• Title/Summary/Keyword: Si-O bond

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Hydrogen-bonded clusters in transformed Lewis acid to new Brønsted acid over WOx/SiO2 catalyst

  • Boonpai, Sirawat;Wannakao, Sippakorn;Panpranot, Joongjai;Praserthdam, Supareak;Chirawatkul, Prae;Praserthdam, Piyasan
    • Advances in nano research
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    • v.12 no.3
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    • pp.291-300
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    • 2022
  • The behavior of hydrogen species on the surface of the catalyst during the Lewis acid transformation to form Brønsted acid sites over the spherical silica-supported WOx catalyst was investigated. To understand the structure-activity relationship of Lewis acid transformation and hydrogen bonding interactions, we explore the potential of using the in situ diffuse reflection infrared Fourier transform spectroscopy (DRIFTS) with adsorbed ammonia and hydrogen exposure. From the results of in situ DRIFTS measurements, Lewis acid sites on surface catalysts were transformed into new Brønsted acid sites upon hydrogen exposure. The adsorbed NH3 on Lewis acid sites migrated to Brønsted acid sites forming NH4+. The results show that the dissociated H atoms present on the catalyst surface formed new Si-OH hydroxyl species - the new Brønsted acid site. Besides, the isolated Si-O-W species is the key towards H-bond and Si-OH formation. Additionally, the H atoms adsorbed surrounding the Si-O-W species of mono-oxo O=WO4 and di-oxo (O=)2WO2 species, where the Si-O-W species are the main species presented on the Inc-SSP catalysts than that of the IWI-SSP catalysts.

A Review on the Bonding Characteristics of SiCN for Low-temperature Cu Hybrid Bonding (저온 Cu 하이브리드 본딩을 위한 SiCN의 본딩 특성 리뷰)

  • Yeonju Kim;Sang Woo Park;Min Seong Jung;Ji Hun Kim;Jong Kyung Park
    • Journal of the Microelectronics and Packaging Society
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    • v.30 no.4
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    • pp.8-16
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    • 2023
  • The importance of next-generation packaging technologies is being emphasized as a solution as the miniaturization of devices reaches its limits. To address the bottleneck issue, there is an increasing need for 2.5D and 3D interconnect pitches. This aims to minimize signal delays while meeting requirements such as small size, low power consumption, and a high number of I/Os. Hybrid bonding technology is gaining attention as an alternative to conventional solder bumps due to their limitations such as miniaturization constraints and reliability issues in high-temperature processes. Recently, there has been active research conducted on SiCN to address and enhance the limitations of the Cu/SiO2 structure. This paper introduces the advantages of Cu/SiCN over the Cu/SiO2 structure, taking into account various deposition conditions including precursor, deposition temperature, and substrate temperature. Additionally, it provides insights into the core mechanisms of SiCN, such as the role of Dangling bonds and OH groups, and the effects of plasma surface treatment, which explain the differences from SiO2. Through this discussion, we aim to ultimately present the achievable advantages of applying the Cu/SiCN hybrid bonding structure.

Electrochemical Characteristics of Zn and Si Ion-doped HA Films on Ti-6Al-4V by PEO Treatment

