• Title/Summary/Keyword: Si tip

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Microgripper driven by E-T(Electro-Thermal) actuator (E-T(Electro-Thermal) 액츄에이터를 이용한 microgripper)

  • Park, Ho-Joon;Lee, Hyun-Ki;Pak, Jung-Ho
    • Proceedings of the KIEE Conference
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    • 1999.07g
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    • pp.3325-3327
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    • 1999
  • A microgripper driven by E-T (electro-thermal) actuators has been designed and fabricated by surface micromachining. This microgripper consists of two E-T actuators. Each actuator has two arms with different widths joined at the end to form a 'U' shape. The wider 'cold' arm has a narrow flexure at the end (anchor or electrode side) for easy bending, This actuator can be fabricated with only two masks - one for the sacrificial layer and the other for the poly-Si structure layer. An E-T actuator bends its arm due to unequal thermal expansion between the 'cold' arm and the 'hot' arm, This actuator tip moves laterally in an arcing motion towards the cold arm side when the structure is unevenly heated by the applied current. Therefore each microgripper is actuated inwards and can hold a micro object. The fabricated E-T actuator was operated in the range of $2{\sim}12V$ and $1{\sim}5mA$. and maximum tip displacement was $13.6{\mu}m$. This device may become useful in many applications because an E-T actuator can be designed and fabricated easily, and obtain large displacement.

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A Study on the Erosion of Wind Turbine Blade Leading Edge by Rain (강우에 의한 풍력 발전기 블레이드 전연부 침식 시험에 관한 연구)

  • Tae-Won Kim;Ki-Woong Moon;Jin-Hyuk Son;Bo-Jung Kim;Si-Hong Ryu;Chang-Bun Yoon
    • Journal of Wind Energy
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    • v.14 no.3
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    • pp.43-53
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    • 2023
  • To improve AEP, wind turbine blade lengths are increasing every year. As the length of blades increases, the blade tip speed also increases. Because of the increased tip speed, the impact energy between the leading edge and raindrops also increases. The increased impact energy is the primary factor contributing to erosion of the blade's leading edge. Blade leading edge erosion reduces aerodynamic performance, increases repair costs, and causes downtime. Therefore, numerous studies are being conducted on protective solutions and RET systems to prevent and delay erosion of the blade's leading edge. However, few institutions in Korea research protective solutions and RET systems. In this study, we aim to develop a laboratory-scale RET system. The developed RET system was based on the ASTM G73-10 standard. As a result of the RET, it was confirmed that the erosion tendency was similar to that of overseas institutions. In addition, the effectiveness of the RET system was verified by a maximum erosion rate of 0.0023 for an epoxy-based protective solution.

A Study on Nano/micro Pattern Fabrication of Metals by Using Mechanical Machining and Selective Deposition Technique (기계적 가공과 무전해 선택적 증착기술을 이용한 나노/마이크로 금속패턴 제작에 관한 연구)

  • Cho S.H.;Youn S.W.;Kang C.G.
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2005.06a
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    • pp.1507-1510
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    • 2005
  • This study was carried out as a part of the research on the development of a maskless and electroless process for fabricating metal micro/nanostructures by using a nanoindenter and an electroless deposition technique. $2-\mu{m}-deep$ indentation tests on Ni and Cu samples were performed. The elastic recovery of the Ni and Cu was 9.30% and 9.53% of the maximum penetration depth, respectively. The hardness and the elastic modulus were 1.56 GPa and 120 GPa for Ni and 1.49 GPa and 100 GPa for Cu. The effect of single-point diamond machining conditions such as the Berkovich tip orientation (0, 45, and $90^{\circ}$) and the normal load (0.1, 0.3, 0.5, 1, 3, and 5 mN), on both the deformation behavior and the morphology of cutting traces (such as width and depth) was investigated by constant-load scratch tests. The tip orientation had a significant influence on the coefficient of friction, which varied from 0.52-0.66 for Ni and from 0.46-0.61 for Cu. The crisscross-pattern sample showed that the tip orientation strongly affects the surface quality of the machined area during scratching. A selective deposition of Cu at the pit-like defect on a p-type Si(111) surface was also investigated. Preferential deposition of the Cu occurred at the surface defect sites of silicon wafers, indicating that those defect sites act as active sites for the deposition reaction. The shape of the Cu-deposited area was almost the same as that of the residual stress field.

