• Title/Summary/Keyword: Soda-Lime Glass

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A Study on Properties of N-type ZnS Deposited at Various RF Power for Solar Cell Applications (RF Power에 따른 태양전지용 N-type ZnS 특성연구)

  • Yang, Hyeon-Hun;Kim, Han-Wool;Jeong, Woon-Jo;Lee, Suk-Ho;So, Soon-Youl;Park, Gye-Choon;Lee, Jin;Chung, Hea-Duck
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.24 no.7
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    • pp.574-577
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    • 2011
  • In this study, we use the $2.5cm{\times}7.5cm$ soda lime glass as the substrate. We used the ultrasonicator. Glass was dipped in the acetone, methanol and DI water respectively for 10 minutes. Ar(99.99%)gas was used as the sputtering gas. We varied the RF power between 100~175 W with 25 W steps. Base pressure was kept by turbo molecular pump at $3.0{\times}10^{-6}$ torr. Working pressure was kept by injection of Ar gas. ZnS thin films were deposited with the radio frequency magnetron sputtering technique at various temperatures and sputtering powers. It is also clearly observed that, the intensity of the (111) XRD peak increases with increasing the RF power. Electrical properties were measured by hall effect methods at room temperature. The resistivity, carrier concentration, and hall mobility of ZnS deposited on glass substrate as a function of sputtering power. It can be seen that as the sputtering power increase from 100 to 175 W, the resistivity of the films on glass decreased significantly from $8.1{\times}10^{-2}$ to $1.2{\times}10^{-3}\;{\Omega}{\cdot}cm$. This behavior could be explained by the effect of the sputtering power on the mobility and carrier concentration. When the RF power increases, the carrier concentration increases slightly while the resistivity decreases significantly. These variation originate from improved crystallinity and enhanced substitutional doping as the sputtering power increases.

Nano/Micro Friction with the Contact Area (접촉 면적에 따른 나노/마이크로 마찰 특성)

  • Yoon Eui-Sung;Singh R. Arvind;Kong Hosung
    • Tribology and Lubricants
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    • v.21 no.5
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    • pp.209-215
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    • 2005
  • Nano/micro friction with the contact area was studied on Si-wafer (100) and diamond-like carbon (DLC) film. Borosilicate balls of radii $0.32{\mu}m,\;0.5{\mu}m,\;1.25{\mu}m\;and\;2.5{\mu}m$ mounted on the top of AFM tip (NPS) were used for nano-scale contact and Soda Lime glass balls of radii 0.25mm, 0.5mm, 1mm were used for micro-scale contact. At nano-scale, the friction between ball and surface was measured with the applied normal load using an atomic force microscope (AFM), and at micro scale it was measured using ball-on flat type micro-tribotester. All the experiments were conducted at controlled conditions of temperature $(24\pm1^{\circ}C)$ and humidity $(45\pm5\%)$. Friction was measured as a function of applied normal load in the range of 0-160nN at nano scale and in the range of $1000{\mu}N,\; 1500{\mu}N,\;3000{\mu}N\;and\;4800{\mu}N$ at micro scale. Results showed that the friction at nano scale increased with the applied normal load and ball size for both kinds of samples. Similar behavior of friction with the applied normal load and ball size was observed for Si-wafer at micro scale. However, for DLC friction decreased with the ball size. This difference of in behavior of friction in DLC nano- and microscale was attribute to the difference in the operating mechanisms. The evidence of the operating mechanisms at micro-scale were observed using scanning electron microscope (SEM). At micro-scale, solid-solid adhesion was dominant in Silicon-wafer, while plowing in DLC. Contrary to the nano scale that shows almost a wear-less situation, wear was prominent at micro-scale. At nano- and micro-scale, effect of contact area on the friction was discussed with the different applied normal load and ball size.

