• 한국재료학회:학술대회논문집
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• 한국재료학회 2011년도 추계학술발표대회
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• pp.16.2-16.2
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• 2011

Graphene has attracted significant attention due to its unique characteristics and promising nanoelectronic device applications. For practical device applications, it is essential to synthesize high-quality and large-area graphene films. Graphene has been synthesized by eloborated mechanical exfoliation of highly oriented pyrolytic graphite, chemical reduction of exfoliated grahene oxide, thermal decomposition of silicon carbide, and chemical vapor deposition (CVD) on metal substrates such as Ni, Cu, Ru etc. The CVD has advantages over some of other methods in terms of mass production on large-areas substrates and it can be easily separated from the metal substrate and transferred to other desired substrates. Especially, plasma-enhanced CVD (PECVD) can be very efficient to synthesize high-quality graphene. Little information is available on the synthesis of graphene by PECVD even though PECVD has been demonstrated to be successful in synthesizing various carbon nanostructures such as carbon nanotubes and nanosheets. In this study, we synthesized graphene on $Ni/SiO_2/Si$ and Cu plate substrates with CH4 diluted in $Ar/H_2$ (10%) by using an inductively-coupled PECVD (ICPCVD). High-quality graphene was synthesized at as low as $700^{\circ}C$ with 600 W of plasma power while graphene layer was not formed without plasma. The growth rate of graphene was so fast that graphene films fully covered on substrate surface just for few seconds $CH_4$ gas supply. The transferred graphene films on glass substrates has a transmittance at 550 nm is higher 94%, indicating 1~3 monolayers of graphene were formed. FETs based on the grapheme films transferred to $Si/SiO_2$ substrates revealed a p-type. We will further discuss the synthesis of graphene and doped graphene by ICPVCD and their characteristics.

• 한국재료학회지
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• 제20권4호
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• pp.217-222
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• 2010

Zirconium diboride (ZrB2) and mixed diboride of (Zr0.7Ta0.3)B2 containing 30 vol.% silicon carbide (SiC) composites were prepared by hot-pressing at $1800^{\circ}C$. XRD analysis identified the high crystalline metal diboride-SiC composites at $1800^{\circ}C$. The TaB2 addition to ZrB2-SiC showed a slight peak shift to a higher angle of 2-theta of ZrB2, which confirmed the presence of a homogeneous solid solution. Elastic modulus, hardness and fracture toughness were slightly increased by addition of TaB2. A volatility diagram was calculated to understand the oxidation behavior. Oxidation behavior was investigated at $1500^{\circ}C$ under ambient and low oxygen partial pressure (pO2~10-8 Pa). In an ambient environment, the TaB2 addition to the ZrB2-SiC improved the oxidation resistance over entire range of evaluated temperatures by formation of a less porous oxide layer beneath the surface SiO2. Exposure of metal boride-SiC at low pO2 resulted in active oxidation of SiC due to the high vapor pressure of SiO (g), and, as a result, it produced a porous surface layer. The depth variations of the oxidized layer were measured by SEM. In the ZrB2-SiC composite, the thickness of the reaction layer linearly increased as a function of time and showed active oxidation kinetics. The TaB2 addition to the ZrB2-SiC composite showed improved oxidation resistance with slight deviation from the linearity in depth variation.

• 한국컴퓨터그래픽스학회논문지
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• 제17권2호
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• pp.37-43
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• 2011

스마트 폰을 비롯한 다양한 임베디드 환경에서 널리 쓰이는 2D 벡터 그래픽스 기술에는 OpenVG와 SVG Tiny가 대표적이다. 고해상도 화면에서 높은 재생속도의 벡터 그래픽스 응용을 위해서는, 이들을 효과적으로 가속해야 한다. 현재까지 OpenVG와 SVG Tiny의 구현방법에는, 전용 그래픽스 칩과 같은 하드웨어로 구현하는 방법과, 전체를 소프트웨어로 구현하는 방식이 있었다. 현재 시장에서 사용 가능한 벡터 그래픽스 전용 칩들은 상대적으로 고가에 큰 전력을 소비한다. 반면, 소프트웨어 구현에서는 100%에 가까운 CPU 사용률에서도 상대적으로 낮은 성능을 보이고, 이 경우에, 다른 멀티-쓰레드 응용프로그램들을 방해할 가능성이 컸다. 본 논문에서는, 현재 미디어 재생 기기들과 휴대폰들에 광범위하게 장착되어 있는 상용 멀티미디어용 하드웨어들을 사용하여 OpenVG와 SVG Tiny 양쪽 모두를 가속하는 비용대비 효과적인 방법을 제시한다. 멀티미디어 프로세서들을 효과적으로 사용함으로써, CPU 사용률과 전력소모량을 줄이면서도 OpenVG와 SVG Tiny를 최소 3.5배에서 최대 30배까지 성공적으로 가속할 수 있었다.