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The Alar Extension Graft for Retracted Ala (Alar Extension Graft를 이용한 콧방울뒤당김의 교정)

  • Kim, Hyun soo;Roh, Si Gyun
    • Archives of Plastic Surgery
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    • v.36 no.1
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    • pp.66-74
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    • 2009
  • Purpose: The importance of the deformities in alar - columellar complex has been underestimated in Asian ethnic groups for the last decades. Fortunately, with increasing familiarity of the open rhinoplasty techniques, the anatomic details of the nasal tip have been pointed up. Definitely, having an interest and demand for improving the sub - normal relationship between the alar rim and columella are indebted for such growing of knowledge about nasal tip anatomy. However, it is true that any single procedure is not settled as versatile and fully confident modality to correct the retracted notching of the alar rim. With this article, I should like to propose another useful option for treating retracted ala. Methods: The author has tried to correct alar rim retraction by means of: (1) Triangular onlay septal cartilage graft on the lower lateral cartilage with the medial end fixed to the anterior surface of the lateral crus(Alar extension graft), (2) Inserting lateral end of the alar extension graft to the vestibular skin pocket in the form of a finger - in - groove, (3) using the vestibular skin in the form of an advancement flap, and (4) using the soft shield graft to prevent possible visible step - off of the alar margin. Results: The author applied an alar extension graft to 16 patients in order to correct a retracted ala for the last 27 months (August, 2003 - October, 2005). The distances from alar rim to long axis of nostril were improved to be within 2 mm in all of the cases, and also the shape of the alar rim changed to a round form. Nostril asymmetry (6%) in one case, temporary palpable step - off (18%) in three cases, temporary visible step - off (6%) in one case, and temporary paresthesia of the tip (25%) in four cases were observed. Conclusion: The alar extension graft is simple and efficacious. It does not need donor sites other than the operative field, and its results are predictable. In particular, since it may give structural intensity to a weak lower lateral cartilage, it may be preferentially used for the correction of a retracted ala that arises from hypoplastic lower lateral cartilage. Moreover intensified lower lateral cartilage also improves the esthetic shape of lobule.

A Study on Nano/Micro Pattern Fabrication of Metals by Using Mechanical Machining and Selective Deposition Technique (기계적 가공과 무전해 선택적 증착기술을 이용한 나노/마이크로 금속패턴 제작에 관한 연구)

  • Cho Sang-Hyun;Youn Sung-Won;Kang Chung-Gil
    • Journal of the Korean Society for Precision Engineering
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    • v.23 no.8 s.185
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    • pp.171-177
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    • 2006
  • This study was performed as a part of the research on the development of a maskless and electroless process for fabricating metal micro/nanostructures by using a nanoindenter and an electroless deposition technique. $2-{\mu}m$-deep indentation tests on Ni and Cu samples were performed. The elastic recovery of the Ni and Cu was 9.30% and 9.53% of the maximum penetration depth, respectively. The hardness and the elastic modulus were 1.56 GPa and 120 GPa for Ni and 1.51 GPa and 104 GPa for Cu. The effect of single-point diamond machining conditions such as the Berkovich tip orientation (0, 45, and $90^{\circ}$ ) and the normal load (0.1, 0.3, 0.5, 1, 3, and 5 mN), on both the deformation behavior and the morphology of cutting traces (such as width and depth) was investigated by constant-load scratch tests. The tip orientation had a significant influence on the coefficient of friction, which varied from 0.52-0.66 for Ni and from 0.46- 0.61 for Cu. The crisscross-pattern sample showed that the tip orientation strongly affects the surface quality of the machined are a during scratching. A selective deposition of Cu at the pit-like defect on a p-type Si(111) surface was also investigated. Preferential deposition of the Cu occurred at the surface defect sites of silicon wafers, indicating that those defect sites act as active sites for the deposition reaction. The shape of the Cu-deposited area was almost the same as that of the residual stress field.

Morphological and Chemical Analysis of Various Disposable Acupuncture Needles Used in South Korea

