• 한국정보디스플레이학회:학술대회논문집
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• 2008.10a
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• pp.851-854
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• 2008

In order to reduce the manufacturing cost of TFT LCDs and cut down an amount facilities invested, there are many LCD panel makers contributes to convert the current Five-mask manufacturing process into the noble Four-mask fabrication process. We optimized the slit mask to improve the poor process reliability.

• Journal of the Korean Society for Precision Engineering
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• v.27 no.8
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• pp.84-90
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• 2010

In focused ion beam (FIB) fabrication processes the ion beam intensity with Gaussian profile has a drawback for high resolution machining. In this paper, the fabrication method to modify the beam profile at substrate using silt mask is proposed to increase the machining resolution at high current. Slit mask is utilized to block the part of beam and transmit only high intensity portion. A nano manipulator is utilized to handle the silt mask. Geometrical analysis on fabricated profile through silt mask was conducted. By utilizing proposed method, improvement of machining resolution was achieved.

• The Bulletin of The Korean Astronomical Society
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• v.43 no.1
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• pp.68.4-69
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• 2018

GMACS is one of the instruments for the Giant Magellan Telescope (GMT) which will provide wide field, multi-object, moderate resolution spectroscopy of faint targets. KHU (Kyung Hee University) is in charge of control software of GMACS. As a first step, the Slit Mask Exchange Mechanism Prototype (SMEM-P) will be used as a preliminary example to make development process between electronics and high level software. Recently, we have developed a sample program to communicate with low level devices via EtherCAT. It is expected to be a mockup design for software and control system of GMACS. In this poster, we show the development process and test operation results of control software for SMEM-P.

• Korean Journal of Optics and Photonics
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• v.16 no.6
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• pp.508-515
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• 2005

We propose a fabrication method for refractive lens by variable velocity moving mask lithography and slit pattern. Distribution of exposure dose should be controlled for the curved photoresist surface that works as a refractive surface. We analyze theoretically the distribution of exposure dose by change of moving velocity, moving direction of mask and the shape of mask pattern, and confirm for the curved surface experimentally. The lens could have sag height of a few of hundreds ${\mu}m$, by using thick photoresist or Deep RIE process.

• Korean Chemical Engineering Research
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• v.44 no.5
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• pp.513-519
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• 2006

We developed two kinds of the microchip for application to electrophoresis based on both glass and quartz employing the MEMS fabrications. The poly-Si layer deposited onto the bonding interface apart from channel regions can play a role as the optical slit cutting off the stray light in order to concentrate the UV ray, from which it is possible to improve the signal-to-noise (S/N) ratio of the detection on a chip. In the glass chip, the deposited poly-Si layer had an important function of the etch mask and provided the bonding surface properly enabling the anodic bonding. The glass wafer including more impurities than quartz one results in the higher surface roughness of the channel wall, which affects subsequently on the microflow behavior of the sample solutions. In order to solve this problem, we prepared here the mixed etchant consisting HF and $NH_4F$ solutions, by which the surface roughness was reduced. Both the shape and the dimension of each channel were observed, and the electroosmotic flow velocities were measured as 0.5 mm/s for quartz and 0.36 mm/s for glass channel by implementing the microchip electrophoresis. Applying the optical slit with poly-Si layer provides that the S/N ratio of the peak is increased as ca. 2 times for quartz chip and ca. 3 times for glass chip. The maximum UV absorbance is also enhanced with ca. 1.6 and 1.7 times, respectively.

• The Bulletin of The Korean Astronomical Society
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• v.44 no.2
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• pp.79.3-79.3
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• 2019

GMACS is one of the first light instruments for the Giant Magellan Telescope (GMT). The development of GMACS control software follows Agile software development process, and the design of the software is based on the Unified Model Language (UML). In this poster, we present the architecture of the GMACS software and the development processes. As an example of the software development, we show the software of the Slit Mask Exchange Mechanism Prototype (SMEM-P) which is part of the GMACS Device Control Package (DCP).