RF 마그네트론 스퍼터링을 이용하여 온도별로 증착한 CIGS 박막의 미세구조 및 화학 조성 분석

  • Jeong, Jae-Heon;Jo, Sang-Hyeon;Song, Pung-Geun
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.08a
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    • pp.278-279
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    • 2012
  • 최근 들어 세계적인 고유가 행진과 화석연료 고갈에 대응하기 위하여 대체 에너지원 발굴에 대한 필요성이 높아지고 있다. 그 중 CIGS 박막 태양전지는 미래 신재생 에너지 자원의 가장 유망한 후보군 중 하나이다. 기존의 Si 기반의 태양전지의 경우 시간경과에 따른 효율 저하, 높은 재료비, 복잡한 공정으로 인하여 대량생산이 힘든 단점을 가지고 있다. 반면 박막 태양전지의 경우 생산 원가를 낮출 수 있는 태양전지 제조기술로서는 2세대 태양전지로 불리우며, 에너지 변환 효율과 생산 원가에서 우월성을 가진다. 그리고 이러한 CIGS 박막 태양전지를 단일 CIGS 타겟을 이용하여 스퍼터링 공정으로 제작하면 기존에 사용되었던 동시 증발법에 비해서 간단하고 대면적 코팅 및 대량 생산이 가능하다. 본 연구에서 사용된 기판으로는 $25{\times}25mm$ 크기의 Soda Lime Glass (SLG) 위에 DC 마그네트론 스퍼터링 공정으로 Mo가 $1{\mu}m$ 증착된 시편을 이용하여, 2 inch 단일 CIGS 타겟 (MATERION, CIGS Target 25-17.5-7.5-50 at%)을 기판 가열하여 증착하였다. RF 파워는 80 W, 기판 온도는 RT, 100, 200, 300, $400^{\circ}C$로 가열 후 증착하였고, CIGS 박막의 두께는 약 $1{\mu}m$로 일정하게 하였다. CIGS/Mo 박막의 파워별 미세구조 분석을 위해 X-ray Diffraction (XRD, BRUKER GADDS)로 측정하였으며, 박막의 결정립 크기를 확인하기 위해 Field Emission Scanning Electron Microscopy (FE-SEM, HITACHI)을 사용하여 측정하였다. 조건별 박막의 조성 분석 및 표면조도는 Energy Dispersive X-ray Spectroscopy (EDS, HORIBA 7395-H)와 Atomic Force Microscopy (AFM)을 이용하여 각각 평가하였다. 마지막으로 광학적 특성을 평가하고 박막의 밴드갭 에너지를 계산하기 위해서 190 nm에서 1,100 nm의 영역 대에서 자외선 광학 측정기(UV-Vis, HP-8453, AGLIENT)로 투과도를 측정하여 밴드갭 에너지를 계산하였다. 증착된 CIGS 박막은 기판 온도가 증가함에 따라 결정립 크기가 커지는 경향을 보였다. 이는 기판 상에 도달한 스퍼터 원자의 확산 에너지 증가로 인한 것으로 생각되어진다. 또한, 기판온도에 따른 결정립 성장 변화는 4성분계의 박막의 조성 및 핵생성 밀도와 관련되어 설명되어질 것이다.

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Effect of SiO2/ITO Film on Energy Conversion Efficiency of Dye-sensitized Solar Cells

  • Woo, Jong-Su;Jang, Gun-Eik
    • Transactions on Electrical and Electronic Materials
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    • v.16 no.6
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    • pp.303-307
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    • 2015
  • Multilayered films of ITO (In2O3:SnO2 = 9:1)/SiO2 were deposited on soda-lime glass by RF/DC magnetron sputtering at 500℃ to improve the energy conversion efficiency of dye-sensitized solar cells (DSSCs). The light absorption of the dye was improved by decrease in light reflectance from the surface of the DSSCs by using an ITO film. In order to estimate the optical characteristics and compare them with experimental results, a simulation program named EMP (essential macleod program) was used. EMP results revealed that the multilayered thin films showed high transmittance (approximate average transmittance of 79%) by adjusting the SiO2 layer thickness. XRD results revealed that the ITO and TiO2 films exhibited a crystalline phase with (400) and (101) preferred orientations at 2 θ = 26.24° and 35.18°, respectively. The photocurrent-voltage (I-V) characteristics of the DSSCs were measured under AM 1.5 and 100 mW/cm2 (1 sun) by using a solar simulator. The DSSC fabricated on the ITO film with a 0.1-nm-thick SiO2 film showed a Voc of 0.697 V, Jsc of 10.596 mA/cm2 , FF of 66.423, and calculated power conversion efficiency (ηAM1.5) of 5.259%, which was the maximum value observed in this study.

