• 제목/요약/키워드: Stannic chloride

검색결과 9건 처리시간 0.021초

가스센서용 $SnO_2$분말 제조시 잔류 염소이온이 Sn수화물의 열분해거동 및 분말물성에 미치는 영향 (Effect of Residual Chloride Ion on Thermal Decomposition Behaviour os Stannic Acid and Physical Properties of $SnO_2$ Powder Fabricated for Gas Sensor)

  • 송국현;최병우;박재환;박순자
    • 한국재료학회지
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    • 제4권8호
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    • pp.934-944
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    • 1994
  • 수산화물법에 의해 제작된 $\alpha$-stannic acid의 열분해 거동과 $SnO_{2}$분말의 성질에 미치는 잔류염소이온의 영향을 관찰하였다. $SnCl_{4}$$NH_{4}$OH 수용액을 중화시켜 $\alpha$-stannic acid침전물을 제작하고 $NH_{4}NO_{3}$수용액으로 세척하였다. 분말내의 잔류 염소이온의 양을 주절하기 위하여 세척정도를 3단계로 조정하였다. 세척후 $100^{\circ}C$에서 건조하고, $500^{\circ}C$ ~ $1100^{\circ}C$에서 하소함으로써 $SnO_{2}$분말을 제조하였다. $\alpha$-stannic acid의열분해 거동ㅇ르 DT-TGA 와 FTIR을 통하여 관찰하고, $SnO_{2}$분말의 조성과 입자크기 및 비표면적을 각각 AES, TEM 및 BET을 통하여 측정하였다. 잔류 염소이온 양이 감소되면, 저온 하소시 일차입자의 상대적 크기가 커지는 반면 고온하소시에는 상대적으로 감소되었ㄷ. 잔류 염소이온의 일부는 $\alpha$-stannic acid내의 격자산소 자리에 위치함으로써, 저온가열시 결정수탈리와 결정화를 지연시키고 또한 고온가열시에는 이의 증발에 의해 산소공공이 생성되어 소결을 촉진시킨다고 제의하였다.

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산화 주석 박막에 대하여 (On the Stannic Oxide Thin Film)

  • 박순자
    • 한국세라믹학회지
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    • 제13권2호
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    • pp.8-16
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    • 1976
  • The conductive transparent film is prepared by spraying thin salt solution. In stannic chloride solution as a base solution, various dopants such as Al, Co, Cu and Ni were dissolved respectively as a chloride state and then the films were made by spraying solutions on hot glass plates. The properties of them were compared with those of the stannic salt single component film. The films doped with copper oxide and nickle oxide were improved by decreasing their sheet resistivity and temperature coefficient of resistivity. In comparison with the sheet resistivity and temperature coefficient of resistivity of stannic oxide single component film, being 2.5 K ohm/$\textrm{cm}^2$ and -1650ppm/$^{\circ}C$ respectively, its values of the film containing 15 mol % of copper oxide and formed at 40$0^{\circ}C$ were 2.5K ohm/$\textrm{cm}^2$ and -920ppm/$^{\circ}C$ respectively. The film containing 15 mol % of nickel oxide and formed at 50$0^{\circ}C$ has shown its sheet resistivity and temperature coefficient 0.7 K ohm/$\textrm{cm}^2$ and -940ppm/$^{\circ}C$ respectively.

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메틸 2-클로로-2-(메틸티오)아세트산을 이용한 치환페놀류로부터 2(3H)-벤조푸란온 유도체의 합성 (Synthesis of 2(3H)-Benzofuranone Derivatives from Substituted Phenols Using Methyl 2-chloro-2-(methylthio)acetate)

  • 최홍대;김미헌;신상훈;손병화
    • 약학회지
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    • 제40권6호
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    • pp.640-645
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    • 1996
  • 5-Alkyl-2(3H)-benzofuranones(3a-e) were prepared from Friedel-Crafts reaction of 4-alkylphenols with methyl 2-chloro-2-(methylthio)acetae(1) followed by the treatment of zinc du st-acetic acid. The reaction of disubstituted phenols with 1 in the presence of stannic chloride afforded 3-methyltWa-2(3H)-benzofuranone derivatives(11a-c), which were readily converted into 2(3H)-benzofuranone derivatives(12a-c) by desulfurization with zinc dust-acetic acid.

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Formation and Reactions of α-Phosphoryl Thiocarbocations: Synthesis of α-Sulfenyl Phosphonates

  • 김택현;오동영
    • Bulletin of the Korean Chemical Society
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    • 제16권7호
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    • pp.609-613
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    • 1995
  • The reaction of chloro(methylthio and arylthio)methanephosphonate (1) and Pummerer-type reaction of sulfinylmethanephosphonate (2) with nucleophiles such as aromatic compounds and thiols were examined. The direct chlorination of (methylthio and arylthio)methanephosphonate with N-chlorosuccinimide (NCS) led to the formation of monochlorinated phosphonates (1) in good yield. The reaction of 1 with aromatic compounds and thiols in the presence of stannic chloride afforded a variety of aryl(methylthio)methanephosphonates (3) and thioacetals of formylphosphonates (4), respectively. Phosphonates 3 and 4 were also obtained from the reaction of Pummerer intermediate, generated from sulfinylmethanephosphonate (2), with aromatic compounds and thiols, respectively. A versatile reaction conditions to generate Pummerer intermediate were examined. The best condition was the combination of trifluoroacetic anhydride with stannic chloride. All reactions may involve an initial formation of α-phosphoryl thiocarbocation and a subsequent nucleophilic attack of aromatic compounds and thiols.

