실험을 진행하였다. HF/pyridine (HF/py) 식각액과 알콜 첨가제를 사용하여 이중 챔버 시스템 방식으로 boron phosphor silica glass (BPSG), tetraethyl orthosilicate (TEOS), thermal $SiO_2$와 Si-nitride (SiN)의 박막 층에 대한 식각 성능을 조사하였다. 메탄올의 첨가에 의하여 실리카 희생막에 대한 HF/py의 식각률이 높아지는 것을 확인할 수 있었다. BPSG를 제외하고는 메탄올이 가장 높은 식각률을 보여줬지만, BPSG의 SiN에 대한 식각 선택비는 이소프로판올이 가장 높았다. HF/py/MeOH 계의 건식 식각반응에서 반응 온도에 따라서 박막별 식각률이 증가하였다. 특히 반응 온도 증가에 따라 BPSG의 식각 속도의 증가폭이 매우 높게 나타났다. HF/py에 알콜 공용매를 첨가하여도 식각 부산물 감소에는 크게 효과가 없었다. HF/$H_2O$의 식각률이 HF/py/alcohol 보다 높게 나타났지만 HF/$H_2O$에 알콜 공용매를 첨가하였을 때는 오히려 식각률이 감소되었다. 캔틸레버 빔 구조를 초임계 이산화탄소 건식 식각으로 제조하여 높은 종횡비의 패턴구조물을 손상 없이 성공적으로 식각할 수 있었다.