유연성 스테인레스와 폴리이미드 기판에서 제조된 CIGS 박막 태양전지의 효율 개선 및 특성 연구

  • Kim, Jae-Ung;Kim, Hye-Jin;Kim, Gi-Rim;Kim, Jin-Hyeok;Jeong, Chae-Hwan
    • Proceedings of the Korean Vacuum Society Conference
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    • 2015.08a
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    • pp.245-245
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    • 2015
  • Cu(In,Ga)Se2 (CIGS) 박막 태양전지는 높은 효율과 낮은 제조비용, 높은 신뢰성으로 인해 박막 태양전지 중 가장 각광받고 있다. 특히 유리기판 대신 가볍고 유연한 철강소재나 플라스틱 소재를 이용하여 발전분야 외에 건물일체형, 수송용, 휴대용등 다양한 분야에 적용이 가능하다. 이러한 유연 기판을 이용한 CIGS 태양전지의 개발을 위해서는 기판의 특성에 따른 다양한 공정개발이 선행되어야 한다. 특히 CIGS 태양전지에서는 Na의 역할이 매우 중요한데 유연기판의 경우 이러한 Na이 없을 뿐만 아니라 철강기판의 경우 Fe, Ni, Cr등의 불순물이 확산되어 흡수층의 특성을 저하시켜 효율을 감소시킨다. 따라서 이러한 철강 기판의 경우 불순물의 확산을 방지하는 확산방지막이 필수적이다. 또한 플라스틱기판의 경우 내열성이 낮아 저온에서 공정을 진행해야하는 단점이 있다. 이러한 유연기판의 특성을 고려하여 본 연구에서는 유연기판으로 STS 430 stainless steel과 poly-imide를 이용하여 특성 개선을 진행하였다. 먼저 stainless steel과 Poly-imide, soda-lime glass, coning glass의 기판을 이용하여 기판에 따른 흡수층의 특성을 비교 분석하였으며 stainless steel 기판을 이용하여 확산 방지막의 유무 및 두께에 따른 흡수층 및 소자의 특성을 분석하였다. 이때 확산 방지막은 기존 TCO 공정에서 사용되는 i-ZnO를 사용하였으며 RF sputter를 이용하여 50~200nm로 두께를 달리하며 특성 비교를 실시하였다. 이때 효율은 확산방지막을 적용하지 않았을 때 약 5.9%에서 확산 방지막 적용시 약 10.6%로 증가하였다. 또한 poly-imide 기판을 이용하여 $400^{\circ}C$이하에서 흡수층을 제조하여 특성평가를 진행하였으며 소자 제조 후 효율은 약 12.2%를 달성하였다. 모든 흡수층은 Co-Evaporation 방법을 이용하여 제조하였으며 제조된 흡수층은 SEM, XRF, XRD, GD-OES, PL, Raman등을 이용하여 분석하였으며 그 외 일반적인 방법을 이용하여 Mo, CdS, TCO, Al grid를 제조하였다. AR 코팅은 제외 하였으며 제조된 소자는 솔라 시뮬레이터를 이용하여 효율 특성 분석을 실시하였으며 Q.E. 분석을 실시하였다.