  • Lim, Sang-Gyu;Hwang, In-Jo;Choe, Han-Cheol
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2016.11a
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    • pp.199-199
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    • 2016
  • Commercially pure titanium (cp-Ti) and Ti alloys (typically Ti-6Al-4V) display excellent corrosion resistance and biocompatibility. Although the chemical composition and topography are considered important, the mechanical properties of the material and the loading conditions in the host have, conventionally. Ti and its alloys are not bioactive. Therefore, they do not chemically bond to the bone, whereas they physically bond with bone tissue. The electrochemical deposition process provides an effective surface for biocompatibility because large surface area can be served to cell proliferation. Electrochemical deposition method is an attractive technique for the deposition of hydroxyapatite (HAp). However, the adhesions of these coatings to the Ti surface needs to be improved for clinical used. Plasma electrolyte oxidation (PEO) enables control in the chemical com position, porous structure, and thickness of the $TiO_2$ layer on Ti surface. In addition, previous studies h ave concluded that the presence of $Ca^{+2}$ and ${PO_4}^{3-}$ ion coating on porous $TiO_2$ surface induced adhesion strength between HAp and Ti surface during electrochemical deposition. Silicon (Si) in particular has been found to be essential for normal bone and cartilage growth and development. Zinc (Zn) plays very important roles in bone formation and immune system regulation, and is also the most abundant trace element in bone. The objective of this work was to study electrochemical characteristcs of Zn and Si coating on Ti-6Al-4V by PEO treatment. The coating process involves two steps: 1) formation of porous $TiO_2$ on Ti-6Al-4V at high potential. A pulsed DC power supply was employed. 2) Electrochemical tests were carried out using potentiodynamic and AC impedance methoeds. The morphology, the chemical composition, and the micro-structure an alysis of the sample were examined using FE-SEM, EDS, and XRD. The enhancements of the HAp forming ability arise from $Si/Zn-TiO_2$ surface, which has formed the reduction of the Si/Zn ions. The promising results successfully demonstrate the immense potential of $Si/Zn-TiO_2$ coatings in dental and biomaterials applications.

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The study on dry etching characteristics of ZnO thin films using high density plasma (고밀도 플라즈마를 이용한 ZnO 박막의 식각 특성)

  • Heo, Keyong-Moo;Woo, Jong-Chang;Kim, Chang-Il
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2010.06a
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    • pp.174-174
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    • 2010
  • In this article, the dry etching mechanism of ZnO thin films in $N_2/Cl_2$/Ar gas chemistry was investigated. The ZnO thin films were deposited on Si substrate using Atomic layer deposition. The etching experiments were performed by inductively coupled plasma system. The maximum etch rate was104.5 nm/min and the highest selectivity of ZnO over $SiO_2$ was 3.3. Etching rate was measured by surface profiler. And the chemical reaction on the surface of the etched ZnO thin films was investigated by x-ray photo electrons pectroscopy. As a result of XPS, $Zn2p_{3/2}$ peak shifted toward a higher binding energy and the O-O and N-O bond were obtained from the sample of ZnO thin film which after plasma treatment.

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The Study on Dielectric Property and Thermal Stability of $Ta_2O_{5}$ Thin-films ($Ta_2O_{5}$ 커패시터 박막의 유전 특성과 열 안정성에 관한 연구)

  • Kim, In-Seong;Lee, Dong-Yun;Song, Jae-Seong;Yun, Mu-Su;Park, Jeong-Hu
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.51 no.5
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    • pp.185-190
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    • 2002
  • Capacitor material utilized in the downsizing passive devices and dynamic random access memory(DRAM) requires the physical and electrical properties at given area such as capacitor thickness reduction, relative dielectric constant increase, low leakage current and thermal stability. Common capacitor materials, $SiO_2$, $Si_3N_4$, $SiO_2$/$Si_3N_4$,TaN and et al., used until recently have reached their physical limits in their application to several hundred angstrom scale capacitor. $Ta_2O_{5}$ is known to be a good alternative to the existing materials for the capacitor application because of its high dielectric constant (25 ~35), low leakage current and high breakdown strength. Despite the numerous investigations of $Ta_2O_{5}$ material, there have little been established the clear understanding of the annealing effect on capacitance characteristic and conduction mechanism, design and fabrication for $Ta_2O_{5}$ film capacitor. This study presents the structure-property relationship of reactive-sputtered $Ta_2O_{5}$ MIM capacitor structure processed by annealing in a vacuum. X-ray diffraction patterns skewed the existence of amorphous phase in as-deposited condition and the formation of preferentially oriented-$Ta_2O_{5}$ in 670, $700^{\circ}C$ annealing. On 670, $700^{\circ}C$ annealing under the vacuum, the leakage current decrease and the enhanced temperature-capacitance characteristic stability. and the leakage current behavior is stable irrespective of applied electric field. The results states that keeping $Ta_2O_{5}$ annealed at vacuum gives rise to improvement of electrical characteristics in the capacitor by reducing oxygen-vacancy and the broken bond between Ta and O.

