• 제목/요약/키워드: Silicon thin

검색결과 1,697건 처리시간 0.029초

Nanoscale Fabrication in Aqueous Solution using Tribo-Nanolithography

  • Park, Jeong-Woo;Lee, Deug-Woo;Kawasegi, Noritaka;Morita, Noboru
    • International Journal of Precision Engineering and Manufacturing
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    • 제7권4호
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    • pp.8-13
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    • 2006
  • Nanoscale fabrication of silicon substrate in an aqueous solution based on the use of atomic force microscopy was demonstrated. A specially designed cantilever with a diamond tip, allowing the formation of a mask layer on the silicon substrate by a simple scratching process (Tribo-Nanolithography, TNL), has been applied instead of the conventional silicon cantilever for scanning. A slant nanostructure can be fabricated by a process in which a thin mask layer rapidly forms on the substrate at the diamond tip-sample junction along scanning path of the tip, and simultaneously, the area uncovered with the mask layer is etched. This study demonstrates how the TNL parameters can affect the formation of the mask layer and the shape of 3-D structure, hence introducing a new process of AFM-based nanolithography in aqueous solution.

릴레이 제어법을 이용한 실리콘 웨이퍼의 정전부상에 관한 연구 (Electrostatic Suspension System of Silicon Wafer using Relay Feedback Control)

  • 이상욱;전종업
    • 한국정밀공학회지
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    • 제22권10호
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    • pp.56-64
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    • 2005
  • A simple and cost-effective method for the electrostatic suspension of thin plates like silicon wafers is proposed which is based on a switched voltage control scheme. It operates according to a relay feedback control and deploys only a single high-voltage power supply that can deliver a DC voltage of positive and/or negative polarity. This method possesses the unique feature that no high-voltage amplifiers are needed which leads to a remarkable system simplification relative to conventional methods. It is shown that despite the inherent limit cycle property of the relay feedback based control, an excellent performance in vibration suppression is attained due to the presence of a relatively large squeeze film damping origination from the air between the electrodes and levitated object. Using this scheme, a 4-inch silicon wafer was levitated stably with airgap variation decreasing down to $1 {\mu}m$ at an airgap of $100{\mu}m$.

A Study on Pumping Effect of Oxygen in Polysilicon Gate Etching

  • Kim, Nam-Hoon;Shin, Sung-Wook;Bin, Shin-Seok;Yu chang-Il kim;Chang, Eui-Goo
    • Transactions on Electrical and Electronic Materials
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    • 제1권2호
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    • pp.1-6
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    • 2000
  • This article presents the experiments and considerations possible about gate etching in polysilicon when oxygen gas is added in chamber, We propose the novel study with optical emission spectroscopy in polysilicon etching. It is shown that added oxygen gases play an important role in enhencement of density in chlorine gases as a scavenger of silicon from SiCl$\_$x/. And a small amount of Si-O bonds are deposited and then the deposited thin film protect silicon dioxyde against reaction chlorine with silicon in SiO$_2$. Consequently, we can improve the selectivity of polysilicon the silicon dioxide, which is clearly explained in this model.

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박형웨이퍼를 사용한 결정질 태양전지의 PC1D를 이용한 최적화

  • 임태규;정우원;이준신
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2009년도 추계학술대회 논문집
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    • pp.38-38
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    • 2009
  • Wafer thickness of crystalline silicon is an important factor which decides a price of solar cell. PC1D was used to fix a condition that is required to get a high efficiency in a crystalline silicon solar cell using thin wafer($150{\mu}m$). In this simulation, base resistivity and emitter doping concentration were used as variables. As a result of the simulation, $V_{oc}$=0.6338(V), $I_{sc}$=5.565(A), $P_{max}$=2.674(W), FF=0.76 and efficiency 17.516(%) were obtained when emitter doping concentration is $5{\times}10^{20}cm^{-3}$, depth factor is 0.04 and sheet resistance is $79.76{\Omega}/square$.

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2 차원 Si 종형 Hall 소자의 자기감도 개선 (Magnetic Sensitivity Improvement of 2-Dimensional Silicon Vertical Hall Device)

  • 류지구
    • 센서학회지
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    • 제23권6호
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    • pp.392-396
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    • 2014
  • The 2-dimensional silicon vertical Hall devices, which are sensitive to X,Y components of the magnetic field parallel to the surface of the chip, are fabricated using a modified bipolar process. It consists of the thin p-layer at Si-$SiO_2$ interface and n-epi layer to improve the sensitivity and influence of interface effect. Experimental samples are a sensor type K with and type J without $p^+$ isolation dam adjacent to the center current electrode. The results for both type show a more high sensitivity than the former's 2-dimensional vertical Hall devices and a good linearity. The measured non-linearity is about 0.8%. The sensitivity of type J and type K are about 66 V/AT and 200 V/AT, respectively. This sensor's behavior can be explained by the similar J-FET model.

