• 한국재료학회지
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• 제8권10호
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• pp.961-968
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• 1998

상변화형 광디스크의 보호막으로 사용되는 $ZnS-SiO_2$ 유전체막을 RF magnetron 스퍼트링방법에 의하여 제조하는 경우에 기판 바이어스전압의 영향을 조사하기 위하여, 알곤가스 분위기에서 ZnS(80mol%)-$SiO_2$(20mol%)타겟을 사용하여 Si Wafer와 Corning flass 위에 박막을 증착시켰다. 본 실험에서는 여러 실험 변수를 효과적으로 조절하면서 실험의 양을 줄이고 도시의 산포를 동시에 만족시키는 최적조건으로 타겟 RF 출력 200W, 기판 RF 출력 20W, 아르곤 압력 5mTorr과 증착시간 20분을 얻을 수 있었으며, 신뢰구간 95%에서 확인실험을 수행하였다. 증착된 박막의 열적 저항성을 측정하기 위해 $300^{\circ}C$와 $600^{\circ}C$에서 열처리시험을 수행하였고, Spectroscopic Ellipsometry 측정을 통한 광학적 데이터를 바탕으로 Bruggeman EMA(Effective Medium Approximation)방법을 이용하여 기공(void)분률을 측정하였다. 본 연구결과에 의하면 특성치 굴절률에 대하여 기판 바이어스인자와 증착시간 사이에는 서로 교호작용이 강하게 존재함을 확인할 수 있었다. TEM분석과 XRD 분석 결과에 의하면 기판 바이어스를 가한 최적조건에서 증착된 미세조직은 기존의 바이어스를 가하지 않을 조건에서 증착시킨 박막보다 미세한 구조를 가지며, 또한 과도한 바이어스전압은 결정구조의 조대화를 야기시켰다. 그리고 적절한 바이어스전압은 박막의 밀도를 증가시키며, 기공분률을 약 3.7%정도 감소시킴을 확인할 수 있었다.

• 한국세라믹학회지
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• 제12권1호
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• pp.23-28
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• 1975

The object of this study is to find the optimum conditions for crystal growth and kinds of crystal in ZnO-Al2O3-SiO2 glass composition. At first, the base glass composed of ZnO (44.7%), Al2O3(14.0%) and SiO2(41.3%) was melted in propane gas furnace at 1450-150$0^{\circ}C$ for an hour, and then it was poured into the stainless steel mould heated previously at $600^{\circ}C$ to obtain the thin glass test piece. Four crystal forms from base glass such as stuffed keatite, zinc orthosilicate, zinc aluminosilicate, and cristobalite were crystallized during heat treatment between 80$0^{\circ}C$ and 110$0^{\circ}C$. For the investigation of crystal growth, X-ray diffractometer and thermal differential analysis were used and the growth rate of the four crystal forms were obtained by the method of Archimedes specific gravity and intensity comparison of X-ray diffraction peak. The results obtained were as follows. 1) Stuffed keatite peaks which started to appear after two hours at 80$0^{\circ}C$ were maximum after 11 hours and this crystal breaks down to willemite irreversibly at about 100$0^{\circ}C$. 2) Development of gahnite started at 85$0^{\circ}C$ and increased with temperature growth. 3) Stuffed keatite which had been transformed slowly into willemite at 100$0^{\circ}C$ was decreased with time and willemite increased until four hours. 4) Cristobalite began to be developed after treatment of 110$0^{\circ}C$.

• 한국표면공학회지
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• 제38권4호
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• pp.144-149
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• 2005

ZnO박막을 R.F. sputtering방법으로 R.F Power와 기판온도를 공정변수로 하여 Si(100)과 $Al_2O_3(0001)$ 기판에 증착하였다. 공정변수에 따른 박막의 미세구조와 잔류응력 및 광학적 특성 등을 평가하였다. 전반적으로 R.F. Power증가에 따른 박막의 미세구조와 잔류응력 및 광학적 특성 등을 평가하였다. 전반적으로 R.F. Power증가에 따른 박막의 미세구조는 결정립이 커지면서 더 거칠어지는 것으로 나타났다. 기판온도 $800^{\cric}C$에서 증착된 박막의 경우, Si기판에 증착한 것보다 $Al_2O_3$기판에 증착된 박막의 막질이 우수한 것으로 나타났다. 박막의 잔류 응류변화는 R.F. Power 보다는 기판온도에 더 의존하는 것으로 나타났다. 대부분의 시편의 잔류응력이 공정변수인 기판온도가 증가할수록 작아지는 것으로 측정되었다. ZnO박막의 열안정성을 평가하기위해 열싸이클링을 실시하였다. 열싸이클링 결과 $Al_2O_3$(0001)기판에 증착된 박막이 Si(100)기판에 증착된 것보다 열안정성이 우수한 것으로 나타났다. PL측정의 경우, $Al_2O_3$기판에 증착된 ZnO박막이 Si기판에 증착된 것보다 UV영역의 발광이 크고 가시광선영역의 발광이 작은것으로 나타났다. 이것은 박막안의 결함이 작아서 낮은 잔류응력을 갖고 있기 때문인 것으로 생각된다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2001년도 하계학술대회 논문집
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• pp.290-294
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• 2001