Effect of various intraoral repair systems on the shear bond strength of composite resin to zirconia

  • Han, In-Hae;Kang, Dong-Wan;Chung, Chae-Heon;Choe, Han-Cheol;Son, Mee-Kyoung
    • The Journal of Advanced Prosthodontics
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    • v.5 no.3
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    • pp.248-255
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    • 2013
  • PURPOSE. This study compared the effect of three intraoral repair systems on the bond strength between composite resin and zirconia core. MATERIALS AND METHODS. Thirty zirconia specimens were divided into three groups according to the repair method: Group I-CoJet$^{TM}$ Repair System (3M ESPE) [chairside silica coating with $30{\mu}m$ $SiO_2$ + silanization + adhesive]; Group II-Ceramic Repair System (Ivoclar Vivadent) [etching with 37% phosphoric acid + Zirconia primer + adhesive]; Group III-Signum Zirconia Bond (Heraus) [Signum Zirconia Bond I + Signum Zirconia Bond II]. Composite resin was polymerized on each conditioned specimen. The shear bond strength was tested using a universal testing machine, and fracture sites were examined with FE-SEM. Surface morphology and wettability after surface treatments were examined additionally. The data of bond strengths were statistically analyzed with one-way ANOVA and Tamhane post hoc test (${\alpha}$=.05). RESULTS. Increased surface roughness and the highest wettability value were observed in the CoJet sand treated specimens. The specimens treated with 37% phosphoric acid and Signum Zirconia Bond I did not show any improvement of surface irregularity, and the lowest wettability value were found in 37% phosphoric acid treated specimens. There was no significant difference in the bond strengths between Group I ($7.80{\pm}0.76$ MPa) and III ($8.98{\pm}1.39$ MPa). Group II ($3.21{\pm}0.78$ MPa) showed a significant difference from other groups (P<.05). CONCLUSION. The use of Intraoral silica coating system and the application of Signum Zirconia Bond are effective for increasing the bond strength of composite resin to zirconia.

A Study on Durability of Sprayed Coating Layer in the Molten Zn-0.2% Al Alloy Bath (아연-0.2%알루미늄합금 용융도금액 중에서 용사층의 내구성에 관한 연구)

  • 강태영;임병문;최장현;김영식
    • Journal of Welding and Joining
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    • v.19 no.5
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    • pp.512-519
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    • 2001
  • Sink roll has been used in molten Zn-0.2%Al alloy bath of continuous galvanizing line in sinking and stabilizing process of the steel strip in molten metal bath. In this process, although the scraper scraps off the sink roll surface, the dross compounds is builded up on the sink roll surface and the life time of the sink roll is shorten by the dross compounds. The present study was investigated the application of the spray coating layer on sink roll body for improving durability In molten Zn-0.2%Al alloy. Through the durability tests in molten Zn-0.2%Al alloy with various ceramic and cermet coating layer, the optimum bond and top coating material was obtained. As the results, the system of STS430F base metal, WC-l7Co bond and $ZrO_2-SiO_2$ top coating was clarified to be the best quality of durability in molten Zn-0.2%Al alloy.

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Properties and pozzolanic reaction degree of tuff in cement-based composite

  • Yu, Lehua;Zhou, Shuangxi;Deng, Wenwu
    • Advances in concrete construction
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    • v.3 no.1
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    • pp.71-90
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    • 2015
  • In order to investigate the feasibility and advantage of tuff used as pozzolan in cement-based composite, the representative specimens of tuff were collected, and their chemical compositions, proportion of vitreous phase, mineral species, and rock structure were measured by chemical composition analysis, petrographic analysis, and XRD. Pozzolanic activity strength index of tuff was tested by the ratio of the compression strength of the tuff/cement mortar to that of a control cement mortar. Pozzolanic reaction degree, and the contents of CH and bond water in the tuff/cement paste were determined by selective hydrochloric acid dissolution, and DSC-TG, respectively. The tuffs were demonstrated to be qualified supplementary binding material in cement-based composite according to relevant standards. The tuffs possessed abundant $SiO_2+Al_2O_3$ on chemical composition and plentiful content of amorphous phase on rock texture. The pozzolanic reaction degrees of the tuffs in the tuff/cement pastes were gradually increased with prolongation of curing time. The consistency of CH consumption and pozzolanic reaction degree was revealed. Variation of the pozzolanic reaction degree was enhanced with the bond water content and relationship between them appeared to satisfy an approximating linear law. The fitting linear regression equation can be applied to mutual conversion between pozzolanic reaction degree and bond water content.