Microstructural improvement in polycrystalline Si films by crystallizing with vapor transport of Al/Ni chlorides

  • Eom, Ji-Hye;Lee, Kye-Ung;Jun, Young-Kwon;Ahn, Byung-Tae
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2004년도 Asia Display / IMID 04
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    • pp.315-318
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    • 2004
  • We developed a vapor induced crystallization (VIC) process for the first time to obtain high quality polycrystalline Si films by sublimating the mixture of $AlCl_3$ and $NiCl_2$. The VIC process enhanced the crystallization of amorphous silicon thin films. The LPCVD amorphous silicon thin films were completely crystallized after 5 hours at 480 $^{\circ}C$. It is known that needle-like grains with very small width grow in the Ni-metal induced lateral crystallization. In our new method, the width of grains is larger because the grain can also grow perpendicular to the needle growth direction. Also the interface between the merging grain boundaries was coherent. As the results, a polycrystalline film with superior microstructure has been obtained.

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비정질 실리콘 박막 트랜지스터의 회로 해석 모델링 (Circuit Modeling of Amorphous Silicon Thin Film Transistor)

  • 최홍석;박진석;최연익;한민구
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1990년도 추계학술대회 논문집 학회본부
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    • pp.106-109
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    • 1990
  • We develop the analytical model of the static and dynamic characteristics of hydrogenated amorphous silicon thin film transistors. It is found out that, compared with the conventional MOS model, our a-Si model has been in better agreement with experimental static and dynamic results. It may be also suggested that our a-Si model is suitable for incorporation into a widely used curcuit simulation.

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Inverted Staggered-Type 비정질 실리콘 박막트랜지스터의 수치적 분석 (Numerical Analysis of Inverted Staggered-Type Hydrogenated Amorphous Silicon Thin Film Transistor)

  • 오창호;박진석;한민구
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1990년도 추계학술대회 논문집 학회본부
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    • pp.93-96
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    • 1990
  • The characteristics of an inverted staggered-type hydrogenated amorphous silicon thin film transistor has been analyzed by employing numerical simulation. The field effect mobility and threshold voltage are characterized as a function of density of deep and tail states and lattice temperature. It has been found that the density of deep states plays an important role of determining the threshold voltage, while the field effect mobility are very sensitive to the slope of band tail states. Also, the numerically temperature dependence of field effect mobility and threshold voltage has been in good agreements with the experimental results.

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중수소 프라즈마 처리가 다결정 실리콘 TFT의 안정성에 미치는 영향에 관한 연구 (A Study on the Effect of Plasma Deuterium Treatment on Reliability of Poly-Silicon Thin Film Transistors)

  • 손송호;배성찬;김동환
    • 한국재료학회지
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    • 제14권7호
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    • pp.516-521
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    • 2004
  • We applied a deuterium plasma treatment to the surface of polycrystalline silicon films using PECVD and observed the change with AFM, XRD, ET-IR, and SIMS measurement. A bias temperature stressing (BTS) test was carried out to evaluate the reliability of the thin-film transistors (TFT). TFTs with channel lengths as small as 2 ${\mu}m$ were electrically stressed fer up to 1000 sec at room temperature. From the parameter variation such as s-factor, leakage current and on/off ratio, we suggest that the deuterium plasma treatment suppress the hot carrier effect and improve the stability of TFTs.

비결정질 실리콘 박막 상에서의 광열 유동을 이용한 액적 조작 (A Droplet-Manipulation Method using Opto-thermal Flows on Amorphous Silicon Thin Film)

  • 이호림;윤진성;김동성;임근배
    • 한국정밀공학회지
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    • 제31권1호
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    • pp.91-96
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    • 2014
  • We present a droplet-manipulation method using opto-thermal flows in oils. The flows are originated from Marangoni and buoyancy effects due to temperature gradient, generated by the adsorption of light on an amorphous silicon thin film. Using this method, we can transport, merge and mix droplets in an extremely simple system. Since the temperature rise during the operation is small, this method can be used for biological applications without the damage on cell viability.