• Bulletin of the Korean Chemical Society
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• v.20 no.4
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• pp.422-426
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• 1999

The Grignard reactions of bis(chloromethyl)dimethylsilane (1) with trimethylchlorosilane (2) in THF give both the intermolecular C-Si coupling and intramolecular C-C coupling products. At beginning stage, 1 reacts with Mg to give the mono-Grignard reagent ClCH2Me2SiCH2MgCl (1) which undergoes the C-Si coupling reaction to give MC2Si(CH2SiMe3)2 3, or C-C coupling to a mixture of formula Me3SiCH2(SiMe2CH2CH2)nR1 (n = 1, 2, 3, ..; 4a, R1I = H: 4b, R1 = SiMe3). In the reaction, two reaction pathways are involved: a) Ⅰ reacts with 2 to give Me3SiCH2SiMe2CH2Cl 6 which further reacts with Mg to afford a Me2SiCH2Mel-SiCH2MgCl (Ⅱ) or b) I cyclizes intramolecularly to a silacyclopropane intermediate A, which undergoes a ring-opening polymerization by the nucleophilic attack of the intermediates I or Ⅱ, followed by the termination reaction with H2O and 2, to give 4a and 4b, respectively. As the mole ratio of 2/1 increased from 2 to 16 folds, the formation of product 3 increased from 16% to 47% while the formation of polymeric products 4 was reduced from 60% to 40%. The intermolecular C-Si coupling reaction of the pathway a becomes more favorable than the intramolecular C-C coupling reaction of the pathways b at the higher mole ratio of 2/1.

• Bulletin of the Korean Chemical Society
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• v.24 no.6
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• pp.723-727
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• 2003

Recently the ab initio effective valence shell Hamiltonian method $H^v$ has been extended to treat spin-orbit coupling in atoms or molecules. The quasidegenerate many-body perturbation theory based $H^v$ method has an advantage of determining the spin-orbit coupling energies of all valence states for both the neutral species and its ions with a similar accuracy from a single computation of the effective spin-orbit coupling operator. The new spin-orbit $H^v$ method is applied to calculating the fine structure splittings of the valence states of SiH, $SiH^+$, and $SiH^{2+}$ not only to assess the accuracy of the method but also to investigate the spin-orbit interaction of highly excited states of SiH species. The computed spin-orbit splittings for ground states are in good agreement with experiment and the few available ab initio computations. The ordering of fine structure levels of the bound and quasi-bound spin-orbit coupled valence states of SiH and its ions, for which neither experiment nor theory is available, is predicted.

• Electrical & Electronic Materials
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• v.5 no.4
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• pp.393-399
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• 1992

In order to increase the coupling strength between bisphenol-A type epoxy resin and filler SiO$_{2}$ it was treated to filler with silane coupling agent[KBM-603]. To observe how silane coupling agent effects on dielectric breakdown strength of Epoxy/SiO$_{2}$ compound material, specimens of eight type were made like following. (A-1, A-2), (B-1, B-2), (C-1, C-2), (D-1, D-2) (see 2-2. Specimen) Specimen treated with silane coupling agent had always bigger dielectric breakdown strength than non-treated specimen. Under the influence of silane coupling agent, increment ratio of dielectric breakdown strength at specimen manufactured by hand drill was very bigger than that of specimen inserted spherical electrode. Therefore, as the specimen shape was varied, it was studied on effect that silane coupling agent affects on dielectric breakdown strength of Epoxy/SiO$_{2}$ compound material.

• Transactions of the Korean Society of Mechanical Engineers A
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• v.23 no.7 s.166
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• pp.1085-1093
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• 1999

Thickness effects of coupling agent on residual bending stress were investigated in $Polyimide/SiO_2$ joints during thermal cycling. Thickness and peel strength of $\gamma$-APS coupling agent were measured and correlated with solution concentration and residual bending stress. The variation of residual bending stress with temperature was also measured for various thicknesses of the coupling agent. Finite element results were compared with experimental data for residual bending stress in $Polyimide/SiO_2$ joints.