Epoxy 및 Siloxane Emulsion 처리가 견직물의 방추성에 미치는 영향 (The Effect of Epoxy and Epoxy-Siloxane Emulsion Treatment on the Anticrease Property of Silk Fabrics)

  • 장병호;신광호;이병학
    • 한국염색가공학회지
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    • 제5권1호
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    • pp.10-18
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    • 1993
  • Epoxy compound was synthesized from bisphellol-A with epichlorophydrine. Epoxy compound and siloxane were emulsified conjugative one or another. The water repellency of silk fabrics was also highly improved by the treatment of epoxy-siloxane mixed emulsions containing stannic chloride and zirconium oxychloride. The maximum wrinkle recovery was obtained from the fabrics treated under the condition 2.5%-epoxy-siloxane emulsion at 16$0^{\circ}C$. The breaking elongation, the reflectance, the tensile strength and the bending properties of silk fabrics were not degraded severely by the treatment of epoxy-siloxane emulsion.

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염화주석용액을 이용한 폐인쇄회로기판으로부터 부품의 분리 (Dismantling of Components from Waste Printed Circuit Boards Using Stannic Chloride Solution)

  • 박유진;유경근
    • 자원리싸이클링
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    • 제30권2호
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    • pp.24-30
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    • 2021
  • 폐인쇄회로기판으로부터 부품을 분리하기 위하여 4가 주석이온 (Sn4+)을 포함한 염산용액을 이용하여 탈착실험을 진행하고, 부품탈착에 대한 교반속도, 반응온도, 4가 주석이온농도, 염산용액농도의 영향을 조사하였다. 100 rpm~300 rpm의 교반속도에서 PCB로부터 부품의 탈착속도는 큰 차이가 없었으며, 반응온도, 4가 주석이온농도, 그리고 염산용액농도를 증가시킴에 따라 탈착속도도 증가하였다. 모든 부품 탈착실험에서 탈착율이 100%에 도달하였을 때 기판에서 솔더는 관찰되지 않았으며 주석농도는 약 1,500 mg/L였다. 10,000 mg/L의 4가 주석이온을 포함한 1 mol/L의 염산용액에 폐하드디스크 PCB 1개를 투입하고, 교반속도와 반응온도를 각각 200 rpm과 90 ℃로 조정한 탈착실험에서 PCB로부터 부품의 탈착은 2시간만에 100% 완료되었다.

염화주석/camphene 슬러리의 동결건조에 의한 방향성 기공구조의 Sn 다공체 제조 (Synthesis of Aligned Porous Sn by Freeze-Drying of Tin Chloride/camphene Slurry)

  • 방수룡;오승탁
    • 한국재료학회지
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    • 제25권1호
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    • pp.27-31
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    • 2015
  • This paper proposes a novel way of fabricating aligned porous Sn by freeze-drying of camphene slurry with stannic oxide ($SnO_2$) coated Sn powders. The $SnO_2$ coated Sn powders were prepared by surface oxidation of the initial and ball-milled Sn powders, as well as heat treatment of tin chloride coated Cu powders. Camphene slurries with 10 vol% solid powders were prepared by mixing at $50^{\circ}C$ with a small amount of oligomeric polyester dispersant. Freezing the slurry was done in a Teflon cylinder attached to a copper bottom plate cooled at $-25^{\circ}C$. Improved dispersion stability of camphene slurry and the homogeneous frozen body was achieved using the oxidized Sn powder at $670^{\circ}C$ in air after ball milling. The porous Sn specimen, prepared by freeze-drying of the camphene slurry with oxidized Sn powder from the heat-treated Sn/tin chloride mixture and sintering at $1100^{\circ}C$ for 1 h in a hydrogen atmosphere, showed large pores of about $200{\mu}m$, which were aligned parallel to the camphene growth direction, and small pores in their internal walls. However, $100{\mu}m$ spherical particles were observed in the bottom part of the specimen due to the melting of the Sn powder during sintering of the green compact.

