• 제목/요약/키워드: Small circular hole defect

검색결과 3건 처리시간 0.021초

알루미늄 합금재의 피로크랙 전파거동에 미치는 미소원공결함 (The Influence of the Small Circular Hole Defect on the Fatigue Crack Propagation Behavior in Aluminum Alloys)

  • 김건호;이호연
    • Journal of Advanced Marine Engineering and Technology
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    • 제32권6호
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    • pp.834-840
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    • 2008
  • We carried out fatigue testing with materials of aluminum alloyC7075-T6, 2024-T4) by rotary bending fatigue tester. We investigated fatigue limit, fatigue crack initiation, fatigue crack propagation behavior and possibility of fatigue life prediction to the different small circular hole defect. The summarized result are as follows; Fatigue limit of the smooth specimens were related tensile strength and yield strength. In case of more large applied stress and small circular hole crack defect, the fatigue crack was grown rapidly. The fatigue crack propagation behavior proceed at according to inclusion. Fatigue crack propagation ratio appeared instability and retardation phenomenon in the first half of fatigue life but appeared stability and replied in the latter half. On other hand, this experimental data of the materials are appeared fatigue life predictability.

미세 홀 어레이 펀칭 가공 (Punching of Micro-Hole Array)

  • 손영기;오수익;임성한
    • 한국소성가공학회:학술대회논문집
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    • 한국소성가공학회 2005년도 금형가공,미세가공,플라스틱가공 공동 심포지엄
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    • pp.193-197
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    • 2005
  • This paper presents a method by which multiple holes of ultra small size can be punched simultaneously. Silicon wafers were used to fabricate punching die. Workpiece used in the present investigation were the rolled pure copper of $3{\mu}m$ in thickness and CP titanium of $1.5{\mu}m$ in thickness. The metal foils were punched with the dies and arrays of circular and rectangular holes were made. The diameter of holes ranges from $2-10{\mu}m$. The process set-up is similar to that of the flexible rubber pad forming or Guerin process. Arrays of holes were punched successfully in one step forming. The punched holes were examined in terms of their dimensions, surface qualities, and potential defect. The effects of the die hole dimension on ultra small size hole formation of the thin foil were discussed. The optimum process condition such as proper die shape and diameter-thickness ratio (d/t) were also discussed. The results in this paper show that the present method can be successfully applied to the fabrication of ultra small size hole array in a one step operation.

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페로브스카이트 반도체 물질에 원형 패턴을 형성하기 위한 상압플라즈마 식각 기술 (Atmospheric Pressure Plasma Etching Technology for Forming Circular Holes in Perovskite Semiconductor Materials)

  • 김무진
    • 융합정보논문지
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    • 제11권2호
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    • pp.10-15
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    • 2021
  • 본 논문에서는 먼저 습식 코팅 방법으로 페로브스카이트 (CH3NH3PbI3) 박막을 글라스 상에 형성하고, 다양한 분석 기법을 이용하여 막의 두께, 표면거칠기, 결정성, 구성성분 및 가시광 영역에서의 이 물질의 반응에 대해 논한다. 완성된 반도체 물질은 막내부에 결함(defect)이 없고 균일하며, 표면거칠기는 매우 작으며, 가시광영역에서 높은 흡수율이 관찰되었다. 다음으로 이와 같이 형성된 유무기 층에 hole 형상을 구현하기 위하여, 구멍이 일정한 간격으로 있는 메탈마스크, 페로브스카이트 물질이 코팅되어 있는 유리, 자석 순서로 되어있는 구조의 샘플을 상압플라즈마 공법을 이용하여 시간에 따른 물질에 형성되는 hole 형태의 변화를 분석하였다. 시간이 길어짐에 따라 더 많이 식각되는 것을 알 수 있으며, 이 중에서 공정 시간을 가장 오래한 샘플에 대해서는 보다 자세하게 살펴보았고, 플라즈마의 위치에 따른 차이에 의해 7영역으로 분류할 수 있었다.