In this study, ZnO is evaporated to be coated on n-type Si wafer substrate. Refractive coefficient of thin film that is evaporating TiO$_2$ onto ZnO increases linearly as thickness is getting thinner to have high value and high angle and it satisfies theoretical equation I(x)=Io exp (-$\alpha$x) theory that represents the strength of photon energy advancing through ZnO thin film. And dielectric constant of TiO$_2$ thin film evaporated onto ZnO is high and $\varepsilon$$_2$ is smaller than $\varepsilon$$_1$. The specimen TiO$_2$ thin film evaporated onto ZnO has much higher dielectric constant when photon energy is increased.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2006년도 추계학술대회 논문집 Vol.19
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• pp.145-146
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• 2006

The most Important research topic in the development of ZnO LED and LD is the production of p-type ZnO thin film that has minimal stress with outstanding stoichiometric ratio. In this study, Phosphorus diffused into the undoped ZnO thin films using the ampoule-tube method for the production of p-type znO thin films. The undoped ZnO thin films were deposited by RF magnetron sputtering system on $GaAs_{0.6}P_{0.4}$/GaP and Si wafers. 4N Phosphorus (P) was diffused into the undoped ZnO thin films in ampoule-tube which was performed and $630^{\circ}C$ during 3hr. We found the diffusion condition of the conductive ZnO films which had p-type properties with the highest mobility of above 532 $cm^2$/Vs compared with other studies PL spectra measured at 10K for the purpose of analyzing optical properties of p-type ZnO thin film showed strong PL intensity in the UV emission band around 365nm ~ 415nm and 365nm ~ 385nm.

• 한국세라믹학회지
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• 제50권1호
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• pp.57-62
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• 2013

We investigated the thermal and electrical properties of the $B_2O_3-ZnO-Bi_2O_3$ glass system as a sealing material in sheath heater modules. A composition with over 90 wt% $Bi_2O_3$ in the $B_2O_3-ZnO-Bi_2O_3$ system was glassified by controlling the cooling rate. The glass transition temperature and thermal expansion coefficient in bismate glass could be controlled by the minor ingredients of ZnO, $SiO_2$, $BaO_2$, and $K_2O$. The $B_2O_3-ZnO-Bi_2O_3$ glass system bonded well to metal, and bismate glass insulating properties were comparable to those of bismate glass $B_2O_3-ZnO-PbO$ glass system in a sheath heater module.

• 한국자기학회지
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• 제9권3호
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• pp.149-153
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• 1999

SiO2-CaO-V2O5 3원계 첨가물을 함유한 Mn-Zn 페라이트 저손실의 주파수 및 온도 의존성에 대해 조사하고 주된 자기손실기구에 대해 고찰하였다. 연쇄고온합성법에 의해 MnO:ZnO:FeO=36:11:53mol% 조성의 페라이트를 제조하였다. 자기손실의 주파수 의존 결과로부터 저주파에서는 자기이력손실이 고주파에서는 와전류손실이 지배적임을 제시하였고, 고저항 첨가제에 의해 비저항이증가할수록 자기이력손실이 감소하였다. 순수 Mn-Zn 페라이트의 경우 자기 손실은 온도 증가에 따라 증가하였으나, 입계저항제가 첨가된 시편의 경우 와전류손실의 감소로 약 4$0^{\circ}C$에 서 자기손실의 최소치가 나타났다.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2001년도 하계학술대회 논문집 C
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• pp.1390-1392
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• 2001

ZnO-based SAW(surface acoustic wave) filters are fabricated with the configuration of IDT/ZnO/$SiO_2$/Si(100) using various IDT materials such as Al, Cu/Ti, and Cu/Al. Their frequency response characteristics are measured and compared. The thickness of Al IDT is varied to examine the mass loading effect. In addition, effects of thermal treatment and electrical stress on the frequency responses of the fabricated SAW filters are investigated.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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• pp.329-329
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• 2016

Large-area graphene films produced by means of chemical vapor deposition (CVD) are polycrystalline and thus contain numerous grain boundaries that can greatly degrade their performance and produce inhomogeneous properties. A better grain boundary engineering in CVD graphene is essential to realize the full potential of graphene in large-scale applications. Here, we report a defect-selective atomic layer deposition (ALD) for stitching grain boundaries of CVD graphene with ZnO so as to increase the connectivity between grains. In the present ALD process, ZnO with hexagonal wurtzite structure was selectively grown mainly on the defect-rich grain boundaries to produce ZnO-stitched CVD graphene with well-connected grains. For the CVD graphene film after ZnO stitching, the inter-grain mobility is notably improved with only a little change in free carrier density. We also demonstrate how ZnO-stitched CVD graphene can be successfully integrated into wafer-scale arrays of top-gated field effect transistors on 4-inch Si and polymer substrates, revealing remarkable device-to-device uniformity.

• 한국세라믹학회지
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• 제46권6호
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• pp.673-678
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• 2009

The effect of MgO buffer layer on the structural properties of sputter-grown ZnO thin film was investigated. Sapphire (0001) and Si (100) substrate were used for the growth and MgO buffer layer was inserted between ZnO thin film and the substrate. X-ray diffraction pattern indicated that enhanced crystallinity in the ZnO thin film grown was achieved by inserting very thin MgO buffer layer, regardless of the substrate type. The strain in the ZnO thin film could also be controlled by the insertion of the MgO buffer layer, and tendency of the strain was strongly dependent on the substrate type.