• 한국환경과학회지
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• 제1권1호
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• pp.41-46
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• 1992

주거지역에서 대기오염물 시료채취에 대한 장기간 연구를 수행하기 위해서 휘발성 유기 화합물 분석에 적합한 24시간동안의 종합적인 공기시료를 채취하기 위해 공기시료 채취기가 제작되었다. 이 시료 채취기는 시료채취시 요구되는 모든 특성을 포함할 뿐만 아니라, 일반가정에 근접해서 설치되어야하므로 심미적 특성도 포함한다. 이 공기시료 채취기는 흡착제(티넥스)로 채워진 5/8인치 외경의 스테인레스 스틸 트랩 네개를 수용할수 있고, 분당 5-50 밀리리터의 범위에서 네 종류의 공기유속을 이용할수 있게 고안 되었다. 금속필도(10마이크로미터)가 트랩 어댑터의 입구에 직접 부착되었다. 부가적인 특성은 다음과 같다. : 1) 유기물질에 불활성인 재료로 제작 되었고, 2) 날씨에 영향을 받지 않고, 3) 전지를 이용하고, 4) 사람의 호흡영역에서 공기 시료를 채취하고, 그리고 5) 방음제로 싸여진 작은 펌프를 이용하여 조용하게 작동된다. 펌프/전지 장치는 시료채취기의 본체로부터 분리 되었다. 이 장치로 부터 야기되는 소음수준은 주거지역의 허용기준치(뉴저지주 환경보호국 기준)보다 낮았다. 이 공기시료 채취기는 일상 주거지역과 단층의 한 국민학교 옥상에서 성공적으로 작동되었다.

• 한국분말야금학회:학술대회논문집
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• 한국분말야금학회 2002년도 제3회 최신 분말제품 응용기술 Workshop
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• pp.25-37
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• 2002

The most important industrial application of gamma radiation in characterizing green compacts is the determination of the density. Examples are given where this method is applied in manufacturing technical components in powder metallurgy. The requirements imposed by modern quality management systems and operation by the workforce in industrial production are described. The accuracy of measurement achieved with this method is demonstrated and a comparison is given with other test methods to measure the density. The advantages and limitations of gamma ray densitometry are outlined. The gamma ray densitometer measures the attenuation of gamma radiation penetrating the test parts (Fig. 1). As the capability of compacts to absorb this type of radiation depends on their density, the attenuation of gamma radiation can serve as a measure of the density. The volume of the part being tested is defined by the size of the aperture screeniing out the radiation. It is a channel with the cross section of the aperture whose length is the height of the test part. The intensity of the radiation identified by the detector is the quantity used to determine the material density. Gamma ray densitometry can equally be performed on green compacts as well as on sintered components. Neither special preparation of test parts nor skilled personnel is required to perform the measurement; neither liquids nor other harmful substances are involved. When parts are exhibiting local density variations, which is normally the case in powder compaction, sectional densities can be determined in different parts of the sample without cutting it into pieces. The test is non-destructive, i.e. the parts can still be used after the measurement and do not have to be scrapped. The measurement is controlled by a special PC based software. All results are available for further processing by in-house quality documentation and supervision of measurements. Tool setting for multi-level components can be much improved by using this test method. When a densitometer is installed on the press shop floor, it can be operated by the tool setter himself. Then he can return to the press and immediately implement the corrections. Transfer of sample parts to the lab for density testing can be eliminated and results for the correction of tool settings are more readily available. This helps to reduce the time required for tool setting and clearly improves the productivity of powder presses. The range of materials where this method can be successfully applied covers almost the entire periodic system of the elements. It reaches from the light elements such as graphite via light metals (AI, Mg, Li, Ti) and their alloys, ceramics ($AI_20_3$, SiC, Si_3N_4, $Zr0_2$, ...), magnetic materials (hard and soft ferrites, AlNiCo, Nd-Fe-B, ...), metals including iron and alloy steels, Cu, Ni and Co based alloys to refractory and heavy metals (W, Mo, ...) as well as hardmetals. The gamma radiation required for the measurement is generated by radioactive sources which are produced by nuclear technology. These nuclear materials are safely encapsulated in stainless steel capsules so that no radioactive material can escape from the protective shielding container. The gamma ray densitometer is subject to the strict regulations for the use of radioactive materials. The radiation shield is so effective that there is no elevation of the natural radiation level outside the instrument. Personal dosimetry by the operating personnel is not required. Even in case of malfunction, loss of power and incorrect operation, the escape of gamma radiation from the instrument is positively prevented.