  • Dong Yong, Park;JiYoon, Ahn;Hyeon Jeong, Park;Doo Suk, Lee;Dae-Hyun, Jo;Jonghoon, Kim;Choulmin, Kim;Heebum, Chung;Ji Hye, Hwang
    • Journal of Pharmacopuncture
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    • v.25 no.4
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    • pp.382-389
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    • 2022
  • Objectives: The Korean Industrial Standard (KS) for sterile acupuncture needles was established in 2009 based on research on the quality control of acupuncture needles. We aimed to determine the quality of acupuncture needles available in South Korea in 2021 by examining their surface condition and chemical composition using field-emission scanning electron microscopy (FE-SEM) and energy-dispersive X-ray spectroscopy (EDS). Methods: In South Korea, there are 23 brands of acupuncture needles, and we examined 10-15 needles from each brand, resulting in a total of 285 needles. The microstructures of the needles were assessed by SEM. Using SEM images, we evaluated the acupuncture needle tips for the following defects/aspects: scratches, lumps, detached coating, bent tip, and tip sharpness. EDS was used to determine the chemical composition of the selected acupuncture needles. Results: Overall, 88.4% of 285 needles were found to have at least one type of abnormality. The most frequently observed abnormalities were scratches and dents on the surface (68.1%), followed by detached coating (63.2%), and lumps (61.8%); blunt tips were observed in about 24% of them. Of 252 needles with at least one defect, 86.9% had two or more types of defects. The ratio of the number of needles with any defect to that of needles without any defect varied among brands, ranging from 50% to 100%. Regarding foreign materials, higher proportions of Si and O were observed on the needles, indicating incomplete or detached silicone coating. Conclusion: The quality of acupuncture needles varied among brands, suggesting that further improvements can be made through various inspection methods.

Microfabrication of Submicron-size Hole on the Silicon Substrate using ICP etching

  • Lee, J.W.;Kim, J.W.;Jung, M.Y.;Kim, D.W.;Park, S.S.
    • Proceedings of the Korean Vacuum Society Conference
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    • 1999.07a
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    • pp.79-79
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    • 1999
  • The varous techniques for fabrication of si or metal tip as a field emission electron source have been reported due to great potential capabilities of flat panel display application. In this report, 240nm thermal oxide was initially grown at the p-type (100) (5-25 ohm-cm) 4 inch Si wafer and 310nm Si3N4 thin layer was deposited using low pressure chemical vapor deposition technique(LPCVD). The 2 micron size dot array was photolithographically patterned. The KOH anisotropic etching of the silicon substrate was utilized to provide V-groove formation. After formation of the V-groove shape, dry oxidation at 100$0^{\circ}C$ for 600 minutes was followed. In this procedure, the orientation dependent oxide growth was performed to have a etch-mask for dry etching. The thicknesses of the grown oxides on the (111) surface and on the (100) etch stop surface were found to be ~330nm and ~90nm, respectively. The reactive ion etching by 100 watt, 9 mtorr, 40 sccm Cl2 feed gas using inductively coupled plasma (ICP) system was performed in order to etch ~90nm SiO layer on the bottom of the etch stop and to etch the Si layer on the bottom. The 300 watt RF power was connected to the substrate in order to supply ~(-500)eV. The negative ion energy would enhance the directional anisotropic etching of the Cl2 RIE. After etching, remaining thickness of the oxide on the (111) was measured to be ~130nm by scanning electron microscopy.

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Effect of $SO_2$ on Leaf Tip Blight of Ginkgo biloba caused by Coniothyrium sp. (은행나무의 잎끝마름병에 미치는 $SO_2$ 의 영향)

  • Kang, Yun-Jie;Park, So-Hong;Lee, Du-Hyung;Bae, Gong-Young
    • Korean Journal of Environmental Agriculture
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    • v.18 no.2
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    • pp.179-184
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    • 1999
  • To examine the relationship between air pollution and occurrence of disease in plants, we investigated the alteration of physiology and biochemistry of Ginkgo biloba by inoculating with Coniothyrium sp. and fumigating with 0.1 ${\mu}l/l\;SO_{2-}$ Visual damage did not appear but photosynthesis, $CO_2$ use efficiency(CUE) and water use efficiency(WUE) were reduced when G. biloba was exposed to $SO_{2-}$for 7days (8 hours a day). When inoculated with Coniothyrium sp., the seventies of damage in G. biloba showed a threefold difference between $SO_{2-}$ treatment (SI) and $SO_{2-}$ free treatment (SFI) at day 42 from initial inoculation. Little difference was observed in sugar contents that may be used pathogens feed, among control, SFI and SI. In spite of the reduction in photosynthetic rate, sugar contents and CUE were maintained. WUE was enhanced 13% more at SI than SFI. The $CO_2$fixation boosted because of enhanced WUE, and thus sugar synthesis was not affected. In addition, sugar transport seems to be retarded for some internal alteration. Consequently, the severity of SI was more serious than that of SFI because Coniothyrium sp. easily invades into the physical texture of G. biloba weakened by $SO_2$ fumigation and because sugar was accumulated in leaves of G. biloba.

