• 제목/요약/키워드: Single-crystalline silicon

검색결과 143건 처리시간 0.035초

Present Status and Prospects of Thin Film Silicon Solar Cells

  • Iftiquar, Sk Md;Park, Jinjoo;Shin, Jonghoon;Jung, Junhee;Bong, Sungjae;Dao, Vinh Ai;Yi, Junsin
    • Current Photovoltaic Research
    • /
    • 제2권2호
    • /
    • pp.41-47
    • /
    • 2014
  • Extensive investigation on silicon based thin film reveals a wide range of film characteristics, from low optical gap to high optical gap, from amorphous to micro-crystalline silicon etc. Fabrication of single junction, tandem and triple junction solar cell with suitable materials, indicate that fabrication of solar cell of a relatively moderate efficiency is possible with a better light induced stability. Due to these investigations, various competing materials like wide band gap silicon carbide and silicon oxide, low band gap micro-crystalline silicon and silicon germanium etc were also prepared and applied to the solar cells. Such a multi-junction solar cell can be a technologically promising photo-voltaic device, as the external quantum efficiency of such a cell covers a wider spectral range.

Extended Sacrificial Bulk Micromachining Process and Its Application to the Fabrication of X-axis Single-crystalline Silicon Micro-gyroscope

  • Kim, Jong-Pal;Park, Sang-Jun;Kwak, Dong-Hun;Ko, Hyoung-Ho;Song, Tae-Yong;Setiadi, Dadi;Carr, William;Buss, James;Dancho, Dong-Il
    • 제어로봇시스템학회:학술대회논문집
    • /
    • 제어로봇시스템학회 2003년도 ICCAS
    • /
    • pp.1547-1552
    • /
    • 2003
  • In this paper, we present a planar single-crystalline silicon x-axis micro-gyroscope fabricated with a perfectly aligned vertical actuation combs on one silicon wafer, using the extended SBM technology. The fabricated x-axis micro-gyroscope has the resolution of 0.1 deg/sec, the bandwidth of 100 Hz. These research results allow integrating 6 axes inertial measurement (3 accelerations and 3 angular rates) on the same silicon substrate using the same process for the first time.

  • PDF

단결정 실리콘 태양전지를 위한 screen printing 전극과 photo lithography 다층전극의 적용에 대한 연구 (Application of Screen Printing and Photo Lithography Multi-layer Metal Contact for Single Crystalline Silicon Solar Cells)

  • 김도완;최준영;이은주;이수홍
    • 한국전기전자재료학회:학술대회논문집
    • /
    • 한국전기전자재료학회 2006년도 추계학술대회 논문집 Vol.19
    • /
    • pp.109-109
    • /
    • 2006
  • Screen printing (SP) metal contact is typically applied to the solar cells for mass production. However, SP metal contact has low aspect ratio, low accuracy, hard control of the substrate penetration and unclean process. On the other hand, photo lithograpy (PL) metal contact can reduce defects by metal contact. In this investigation, PL metal contact was obtained the multi-layer structure of Ti/Pd/Ag by e-beam process. We applied SP metal contact and PL metal contact to single crystalline silicon solar cells, and demonstrated the difference of conversion efficiency. Because PL metal contact silicon solar cell has Jsc (short circuit current density) better than silicon solar cell applied SP metal contact.

  • PDF

Scratching Test에 의한 단결정 실리콘의 기계적 손상거동 (Mechanical Damage Behavior of Single Crystalline Silicon by Scratching Test)

  • 김현호;정성민;이홍림
    • 한국세라믹학회지
    • /
    • 제40권1호
    • /
    • pp.104-108
    • /
    • 2003
  • 스크래칭 시험(scratching test)을 이용하여 단결정 실리콘의 수직하중에 대한 마찰계수, AE(Acoustic Emission) 신호와 긁힌 자취의 미세균열을 관찰하고 그 결정구조를 분석하였다. 스크래칭 시험은 하중인가속도(loading rate)를 100N/min으로 하고 스크래칭 속도(scratching speed)를 1, 3, 6, 10mm/min의 4가지로 하여 최대 30N이 될 때까지 행하였다. 그 결과, 수직하중 또는 스크래칭 속도가 증가할 때 마찰계수, AE, 균열밀도는 증가하는 경향을 나타내었다. 스크래칭, 자취에 대한 마이크로 라만 분광법을 이용한 결정구조 분석결과, 스크래칭 속도가 느린 조건에서 압력인가에 따른 실리콘의 다이아몬드 구조에서 다른 고압상의 구조로의 상전이 현상을 관찰할 수 있었다.