• Elastomers and Composites
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• v.53 no.3
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• pp.109-123
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• 2018

The effect of the silica content on the state and properties of silica-filled styrene-butadiene rubber/butadiene rubber (SBR/BR) compounds containing coupling and dispersion agents was evaluated by varying the content of silica from 50 to 120 phr. Bis-[(triethoxysilyl)propyl] tetrasulfide (TESPT) and zinc 2-ethylhexanoate (ZEH) were used as the coupling and dispersion agents, respectively. The maximum silica content in the pristine material was 80 phr, which increased to 120 phr upon the addition of TESPT and ZEH. The incorporation of TESPT considerably improved most of the rubber properties due to its coupling action and the suppression of silica flocculation, while further addition of ZEH resulted in additional improvements. The properties of the rubber compounds with different silica contents can be fully explained either by an enhancement of the rubber-silica interactions or by their deterioration due to an excessive amount of silica aggregates.

• Proceedings of the Korean Vacuum Society Conference
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• 1999.07a
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• pp.168-168
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• 1999

Recently, Fe/Si multilayered films (MLF) have been a focus of interest due to the strong antiferromagnetic (AF) coupling observed in such kind of MLF originates from the same nature as in the metal/metal MLF. In particular, a question of whether the spacer layer in the Fe/Si MLF is metallic or semiconducting is of interest. In spite of various experimental techniques envolved in the study, the chemical composition and the properties of the interfacial regions in the MLF exhibiting the AF coupling is still questionable. The nature of the AF coupling and the interfacial properties of Fe/Si MLF are investigated in this study. A series of Fe/Si MLF with a fixed nominal thickness of Fe(3nm) and a variable thickness of Sk(1.0-2.2nm) were deposited by RF-sputtering onto glass substrates at room temperature. The atomic structures and the actual sublayer thicknesses of the Fe/Si MLF are investigated by using x-ray diffraction. The magnetic-field dependence of the equatorial Kerr effect clearly shows an appearance of the AF coupling between Fe sublayers at tsi = 1.5 - 1.8 nm. the drastic discrepancies between the experimental magnetooptical (MO) and optical properties, and based on the assumption of sharp interfaces between Fe and Si sublayers leads to a conclusion that pure si is absent in the AF-coupled Fe/Si MLF. Introducing in the model nonmagnetic semiconducting FeSi alloy layers between Fe and Si sublayers or as spacer between pure Fe sublayers only slightly improves the agreement between model and experiment. A reasonable agreement between experimental and simulated MO spectra was reached with using the fitted optical properties for the spacer with a typical metallic type of behavior. The results of the magnetic properties measured by vibrating sample magnetometer and magnetic circular dichroism are also analyzed in connection with the MO and optical properties.

• Proceedings of the Korean Vacuum Society Conference
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• 2000.02a
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• pp.174-174
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• 2000

A strong antiferromagnetic coupling in Fe/Si multilayered films (MLF) had been recently discovered and much consideration has been given to whether the coupling in the Fe/Si MLF system has the same origin as the metal/metal MLF. Nevertheless, the nature of the interfacial ron silicide is still controversial. On one hand, a metal/ semiconductor structure was suggested with a narrow band-gap semiconducting $\varepsilon$-FeSi spacer that mediates the coupling. However, some features show that the nature of coupling can be well understood in terms of the conventional metal/metal multilayered system. It is well known that both magneto-optical (MO) and optical properties of a metal depend strongly on their electronic structure that is also correlated with the atomic and chemical ordering. In this study, the nature of the interfacial regions is the Fe/Si multilayers has been investigated by the experimental and computer-simulated MO and optical spectroscopies. The Fe/Si MLF were prepared by rf-sputtering onto glass substrates at room temperature with the number of repetition N=50. The thickness of Fe sublayer was fixed at 3.0nm while the Si sublayer thickness was varied from 1.0 to 2.0 nm. The topmost layer of all the Fe/Si MLF is Fe. In order to carry out the computer simulations, the information on the MO and optical parameters of the materials that may constitute a real multilayered structure should be known in advance. For this purpose, we also prepared Fe, Si, FeSi2 and FeSi samples. The structural characterization of Fe/Si MLF was performed by low- and high -angle x-ray diffraction with a Cu-K$\alpha$ radiation and by transmission electron microscopy. A bulk $\varepsilon$-FeSi was also investigated. The MO and optical properties were measured at room temperature in the 1.0-4.7 eV energy range. The theoretical simulations of MO and optical properties for the Fe/Si MLF were performed by solving exactly a multireflection problem using the scattering matrix approach assuming various stoichiometries of a nonmagnetic spacer separating the antiferromagnetically coupled Fe layers. The simulated spectra of a model structure of FeSi2 or $\varepsilon$-FeSi as the spacer turned out to fail in explaining the experimental spectra of the Fe/Si MLF in both intensity and shape. Thus, the decisive disagreement between experimental and simulated MO and optical properties ruled out the hypothesis of FeSi2 and $\varepsilon$-FeSi as the nonmagnetic spacer. By supposing the spontaneous formation of a metallic ζ-FeSi, a reasonable agreement between experimental and simulated MO and optical spectra was obtained.