Characterization of Poly(methyl methacrylate)-tin (IV) Chloride Blend by TG-DTG-DTA, IR and Pyrolysis-GC-MS Techniques

  • Arshad, Muhammad;Masud, Khalid;Arif, Muhammad;Rehman, Saeed-Ur;Saeed, Aamer;Zaidi, Jamshed Hussain
    • Bulletin of the Korean Chemical Society
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    • 제32권9호
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    • pp.3295-3305
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    • 2011
  • Thermal behavior of poly (methyl methacrylate) was analyzed in the presence of tin (IV) chloride. Five different proportions - polymer to additive - were selected for casting films from common solvent. TG, DTG and DTA were employed to monitor thermal degradation of the systems. IR and py-GC-MS helped identify the decomposition products. The blends start degrading at a temperature lower than that of the neat polymer and higher than that of the pure additive. Complex formation between tin of additive and carbonyl oxygen (pendent groups of MMA units) was noticed in the films soon after the mixing of the components in the blends. The samples were also heated at three different temperatures to determine the composition of residues left after the expulsion of volatiles. The polymer, blends and additive exhibited a one step, two-step and three-step degradation, respectively. $T_0$ is highest for the polymer, lowest for the additive and is either $60^{\circ}C$ or $70^{\circ}C$ for the blends. The amount of residue increases down the series [moving from blend-1 (minimum additive concentration) to blend-5 (maximum additive concentration)]. For blend-1, it is 7% of the original mass whereas it is 16% for blend-5. $T_{max}$ also goes up as the concentration of additive in the blends is elevated. The complexation appears to be the cause of observed stabilization. Some new products of degradation were noted apart from those reported earlier. These included methanol, isobutyric acid, acid chloride, etc. Molecular-level mixing of the constituents and "positioning effect" of the additive may have brought about the formation of new compounds. Routes are proposed for the appearance of these substances. Horizontal burning tests were also conducted on polymer and blends and the results are discussed. Activation energies and reaction orders were calculated. Activation energy is highest for the polymer, i.e., 138.9 Kcal/mol while the range for blends is from 51 to 39 Kcal/mol. Stability zones are highlighted for the blends. The interaction between the blended parts seems to be chemical in nature.

Synthesis and Antitumor Evaluation of cis-(1,2-Diaminoethane) dichloroplatinum (II) Complexes Linked to 5- and 6-Methyleneuracil and -uridine Analogues

  • Kim, Jack-C.;Lee, Min-Hwa;Choi, Soon-Kyu
    • Archives of Pharmacal Research
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    • 제21권4호
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    • pp.465-469
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    • 1998
  • The search for platinum (II)-based compounds with improved therapeutic properties was prompted to design and synthesize a new family of water-soluble, third generation cis-diaminedichloroplatinum (II) complexes linked to uracil and uridine. Six heretofore unreported uracil and uridine-platinum (II) complexes are; [N-(uracil-5-yl-methyl)ethane-1,2-di-amine]dichloroplatinum (II) (3a), [N-(uracil-6-yl-methyl)ethane-1,2-diaminel dichloroplatinum (II) (3b), t[N-($2^1$, $3^1$,$5^1$-tri-O-acetyl)uridine-5-yl-methyl] ethane-1,2-diamineldichloroplatinum (II) (6a), {[N-($2^1$,$3^1$, $5^1$-tri-O-acetyl) uridine-6-yl-methyl]ethane-1,2-diamine)dichloroplatinum (II) (6b),[N-(uridine- 5-yl-methyl)ethane-1,2-diamine]dichloroplatinum (II) (7a), [N-(uridine-6-yl- methyl)ethane-1,2-diamine]dichloroplatinum (II) (7b). These analogues were prepared from the key starting materials, 5-chloromethyluracil (1a) and 6-chloromethyluracil (1b) which were reacted with ethylenediamine to afford the respective 5-[(2-aminoethyl)aminol methyluracil (2a) and 6-[(2-aminoethyl)amino]methyluracil (2b). The cis-platin complexes 3a and 3b were obtained through the reaction of the respective 2a and 2b with potassium tetrachloroplatinate (II). The heterocyclic nucleic acid bases 1a and 1b were efficiently introduced on the .betha.-D-ribose ring via a Vorbruggen-type nucleoside coupling procedure with hexamethyldisilazane, trimethylchlorosilane and stannic chloride under anhydrous acetonitrile to yield the stereospecific .betha.-anomeric 5-chloromethyl- $2^1$,$3^1$,$5^1$-tri-O-acetyluridine (4a) and 6-chloromethyl-$2^1$,$3^1$,$5^1$-tri-O-acetyluridine (4b), respectively. The nucleosides 4a and 4b were coupled with ethylenediamine to provide the respective 5-[(amino-ethyl)aminolmethyl-$2^1$,$3^1$,$5^1$-tri-O-acetyluridine (5a) and 6-[(aminoethyl)amino] methyl-$2^1$,$3^1$,$5^1$-tri-O-acetyluridine (5b). The diamino-uridines 5a and 5b were reacted with potassium tetrachloroplatinate (II) to give the novel nucleoside complexes, 6a and 6b, respectively which were deacetylated into the free nucleosides, 7a and 7b by the treatment with CH$_{3}$ONa. The cytotoxic activities were evaluated against three cell lines (FM-3A, P-388 and J-82) and none of the synthesized compounds showed any significant activity.

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