• Journal of the Korean Applied Science and Technology
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• v.37 no.4
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• pp.860-869
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• 2020

This study was conducted to see the effect of maintaining the freshness of mackerel caught offshore, through the chemical analysis method in seawater slurry ice(SS), sea water cube ice(SC), tap water slurry ice(TS) and tap water cube ice(TC). Among each ice mass, bacteria were below the drinking water standard and ammonia nitrogen was over the threshold of 11 mg/l in sea water. The turbidity of the seawater was severe compared to that of fresh water. Proximate compositions showed 72.7% moisture content, 20.5% protein, 5.25% lipid, and 1.3% ash content. Sea slurry ice was kept low in pH compared with fresh water ice. VBN increases were inhibited in all reservoirs at the beginning of the storage. Generally Sea ice was kept lower VBN value than the fresh water ice.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.11 no.4
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• pp.1354-1360
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• 2010

The purpose of this study is to analyze the behavior of swine slurry wastewater from bogen, in the treatment of Aerobic Liquid-Composting treatment by Aerobic Liquid-Composting using a mixer and Micro Air Diffusion pH level was at the beginning and its rise was seemingly related to VFA. It appears that removal of BOD and COD are more effective by Aerobic than by Anaerobic. In terms of removal efficiency, it shows 70.9% of BOD and 39% of COD in M.A+Mix and 67.8% of BOD and 19% of COD in M.A. $NH_3-N$ decreases in all conditions, which is caused by both the characteristic of nitrogen and the rise of pH. $NO_3-N$ increases in all conditions. It is judged that the accumulation of $NO_3-N$ affects the reduction of the ratio of denitrification. In the result of the analysis of Manure in swine slurry of liquified fertilizer ingredients, content of Manure in swine slurry of liquified fertilizer ingredients in aerobic conditions (M.A+Mix) is higher than anaerobic conditions.

• Journal of the Korea Organic Resources Recycling Association
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• v.25 no.1
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• pp.103-110
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• 2017

In Concentrated Animal Feeding Operations(CAFOs), emission of ammonia from stored manure contributes negatively on the wellness of livestock. In CAFOs facilities, indoor aerial ammonia concentration oftentime surpasses the critical level potentially harmful to livestock's immune system. Understandably, numerous researches to control aerial ammonia have been conducted in countries where CAFOs were practiced for many decades. Some innovative technologies, such as scrubber, bio-filter, and additives emerged, as a result. Among them, microbial additives became popular in Korea, due to an easiness of use and affordability. However, microbial additives still have some weaknesses. Their price is still high enough to discourage farmers who run a small scale farm and their effectiveness are still questioned by many users and researchers. In the present study, we found soluble carbohydrates, such as sugar, glucose, and molasses, when supplemented to pig slurry manure, can mitigate ammonia emission. To be more specific, pig manure slurry(120kg), stored in container(200L), was supplemented with sugar at 0.1%(w/w) and was, subsequently, monitored for pH and aerial ammonia for next 10 days. From this experiment, it was found that the sugar supplementation was effective in mitigating the aerial ammonia concentration (33% in average) when monitored daily. Also, the pH of manure slurry was maintained at relatively low level(8.2) in sugar-supplemented manure slurry while it was elevated to 8.5 in untreated slurry. Conclusively, the obtained data suggest that soluble carbohydrate can mitigate ammonia emission by acidifying manure slurry. Additionally, it can be suggested that soluble carbohydrates, such as sugar, glucose, and molasses, can be reasonable choices for animal farmers who have been looking for an alternative choice to replace expensive microbial additives.

• Proceedings of the Korean Ceranic Society Conference
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• 2003.04a
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• pp.78.2-78
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• 2003

• Proceedings of the Korea Association of Crystal Growth Conference
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• 1996.06b
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• pp.87-107
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• 1996

The fine Co powder with an average particle sie of less than 1$\mu\textrm{m}$ was prepared by hydrothermal reduction with hydrogen from Co(OH)2 slurry obtained by mixing the solutons of CoSO4$.$7H2O and NaOH. A method to control pH of the end solution around neutrality was proposed. The reduction rate was found to be a function of pH, temperature, hydrogen pressure and the amount of catalyst.

• Applied Chemistry for Engineering
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• v.29 no.3
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• pp.258-263
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• 2018

This study attempted to utilize ultrafine precipitated calcium carbonate for fluoride removal from the wastewater of electronics industries. An average particle size of the calcium carbonate was $0.96{\mu}m$, and pH of the aqueous slurry was 10 with 70% in mass. The suspension solution showed approximately 2 mL/hr of the sedimentation rate. The present calcium carbonate solution could be comparable to the conventional aqueous calcium source, $Ca(OH)_2$, for the neutralization and removal of fluoride ions. Depending on the amount of an additional alkali source, less amounts of test Ca-source slurries were required to reach the solution pH of 7.0 than that of using the aqueous calcium hydroxide. It was also found from XRD analysis that more calcium fluoride precipitates were formed by the addition of calcium carbonate solution rather than that of calcium hydroxide. In addition, Minteq equilibrium modelling estimated various ion complexes of fluoride and calcium in this process.