Synthesis and Characterization of Magnetic Core-shell ZnFe2O4@ZnO@SiO2 Nanoparticles (Magnetic Core-shell ZnFe2O4@ZnO@SiO2 Nanoparticle의 합성과 성질에 관한 연구)

  • Yoo, Jeong-Yeol;Lee, Young-Ki;Kim, Jong-Gyu
    • Journal of the Korean Chemical Society
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    • v.59 no.5
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    • pp.397-406
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    • 2015
  • ZnO, II-VI group inorganic compound semi-conductor, has been receiving much attention due to its wide applications in various fields. Since the ZnO has 3.37 eV of a wide band gap and 60 meV of big excitation binding energy, it is well-known material for various uses such the optical property, a semi-conductor, magnetism, antibiosis, photocatalyst, etc. When applied in the field of photocatalyst, many research studies have been actively conducted regarding magnetic materials and the core-shell structure to take on the need of recycling used materials. In this paper, magnetic core-shell ZnFe2O4@SiO2 nanoparticles (NPs) have been successfully synthesized through three steps. In order to analyze the structural characteristics of the synthesized substances, X-ray diffraction (XRD), scanning electron microscopy (SEM), and Fourier transform infrared spectroscopy (FT-IR) were used. The spinel structure of ZnFe2O4 and the wurtzite structure of ZnO were confirmed by XRD, and ZnO production rate was confirmed through the analysis of different concentrations of the precursors. The surface change of the synthesized materials was confirmed by SEM. The formation of SiO2 layer and the synthesis of ZnFe2O4@ZnO@SiO2 NPs were finally verified through the bond of Fe-O, Zn-O and Si-O-Si by FT-IR. The magnetic property of the synthesized materials was analyzed through the vibrating sample magnetometer (VSM). The increase and decrease in the magnetism were respectively confirmed by the results of the formed ZnO and SiO2 layer. The photocatalysis effect of the synthesized ZnFe2O4 @ZnO@SiO2 NPs was experimented in a black box (dark room) using methylene blue (MB) under UV irradiation.

Quantum Chemical Calculations of the Effect of Si-O Bond Length on X-ray Raman Scattering Features for MgSiO3 Perovskite (양자화학계산을 이용한 Si-O 결합길이가 MgSiO3 페로브스카이트의 X-선 Raman 산란 스펙트럼에 미치는 영향에 대한 연구)

  • Yi, Yoo Soo;Lee, Sung Keun
    • Journal of the Mineralogical Society of Korea
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    • v.27 no.1
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    • pp.1-15
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    • 2014
  • Probing the electronic structures of crystalline Mg-silicates at high pressure is essential for understanding the various macroscopic properties of mantle materials in Earth's interior. Quantum chemical calculations based on the density functional theory are used to explore the atomic configuration and electronic structures of Earth materials at high pressure. Here, we calculate the partial density of states (PDOS) and O K-edge energy-loss near-edge structure (ELNES) spectra for $MgSiO_3$ perovskite at 25 GPa and 120 GPa using the WIEN2k program based on the full-potential linearized projected augmented wave (FP-LPAW) method. The calculated PDOS and O K-edge ELNES spectra for $MgSiO_3$ Pv show significant pressure-induced changes in their characteristic spectral features and relative peak intensity. These changes in spectral features of $MgSiO_3$ Pv indicate that the pressure-induced changes in local atomic configuration around O atoms such as Si-O, O-O, and Mg-O length can induce the significant changes on the local electronic structures around O atoms. The result also indicates that the significant changes in O K-edge features can results from the topological densification at constant Si coordination number. This study can provide a unique opportunity to understand the atomistic origins of pressure-induced changes in local electronic structures of crystalline and amorphous $MgSiO_3$ at high pressure more systematically.