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Surface Characteristics and Micro-Scale Friction Property of Natural Surface (식물잎의 표면형상 및 마이크로-스케일에서의 마찰 특성)

  • Yoon, Eui-Sung;Kim, Hong-Joon;Singh R. Arvind;Kim, Jin-Seok
    • Tribology and Lubricants
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    • v.22 no.5
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    • pp.237-242
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    • 2006
  • Surfaces found in nature, including biological surfaces have been providing inspiration to modify/fabricate artificial surfaces as solutions for tribological applications. As an example, the concept of 'lotus-effect' has motivated tribologists world wide to modify/fabricate surfaces for enhanced tribological performance. These was done by creating nano/micro-scale asperities on various surfaces using ion beam milling and ion-beam assisted roughening. In order to understand the attributes of natural surfaces, which are inspirational to tribologists, we characterized the surface of two natural surfaces-Nelumbo nucifera (lotus) and Colocasia esculenta leaves. Further, we evaluated their micro-scale friction property, both in their fresh and dried conditions. The characterization of surfaces was conducted using a confocal microscope and SEM, which involved the evaluation of size and distribution of protuberances. The micro-scale friction property was evaluated using a ball-on-flat type micro-tribo tester, under reciprocating motion. A soda lime glass ball (2 mm diameter) was used in these tests. Tests were conducted at the applied normal load of $3000{\mu}N$, at a sliding speed of 1 mm/sec for a scan length of 3 mm. All experiments were conducted at ambient temperature ($24{\pm}1^{\circ}C}$) and relative humidity ($45{\pm}5%$). It was observed that the friction behaviour of the natural surfaces was influenced by their surface characteristics (morphology and distribution of protuberances) and also by the condition (fresh or dried) in which they were tested.

Preparation of SiO2-TiO2-MxOy ( M = Co, Cr or Cu ) Thin Films by the Chemical Solution Process (스핀코팅에 의한 SiO2-TiO2-MxOy (M = CO, Cr or Cu)계 비정질 박막의 제조)

  • Kim, Sangmoon;Lim, Yongmu;Hwang, Kyuseog
    • Journal of Korean Ophthalmic Optics Society
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    • v.3 no.1
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    • pp.223-228
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    • 1998
  • Glass films of $SiO_2-TiO_2-M_xO_y$ (M = Co, Cr or Cu) have been prepared on soda-lime-silica slide glasses by the chemical solution method using a spin-coating technique. Commercially available tetraethyl orthosilicate, titanium trichloride, and cobalt-, chromium- and copper-nitrates were used as starting materials. No crystalline segregations of $Co_3O_4$, $Cr_2O_3$ and CuO were observed by X-ray diffraction ${\theta}-2{\theta}$ scans. From the optical transmission analysis, cobalt existed as $ Co^{2+}$ in tetrahedral coordination, chromium as $Cr^{6+}$ in tetrahedral symmetry and copper as $Cu^{2+}$ in octahedral coordination. Films with a crack-free and no texture exhibited homogeneous interfaces between the films and the substrates along the cross-section.

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Studies on Effect of S/Se Ratio on the Properties of Cu2ZnSn(SxSe1-x)4 (CZTSSe) Thin Films by Sulfo-Selenization of Stacked Precursor Thin Films (열처리 시 S/Se 분말 비율에 따른 Cu2ZnSnSe4 (CZTSSe) 박막의 합성 및 특성 평가)

  • Gang, Myeng Gil;He, Ming Rui;Hong, Chang Woo;Kim, Jin Hyeok
    • Current Photovoltaic Research
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    • v.2 no.4
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    • pp.177-181
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    • 2014
  • $Cu_2ZnSn(S_xSe_{1-x})_4$ (CZTSSe) absorber thin films were prepared on Mo coated soda lime glass substrates by sulfo-selenization of sputtered stacked Zn-Sn-Cu precursor thin films. The Zn-Sn-Cu precursor thin films were sulfo-selenized inside a graphite box containing S and Se powder using rapid thermal processing furnace at $540^{\circ}C$ in Ar atmosphere with pre-treatment at $300^{\circ}C$. The effect of different S/Se ratio on the structural, compositional, morphological and electrical properties of the CZTSSe thin films were studied using XRD (X-ray diffraction), XRF (X-ray fluorescence analysis), FE-SEM (field-emission scanning electron microscopy), respectively. The XRD, FE-SEM, XRF results indicated that the properties of sulfo-selenized CZTSSe thin films were strongly related to the S/Se composition ratio. In particular, the CZTS thin film solar cells with S/(S+Se)=0.25 shows best conversion efficiency of 4.6% ($V_{oc}$ : 348 mV, $J_{sc}$ : $26.71mA/cm^2$, FF : 50%, and active area : $0.31cm^2$). Further detailed analysis and discussion for effect of S/Se composition ratio on the properties CZTSSe thin films will be discussed.

