• 한국고분자학회:학술대회논문집
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• 한국고분자학회 2006년도 IUPAC International Symposium on Advanced Polymers for Emerging Technologies
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• pp.316-316
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• 2006

The preparation of an organic/inorganic polymer hybrid from a novolac derivatives is described. The hybrid was prepared by the acid-catalyzed solgel reaction of phenyl-trimethoxysilane (PhTMOS) in the presence of anisole novolac. The resulting film was transparent and showed a high heat stability. The dispersion of two components might be due to the utilization of the p-p interaction between the phenyl ring of the silica matrix and that of novolac. This makes it possible to prepare a hybrid glass having a highly content of novolac derivatives.

• 한국세라믹학회지
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• 제29권6호
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• pp.496-504
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• 1992

Alumina tubes suitable for the support of gas separation membranes have been prepared by the slipcasting technique. These supports have the average pore size of 0.1 ${\mu}{\textrm}{m}$ within the narrow distribution. The sol-gel dipcoating process of nanoparticulate sols is very sensitive to microstructure of the support, and the coating on the inside surface of the tube is found to be more successful than on the outside surface. Nanoparticulate silica sols (0.82 mol/ι) have been synthesized by an interfacial hydrolysis reaction between TEOS and high alkaline water. When coating an alumina tube with these sols, the minimum limits of the particle size and the aging time required for forming the coated gel layer at the given pH are provided. It is optimum to coat the support with less concentrated sols stabilized through aging for the appropriate time (more than 22 days) at the lower pH (pH 2.0) for producing a reproducible crack free thin film coating in composite membranes.

• 한국수소및신에너지학회논문집
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• 제1권1호
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• pp.9-14
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• 1989

Mixed photocatalyst containing cadmium sulfide and zinc sulfide was prepared on silica gel powder and Nafion film. Photo-irradiation of aqueous mixture containing the photocatalysis generated hydrogen by water cleavage reaction. Use of sodium sulfide as sacrificial reagent help the photo-reaction. Evolution of the hydrogen was measured by gas chromatographic analysis. Composition of the catalyst was determined by atomic absorption spectrophotometer. 0.2 mL of of hydrogen was generated per hour. The maximun catalytic activity was obtained after 8-12 hours later. Hydrogen generation efficiency by the two different catalytic system was compared and showed that the Nafion-based catalyst is more efficient than the silicagel-based catalyst for the photoreaction.

• 수산해양기술연구
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• 제32권2호
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• pp.157-163
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• 1996

To ceramic film, $SiO_2$ and $Al_2O_3$, coated on pure Fe and stainless steel(SUS41O) by RF magnetron sputtering, the adherence between mm and substarte was studied. The adherence index (${\chi}$) was determined by the measure of micro hardness test. Also, the corrosion resistance on oxide coatings was studied using electrochemical measurement. The main results obtained are as the following: 1) In the micro-hardness test, with $1{\mu}m$ thickness mm, it has only one the value of ${\chi}$. Above $2{\mu}$thickness fIlm, however, get another value of ${\chi}$as the cracks in fIlm. 2) The oxide fIlm adhere well on the mild materials such as pure steel than high intensity materials like stainless. 3) Alumina($Al_2O_3$) coated materials have better corrosion resistance than silica($SiO_2$)coated materials

• 태양에너지
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• 제6권2호
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• pp.70-75
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• 1986

The fabrication procedure and characteristics of $Ta_2O_5/Al/SiO_2/p-Si$ MIS solar cells forming a fine grating pattern of aluminum evaporated on to p-type silicon crystal are discribed. The proper temperature for oxide growing of these cells was found to be about $450^{\circ}C$ for 20 minutes with oxygen flow. The conversion efficiency increased about 3% after $750{\AA}$ thickness of tantalium silica film spin on anti-reflective coating. The best results showed that $V_{oc}=0.545V,\;J_{sc}=34mA$ and F.F = 0.65, which represent that the conversion efficiency is 12%.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2007년도 하계학술대회 논문집 Vol.8
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• pp.551-552
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• 2007

Coating films were prepared from silane-terminated Colloidal silaca(CS) and UV-curable acrylate resin. The silane-terminated CSs were synthesized from CS and methyltrimethoxysilane(MTMS) and then treated with 3-methacryloxypropyltrimethoxysilane(MAPTMS)/3-glycidoxypropyltrimethoxysilane( GPTMS)/vinyltrimethoxysilane(VTMS) by sol-gel process, respectively. The silane-terminated CS and acrylate resin were hybridized using UV-curing system. Thin films of hybrid material were prepared using spin coater on the glass. Their hardness, contact angle and transmittance improved with the addition of silane-terminated CS.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2004년도 하계학술대회 논문집 Vol.5 No.1
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• pp.313-316
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• 2004

Chemical mechanical polishing(CMP) process has been widely used to planarize dielectric layers, which can be applied to the integrated circuits for sub-micron technology. Despite the increased use of CMP process, it is difficult to accomplish the global planarization of in the defect-free inter-level dielectrics(ILD). we investigated the performance of $WO_3$ CMP used silica slurry, ceria slurry, tungsten slurry In this paper, the effects of addition oxidizer on the $WO_3$ CMP characteristics were investigated to obtain the higher removal rate and lower non-uniformity.