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Fabrication and Characteristics of Lateral Type Field Emitter Arrays

  • Lee, Jae-Hoon;Kwon, Ki-Rock;Lee, Myoung-Bok;Hahm, Sung-Ho;Park, Kyu-Man;Lee, Jung-Hee
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.2 no.2
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    • pp.93-101
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    • 2002
  • We have proposed and fabricated two lateral type field emission diodes, poly-Si emitter by utilizing the local oxidation of silicon (LOCOS) and GaN emitter using metal organic chemical vapor deposition (MOCVD) process. The fabricated poly-Si diode exhibited excellent electrical characteristics such as a very low turn-on voltage of 2 V and a high emission current of $300{\;}\bu\textrm{A}/tip$ at the anode-to-cathode voltage of 25 V. These superior field emission characteristics was speculated as a result of strong surface modification inducing a quasi-negative electron affinity and the increase of emitting sites due to local sharp protrusions by an appropriate activation treatment. In respect, two kinds of procedures were proposed for the fabrication of the lateral type GaN emitter: a selective etching method with electron cyclotron resonance-reactive ion etching (ECR-RIE) or a simple selective growth by utilizing $Si_3N_4$ film as a masking layer. The fabricated device using the ECR-RIE exhibited electrical characteristics such as a turn-on voltage of 35 V for $7\bu\textrm{m}$ gap and an emission current of~580 nA/l0tips at anode-to-cathode voltage of 100 V. These new field emission characteristics of GaN tips are believed to be due to a low electron affinity as well as the shorter inter-electrode distance. Compared to lateral type GaN field emission diode using ECR-RIE, re-grown GaN emitters shows sharper shape tips and shorter inter-electrode distance.

광전자 소자 응용을 위한 수직 정렬된 ZnO Nanorod Array를 이용한 계층 나노구조

  • Go, Yeong-Hwan;Yu, Jae-Su
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.08a
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    • pp.126-126
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    • 2011
  • 수직으로 정렬된 1차원 ZnO nanorod arrays (NRAs)는 효율적인 반사방지 특성의 기하학적 구조를 갖고 있어, 크기와 모양 그리고 정렬형태의 다양한 설계를 통해 빛의 흡수율과 광 추출효율을 증가시켜 광전소자 및 태양광 소자의 성능을 향상시킬 수 있으며, 최근 이러한 연구에 대한 관심이 집중되고 있다. 본 연구에서는 ZnO NRAs의 넓은 표면적과 불연속적인 독특한 표면을 활용하여 광학적 특성을 효과적으로 개선하였다. 실험을 위해, thermal evaporator를 사용하여 Au와 Ag 그리고 e-beam evaporator를 사용하여 $SiO_2$를 ZnO NRAs 표면에 여러 가지 조건으로 증착하여, 독특한 계층 나노구조의 형성과 광학적 특성을 관찰하였다. 표면 roughness가 큰 FTO/glass 위에 수열합성법을 통해 끝이 뾰족하고, 비스듬히 정렬된 ZnO nano-tip array에 Au를 증착할 경우 ZnO/Au core/shell 구조가 형성되며, Au의 광 흡수율이 매우 크게 증가함을 관찰할 수 있었다. 반면 flat한 표면위에 빽빽하게 수직으로 정렬된 ZnO NRAs를 성장시켜 그 위에 Ag를 증착할 경우, evaporated Ag flux가 ZnO nanorod의 사이에 scattered 되어 ZnO nanorod 기둥의 측면에 직경이 50 nm 이하인 nanoparticles이 decorated 되어 국소표면플라즈몬 현상이 관찰되었으며, 이러한 효과를 통해 입사되는 빛의 흡수율을 효과적으로 증가시킬 수 있었다. 또한, ZnO NRAs의 표면에 $SiO_2$를 e-beam evaporator를 이용하여 증착할 경우, 자연적으로 vapor flux와 ZnO nanorod 사이에 oblique angle이 $80^{\circ}$ 이상으로 증가하여 $SiO_2$ nanorods가 자발적으로 형성되어 ZnO/$SiO_2$ branch 계층형태의 나노구조를 제작할 수 있었다. 이러한 구조는 유효 graded refractive index profile로 인해 기존의 ZnO NRAs보다 개선된 반사방지 특성을 나타냈다. 이러한 계층 나노구조의 광학적 특성을 시뮬레이션을 통해 이론적으로 분석을 통해 광전자 소자의 성능의 개선에 대한 적용 가능성을 조사하였다.

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