태양전지 응용을 위한 PECVD 실리콘 질화막 증착 및 열처리 최적화 (PECVD Silicon Nitride Film Deposition and Annealing Optimization for Solar Cell Application)

  • Yoo, Jin-Su;Dhungel Suresh Kumar;Yi, Jun-Sin
    • 대한전기학회논문지:전기물성ㆍ응용부문C
    • /
    • 제55권12호
    • /
    • pp.565-569
    • /
    • 2006
  • Plasma enhanced chemical vapor deposition(PECVD) is a well established technique for the deposition of hydrogenated film of silicon nitride (SiNx:H), which is commonly used as an antireflection coating as well as passivating layer in crystalline silicon solar cell. PECVD-SiNx:H films were investigated by varying the deposition and annealing conditions to optimize for the application in silicon solar cells. By varying the gas ratio (ammonia to silane), the silicon nitride films of refractive indices 1.85 - 2.45 were obtained. The film deposited at $450^{\circ}C$ showed the best carrier lifetime through the film deposition rate was not encouraging. The film deposited with the gas ratio of 0.57 showed the best carrier lifetime after annealing at a temperature of $800^{\circ}C$. The single crystalline silicon solar cells fabricated in conventional industrial production line applying the optimized film deposition and annealing conditions on large area substrate of size $125mm{\times}125mm$ (pseudo square) was found to have the conversion efficiencies as high as 17.05 %. Low cost and high efficiency silicon solar cells fabrication sequence has also been explained in this paper.

저가격 박막 실리콘 기판을 위한 단결정 실리콘 웨이퍼에 layer transfer 형성 연구 (Cost down thin film silicon substrate for layer transfer formation study)

  • 권재홍;김동섭;이수홍
    • 한국전기전자재료학회:학술대회논문집
    • /
    • 한국전기전자재료학회 2004년도 춘계학술대회 논문집 반도체 재료 센서 박막재료 전자세라믹스
    • /
    • pp.85-88
    • /
    • 2004
  • Mono-crystalline silicon(mono-Si) is both abundant in our environment and an excellent material for Si device applications. However, single crystalline silicon solar cell has been considered to be expensive for terrestrial applications. For that reason, the last few years have seen very rapid progress in the research and development activities of layer transfer(LT) processes. Thin film Si layers which can be detached from a reusable mono-Si wafers served as a substrate for epitaxial growth. The epitaxial films have a very high efficiency potential. LT technology is a promising approach to reduce fabrication cost with high efficiency at large scale since expensive Si substrate can be recycled. Low quality Si can be used as a substrate. Therefore, we propose one of the major technologies on fabricating thin film Si substrate using a LT. In this paper, we study the LT method using the electrochemical etching(ECE) and solid edge.

  • PDF

BIPV용 건식 및 습식 텍스쳐링 공정에 의한 다결정실리콘 태양전지 모듈 특성 연구 (A Study of Characterization of Multi-Crystalline Silicon Solar Cell Module using by RIE and Wet Texturing for BIPV)