Electronic, Optical and Electrical Properties of Nickel Oxide Thin Films Grown by RF Magnetron Sputtering

  • Park, Chanae;Kim, Juhwan;Lee, Kangil;Oh, Suhk Kun;Kang, Hee Jae;Park, Nam Seok
    • Applied Science and Convergence Technology
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    • v.24 no.3
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    • pp.72-76
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    • 2015
  • Nickel oxide (NiO) thin films were grown on soda-lime glass substrates by RF magnetron sputtering method at room temperature (RT), and they were post-annealed at the temperatures of $100^{\circ}C$, $200^{\circ}C$, $300^{\circ}C$ and $400^{\circ}C$ for 30 minutes in vacuum. The electronic structure, optical and electrical properties of NiO thin films were investigated using X-ray photoelectron spectroscopy (XPS), reflection electron energy spectroscopy (REELS), UV-spectrometer and Hall Effect measurements, respectively. XPS results showed that the NiO thin films grown at RT and post annealed at temperatures below $300^{\circ}C$ had the NiO phase, but, at $400^{\circ}C$, the nickel metal phase became dominant. The band gaps of NiO thin films post annealed at temperatures below $300^{\circ}C$ were about 3.7 eV, but that at $400^{\circ}C$ should not be measured clearly because of the dominance of Ni metal phase. The NiO thin films post-annealed at temperatures below $300^{\circ}C$ showed p-type conductivity with low electrical resistivity and high optical transmittance of 80% in the visible light region, but that post-annealed at $400^{\circ}C$ showed n-type semiconductor properties, and the average transmittance in the visible light region was less than 42%. Our results demonstrate that the post-annealing plays a crucial role in enhancing the electrical and optical properties of NiO thin films.

Deposition Characteristic of InNx Films by Reactive DC Magnetron Sputtering (반응성 직류 스퍼터법에 의한 질화 인듐 박막의 제막 특성)

  • 송풍근;류봉기;김광호
    • Journal of the Korean Ceramic Society
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    • v.40 no.8
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    • pp.739-745
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    • 2003
  • In $N_{x}$ films were deposited on soda-lime glass without substrate heating by reactive dc magnetron sputtering using indium (In) metal target. Depositions were carried out under various total gas pressures ( $P_{tot}$) of mixture gases (Ar+$N_2$ or He+$N_2$). He gas was introduced to $N_2$ gas in order to enhance the reactivity of nitrogen on film surface by the "penning ionization". Plasma impedance decreased greatly when 20% or more introduced the $N_2$ gas. This is due to the In $N_{x}$ layers formed on target surface because a secondary electron emission rate of InN is small compared with In metal. XRD patterns of the films revealed that <001> preferred oriented polycrystalline In $N_{x}$ films, where the crystallinity of the films was improved with decrease of $P_{tot}$ and with increase of $N_2$ flow ratio. The improvement of the crystallinity and stoichimetry of the In $N_{x}$ films were considered to be caused by an increase in the activated nitrogen radicals and also by an increase in the kinetic energy of sputtered In atoms arriving at growing film surface, which should enhance the chemical reaction and surface migration on the growing film surface, respectively. Furthermore, the films deposited using mixture gases of He+$N_2$ showed higher crystallinity compared with the film deposited by the mixture gases of Ar+$N_2$.$.EX>.