• Restorative Dentistry and Endodontics
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• 제34권1호
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• pp.69-79
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• 2009

본 연구의 목적은 근관치료 된 치아를 구조와 물성이 다른 post와 core 그리고 전장관으로 수복한 후 과도한 교합하중을 가했을 때 치아에 나타나는 응력분포를 조사하기 위함이다. 발치 된 상악 제2소구치를 micro-CT로 단층촬영하고 3D Doctor로 윤곽선을 추출한 다음 HyperMesh Ver. 6으로 삼차원 치아모형을 만들고 다음과 같은 세 가지 방법으로 수복한 유한요소모형을 제작하였다. 1) 스테인레스 스틸 포스트와 복합레진 코어 그리고 도재소부전장금관으로 수복한 모형. 2) fiber 포스트와 복합레진 코어 그리고 전부도재관으로 수복한 모형 3) 포스트, 코어와 전장관이 일체형인 간접복합레진 EndoCrown으로 수복한 모형 형성된 모형의 협측 또는 설측교두에 500N의 하중을 가하였으며 하중의 방향은 치아 장축에 대해 45도 이었다. 치관부와 치근부의 von Mises 응력을 ANSYS 9.0프로그램으로 분석한 결과 포스트와 코어의 형태보다는 전장관 재료의 탄성 계수가 근관치료된 상악 소구치의 응력분포를 좌우하였다. 치관부에서는 재료의 탄성계수가 높은 전 장관으로 수복한 모형이 낮은 응력분포를 보였다. 치근부에서는 재료의 탄성계수가 낮은 전 장관으로 수복한 모형 이 낮은 응력분포를 보였다.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2000년도 추계학술발표회 초록집
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• pp.3-4
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• 2000

Many researchers are interested in the synthesis and characterization of carbon nitride and diamond-like carbon (DLq because they show excellent mechanical properties such as low friction and high wear resistance and excellent electrical properties such as controllable electical resistivity and good field electron emission. We have deposited amorphous carbon nitride (a-C:N) thin films and DLC thin films by shielded arc ion plating (SAIP) and evaluated the structural and tribological properties. The application of appropriate negative bias on substrates is effective to increase the film hardness and wear resistance. This paper reports on the deposition and tribological OLC films in relation to the substrate bias voltage (Vs). films are compared with those of the OLC films. A high purity sintered graphite target was mounted on a cathode as a carbon source. Nitrogen or argon was introduced into a deposition chamber through each mass flow controller. After the initiation of an arc plasma at 60 A and 1 Pa, the target surface was heated and evaporated by the plasma. Carbon atoms and clusters evaporated from the target were ionized partially and reacted with activated nitrogen species, and a carbon nitride film was deposited onto a Si (100) substrate when we used nitrogen as a reactant gas. The surface of the growing film also reacted with activated nitrogen species. Carbon macropartic1es (0.1 -100 maicro-m) evaporated from the target at the same time were not ionized and did not react fully with nitrogen species. These macroparticles interfered with the formation of the carbon nitride film. Therefore we set a shielding plate made of stainless steel between the target and the substrate to trap the macropartic1es. This shielding method is very effective to prepare smooth a-CN films. We, therefore, call this method "shielded arc ion plating (SAIP)". For the deposition of DLC films we used argon instead of nitrogen. Films of about 150 nm in thickness were deposited onto Si substrates. Their structures, chemical compositions and chemical bonding states were analyzed by using X-ray diffraction, Raman spectroscopy, X-ray photoelectron spectroscopy and infrared spectroscopy. Hardness of the films was measured with a nanointender interfaced with an atomic force microscope (AFM). A Berkovich-type diamond tip whose radius was less than 100 nm was used for the measurement. A force-displacement curve of each film was measured at a peak load force of 250 maicro-N. Load, hold and unload times for each indentation were 2.5, 0 and 2.5 s, respectively. Hardness of each film was determined from five force-displacement curves. Wear resistance of the films was analyzed as follows. First, each film surface was scanned with the diamond tip at a constant load force of 20 maicro-N. The tip scanning was repeated 30 times in a 1 urn-square region with 512 lines at a scanning rate of 2 um/ s. After this tip-scanning, the film surface was observed in the AFM mode at a constant force of 5 maicro-N with the same Berkovich-type tip. The hardness of a-CN films was less dependent on Vs. The hardness of the film deposited at Vs=O V in a nitrogen plasma was about 10 GPa and almost similar to that of Si. It slightly increased to 12 - 15 GPa when a bias voltage of -100 - -500 V was applied to the substrate with showing its maximum at Vs=-300 V. The film deposited at Vs=O V was least wear resistant which was consistent with its lowest hardness. The biased films became more wear resistant. Particularly the film deposited at Vs=-300 V showed remarkable wear resistance. Its wear depth was too shallow to be measured with AFM. On the other hand, the DLC film, deposited at Vs=-l00 V in an argon plasma, whose hardness was 35 GPa was obviously worn under the same wear test conditions. The a-C:N films show higher wear resistance than DLC films and are useful for wear resistant coatings on various mechanical and electronic parts.nic parts.