• 청정기술
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• 제17권1호
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• pp.25-30
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• 2011

본 연구 논문은 수용액 기반의 청정 표면 개질 기술을 이용하여 세포칩을 제작하는 방법에 관한 것이다. 세포칩의 활용범위는 유전학, 의생물학, 세포생물학 등과 같은 기초학문과 더불어 암 진단 및 치료에 대한 유용한 도구로 응용 가능성을 가지게 된다. 기존의 세포 칩 제작을 위해서는 다량의 유기용매의 사용, 반도체 공정의 복잡성, 고가의 장비 등을 사용함으로 인해 경제적 손실과 환경적 악영향을 주었다. 본 연구에서는 수용액 기반의 청정 표면 개질 기술과 마이크로 컨택트 프린팅 방법을 이용한 세포 패터닝 기술을 융합하여 매우 손쉬운 세포 칩 구현을 하는 기반기술을 제시하였다. 이 세포칩을 이용하여 암세포와 정상세포간의 세포표면에서 발현되는 다양한 탄수화물 및 그의 유도체의 발현양의 차이를 분석할 수 있었다. 이를 바탕으로 새로운 암진단 기술 및 기초 의공학 기술에 활용하고자 한다.

• 한국안광학회지
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• 제12권3호
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• pp.77-81
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• 2007

금속테의 황색도금물질로 사용되는 티타늄질화물(titanium nitride: $TiN_x$)의 단일박막을 질소가스의 양을 달리 공급 하여 Si(100) 기판위에 초고진공 RF 마그네트론 스퍼터링(ultra high vacuum radio frequency magnetron sputtering) 방법으로 증착하였다. 박막 증착 후 가변입사각분광타원계를 사용하여 1.5-5.0 eV 에너지 영역에서 타원 각 ${\Delta}$와 ${\Psi}$를 측정하였다. 이 측정결과들을 Drude+Lorentz oscillator 분산관계식을 사용하여 최적 맞춤하고, 매개변수들을 구하여 박막의 광학상수인 굴절계수 $n({\lambda})$과 소광계수 $k({\lambda})$를 각각 결정하였다.

• 한국진공학회지
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• 제16권6호
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• pp.439-445
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• 2007

RF 및 고속 아날로그 특성 및 제조 공정의 용이성에 의하여 고속 유무선통신 및 초고주파 분야에서 많이 이용되고 있는 SiGe 집적회로에서, SiGe 박막 저항기의편차를 줄여 집적회로의 신뢰성을 높이는 것이 중요하다. 본 논문에서는 실리콘계 박막 저항기 제조 후 발생하는 불균일한 저항 값 분포의 원인 규명과 그 해결 방안에 대하여 고찰한다. SiGe 박막 저항기의 실리사이드가 존재하는 컨택 영역에서 Ti-B석출물의 영향으로 인하여 저항 값의 불균일성 발생하는데, 이를 최소화하기 위하여는 가능한 최대의 boron 이온을 주입할 필요가 있다. SiGe 저항기와 금속을 배선하기 위한 컨택 홀의 크기가 작을수록 SiGe 층 내에서 돌출부가 컨택 홀의 전체면적을 차지하게 될 확률이 커지게 되어 접촉저항이 비정상적으로 커질 확률 또한 높아지게 되므로, 돌출부가 생성되는 SiGe 저항기의 경우는 컨택 홀의 면적을 크게하여 SiGe 저항기의 편차를 개선하였다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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• pp.277-277
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• 2013

The epitaxial graphene on the 4H- or 6H-SiC(0001) surface has been intensively studied due to the possibility of wafer-scale growt. However the existence of interface layer (zero layer graphene) and its influence on the upper graphene layer have been considered as one of the main obstarcles for the industrial application. Among various methods tried to overcome the strong interaction with the substrate through the interface layer, it has been proved that the hydrogen intercalation successfully passivate the Si dangling bond of the substrate and can produce the quasi-free standing epitaxial graphene (QFEG) layers on the siC(0001) surface. In this study, we report the results of the angle-resolved photoemission spectroscopy (ARPES) and Raman spectroscopy for the QFEG layers produced by ex-situ and in-situ hydrogen intercalation.From the ARPES measurement, we confirmed that the Dirac points of QFEG layers exactly coincide with the Fermi level. The band structure of QFEG layer are sustainable upon thermal heating up to 1100 K and robust against the deposition of several metals andmolecular deposition. We also investigated the strain of the QFEG layers by using Raman spectroscopy measurement. From the change of the 2D peak position of graphene Raman spectrum, we found out that unlike the strong compressive strain in the normal epitaxial graphene on the SiC(0001) surface, the strain of the QFEG layer are significantly released and almost similar to that of the mechanically exfoliated graphene on the silicon oxide substrate. These results indicated that various ideas proposed for the ideal free-standing graphene can be tested based on the QFEG graphene layers grown on the SiC(0001) surface.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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• pp.215-216
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• 2013