• Proceedings of the Materials Research Society of Korea Conference
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• 2011.05a
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• pp.37.2-37.2
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• 2011

반도체공정에서 Photo-lithography는 특정 광원을 사용하여 구현하고자 하는 패턴을 기판상에 형성하는 기술이다. 이러한 Photo-lithography 공정에서는 패턴이 형성되어 있는 마스크가 핵심적인 역할을 하며 반도체소자의 전체적인 성능을 결정한다. 이에 따라 Photo-lithography용 마스크에 사용되는 Blank 마스크는 Defect의 최소화 및 우수한 평탄도 등의 조건들이 요구되고 있다. 이러한 Blank 마스크 재료로 광원을 효율적으로 투과시키는 성질이 우수하고 다른 재료에 비해 열팽창계수가 작은 석영기판이 사용되고 있다. 석영 기반의 마스크는 UV Lithography에서 주로 사용되고 있으며 그 밖에 UV-NIL (Nano Imrpint Lithography), EUVL (Extreme Ultra Violet Lithography) 등에도 이용되고 있다. 석영기판을 가공하여 Blank 마스크로 제작하기 위해 석영기판의 Lapping/Polishing 등이 핵심기술이며 현재 일본에서 전량 수입에 의존하고 있어, 이에 대한 연구의 필요성이 절실한 상황이다. 본 연구에서는 Blank 마스크제작을 위한 석영기판의 Polishing 공정에 사용되는 Ceria Slurry의 특성 연구 및 이에 따른 연마평가를 실시하였으며 첨가제의 조건에 따른 pH/Viscosity/Stability 등의 물리적인 특성을 관찰하여 석영기판 Polishing에 효율적인 Ceria slurry의 최적조건을 도출했다. 또한, 조건에 따른 Slurry의 정확한 분석을 위해 Zeta Potential Analyzer를 이용하여 연마입자의 크기 및 Zeta Potential에 대한 평가를 실시한 후 연마제와 석영기판의 Interaction force를 측정하였다. 상기 실험에 의해 얻어진 최적화된 연마 공정 조건하에서 Ceria slurry를 사용하여 연마평가를 실시함으로써 Removal Rate/Roughness 등의 결과를 관찰하였다. 본 연구를 통해 반도체 photo mask 제작을 위한 Ceria slurry의 주요특성을 파악하고 석영기판의 Polishing에 효율적인 조건을 도출함으로써 Lithography 마스크를 효율적으로 제작할 수 있을 것으로 예상된다.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2003.05c
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• pp.158-161
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• 2003

The primary aim of this study is to investigate new semi-abrasive free slurry including acid colloidal silica and hydrogen peroxide for copper chemical-mechanical planarization (CMP). In general, slurry for copper CMP consists of colloidal silica as an abrasive, organic acid as a complex-forming agent, hydrogen peroxide as an oxidizing agent, a film forming agent, a pH control agent and several additives. We developed new semi-abrasive free slurry (SAFS) including below 0.5% acid colloidal silica. We evaluated additives as stabilizers for hydrogen peroxide as well as accelerators in tantalum nitride CMP process. We also estimated dispersion stability and Zeta potential of the acid colloidal silica with additives. The extent of enhancement in tantalum nitride CMP was verified through anelectrochemical test. This approach may be useful for the application of single and first step copper CMP slurry with one package system.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2004.07a
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• pp.227-230
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• 2004

As the organic acids were added in the slurry, zeta potential of alumina was changed to negative value and IEP value was shifted from alkaline to acidic pH. In citric acid based slurry, Cu surface continuously dissolved and etching depth linearly increased. On the contrary, passivation layer was grown on Cu surface in oxalic acid based slurry. As the platen rotation speed increased, Preston coefficient decreased in both slurries. With oxalic acid based slurry, at low velocity, removal rate is high value because of high friction force compared to citric acid based slurry. As platen velocity increased, removal of Cu in citric acid based slurry became higher value than oxalic acid based slurry. Typical lubrication behaviors were observed in both slurries. As Sommerfeld number increased, COF values gradually decreased and then re-increased. It indicated that lubrication was changed to direct contact or semi-direct contact mode to hydro-lubrication mode.

• Journal of the Korean Magnetics Society
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• v.5 no.6
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• pp.928-936
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• 1995

In this research, the processing control of NiCuZn Ferrite has been developed. The mixing and the size reduction of raw materials have been proceeded. In order to produce NiCuZn Ferrite, highly concentrated slurry with fixed ratio and wet ball milling were used. First, the dispersion behavior of raw mixture at the region of pH4~pH11 has been studied. Using wet ball milling operation, the best conditions of mixing and size reduction have been determined. Further more, the most suitable conditions, such as, dispersant kind, dispersant amount, milling time, and slurry concentration have been studied. The poly acrylic ammonium salt (PAN) was chosen as a suitable dispersant to have effective dispersion in basic region. The slurry of raw mixture without dispersant, showed high viscosity and poor grindability. As 0.7 wt% of PAN was added, the concentrated slurry (up to 55 vol%) was possible, and showed well grindability. After 18 h ball milling of 30 vol% of mixture slurry with 0.7 wt% of PAN, the average particle size and specific surface area of raw mixture were $0.54\mu\textrm{m}$ and $12.92m^{2}/cc$, respectively. The ball milled raw mixture, calcined at $700^{\circ}C$ for 3h, was totally changed into NiCuZn Ferrite with spinel phase.