Study on Surface Analysis of TEOS Film by Change of Slurry Temperature in CMP Process (CMP 공정중 TEOS 막의 슬러리 온도 변화에 따른 표면 분석 연구)
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- Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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- 2005.07a
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- pp.645-646
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- 2005