  • 서일원;윤명수;조태훈;손찬희;차성호;이상두;권기청
    • 신재생에너지
    • /
    • 제9권2호
    • /
    • pp.30-39
    • /
    • 2013
  • Multi-crystalline silicon solar cells is not exist a specific crystal direction different from single crystalline silicon solar cells. In functional materials, therefore, isotropic wet etching of mc-Si solar cell is easy the acid solution rather than the alkaline solution. The reflectance of wet texturing process is about 25% and the reflectance of RIE texturing process is achieved less than 10%. In addition, wet texturing has many disadvantages as well as reflectance. So wet texturing process has been replaced by a RIE texturing process. In order to apply BIPV, RIE and wet textured multi-crystalline silicon solar cell modules was manufactured by different kind of EVA sheet. Moreover, in case of BIPV, the short circuit current characteristics according to the angle of incidence is more important, because the installation of BIPV is fixed location. In this study, we has measured SEM image and I-V curve of RIE and wet textured silicon solar cell and PV module. Also we has analyzed quantum efficiency characteristics of RIE and wet textured silicon solar cell for PV modules depending on incidence angle.

바이오칩 제작 장치용 단결정 실리콘 마이크로 미러 어레이의 설계와 제작 (Design and fabrication of a single crystalline silicon micromirror array for biochip fabrication systems)

  • 장윤호;이국녕;김용권
    • 대한전기학회:학술대회논문집
    • /
    • 대한전기학회 2003년도 추계학술대회 논문집 전기물성,응용부문
    • /
    • pp.49-52
    • /
    • 2003
  • Single crystalline silicon (SCS) was adopted for a reliable micromirror array of biochip fabrication applications. SCS has excellent mechanical properties and smooth surface, which is the best material for micromirror devices. The mirror array has $16{\times}16$ micromirrors and each mirror has a $120{\mu}m{\times}100{\mu}m$ reflective surface. The micromirror has simple torsional beam springs and electrostatic force was used for driving. The designed tilting angle was $9.6^{\circ}$, and the tilting angles were measured according to applied voltages. The surface roughness was measured by a laser profiler. The response time was measured using He-Ne laser and position sensitive diode (PSD), and the lifetime was checked for reliability proof.

  • PDF

정보통신 소자 응용을 위한 단결정 실리콘 마이크로 미러 어레이 (Single crystalline silicon micyomirror array for data communication applications)

  • 장윤호;이국녕;김용권
    • 한국정보통신설비학회:학술대회논문집
    • /
    • 한국정보통신설비학회 2003년도 하계학술대회
    • /
    • pp.93-95
    • /
    • 2003
  • We have designed and fabricated a micromirror array using single crystalline silicon (SCS) for data communication applications. The mirror array has $16{\times}16$ micromirrors and each mirror has $120{\mu}m{\times}100{\mu}m$ reflective surface. Electrostatic force was adopted as a driving mechanism. The spring dimensions were determined using relationship between spring dimensions and driving voltage. The designed tilting angle was $9.6^{\circ}$, and measured tilting angle according to applied voltages were experimented. The response time was measured using He-Ne laser and position sensitive diode (PSD), and lifetime was checked for reliability proof.

  • PDF

CVD에 의한 고전력 디바이스용 단결정 3C-SiC 박막 성장 (Growth of Single Crystalline 3C-SiC Thin Films for High Power Devices by CVD)

  • 정귀상;심재철
    • 한국전기전자재료학회논문지
    • /
    • 제23권2호
    • /
    • pp.98-102
    • /
    • 2010
  • This paper describes that single crystalline 3C-SiC (cubic silicon carbide) thin films have been deposited on carbonized Si(100) substrates using hexamethyldisilane (HMDS, $Si_2(CH_3){_6}$) as a safe organosilane single precursor and a nonflammable mixture of Ar and $H_2$ gas as the carrier gas by APCVD at $1280^{\circ}C$. The deposition was performed under various conditions to determine the optimized growth condition. The crystallinity of the 3C-SiC thin film was analyzed by XRD (X-ray diffraction). The surface morphology was also observed by AFM (atomic force microscopy) and voids between SiC and Si interfaces were measured by SEM (scanning electron microscopy). Finally, residual strain and hall mobility was investigated by surface profiler and hall measurement, respectively. From these results, the single crystalline 3C-SiC film had a good crystal quality without defects due to viods, a low residual stress, a very low roughness.