• 한국산학기술학회논문지
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• 제21권12호
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• pp.261-267
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• 2020

휴대용기기에 대한 경박단소 및 빠른 속도에 대한 요구는 반도체 패키징 기술에도 변화를 가져왔다. 이에 대한 대응의 하나로 stacked chip scale package(SCSP)가 업계에서 사용되고 있다. SCSP를 구현하기 위한 핵심소재 중의 하나가 die attach film(DAF)이다. 특히, 다이와 기판을 접착하거나 다이와 다이를 접착하는 경우, DAF의 접착필름은 기판의 단차나 본딩 와이어 사이를 기공의 발생 없이 채우기 위해 우수한 고온 유동성이 요구된다. 그러나 이 경우 경화 크랙의 발생을 최소화하기 위해 2단계 경화가 종종 요구되나, 공정시간 단축을 위해서는 1단계 경화가 바람직하다. 본 연구에서는 DAF 접착필름의 조성물을 경화 성분(에폭시 수지), 유연 성분(고무성분), 딱딱한 성분(페녹시수지, 실리카), 3개 군으로 분류하고, 조성물의 변화에 따른 1단계 경화시 경화 크랙, 고온 유동성, die attach (DA) 기공발생에 대한 영향을 혼합물 실험 설계법를 통해 살펴보았다. 경화 크랙은 딱딱한 성분 함량에 가장 크게 영향을 받았으며, 함량이 증가할수록 경화 크랙이 감소하였다. DA 기공의 발생은 딱딱한 성분의 함량이 감소할수록 감소하였으며, 특히, 딱딱한 성분의 함량이 적은 경우는 경화 성분의 함량이 감소할수록, 기공의 발생이 억제되었다. 고온 유동성은 100℃ 저장탄성 계수와 120℃에서의 블리드 아웃(BL-120)으로 평가되었다. 100℃의 고온 저장탄성률은 딱딱한 성분의 감소가 중요하였고, 유동성 지표인 BL-120의 경우는 경화 성분의 함량의 증가와 딱딱한 성분의 감소가 동시에 중요하였다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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• pp.393-393
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• 2012

Optically active nanostructures such as subwavelength moth-eye antireflective structures or surface enhanced Raman spectroscopy (SERS) active structures have been demonstrated to provide the effective suppression of unwanted reflections as in subwavelength structure (SWS) or effective enhancement of selective signals as in SERS. While various nanopatterning techniques such as photolithography, electron-beam lithography, wafer level nanoimprinting lithography, and interference lithography can be employed to fabricate these nanostructures, roll-to-roll (R2R) nanoimprinting is gaining interests due to its low cost, continuous, and scalable process. R2R nanoimprinting requires a master to produce a stamp that can be wrapped around a quartz roller for repeated nanoimprinting process. Among many possibilities, two different types of mask can be employed to fabricate optically active nanostructures. One is self-assembled Au nanoparticles on Si substrate by depositing Au film with sputtering followed by annealing process. The other is monolayer silica particles dissolved in ethanol spread on the wafer by spin-coating method. The process is optimized by considering the density of Au and silica nano particles, depth and shape of the patterns. The depth of the pattern can be controlled with dry etch process using reactive ion etching (RIE) with the mixture of SF6 and CHF3. The resultant nanostructures are characterized for their reflectance using UV-Vis-NIR spectrophotometer (Agilent technology, Cary 5000) and for surface morphology using scanning electron microscope (SEM, JEOL JSM-7100F). Once optimized, these optically active nanostructures can be used to replicate with roll-to-roll process or soft lithography for various applications including displays, solar cells, and biosensors.

• 한국안광학회지
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• 제13권3호
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• pp.73-77
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• 2008

목적: 본 논문은 저온열처리로 비결정 또는 결정 ZnO 박막의 UV emission 가능하다는 것이다. 방법: 화학적 용액법을 이용하여 소다-라임-실리카 유리 위에 100, 150, 200, 250 및 $300^{\circ}C$로 열처리하여 비정질 및 나노 결정질 ZnO 박막을 제조하였으며, 박막의 성장 특성 및 광학적 특성을 X-선 회절 분석법, 자외선-가시광선-근적외선 분광법 및 발광분석법을 통하여 분석하였다. 결과: $100^{\circ}C{\sim}200^{\circ}C$에서 60분간 열처리된 박막은 비정질 특성을 나타내고 있었으며, $250^{\circ}C$ 및 $300^{\circ}C$로 열처리된 박막에서는 ZnO 결정상이 나타났다. 비정질 ZnO 박막의 PL분석에 의하면 매우 강한 Near-band-edge emission이 나타났으며, Green emission은 거의 검출되지 않았다. 결론: 앞으로는 저온에서 ZnO 광전자소자를 쉽게 제조할 수 있을 것이다.