• Elastomers and Composites
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• v.36 no.4
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• pp.237-245
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• 2001

A study was made on the chemical treatment of silica and silane coupling agents, bistriethox ysilylpropyltetrasulfide(Si 69) and ${\gamma}$-mercaptopropyltrimethoxy silane (MPS) for reinforcement of silica formulation. The effects of chemical treatment method and the most popular two coupling agents were examined. The results clearly indicate that the wet method, coupling agent is combined chemically with the silica prior to mixing, has more dispersion, wetting ability, dynamic properties and stability than the dry method, coupling agent is premixed directly with the silica. The mixing was done using a bench-type kneader having two mixing cam and a two-roll mill, under approximately similar conditions. The physical properties of SBR vulcanizates give rise to marked improvements by addition of Si 69 and MPS in comparison with without silane coupling agents. The optimum amount of Si 69 and MPS was 2 w/w% by experiments in the dry method but was 4 w/w% by EA and TGA analysis in the wet method.

• Journal of Sensor Science and Technology
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• v.29 no.3
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• pp.172-179
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• 2020

We studied an integrated-optic biosensor configuration that operates at a wavelength of 0.63 ㎛ based on the evanescent-wave and two horizontal mode power coupling of Si₃N₄ rib-optical waveguides formed on a Si/SiO₂/Si₃N₄/SiO₂ multilayer thin films. The sensor consists of a single-mode input waveguide, followed by a two-mode section which acts as the sensing region, and a Y-branch output for separating the two output waveguides. The coupling between the two propagating modes in the sensing region produces a periodically repeated optical power exchanges along the propagation. A light power was steered from one output channel to the other due to the change in the cladding layer (bio-material) refractive index, which affected the effective refractive index (phase-shift) of two modes through evanescent-wave. Waveguide analyses based on the rib optical waveguide dimensions were performed using various numerical computational software. Sensitivity values of 12~23 and 65~165 au/RIU, respectively for the width and length of 4 ㎛, and 3841.46 and 26250 ㎛ of the two-mode region corresponding to the refractive index range 1.36~1.43 and 1.398~1.41, respectively, were obtained.

• Journal of the Korean Magnetics Society
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• v.12 no.4
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• pp.132-136
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• 2002

Enhancement of crystallinity and exchange bias characteristics for NiFe/FeMn/NiFe trilayer with Si buffer layer fabricated by ion-beam deposition were examined. A Si buffer layer promoted (111) texture of fcc crystallities in the initial growth region of NiFe layer deposited on it. FeMn layers deposited on Si/NiFe bilayer exhibited excellent (111) crystal texture. The antiferromagnetic FeMn layer between top and bottom NiFe films with the buffer Si 50 ${\AA}$-thick induced a large exchange coupling field Hex with a different dependence. It was found that H$\sub$ex/ of the bottom and top NiFe films with Si buffer layer revealed large value of about 110 Oe and 300 Oe, respectively. In the comparison of two Ta and Si buffer layers, the NiFe/FeMn/NiFe trilayer with Si could possess larger exchange coupling field and higher crystallinity.