The silicide is a compound of Si with an electropositive component. Silicides are commonly used in silicon-based microelectronics to reduce resistivity of gate and local interconnect metallization. The popular silicide candidates, CoSi2 and TiSi2, have some limitations. TiSi2 showed line width dependent sheet resistance and has difficulty in transformation of the C49 phase to the low resistive C54. CoSi2 consumes more Si than TiSi2. Nickel silicide is a promising material to substitute for those silicide materials providing several advantages; low resistivity, lower Si consumption and lower formation temperature. Nickel silicide (NiSi) nanowire (NW) has features of a geometrically tiny size in terms of diameter and significantly long directional length, with an excellent electrical conductivity. According to these advantages, NiSi NWs have been applied to various nanoscale applications, such as interconnects [1,2], field emitters [3], and functional microscopy tips [4]. Beside its tiny geometric feature, NW can provide a large surface area at a fixed volume. This makes the material viable for photovoltaic architecture, allowing it to be used to enhance the light-active region [5]. Additionally, a recent report has suggested that an effective antireflection coating-layer can be made with by NiSi NW arrays [6]. A unique growth mechanism of nickel silicide (NiSi) nanowires (NWs) was thermodynamically investigated. The reaction between Ni and Si primarily determines NiSi phases according to the deposition condition. Optimum growth conditions were found at $375^{\circ}C$ leading long and high-density NiSi NWs. The ignition of NiSi NWs is determined by the grain size due to the nucleation limited silicide reaction. A successive Ni diffusion through a silicide layer was traced from a NW grown sample. Otherwise Ni-rich or Si-rich phase induces a film type growth. This work demonstrates specific existence of NiSi NW growth [7].

• Current Photovoltaic Research
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• 제4권3호
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• pp.124-129
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• 2016

Recently industry has voiced a need for optimally designing the production process of low-cost, high-quality ingots by improving productivity and reducing production costs with the Czochralski process. Crystalline defect control is important for the production of high-quality ingots. Also oxygen is one of the most important impurities that influence crystalline defects in single crystals. Oxygen is dissolved into the silicon melt from the silica crucible and incorporated into the crystalline a far larger amount than other additives or impurities. Then it is eluted during the cooling process, there by causing various defect. Excessive quantities of oxygen degrade the quality of silicone. However an appropriate amount of oxygen can be beneficial. because it eliminates metallic impurities within the silicone. Therefore, when growing crystals, an attempt should be made not to eliminate oxygen, but to uniformly maintain its concentration. Thus, the control of oxygen concentration is essential for crystalline growth. At present, the control of oxygen concentration is actively being studied based on the interdependence of various factors such as crystal rotation, crucible rotation, argon flow, pressure, magnet position and magnetic strength. However for methods using a magnetic field, the initial investment and operating costs of the equipment affect the wafer pricing. Hence in this study simulations were performed with the purpose of producing low-cost, high-quality ingots through the development of a process to optimize oxygen concentration without the use of magnets and through the following. a process appropriate to the defect-free range was determined by regulating the pulling rate of the crystals.

• 한국우주과학회:학술대회논문집(한국우주과학회보)
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• 한국우주과학회 2008년도 한국우주과학회보 제17권2호
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• pp.33.3-34
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• 2008

As an activity of building Korean Space Weather Prediction Center (KSWPC), we has studied of radiation effect on the spacecraft components. High energy charged particles trapped by geomagnetic field in the region named Van Allen Belt can move to low altitude along magnetic field and threaten even low altitude spacecraft. Space Radiation can cause equipment failures and on occasions can even destroy operations of satellites in orbit. Sun sensors aboard Science and Technology Satellite (STSAT-1) was designed to detect sun light with silicon solar cells which performance was degraded during satellite operation. In this study, we try to identify which particle contribute to the solar cell degradation with ground based radiation facilities. We measured the short circuit current after bombarding electrons and protons on the solar cells same as STSAT-1 sun sensors. Also we estimated particle flux on the STSAT-1 orbit with analyzing NOAA POES particle data. Our result clearly shows STSAT-1 solar cell degradation was caused by energetic protons which energy is about 700 keV to 1.5 MeV. Our result can be applied to estimate solar cell conditions of other satellites.